ATE555421T1 - Lichtempfindliche zusammensetzung und negativ arbeitende flachdruckplatte - Google Patents

Lichtempfindliche zusammensetzung und negativ arbeitende flachdruckplatte

Info

Publication number
ATE555421T1
ATE555421T1 AT02007216T AT02007216T ATE555421T1 AT E555421 T1 ATE555421 T1 AT E555421T1 AT 02007216 T AT02007216 T AT 02007216T AT 02007216 T AT02007216 T AT 02007216T AT E555421 T1 ATE555421 T1 AT E555421T1
Authority
AT
Austria
Prior art keywords
light sensitive
sensitive composition
photosensitive composition
plant plate
negative plant
Prior art date
Application number
AT02007216T
Other languages
English (en)
Inventor
Kazuto Kunita
Original Assignee
Fujifilm Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujifilm Corp filed Critical Fujifilm Corp
Application granted granted Critical
Publication of ATE555421T1 publication Critical patent/ATE555421T1/de

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C1/00—Forme preparation
    • B41C1/10—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme
    • B41C1/1008—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme by removal or destruction of lithographic material on the lithographic support, e.g. by laser or spark ablation; by the use of materials rendered soluble or insoluble by heat exposure, e.g. by heat produced from a light to heat transforming system; by on-the-press exposure or on-the-press development, e.g. by the fountain of photolithographic materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/016—Diazonium salts or compounds
    • G03F7/021—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders
    • G03F7/0212—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders characterised by the polymeric binder or the macromolecular additives other than the diazo resins or the polymeric diazonium compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C1/00—Forme preparation
    • B41C1/10—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme
    • B41C1/1008—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme by removal or destruction of lithographic material on the lithographic support, e.g. by laser or spark ablation; by the use of materials rendered soluble or insoluble by heat exposure, e.g. by heat produced from a light to heat transforming system; by on-the-press exposure or on-the-press development, e.g. by the fountain of photolithographic materials
    • B41C1/1016—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme by removal or destruction of lithographic material on the lithographic support, e.g. by laser or spark ablation; by the use of materials rendered soluble or insoluble by heat exposure, e.g. by heat produced from a light to heat transforming system; by on-the-press exposure or on-the-press development, e.g. by the fountain of photolithographic materials characterised by structural details, e.g. protective layers, backcoat layers or several imaging layers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2201/00—Location, type or constituents of the non-imaging layers in lithographic printing formes
    • B41C2201/02—Cover layers; Protective layers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2201/00—Location, type or constituents of the non-imaging layers in lithographic printing formes
    • B41C2201/04—Intermediate layers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2201/00—Location, type or constituents of the non-imaging layers in lithographic printing formes
    • B41C2201/14—Location, type or constituents of the non-imaging layers in lithographic printing formes characterised by macromolecular organic compounds, e.g. binder, adhesives
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/04—Negative working, i.e. the non-exposed (non-imaged) areas are removed
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/06—Developable by an alkaline solution
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/22—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation characterised by organic non-macromolecular additives, e.g. dyes, UV-absorbers, plasticisers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/24—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation characterised by a macromolecular compound or binder obtained by reactions involving carbon-to-carbon unsaturated bonds, e.g. acrylics, vinyl polymers
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/145—Infrared
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/146—Laser beam
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/165—Thermal imaging composition

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Thermal Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Optics & Photonics (AREA)
  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Materials For Photolithography (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Printing Plates And Materials Therefor (AREA)
AT02007216T 2001-04-13 2002-03-27 Lichtempfindliche zusammensetzung und negativ arbeitende flachdruckplatte ATE555421T1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2001115598A JP4213876B2 (ja) 2001-04-13 2001-04-13 感光性組成物及びネガ型平版印刷版

Publications (1)

Publication Number Publication Date
ATE555421T1 true ATE555421T1 (de) 2012-05-15

Family

ID=18966469

Family Applications (1)

Application Number Title Priority Date Filing Date
AT02007216T ATE555421T1 (de) 2001-04-13 2002-03-27 Lichtempfindliche zusammensetzung und negativ arbeitende flachdruckplatte

Country Status (5)

Country Link
US (1) US6858373B2 (de)
EP (1) EP1249731B1 (de)
JP (1) JP4213876B2 (de)
CN (1) CN1288497C (de)
AT (1) ATE555421T1 (de)

Families Citing this family (57)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003252939A (ja) 2002-03-01 2003-09-10 Fuji Photo Film Co Ltd 光重合性組成物
US7569328B2 (en) * 2002-08-16 2009-08-04 Fujifilm Corporation Resin composition and thermo/photosensitive composition
JP2004126050A (ja) 2002-09-30 2004-04-22 Fuji Photo Film Co Ltd 平版印刷版原版
ATE428558T1 (de) * 2002-09-30 2009-05-15 Fujifilm Corp Polymerisierbare zusammensetzung und flachdruckplattenvorläufer
JP4137577B2 (ja) 2002-09-30 2008-08-20 富士フイルム株式会社 感光性組成物
EP1431032B1 (de) 2002-12-18 2015-12-09 FUJIFILM Corporation Polymerisierbare Zusammensetzung und lithographische Druckplattenvorläufer
JP4150261B2 (ja) 2003-01-14 2008-09-17 富士フイルム株式会社 平版印刷版原版の製版方法
JP2004252201A (ja) 2003-02-20 2004-09-09 Fuji Photo Film Co Ltd 平版印刷版原版
JP4299639B2 (ja) 2003-07-29 2009-07-22 富士フイルム株式会社 重合性組成物及びそれを用いた画像記録材料
JP2005099284A (ja) 2003-09-24 2005-04-14 Fuji Photo Film Co Ltd 感光性組成物及び平版印刷版原版
US7338742B2 (en) * 2003-10-08 2008-03-04 Hynix Semiconductor Inc. Photoresist polymer and photoresist composition containing the same
DE602005003552T2 (de) * 2004-01-13 2008-10-23 Nippon Paper Industries Co. Ltd. Wärmeempfindliches aufzeichungsmedium für laseraufzeichnungen
JP2006008880A (ja) * 2004-06-28 2006-01-12 Fuji Photo Film Co Ltd インクジェット記録用インク組成物およびこれを用いた平版印刷版の作製方法
JP4406617B2 (ja) * 2005-03-18 2010-02-03 富士フイルム株式会社 感光性組成物および平版印刷版原版
SG127749A1 (en) * 2005-05-11 2006-12-29 Agency Science Tech & Res Method and solution for forming anatase titanium dioxide, and titanium dioxide particles, colloidal dispersion and film
US9297092B2 (en) 2005-06-05 2016-03-29 Qd Vision, Inc. Compositions, optical component, system including an optical component, devices, and other products
US8845927B2 (en) * 2006-06-02 2014-09-30 Qd Vision, Inc. Functionalized nanoparticles and method
WO2010014205A1 (en) * 2008-07-28 2010-02-04 Qd Vision, Inc. Compositions, optical component, system including an optional component, devices, and other products
US8718437B2 (en) 2006-03-07 2014-05-06 Qd Vision, Inc. Compositions, optical component, system including an optical component, devices, and other products
US8849087B2 (en) * 2006-03-07 2014-09-30 Qd Vision, Inc. Compositions, optical component, system including an optical component, devices, and other products
US9874674B2 (en) 2006-03-07 2018-01-23 Samsung Electronics Co., Ltd. Compositions, optical component, system including an optical component, devices, and other products
EP1849600B1 (de) * 2006-04-25 2013-12-11 Eastman Kodak Company Einbrennbare strahlungsempfindliche Elemente mit hoher Chemikalienresistenz
US9212056B2 (en) 2006-06-02 2015-12-15 Qd Vision, Inc. Nanoparticle including multi-functional ligand and method
US7332253B1 (en) 2006-07-27 2008-02-19 Eastman Kodak Company Negative-working radiation-sensitive compositions and imageable materials
JP5022731B2 (ja) * 2007-02-20 2012-09-12 富士フイルム株式会社 重合性組成物、粘着性材料及び接着剤
JP5002295B2 (ja) * 2007-03-26 2012-08-15 富士フイルム株式会社 平版印刷版原版および平版印刷版の作製方法
CN101281370B (zh) * 2007-04-06 2012-05-30 村上精密制版（昆山）有限公司 一种低表面粘着性的感光性树脂组合物及其用途
US7732118B2 (en) * 2007-05-10 2010-06-08 Eastman Kodak Company Negative-working imageable elements and methods of use
JP2009091555A (ja) 2007-09-18 2009-04-30 Fujifilm Corp 硬化性組成物、画像形成材料及び平版印刷版原版
US7955781B2 (en) 2007-09-28 2011-06-07 Fujifilm Corporation Negative-working photosensitive material and negative-working planographic printing plate precursor
JP5448352B2 (ja) 2008-03-10 2014-03-19 富士フイルム株式会社 着色硬化性組成物、カラーフィルタ、及び、固体撮像素子
KR20090100262A (ko) 2008-03-18 2009-09-23 후지필름 가부시키가이샤 감광성 수지 조성물, 차광성 컬러필터와 그 제조 방법, 및 고체촬상소자
JP5535444B2 (ja) 2008-03-28 2014-07-02 富士フイルム株式会社 固体撮像素子用緑色硬化性組成物、固体撮像素子用カラーフィルタ及びその製造方法
JP5173528B2 (ja) 2008-03-28 2013-04-03 富士フイルム株式会社 感光性樹脂組成物、遮光性カラーフィルター及びその製造方法、並びに、固体撮像素子
JP5528677B2 (ja) 2008-03-31 2014-06-25 富士フイルム株式会社 重合性組成物、固体撮像素子用遮光性カラーフィルタ、固体撮像素子および固体撮像素子用遮光性カラーフィルタの製造方法
KR101441998B1 (ko) 2008-04-25 2014-09-18 후지필름 가부시키가이샤 중합성 조성물, 차광성 컬러필터, 흑색 경화성 조성물, 고체촬상소자용 차광성 컬러필터와 그 제조 방법, 및 고체촬상소자
WO2009151515A1 (en) 2008-05-06 2009-12-17 Qd Vision, Inc. Solid state lighting devices including quantum confined semiconductor nanoparticles
US9207385B2 (en) 2008-05-06 2015-12-08 Qd Vision, Inc. Lighting systems and devices including same
WO2009137053A1 (en) 2008-05-06 2009-11-12 Qd Vision, Inc. Optical components, systems including an optical component, and devices
JP5171506B2 (ja) 2008-06-30 2013-03-27 富士フイルム株式会社 新規化合物、重合性組成物、カラーフィルタ、及びその製造方法、固体撮像素子、並びに、平版印刷版原版
JP5171514B2 (ja) 2008-09-29 2013-03-27 富士フイルム株式会社 着色硬化性組成物、カラーフィルタ、及びカラーフィルタの製造方法
JP5127651B2 (ja) 2008-09-30 2013-01-23 富士フイルム株式会社 着色硬化性組成物、カラーフィルタ及びその製造方法、並びに固体撮像素子
JP5669386B2 (ja) 2009-01-15 2015-02-12 富士フイルム株式会社 新規化合物、重合性組成物、カラーフィルタ、及びその製造方法、固体撮像素子、並びに、平版印刷版原版
JP5710597B2 (ja) 2009-04-28 2015-04-30 キユーデイー・ビジヨン・インコーポレーテツド 光学材料、光学部品および方法
JP5622564B2 (ja) 2010-06-30 2014-11-12 富士フイルム株式会社 感光性組成物、パターン形成材料、並びに、これを用いた感光性膜、パターン形成方法、パターン膜、低屈折率膜、光学デバイス、及び、固体撮像素子
JP5976523B2 (ja) 2011-12-28 2016-08-23 富士フイルム株式会社 光学部材セット及びこれを用いた固体撮像素子
JP5922013B2 (ja) 2011-12-28 2016-05-24 富士フイルム株式会社 光学部材セット及びこれを用いた固体撮像素子
JP5934682B2 (ja) 2012-08-31 2016-06-15 富士フイルム株式会社 マイクロレンズ形成用又はカラーフィルターの下塗り膜形成用硬化性組成物、透明膜、マイクロレンズ、固体撮像素子、及び、硬化性組成物の製造方法
JP5894943B2 (ja) 2012-08-31 2016-03-30 富士フイルム株式会社 分散組成物、これを用いた硬化性組成物、透明膜、マイクロレンズ、マイクロレンズの製造方法、及び固体撮像素子
JP5909468B2 (ja) 2012-08-31 2016-04-26 富士フイルム株式会社 分散組成物、これを用いた硬化性組成物、透明膜、マイクロレンズ、及び固体撮像素子
EP2940081A4 (de) 2012-12-28 2016-01-06 Fujifilm Corp Härtbare harzzusammensetzung, infrarot-sperrfilter und festkörperbildgebungselement damit
WO2014104136A1 (ja) 2012-12-28 2014-07-03 富士フイルム株式会社 赤外線反射膜形成用の硬化性樹脂組成物、赤外線反射膜及びその製造方法、並びに赤外線カットフィルタ及びこれを用いた固体撮像素子
JP6097128B2 (ja) 2013-04-12 2017-03-15 富士フイルム株式会社 遠赤外線遮光層形成用組成物
US11199777B2 (en) 2013-12-26 2021-12-14 Nissan Chemical Industries, Ltd. Resist underlayer film-forming composition containing novolac polymer having secondary amino group
CN106459760A (zh) * 2014-06-20 2017-02-22 米兰集团 包括具有交联表面的辐射敏感可成像层的平版印刷板前体
CN109852202B (zh) * 2019-01-09 2021-05-14 山西大学 含有苯并杂环骨架的硫酯作为紫外光吸收剂的应用
CN109733082B (zh) * 2019-02-21 2021-04-06 界首市兴华渔具有限公司 一种仿生鱼饵水转印上色工艺

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5691114A (en) * 1996-03-12 1997-11-25 Eastman Kodak Company Method of imaging of lithographic printing plates using laser ablation
US5759742A (en) * 1996-09-25 1998-06-02 Eastman Kodak Company Photosensitive element having integral thermally bleachable mask and method of use
JP3980201B2 (ja) * 1998-10-29 2007-09-26 株式会社日本触媒 レジスト組成物およびそれを用いたレジストパターン形成方法
JP4037015B2 (ja) * 1999-09-22 2008-01-23 富士フイルム株式会社 光重合性組成物、画像形成材料及び平版印刷版用版材
US20010054363A1 (en) * 2000-05-16 2001-12-27 Yusuke Nakazawa Computer-to-cylinder recording type lithographic printing method and computer-to-cylinder recording type lithographic printing apparatus
CN100470365C (zh) * 2001-01-12 2009-03-18 富士胶片株式会社 正型成像材料
JP4171589B2 (ja) * 2001-03-07 2008-10-22 富士フイルム株式会社 平版印刷版用原版
JP4414607B2 (ja) * 2001-03-14 2010-02-10 富士フイルム株式会社 ラジカル重合性化合物
US6551757B1 (en) * 2001-05-24 2003-04-22 Eastman Kodak Company Negative-working thermal imaging member and methods of imaging and printing

Also Published As

Publication number Publication date
JP4213876B2 (ja) 2009-01-21
CN1288497C (zh) 2006-12-06
EP1249731A2 (de) 2002-10-16
EP1249731A3 (de) 2006-07-05
US20030091933A1 (en) 2003-05-15
CN1388412A (zh) 2003-01-01
JP2002311569A (ja) 2002-10-23
EP1249731B1 (de) 2012-04-25
US6858373B2 (en) 2005-02-22

Similar Documents

Publication Publication Date Title
ATE555421T1 (de) Lichtempfindliche zusammensetzung und negativ arbeitende flachdruckplatte
ATE412202T1 (de) Lichtempfindliche zusammensetzung und lithographischer druckplattenvorläufer
DE60108826D1 (de) Photoempfindliche, lithographische Druckplattenvorstufe
ATE428558T1 (de) Polymerisierbare zusammensetzung und flachdruckplattenvorläufer
AR057914A1 (es) Compuestos organicos de azufre y su uso
CA2374207A1 (en) A process for making a flexographic printing plate and a photosensitive element for use in the process
JP2002244289A5 (de)
EP1736477A4 (de) Fluorhaltige verbindung, wasserabstossende zusammensetzung und dünner film
JP2004117688A5 (de)
DE60200706D1 (de) Negativ arbeitende lichtempfindliche Zusammensetzung und negativ arbeitende lichtempfindliche lithographische Druckplatte
ATE435124T1 (de) Bilderzeugungsmaterial und ammoniumverbindung
JP2002049156A5 (de)
DK0619806T3 (da) Fremstilling af substituerede piperidiner
EP1335247A3 (de) Lichtempfindliche Zusammensetzung, lichtempfindlicher Flachdruckplattenvorläufer und Bilderzeugungsverfahren
DE602004009846D1 (de) Flachdruckplattenvorläufer
JP2000231194A5 (de)
TW200512543A (en) Polyamide resin, positive-working photosensitive resin composition, method for producing pattern-formed resin film, semiconductor device, display device, and method for producing the semiconductor device and the display device
DE60314794D1 (de) IR-photoempfindliche Zusammensetzung
ATE541239T1 (de) Lichtempfindliche zusammensetzung
KR920005847A (ko) 수중 오염방지 조성물
JP2002006495A5 (de)
JP2004078105A5 (de)
DE602004011160D1 (de) Photosensible Zusammensetzung und lithographischer Druckplattenvorläufer, der diese Zusammensetzung verwendet.
JP2004077810A5 (de)
ATE527577T1 (de) Lichtempfindliche polymerzusammensetzung, prozess zur erzeugung einer struktur und elektronisches teil