ATE541239T1 - Lichtempfindliche zusammensetzung - Google Patents

Lichtempfindliche zusammensetzung

Info

Publication number
ATE541239T1
ATE541239T1 AT06014591T AT06014591T ATE541239T1 AT E541239 T1 ATE541239 T1 AT E541239T1 AT 06014591 T AT06014591 T AT 06014591T AT 06014591 T AT06014591 T AT 06014591T AT E541239 T1 ATE541239 T1 AT E541239T1
Authority
AT
Austria
Prior art keywords
photosensitive composition
radical
acid
base
compound capable
Prior art date
Application number
AT06014591T
Other languages
English (en)
Inventor
Naoyuki Hanaki
Original Assignee
Fujifilm Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujifilm Corp filed Critical Fujifilm Corp
Application granted granted Critical
Publication of ATE541239T1 publication Critical patent/ATE541239T1/de

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Materials For Photolithography (AREA)
  • Polymerisation Methods In General (AREA)
AT06014591T 2005-07-13 2006-07-13 Lichtempfindliche zusammensetzung ATE541239T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2005204539 2005-07-13
JP2005204538 2005-07-13

Publications (1)

Publication Number Publication Date
ATE541239T1 true ATE541239T1 (de) 2012-01-15

Family

ID=37398971

Family Applications (1)

Application Number Title Priority Date Filing Date
AT06014591T ATE541239T1 (de) 2005-07-13 2006-07-13 Lichtempfindliche zusammensetzung

Country Status (3)

Country Link
US (1) US20070015087A1 (de)
EP (1) EP1744212B1 (de)
AT (1) ATE541239T1 (de)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20090208692A1 (en) * 2007-12-17 2009-08-20 Flexplay Technologies, Inc. Limited life optical media
CN101983188A (zh) * 2008-04-01 2011-03-02 安斯泰来制药有限公司 吲哚啉酮化合物
US9886368B2 (en) * 2016-05-23 2018-02-06 International Business Machines Corporation Runtime detection of uninitialized variable across functions
CN109283793B (zh) 2018-10-16 2021-02-23 武汉华星光电半导体显示技术有限公司 光刻胶及其制备方法
CN111410705B (zh) * 2020-05-21 2021-07-06 北京航空航天大学 多组分光引发体系及光致聚合物材料

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4239848A (en) * 1979-02-26 1980-12-16 Eastman Kodak Company Photocrosslinkable carbonyl-containing polymeric composition and element with cobalt complex
JP4130030B2 (ja) * 1999-03-09 2008-08-06 富士フイルム株式会社 感光性組成物および１，３−ジヒドロ−１−オキソ−２ｈ−インデン誘導体化合物
US6335144B1 (en) * 1999-04-27 2002-01-01 Fuji Photo Film Co., Ltd. Photopolymerizable composition for short wavelength semiconductor laser exposure
JP2003043673A (ja) * 2001-07-26 2003-02-13 Fuji Photo Film Co Ltd 光重合性平版印刷版の製版方法
JP4581387B2 (ja) * 2003-02-21 2010-11-17 三菱化学株式会社 感光性樹脂組成物、並びにそれを用いた感光性画像形成材料及び感光性画像形成材
JP4570857B2 (ja) * 2003-03-31 2010-10-27 富士フイルム株式会社 感光性組成物及び平版印刷版原版

Also Published As

Publication number Publication date
US20070015087A1 (en) 2007-01-18
EP1744212A2 (de) 2007-01-17
EP1744212A3 (de) 2011-02-09
EP1744212B1 (de) 2012-01-11

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