JP4813321B2 - 静電チャックの洗浄方法 - Google Patents
静電チャックの洗浄方法 Download PDFInfo
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- JP4813321B2 JP4813321B2 JP2006280832A JP2006280832A JP4813321B2 JP 4813321 B2 JP4813321 B2 JP 4813321B2 JP 2006280832 A JP2006280832 A JP 2006280832A JP 2006280832 A JP2006280832 A JP 2006280832A JP 4813321 B2 JP4813321 B2 JP 4813321B2
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- cleaning
- electrostatic chuck
- aromatic hydrocarbon
- electrostatic
- hydrocarbon compound
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- 238000004140 cleaning Methods 0.000 title claims description 46
- 238000000034 method Methods 0.000 title claims description 24
- 239000000919 ceramic Substances 0.000 claims description 17
- 150000004945 aromatic hydrocarbons Chemical class 0.000 claims description 14
- 239000007788 liquid Substances 0.000 claims description 11
- 238000005422 blasting Methods 0.000 claims description 8
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims description 6
- 238000001179 sorption measurement Methods 0.000 claims description 5
- 229910052783 alkali metal Inorganic materials 0.000 claims description 3
- 150000001340 alkali metals Chemical class 0.000 claims description 3
- 229910052784 alkaline earth metal Inorganic materials 0.000 claims description 3
- 150000001342 alkaline earth metals Chemical class 0.000 claims description 3
- 229910052742 iron Inorganic materials 0.000 claims description 3
- 238000001095 inductively coupled plasma mass spectrometry Methods 0.000 claims description 2
- 238000004381 surface treatment Methods 0.000 claims description 2
- 239000004094 surface-active agent Substances 0.000 claims 1
- 238000010438 heat treatment Methods 0.000 description 21
- 229910052751 metal Inorganic materials 0.000 description 18
- 239000002184 metal Substances 0.000 description 17
- 239000002736 nonionic surfactant Substances 0.000 description 17
- 239000000356 contaminant Substances 0.000 description 11
- 238000004519 manufacturing process Methods 0.000 description 11
- 239000000463 material Substances 0.000 description 11
- 230000000052 comparative effect Effects 0.000 description 9
- 238000005219 brazing Methods 0.000 description 8
- 238000007654 immersion Methods 0.000 description 8
- 239000003945 anionic surfactant Substances 0.000 description 7
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 6
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 6
- 235000014113 dietary fatty acids Nutrition 0.000 description 6
- 229930195729 fatty acid Natural products 0.000 description 6
- 239000000194 fatty acid Substances 0.000 description 6
- 150000004996 alkyl benzenes Chemical class 0.000 description 5
- -1 bicyclic aromatic compound Chemical class 0.000 description 5
- 230000000694 effects Effects 0.000 description 5
- 150000002739 metals Chemical class 0.000 description 5
- 239000004065 semiconductor Substances 0.000 description 5
- UFWIBTONFRDIAS-UHFFFAOYSA-N Naphthalene Chemical compound C1=CC=CC2=CC=CC=C21 UFWIBTONFRDIAS-UHFFFAOYSA-N 0.000 description 4
- 239000002253 acid Substances 0.000 description 4
- 239000002585 base Substances 0.000 description 4
- 150000004665 fatty acids Chemical class 0.000 description 4
- 238000010304 firing Methods 0.000 description 4
- 238000005530 etching Methods 0.000 description 3
- 238000000227 grinding Methods 0.000 description 3
- 229910052759 nickel Inorganic materials 0.000 description 3
- 238000005245 sintering Methods 0.000 description 3
- 239000000758 substrate Substances 0.000 description 3
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 2
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 2
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 2
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 2
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 2
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 2
- 150000005215 alkyl ethers Chemical class 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 235000011089 carbon dioxide Nutrition 0.000 description 2
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 2
- PQNFLJBBNBOBRQ-UHFFFAOYSA-N indane Chemical compound C1=CC=C2CCCC2=C1 PQNFLJBBNBOBRQ-UHFFFAOYSA-N 0.000 description 2
- 239000011812 mixed powder Substances 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 229910052750 molybdenum Inorganic materials 0.000 description 2
- 239000011733 molybdenum Substances 0.000 description 2
- 229910017604 nitric acid Inorganic materials 0.000 description 2
- 229910052575 non-oxide ceramic Inorganic materials 0.000 description 2
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 2
- 229920001515 polyalkylene glycol Polymers 0.000 description 2
- 229910052709 silver Inorganic materials 0.000 description 2
- 239000004332 silver Substances 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 239000010936 titanium Substances 0.000 description 2
- 229910052719 titanium Inorganic materials 0.000 description 2
- 239000008096 xylene Substances 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 1
- 229920003171 Poly (ethylene oxide) Polymers 0.000 description 1
- 229930006000 Sucrose Natural products 0.000 description 1
- 150000003973 alkyl amines Chemical class 0.000 description 1
- 125000002947 alkylene group Chemical group 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 239000012298 atmosphere Substances 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 239000012159 carrier gas Substances 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000012459 cleaning agent Substances 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- PMHQVHHXPFUNSP-UHFFFAOYSA-M copper(1+);methylsulfanylmethane;bromide Chemical compound Br[Cu].CSC PMHQVHHXPFUNSP-UHFFFAOYSA-M 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 230000008878 coupling Effects 0.000 description 1
- 238000010168 coupling process Methods 0.000 description 1
- 238000005859 coupling reaction Methods 0.000 description 1
- 150000005690 diesters Chemical class 0.000 description 1
- 239000012895 dilution Substances 0.000 description 1
- 238000010790 dilution Methods 0.000 description 1
- 239000003344 environmental pollutant Substances 0.000 description 1
- LYCAIKOWRPUZTN-UHFFFAOYSA-N ethylene glycol Natural products OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 1
- 239000012530 fluid Substances 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 238000007731 hot pressing Methods 0.000 description 1
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 230000001939 inductive effect Effects 0.000 description 1
- 238000009616 inductively coupled plasma Methods 0.000 description 1
- 238000010030 laminating Methods 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 125000002950 monocyclic group Chemical group 0.000 description 1
- 239000011225 non-oxide ceramic Substances 0.000 description 1
- 229910052574 oxide ceramic Inorganic materials 0.000 description 1
- 239000011224 oxide ceramic Substances 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 150000008379 phenol ethers Chemical class 0.000 description 1
- 238000000918 plasma mass spectrometry Methods 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 231100000719 pollutant Toxicity 0.000 description 1
- 229920001521 polyalkylene glycol ether Polymers 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 229910001404 rare earth metal oxide Inorganic materials 0.000 description 1
- 239000003870 refractory metal Substances 0.000 description 1
- 229920002379 silicone rubber Polymers 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
- 239000005720 sucrose Substances 0.000 description 1
- 150000005846 sugar alcohols Polymers 0.000 description 1
- 230000003746 surface roughness Effects 0.000 description 1
- 238000002230 thermal chemical vapour deposition Methods 0.000 description 1
- 238000007751 thermal spraying Methods 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
- 229910021642 ultra pure water Inorganic materials 0.000 description 1
- 239000012498 ultrapure water Substances 0.000 description 1
- 238000004506 ultrasonic cleaning Methods 0.000 description 1
- 229910052720 vanadium Inorganic materials 0.000 description 1
- GPPXJZIENCGNKB-UHFFFAOYSA-N vanadium Chemical compound [V]#[V] GPPXJZIENCGNKB-UHFFFAOYSA-N 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- 238000009736 wetting Methods 0.000 description 1
- 229910052845 zircon Inorganic materials 0.000 description 1
- GFQYVLUOOAAOGM-UHFFFAOYSA-N zirconium(iv) silicate Chemical compound [Zr+4].[O-][Si]([O-])([O-])[O-] GFQYVLUOOAAOGM-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Cleaning Or Drying Semiconductors (AREA)
- Cleaning In General (AREA)
- Cleaning By Liquid Or Steam (AREA)
Description
メタノールによる超音波洗浄を10分行った後、キシレン系の芳香族炭化水素系化合物を用いた洗浄液で30分浸漬洗浄を行った。次にメタノールによる浸漬洗浄を30分行い、CO2ブラストを20分行う。硝酸(2%)洗浄を1分、超純水による洗い流しを5分行い、乾燥機で乾燥させた。
脂肪酸アルカノールアミド型の非イオン系界面活性剤を用い、浸漬洗浄時間を40分にした以外は実施例1と同様の方法で洗浄を行った。
ポリオキシエチレンアルキルエーテル型の非イオン系界面活性剤を用い、浸漬洗浄時間を20分にした以外は実施例1と同様の方法で洗浄を行った。
キシレン系の芳香族炭化水素系化合物および脂肪酸アルカノールアミド型の非イオン系界面活性剤を2:1で混合した洗浄剤を用い、浸漬洗浄時間を30分にした以外は実施例1と同様の方法で洗浄を行った。
直鎖アルキルベンゼン系の陰イオン系界面活性剤を用い、浸漬洗浄時間を30分にした以外は実施例1と同様の方法で洗浄を行った。
CO2ブラストによる工程を除外した以外は実施例1と同様の方法で洗浄を行った。
直鎖アルキルベンゼン系の陰イオン系界面活性剤を用い、浸漬洗浄時間を30分にした以外は実施例1と同様の方法で洗浄を行った後、大気中、500℃での加熱処理を行った。
直鎖アルキルベンゼン系の陰イオン系界面活性剤を用い、浸漬洗浄時間を30分にした以外は実施例1と同様の方法で洗浄を行った後、大気中、1000℃での加熱処理を行った。
Claims (2)
- 内部電極に給電端子がロウ付け接合され、吸着面がSi 3 N 4 またはAlNを主成分とするセラミックスである静電チャックの洗浄方法であって、芳香族炭化水素系化合物および/または非イオン系界面活性剤を用いた洗浄液に浸漬する工程と、
その後、CO2ブラストによる表面処理を行う工程と、
を含むことを特徴とする静電チャックの洗浄方法。 - 洗浄後の静電チャック表面の誘導結合プラズマ質量分析によるアルカリ金属、アルカリ土類金属または鉄の各元素が300×1010atoms/cm2以下であることを特徴とする請求項1記載の静電チャックの洗浄方法。
Priority Applications (1)
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---|---|---|---|
JP2006280832A JP4813321B2 (ja) | 2006-10-16 | 2006-10-16 | 静電チャックの洗浄方法 |
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JP2006280832A JP4813321B2 (ja) | 2006-10-16 | 2006-10-16 | 静電チャックの洗浄方法 |
Publications (2)
Publication Number | Publication Date |
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JP2008093615A JP2008093615A (ja) | 2008-04-24 |
JP4813321B2 true JP4813321B2 (ja) | 2011-11-09 |
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JP2006280832A Expired - Fee Related JP4813321B2 (ja) | 2006-10-16 | 2006-10-16 | 静電チャックの洗浄方法 |
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JP (1) | JP4813321B2 (ja) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US11626271B2 (en) | 2020-06-18 | 2023-04-11 | Tokyo Electron Limited | Surface fluorination remediation for aluminium oxide electrostatic chucks |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2011230084A (ja) * | 2010-04-28 | 2011-11-17 | Tokyo Ohka Kogyo Co Ltd | サポートプレートの洗浄方法 |
JP5591627B2 (ja) * | 2010-08-24 | 2014-09-17 | 太平洋セメント株式会社 | セラミックス部材及びその製造方法 |
JP5860055B2 (ja) * | 2011-09-27 | 2016-02-16 | 大陽日酸株式会社 | 窒化物半導体製造装置用部材の洗浄方法 |
US10391526B2 (en) * | 2013-12-12 | 2019-08-27 | Lam Research Corporation | Electrostatic chuck cleaning fixture |
CN112871853B (zh) * | 2021-01-12 | 2022-06-24 | 度亘激光技术(苏州)有限公司 | 多孔吸盘的清洗方法 |
TWI752835B (zh) * | 2021-02-26 | 2022-01-11 | 台灣積體電路製造股份有限公司 | 物理氣相沉積構件以及清潔靜電吸盤的方法 |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0641587A (ja) * | 1992-06-25 | 1994-02-15 | Nippon Petrochem Co Ltd | 精密部品用洗浄剤 |
JP3341539B2 (ja) * | 1995-07-25 | 2002-11-05 | 荒川化学工業株式会社 | 洗浄方法 |
JPH10189699A (ja) * | 1996-12-27 | 1998-07-21 | Kyocera Corp | 静電チャックの洗浄方法 |
JP4666576B2 (ja) * | 2004-11-08 | 2011-04-06 | 東京エレクトロン株式会社 | セラミック溶射部材の洗浄方法、該方法を実行するためのプログラム、記憶媒体、及びセラミック溶射部材 |
US7052553B1 (en) * | 2004-12-01 | 2006-05-30 | Lam Research Corporation | Wet cleaning of electrostatic chucks |
-
2006
- 2006-10-16 JP JP2006280832A patent/JP4813321B2/ja not_active Expired - Fee Related
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US11626271B2 (en) | 2020-06-18 | 2023-04-11 | Tokyo Electron Limited | Surface fluorination remediation for aluminium oxide electrostatic chucks |
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JP2008093615A (ja) | 2008-04-24 |
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