JP4809887B2 - 窒化ガリウム基板の製造方法 - Google Patents
窒化ガリウム基板の製造方法 Download PDFInfo
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- JP4809887B2 JP4809887B2 JP2008322817A JP2008322817A JP4809887B2 JP 4809887 B2 JP4809887 B2 JP 4809887B2 JP 2008322817 A JP2008322817 A JP 2008322817A JP 2008322817 A JP2008322817 A JP 2008322817A JP 4809887 B2 JP4809887 B2 JP 4809887B2
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- gallium nitride
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02518—Deposited layers
- H01L21/02521—Materials
- H01L21/02538—Group 13/15 materials
- H01L21/0254—Nitrides
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- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B25/00—Single-crystal growth by chemical reaction of reactive gases, e.g. chemical vapour-deposition growth
- C30B25/02—Epitaxial-layer growth
- C30B25/18—Epitaxial-layer growth characterised by the substrate
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
- C30B29/10—Inorganic compounds or compositions
- C30B29/40—AIIIBV compounds wherein A is B, Al, Ga, In or Tl and B is N, P, As, Sb or Bi
- C30B29/403—AIII-nitrides
- C30B29/406—Gallium nitride
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02367—Substrates
- H01L21/0237—Materials
- H01L21/0242—Crystalline insulating materials
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02436—Intermediate layers between substrates and deposited layers
- H01L21/02439—Materials
- H01L21/02455—Group 13/15 materials
- H01L21/02458—Nitrides
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02612—Formation types
- H01L21/02617—Deposition types
- H01L21/0262—Reduction or decomposition of gaseous compounds, e.g. CVD
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02656—Special treatments
Description
ベース基板10は、成長炉内に配置される。
Claims (12)
- ベース基板を準備する第1工程と、該ベース基板の上に複数のInリッチ(In rich)領域を有する窒化物挿入層を窒化物挿入層の金属化が起きる臨界温度より低い第1温度で成長させる第2工程と、前記窒化物挿入層の上に窒化ガリウム層を成長させる第3工程とを順次に含み、前記第2工程の後、窒化物挿入層の金属化が起きる臨界温度より高い第2温度にて前記窒化物挿入層のInリッチ領域に金属化による多数のボイド(void)を形成するボイド形成工程を行なうことを特徴とする、窒化ガリウム基板製造方法。
- 前記ボイド形成工程は、前記第2工程の後と前記第3工程の終了の間に行なうことを特徴とする、請求項1に記載の窒化ガリウム基板製造方法。
- 前記窒化物挿入層の上に、前記窒化ガリウム層を前記第2温度で成長させることにより、前記第3工程と前記ボイド形成工程を、同時に行なうことを特徴とする、請求項1に記載の窒化ガリウム基板製造方法。
- 前記第2工程、第3工程およびボイド形成工程を、同一成長炉(reactor)内で進行することを特徴とする、請求項1に記載の窒化ガリウム基板製造方法。
- 前記窒化物挿入層が、AlxGa1−yInyN(0≦x≦1−y、0<y≦1)で表される材料を用いることを特徴とする、請求項1に記載の窒化ガリウム基板製造方法。
- 前記第1温度が、第2温度に比べて100℃以上低いことを特徴とする、請求項1に記載の窒化ガリウム基板製造方法。
- 前記第1温度が、500〜950℃であることを特徴とする、請求項1に記載の窒化ガリウム基板製造方法。
- 前記窒化物挿入層が、窒化ガリウム挿入層を間に介在して多層に形成されることを特徴とする、請求項1に記載の窒化ガリウム基板製造方法。
- 前記窒化ガリウム挿入層は、第1温度で成長させ、多数の前記窒化物挿入層をすべて形成した後、同時に第2温度を適用して、前記ボイド形成工程は、多数の前記窒化物挿入層すべてに同時に行なうことを特徴とする、請求項8に記載の窒化ガリウム基板製造方法。
- 前記窒化ガリウム層を、第2温度で成長させることにより、前記第3工程と前記ボイド形成工程を、同時に行なうことを特徴とする、請求項9に記載の窒化ガリウム基板製造方法。
- 隣接する窒化物挿入層に形成されるInリッチ領域のボイドが、互いに結合してより大きなボイドを形成することを特徴とする、請求項10に記載の窒化ガリウム基板製造方法。
- 前記窒化ガリウム挿入層を第2温度で成長させ、前記ボイド形成工程が各窒化物挿入層ごとに行なわれることを特徴とする、請求項8に記載の窒化ガリウム基板製造方法。
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KR1020070133385A KR101137911B1 (ko) | 2007-12-18 | 2007-12-18 | 질화갈륨 기판의 제조 방법 |
KR10-2007-0133385 | 2007-12-18 |
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JP2009152610A JP2009152610A (ja) | 2009-07-09 |
JP4809887B2 true JP4809887B2 (ja) | 2011-11-09 |
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JP2008322817A Active JP4809887B2 (ja) | 2007-12-18 | 2008-12-18 | 窒化ガリウム基板の製造方法 |
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US (1) | US8334192B2 (ja) |
JP (1) | JP4809887B2 (ja) |
KR (1) | KR101137911B1 (ja) |
FR (1) | FR2925071B1 (ja) |
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KR100416400B1 (ko) * | 2001-02-14 | 2004-01-31 | 우원홍 | 천화분 추출물의 제조방법 및 이를 함유하는 피부 미백용외용제 조성물 |
KR100714629B1 (ko) * | 2006-03-17 | 2007-05-07 | 삼성전기주식회사 | 질화물 반도체 단결정 기판, 그 제조방법 및 이를 이용한수직구조 질화물 발광소자 제조방법 |
FI123319B (fi) * | 2009-09-10 | 2013-02-28 | Optogan Oy | Menetelmä sisäisten mekaanisten jännitysten vähentämiseksi puolijohderakenteessa ja puolijohderakenne, jossa on vähän mekaanisia jännityksiä |
CN103053013A (zh) * | 2011-04-20 | 2013-04-17 | 松下电器产业株式会社 | 半导体层叠基板、半导体芯片和半导体层叠基板的制造方法 |
US10032956B2 (en) | 2011-09-06 | 2018-07-24 | Sensor Electronic Technology, Inc. | Patterned substrate design for layer growth |
US9653313B2 (en) | 2013-05-01 | 2017-05-16 | Sensor Electronic Technology, Inc. | Stress relieving semiconductor layer |
JP6322890B2 (ja) | 2013-02-18 | 2018-05-16 | 住友電気工業株式会社 | Iii族窒化物複合基板およびその製造方法、ならびにiii族窒化物半導体デバイスの製造方法 |
CN108281378B (zh) | 2012-10-12 | 2022-06-24 | 住友电气工业株式会社 | Iii族氮化物复合衬底、半导体器件及它们的制造方法 |
WO2014125688A1 (ja) | 2013-02-18 | 2014-08-21 | 住友電気工業株式会社 | Iii族窒化物複合基板およびその製造方法、積層iii族窒化物複合基板、ならびにiii族窒化物半導体デバイスおよびその製造方法 |
US10460952B2 (en) | 2013-05-01 | 2019-10-29 | Sensor Electronic Technology, Inc. | Stress relieving semiconductor layer |
WO2014179523A2 (en) * | 2013-05-01 | 2014-11-06 | Sensor Electronic Technology, Inc. | Stress relieving semiconductor layer |
CN105648524B (zh) * | 2014-11-14 | 2018-03-27 | 东莞市中镓半导体科技有限公司 | 一种异质衬底表面改性调控基片弯曲度的方法 |
US9337023B1 (en) * | 2014-12-15 | 2016-05-10 | Texas Instruments Incorporated | Buffer stack for group IIIA-N devices |
KR20180070781A (ko) | 2016-12-16 | 2018-06-27 | 삼성전자주식회사 | 질화물 반도체 기판의 형성 방법 및 반도체 소자의 제조 방법 |
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JP2751963B2 (ja) * | 1992-06-10 | 1998-05-18 | 日亜化学工業株式会社 | 窒化インジウムガリウム半導体の成長方法 |
JP3174257B2 (ja) * | 1995-11-10 | 2001-06-11 | 松下電子工業株式会社 | 窒化物系化合物半導体の製造方法 |
JP4783483B2 (ja) * | 1997-11-07 | 2011-09-28 | フィリップス ルミレッズ ライティング カンパニー リミテッド ライアビリティ カンパニー | 半導体基板および半導体基板の形成方法 |
JP4653768B2 (ja) * | 1998-06-26 | 2011-03-16 | シャープ株式会社 | 窒化物系化合物半導体素子及びその製造方法 |
JP2000299496A (ja) * | 1999-04-14 | 2000-10-24 | Sharp Corp | 窒化ガリウム系化合物半導体層の製造方法およびそれにより製造された半導体装置 |
JP3631724B2 (ja) * | 2001-03-27 | 2005-03-23 | 日本電気株式会社 | Iii族窒化物半導体基板およびその製造方法 |
JP4734786B2 (ja) * | 2001-07-04 | 2011-07-27 | 日亜化学工業株式会社 | 窒化ガリウム系化合物半導体基板、及びその製造方法 |
JP4117156B2 (ja) * | 2002-07-02 | 2008-07-16 | 日本電気株式会社 | Iii族窒化物半導体基板の製造方法 |
KR20040078211A (ko) * | 2003-03-03 | 2004-09-10 | 엘지전자 주식회사 | 질화갈륨 기판 제조 방법 |
KR100513923B1 (ko) * | 2004-08-13 | 2005-09-08 | 재단법인서울대학교산학협력재단 | 질화물 반도체층을 성장시키는 방법 및 이를 이용하는 질화물 반도체 발광소자 |
JP2007008742A (ja) * | 2005-06-29 | 2007-01-18 | Sumitomo Electric Ind Ltd | Iii族窒化物膜を形成する方法および半導体装置 |
JP4993435B2 (ja) * | 2006-03-14 | 2012-08-08 | スタンレー電気株式会社 | 窒化物半導体発光素子の製造方法 |
WO2007125914A1 (ja) * | 2006-04-28 | 2007-11-08 | Sumitomo Electric Industries, Ltd. | 窒化ガリウム結晶を作製する方法および窒化ガリウムウエハ |
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2007
- 2007-12-18 KR KR1020070133385A patent/KR101137911B1/ko active IP Right Grant
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2008
- 2008-12-15 US US12/334,583 patent/US8334192B2/en active Active
- 2008-12-17 FR FR0858699A patent/FR2925071B1/fr active Active
- 2008-12-18 JP JP2008322817A patent/JP4809887B2/ja active Active
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Publication number | Publication date |
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US20090155987A1 (en) | 2009-06-18 |
JP2009152610A (ja) | 2009-07-09 |
KR20090065861A (ko) | 2009-06-23 |
FR2925071A1 (fr) | 2009-06-19 |
US8334192B2 (en) | 2012-12-18 |
FR2925071B1 (fr) | 2019-12-27 |
KR101137911B1 (ko) | 2012-05-03 |
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