JP4776923B2 - シロキサンビスクロロホルメート - Google Patents
シロキサンビスクロロホルメート Download PDFInfo
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- JP4776923B2 JP4776923B2 JP2004529073A JP2004529073A JP4776923B2 JP 4776923 B2 JP4776923 B2 JP 4776923B2 JP 2004529073 A JP2004529073 A JP 2004529073A JP 2004529073 A JP2004529073 A JP 2004529073A JP 4776923 B2 JP4776923 B2 JP 4776923B2
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- JP
- Japan
- Prior art keywords
- siloxane
- bisphenol
- formula
- bischloroformate
- phosgene
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
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- KPUWHANPEXNPJT-UHFFFAOYSA-N disiloxane Chemical class [SiH3]O[SiH3] KPUWHANPEXNPJT-UHFFFAOYSA-N 0.000 title claims abstract description 43
- NANCWWPLVNQCEU-UHFFFAOYSA-N 2-(2-hydroxyphenyl)silyloxyphenol Chemical class OC1=CC=CC=C1O[SiH2]C1=CC=CC=C1O NANCWWPLVNQCEU-UHFFFAOYSA-N 0.000 claims abstract description 90
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 claims abstract description 48
- YGYAWVDWMABLBF-UHFFFAOYSA-N Phosgene Chemical compound ClC(Cl)=O YGYAWVDWMABLBF-UHFFFAOYSA-N 0.000 claims abstract description 40
- 238000000034 method Methods 0.000 claims abstract description 30
- 238000004519 manufacturing process Methods 0.000 claims abstract description 9
- 238000010924 continuous production Methods 0.000 claims abstract description 5
- RRAFCDWBNXTKKO-UHFFFAOYSA-N eugenol Chemical compound COC1=CC(CC=C)=CC=C1O RRAFCDWBNXTKKO-UHFFFAOYSA-N 0.000 claims description 73
- NPBVQXIMTZKSBA-UHFFFAOYSA-N Chavibetol Natural products COC1=CC=C(CC=C)C=C1O NPBVQXIMTZKSBA-UHFFFAOYSA-N 0.000 claims description 43
- 239000005770 Eugenol Substances 0.000 claims description 43
- UVMRYBDEERADNV-UHFFFAOYSA-N Pseudoeugenol Natural products COC1=CC(C(C)=C)=CC=C1O UVMRYBDEERADNV-UHFFFAOYSA-N 0.000 claims description 43
- 229960002217 eugenol Drugs 0.000 claims description 43
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 claims description 36
- 239000000376 reactant Substances 0.000 claims description 20
- 239000000243 solution Substances 0.000 claims description 17
- -1 cyano, trifluoropropyl Chemical group 0.000 claims description 16
- 229910000000 metal hydroxide Inorganic materials 0.000 claims description 15
- 150000004692 metal hydroxides Chemical class 0.000 claims description 15
- 125000003118 aryl group Chemical group 0.000 claims description 12
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims description 12
- 239000007864 aqueous solution Substances 0.000 claims description 9
- 150000008044 alkali metal hydroxides Chemical class 0.000 claims description 8
- 239000002904 solvent Substances 0.000 claims description 8
- 229910001860 alkaline earth metal hydroxide Inorganic materials 0.000 claims description 6
- WSNMPAVSZJSIMT-UHFFFAOYSA-N COc1c(C)c2COC(=O)c2c(O)c1CC(O)C1(C)CCC(=O)O1 Chemical compound COc1c(C)c2COC(=O)c2c(O)c1CC(O)C1(C)CCC(=O)O1 WSNMPAVSZJSIMT-UHFFFAOYSA-N 0.000 claims description 5
- 125000000008 (C1-C10) alkyl group Chemical group 0.000 claims description 4
- 125000006832 (C1-C10) alkylene group Chemical group 0.000 claims description 4
- 125000000882 C2-C6 alkenyl group Chemical group 0.000 claims description 4
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 claims description 4
- 229910052736 halogen Inorganic materials 0.000 claims description 4
- 150000002367 halogens Chemical class 0.000 claims description 4
- 125000005702 oxyalkylene group Chemical group 0.000 claims description 4
- 125000004430 oxygen atom Chemical group O* 0.000 claims description 4
- 125000003011 styrenyl group Chemical group [H]\C(*)=C(/[H])C1=C([H])C([H])=C([H])C([H])=C1[H] 0.000 claims description 4
- 238000002360 preparation method Methods 0.000 claims description 3
- WSLDOOZREJYCGB-UHFFFAOYSA-N 1,2-Dichloroethane Chemical compound ClCCCl WSLDOOZREJYCGB-UHFFFAOYSA-N 0.000 claims description 2
- QIRNGVVZBINFMX-UHFFFAOYSA-N 2-allylphenol Chemical compound OC1=CC=CC=C1CC=C QIRNGVVZBINFMX-UHFFFAOYSA-N 0.000 claims description 2
- 239000003960 organic solvent Substances 0.000 claims description 2
- FUGYGGDSWSUORM-UHFFFAOYSA-N 4-hydroxystyrene Chemical compound OC1=CC=C(C=C)C=C1 FUGYGGDSWSUORM-UHFFFAOYSA-N 0.000 claims 2
- 229910052784 alkaline earth metal Inorganic materials 0.000 claims 1
- 150000001342 alkaline earth metals Chemical class 0.000 claims 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-M hydroxide Chemical compound [OH-] XLYOFNOQVPJJNP-UHFFFAOYSA-M 0.000 claims 1
- 238000006243 chemical reaction Methods 0.000 abstract description 11
- 229920001296 polysiloxane Polymers 0.000 abstract description 8
- 238000010923 batch production Methods 0.000 abstract description 2
- 239000000543 intermediate Substances 0.000 abstract description 2
- 239000000203 mixture Substances 0.000 description 19
- 239000000047 product Substances 0.000 description 19
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 17
- 229930185605 Bisphenol Natural products 0.000 description 12
- 230000000052 comparative effect Effects 0.000 description 6
- 230000003068 static effect Effects 0.000 description 6
- AOGYCOYQMAVAFD-UHFFFAOYSA-N chlorocarbonic acid Chemical group OC(Cl)=O AOGYCOYQMAVAFD-UHFFFAOYSA-N 0.000 description 5
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 5
- 238000006459 hydrosilylation reaction Methods 0.000 description 4
- 238000005160 1H NMR spectroscopy Methods 0.000 description 3
- VPWNQTHUCYMVMZ-UHFFFAOYSA-N 4,4'-sulfonyldiphenol Chemical class C1=CC(O)=CC=C1S(=O)(=O)C1=CC=C(O)C=C1 VPWNQTHUCYMVMZ-UHFFFAOYSA-N 0.000 description 3
- BVKZGUZCCUSVTD-UHFFFAOYSA-L Carbonate Chemical compound [O-]C([O-])=O BVKZGUZCCUSVTD-UHFFFAOYSA-L 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 239000012527 feed solution Substances 0.000 description 3
- 229920000515 polycarbonate Polymers 0.000 description 3
- 239000004417 polycarbonate Substances 0.000 description 3
- 238000011144 upstream manufacturing Methods 0.000 description 3
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- 125000001931 aliphatic group Chemical group 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 125000005587 carbonate group Chemical group 0.000 description 2
- 239000003518 caustics Substances 0.000 description 2
- RGIBXDHONMXTLI-UHFFFAOYSA-N chavicol Chemical compound OC1=CC=C(CC=C)C=C1 RGIBXDHONMXTLI-UHFFFAOYSA-N 0.000 description 2
- 239000005457 ice water Substances 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- SYSQUGFVNFXIIT-UHFFFAOYSA-N n-[4-(1,3-benzoxazol-2-yl)phenyl]-4-nitrobenzenesulfonamide Chemical class C1=CC([N+](=O)[O-])=CC=C1S(=O)(=O)NC1=CC=C(C=2OC3=CC=CC=C3N=2)C=C1 SYSQUGFVNFXIIT-UHFFFAOYSA-N 0.000 description 2
- 150000002989 phenols Chemical class 0.000 description 2
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 2
- 238000000425 proton nuclear magnetic resonance spectrum Methods 0.000 description 2
- SCPYDCQAZCOKTP-UHFFFAOYSA-N silanol Chemical class [SiH3]O SCPYDCQAZCOKTP-UHFFFAOYSA-N 0.000 description 2
- PWRCOONECNWDBH-UHFFFAOYSA-N 4-prop-2-enoxyphenol Chemical compound OC1=CC=C(OCC=C)C=C1 PWRCOONECNWDBH-UHFFFAOYSA-N 0.000 description 1
- 0 CC*(CCCc1ccc(*)c(OC)c1)[S+]OC(C)(C#C)[Si](C)(C)CCCc1cc(OC)c(*)cc1 Chemical compound CC*(CCCc1ccc(*)c(OC)c1)[S+]OC(C)(C#C)[Si](C)(C)CCCc1cc(OC)c(*)cc1 0.000 description 1
- QXNVGIXVLWOKEQ-UHFFFAOYSA-N Disodium Chemical class [Na][Na] QXNVGIXVLWOKEQ-UHFFFAOYSA-N 0.000 description 1
- BDAGIHXWWSANSR-UHFFFAOYSA-M Formate Chemical compound [O-]C=O BDAGIHXWWSANSR-UHFFFAOYSA-M 0.000 description 1
- 239000000370 acceptor Substances 0.000 description 1
- 150000001336 alkenes Chemical class 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 239000011260 aqueous acid Substances 0.000 description 1
- 150000001491 aromatic compounds Chemical class 0.000 description 1
- 229920000402 bisphenol A polycarbonate polymer Polymers 0.000 description 1
- 239000006227 byproduct Substances 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- 238000005119 centrifugation Methods 0.000 description 1
- 239000013626 chemical specie Substances 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 238000010406 interfacial reaction Methods 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 239000000178 monomer Substances 0.000 description 1
- JRZJOMJEPLMPRA-UHFFFAOYSA-N olefin Natural products CCCCCCCC=C JRZJOMJEPLMPRA-UHFFFAOYSA-N 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 238000005070 sampling Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
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Classifications
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- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
- C07F7/08—Compounds having one or more C—Si linkages
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/04—Polysiloxanes
- C08G77/06—Preparatory processes
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/04—Polysiloxanes
- C08G77/22—Polysiloxanes containing silicon bound to organic groups containing atoms other than carbon, hydrogen and oxygen
- C08G77/24—Polysiloxanes containing silicon bound to organic groups containing atoms other than carbon, hydrogen and oxygen halogen-containing groups
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- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Silicon Polymers (AREA)
- Polyesters Or Polycarbonates (AREA)
- Catching Or Destruction (AREA)
- Low-Molecular Organic Synthesis Reactions Using Catalysts (AREA)
- Polyurethanes Or Polyureas (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
Description
供給流(1):EuSiD50(d−50オイゲノールシロキサン)7.6グラム/分(gm/min)、塩化メチレン30.4グラム/分。
供給流(3):COCl21.12グラム/分。
500mLのMortonフラスコに、d−50オイゲノールシロキサンビスフェノール(5.0g、0.12mmol)、塩化メチレン(130mL)及び水(10mL)を入れた。ホスゲン(5.0g、50mmol)を添加する間25wt%の水性水酸化ナトリウムでpHを約0〜約5に調節しそのpHに維持した。ホスゲン添加後pHを約10に上げて過剰のホスゲンを消費した。塩酸溶液(1N HCL、135mL)を加え、生成物のビスクロロホルメート溶液を遠心により分離した。プロトンNMR分析により、オイゲノールシロキサンビスフェノールのヒドロキシ基の約90%のみがクロロホルメート基に転化されたことが示された。カーボネート結合生成物は殆ど又は全くなかった。
実施例7〜24で使用したフロー反応器は以下の修正点を除いて実施例1〜6で用いたものと本質的に同じであった。このフロー反応器は図1に示した構成であった。第1の反応器セクション(タイプAの管型反応器セクション)の下流端で試料口を系に追加し、選択された実験では水性苛性供給流を冷却するために冷却器を設置した。実施例17〜22でこの水性苛性冷却器を用いた。実施例7〜24の各々で、塩化メチレン(CH2Cl2)中のオイゲノールシロキサンビスフェノールの溶液を、フロー反応器溶液冷却器に導入する前に氷水浴で冷却した。実施例7〜24で使用した詳細な実験条件を表2に示す。実施例7〜24における出発オイゲノールシロキサンビスフェノールから生成物オイゲノールシロキサンビスクロロホルメートへの転化に関する追加の実験データ及び結果をまとめて表3に示す。実施例7〜24で使用したオイゲノールシロキサンビスフェノール、塩化メチレン及びホスゲンの供給速度を次に示す。
供給流1:EuSiD50 7.6グラム/分、CH2Cl230.5グラム/分。
供給流2:COCl2(流速については表参照)。
供給流3:水性NaOH(流速については表参照)。
Claims (10)
- シロキサンビスフェノールのビスクロロホルメートの連続製造法であって、1種以上のシロキサンビスフェノールと、1種以上のアルカリ金属水酸化物又はアルカリ土類金属水酸化物と、ホスゲンをフロー反応器に導入することを含んでなり、ホスゲンを、シロキサンビスフェノールのOH基に対するホスゲンの比がシロキサンビスフェノールOH基1モル当たりホスゲン2.5〜6モルとなる速度で導入し、アルカリ金属水酸化物又はアルカリ土類金属水酸化物を水溶液として導入し、水溶液は金属水酸化物5重量%以上の濃度を有しており、金属水酸化物を、金属水酸化物対ホスゲンのモル比が3.5〜6となる速度で導入する方法。
- 前記シロキサンビスフェノールが次式の構造Iからなる、請求項1記載の方法。
- pが10〜100の整数である、請求項3記載の方法。
- 前記シロキサンビスフェノールを有機溶媒中の溶液としてフロー反応器に導入する、請求項1記載の方法。
- 前記溶液が、塩化メチレン、クロロホルム及び1,2−ジクロロエタンからなる群から選択されるハロゲン化溶媒を含む、請求項5記載の方法。
- 当該方法がさらにある反応体滞留時間を有することを特徴としており、滞留時間が5〜800秒の範囲である、請求項1記載の方法。
- 次式の構造IXのシロキサンビスクロロホルメート(但し、請求項1〜7のいずれか一項に記載の方法を用いて調製したシロキサンビスクロロホルメートに限る):
- 以下の式VIIIのオイゲノールシロキサンビスクロロホルメートの連続製造法であって、以下の式IIのオイゲノールシロキサンビスフェノールの溶液をフロー反応器に導入することを含んでなり、溶液は塩化メチレンと水酸化ナトリウム水溶液とホスゲンを含んでおり、ホスゲンを、ホスゲンとオイゲノールシロキサンビスフェノールのOH基との比がオイゲノールシロキサンビスフェノールOH基1モル当たりホスゲン2.5〜6モルとなる速度で導入し、水酸化ナトリウムの水溶液が水酸化ナトリウム5重量%以上の濃度を有しており、水酸化ナトリウムの水溶液を、金属水酸化物対ホスゲンのモル比が3.5〜6となる速度で導入する方法。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US10/223,030 | 2002-08-16 | ||
US10/223,030 US6723864B2 (en) | 2002-08-16 | 2002-08-16 | Siloxane bischloroformates |
PCT/US2003/018144 WO2004016675A1 (en) | 2002-08-16 | 2003-06-10 | Siloxane bischloroformates |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2005535759A JP2005535759A (ja) | 2005-11-24 |
JP2005535759A5 JP2005535759A5 (ja) | 2006-07-27 |
JP4776923B2 true JP4776923B2 (ja) | 2011-09-21 |
Family
ID=31886636
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2004529073A Expired - Fee Related JP4776923B2 (ja) | 2002-08-16 | 2003-06-10 | シロキサンビスクロロホルメート |
Country Status (10)
Country | Link |
---|---|
US (2) | US6723864B2 (ja) |
EP (1) | EP1530606B1 (ja) |
JP (1) | JP4776923B2 (ja) |
KR (1) | KR100977893B1 (ja) |
CN (1) | CN1324071C (ja) |
AT (1) | ATE490991T1 (ja) |
AU (1) | AU2003285501A1 (ja) |
DE (1) | DE60335265D1 (ja) |
TW (1) | TW200404057A (ja) |
WO (1) | WO2004016675A1 (ja) |
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US7605221B2 (en) * | 1999-05-18 | 2009-10-20 | Sabic Innovative Plastics Ip B.V. | Weatherable, thermostable polymers having improved flow composition |
US7321014B2 (en) * | 2004-12-29 | 2008-01-22 | General Electric Company | Transparent compositions, methods for the preparation thereof, and articles derived therefrom |
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US20070060716A1 (en) * | 2005-09-13 | 2007-03-15 | Bala Ambravaneswaran | Fatigue resistant thermoplastic composition, method of making, and articles formed therefrom |
US20070093629A1 (en) * | 2005-09-14 | 2007-04-26 | General Electric Company | Siloxane bishchloroformates |
CN100393617C (zh) * | 2005-12-12 | 2008-06-11 | 张士和 | 光气化工艺中控制反应物进料的装置 |
US7498388B2 (en) * | 2006-04-10 | 2009-03-03 | Sabic Innovative Plastics Ip B.V. | Polysiloxane-polycarbonate copolymer article |
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Also Published As
Publication number | Publication date |
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KR20050044904A (ko) | 2005-05-13 |
US6723864B2 (en) | 2004-04-20 |
TW200404057A (en) | 2004-03-16 |
JP2005535759A (ja) | 2005-11-24 |
EP1530606B1 (en) | 2010-12-08 |
DE60335265D1 (de) | 2011-01-20 |
ATE490991T1 (de) | 2010-12-15 |
KR100977893B1 (ko) | 2010-08-24 |
US20040133024A1 (en) | 2004-07-08 |
US20040039218A1 (en) | 2004-02-26 |
CN1688634A (zh) | 2005-10-26 |
US6930194B2 (en) | 2005-08-16 |
CN1324071C (zh) | 2007-07-04 |
EP1530606A1 (en) | 2005-05-18 |
WO2004016675A1 (en) | 2004-02-26 |
AU2003285501A1 (en) | 2004-03-03 |
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