JP4763235B2 - プラズマ処理のための装置並びに方法 - Google Patents

プラズマ処理のための装置並びに方法 Download PDF

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Publication number
JP4763235B2
JP4763235B2 JP2003525699A JP2003525699A JP4763235B2 JP 4763235 B2 JP4763235 B2 JP 4763235B2 JP 2003525699 A JP2003525699 A JP 2003525699A JP 2003525699 A JP2003525699 A JP 2003525699A JP 4763235 B2 JP4763235 B2 JP 4763235B2
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gas
flow
pulsed
power
time
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JP2005502198A5 (enExample
JP2005502198A (ja
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ストラング、エリック・ジェイ
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Tokyo Electron Ltd
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/3244—Gas supply means
    • H01J37/32449—Gas control, e.g. control of the gas flow
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/32137—Radio frequency generated discharge controlling of the discharge by modulation of energy
    • H01J37/32146—Amplitude modulation, includes pulsing
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67242—Apparatus for monitoring, sorting or marking
    • H01L21/67253—Process monitoring, e.g. flow or thickness monitoring

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  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Drying Of Semiconductors (AREA)
  • Plasma Technology (AREA)
JP2003525699A 2001-08-29 2002-08-29 プラズマ処理のための装置並びに方法 Expired - Fee Related JP4763235B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US31536901P 2001-08-29 2001-08-29
US60/315,369 2001-08-29
PCT/US2002/025955 WO2003021002A1 (en) 2001-08-29 2002-08-29 Apparatus and method for plasma processing

Publications (3)

Publication Number Publication Date
JP2005502198A JP2005502198A (ja) 2005-01-20
JP2005502198A5 JP2005502198A5 (enExample) 2010-05-20
JP4763235B2 true JP4763235B2 (ja) 2011-08-31

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JP2003525699A Expired - Fee Related JP4763235B2 (ja) 2001-08-29 2002-08-29 プラズマ処理のための装置並びに方法

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US (1) US7199328B2 (enExample)
JP (1) JP4763235B2 (enExample)
CN (1) CN100462475C (enExample)
WO (1) WO2003021002A1 (enExample)

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Also Published As

Publication number Publication date
CN1549872A (zh) 2004-11-24
CN100462475C (zh) 2009-02-18
US7199328B2 (en) 2007-04-03
US20040195216A1 (en) 2004-10-07
WO2003021002A1 (en) 2003-03-13
JP2005502198A (ja) 2005-01-20

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