JP4737746B2 - 薄膜形成方法及びその装置 - Google Patents

薄膜形成方法及びその装置 Download PDF

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Publication number
JP4737746B2
JP4737746B2 JP2005098032A JP2005098032A JP4737746B2 JP 4737746 B2 JP4737746 B2 JP 4737746B2 JP 2005098032 A JP2005098032 A JP 2005098032A JP 2005098032 A JP2005098032 A JP 2005098032A JP 4737746 B2 JP4737746 B2 JP 4737746B2
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Prior art keywords
film forming
substrate
chamber
vapor deposition
small
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Japanese (ja)
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JP2006274396A5 (enExample
JP2006274396A (ja
Inventor
陽彦 熱海
篤一 山本
宏 酒井
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Showa Shinku Co Ltd
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Showa Shinku Co Ltd
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  • Physical Vapour Deposition (AREA)
JP2005098032A 2005-03-30 2005-03-30 薄膜形成方法及びその装置 Expired - Lifetime JP4737746B2 (ja)

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JP2005098032A JP4737746B2 (ja) 2005-03-30 2005-03-30 薄膜形成方法及びその装置

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JP2005098032A JP4737746B2 (ja) 2005-03-30 2005-03-30 薄膜形成方法及びその装置

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JP2006274396A JP2006274396A (ja) 2006-10-12
JP2006274396A5 JP2006274396A5 (enExample) 2008-05-01
JP4737746B2 true JP4737746B2 (ja) 2011-08-03

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Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6375694B2 (ja) * 2014-05-28 2018-08-22 日本精機株式会社 蒸着装置及び有機ｅｌ素子の製造方法
CN108359937B (zh) * 2018-02-27 2023-08-22 温州驰诚真空机械有限公司 转换式物理气相沉积粒子源
CN115110037B (zh) * 2022-06-23 2024-01-12 北海惠科半导体科技有限公司 蒸发镀膜装置的镀膜方法和蒸发镀膜装置
CN115584472B (zh) * 2022-11-01 2024-09-27 上海哈呐技术装备有限公司 一种磁控溅射镀膜机

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04176863A (ja) * 1990-11-09 1992-06-24 Mitsubishi Electric Corp 薄膜形成装置
JPH04323362A (ja) * 1991-04-19 1992-11-12 Ulvac Japan Ltd 多層膜の形成方法およびその形成装置
JPH05179428A (ja) * 1991-05-23 1993-07-20 Matsushita Electric Ind Co Ltd 薄膜形成装置
JP3585504B2 (ja) * 1991-11-06 2004-11-04 株式会社アルバック 多層膜コンデンサーの製造方法
JP2832115B2 (ja) * 1992-09-25 1998-12-02 株式会社テック 薄膜製造装置
JPH06322542A (ja) * 1993-05-13 1994-11-22 Sony Corp 薄膜形成装置
JP2845856B2 (ja) * 1997-03-10 1999-01-13 出光興産株式会社 有機エレクトロルミネッセンス素子の製造方法
JPH1194714A (ja) * 1997-09-18 1999-04-09 Ricoh Co Ltd サンプル搬送装置
JP3879093B2 (ja) * 2000-07-13 2007-02-07 独立行政法人科学技術振興機構 コンビナトリアルデバイス作製装置
JP2002334489A (ja) * 2001-05-10 2002-11-22 Matsushita Electric Ind Co Ltd 光学情報記録媒体の製造方法
JP2003059130A (ja) * 2001-08-21 2003-02-28 Sony Corp 成膜装置、成膜方法、光記録媒体の製造方法および光記録媒体
JP3933591B2 (ja) * 2002-03-26 2007-06-20 淳二 城戸 有機エレクトロルミネッセント素子
JP4187142B2 (ja) * 2002-04-17 2008-11-26 株式会社アルバック マスク位置合せ機構付き成膜装置及び成膜方法

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