JP4732801B2 - ジンバル機構を備えた転写装置及び同装置を用いた転写方法 - Google Patents

ジンバル機構を備えた転写装置及び同装置を用いた転写方法 Download PDF

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Publication number
JP4732801B2
JP4732801B2 JP2005152975A JP2005152975A JP4732801B2 JP 4732801 B2 JP4732801 B2 JP 4732801B2 JP 2005152975 A JP2005152975 A JP 2005152975A JP 2005152975 A JP2005152975 A JP 2005152975A JP 4732801 B2 JP4732801 B2 JP 4732801B2
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JP
Japan
Prior art keywords
gimbal
mold
transfer device
gimbal mechanism
transfer
Prior art date
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Expired - Fee Related
Application number
JP2005152975A
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English (en)
Japanese (ja)
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JP2006326991A5 (zh
JP2006326991A (ja
Inventor
光典 小久保
健太郎 石橋
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Shibaura Machine Co Ltd
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Toshiba Machine Co Ltd
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Publication date
Application filed by Toshiba Machine Co Ltd filed Critical Toshiba Machine Co Ltd
Priority to JP2005152975A priority Critical patent/JP4732801B2/ja
Priority to US11/403,984 priority patent/US7648354B2/en
Priority to TW095114106A priority patent/TWI295623B/zh
Priority to DE102006019644.9A priority patent/DE102006019644B4/de
Priority to KR1020060037888A priority patent/KR100747855B1/ko
Publication of JP2006326991A publication Critical patent/JP2006326991A/ja
Publication of JP2006326991A5 publication Critical patent/JP2006326991A5/ja
Priority to US12/633,183 priority patent/US8318074B2/en
Application granted granted Critical
Publication of JP4732801B2 publication Critical patent/JP4732801B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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  • Shaping Of Tube Ends By Bending Or Straightening (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2005152975A 2005-04-28 2005-05-25 ジンバル機構を備えた転写装置及び同装置を用いた転写方法 Expired - Fee Related JP4732801B2 (ja)

Priority Applications (6)

Application Number Priority Date Filing Date Title
JP2005152975A JP4732801B2 (ja) 2005-05-25 2005-05-25 ジンバル機構を備えた転写装置及び同装置を用いた転写方法
US11/403,984 US7648354B2 (en) 2005-04-28 2006-04-14 Transfer apparatus having gimbal mechanism and transfer method using the transfer apparatus
TW095114106A TWI295623B (en) 2005-04-28 2006-04-20 Transfer apparatus having gimbal mechanism and transfer method using the transfer apparatus
KR1020060037888A KR100747855B1 (ko) 2005-04-28 2006-04-27 짐벌 기구를 구비한 전사 장치 및 전사 장치를 이용한 전사방법
DE102006019644.9A DE102006019644B4 (de) 2005-04-28 2006-04-27 Übertragungseinrichung mit einem Kardangelenkmechanismus und Übertragungsverfahren unter Verwendung der Übertragungseinrichtung
US12/633,183 US8318074B2 (en) 2005-04-28 2009-12-08 Transfer apparatus having gimbal mechanism and transfer method using the transfer apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005152975A JP4732801B2 (ja) 2005-05-25 2005-05-25 ジンバル機構を備えた転写装置及び同装置を用いた転写方法

Publications (3)

Publication Number Publication Date
JP2006326991A JP2006326991A (ja) 2006-12-07
JP2006326991A5 JP2006326991A5 (zh) 2008-05-08
JP4732801B2 true JP4732801B2 (ja) 2011-07-27

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JP2005152975A Expired - Fee Related JP4732801B2 (ja) 2005-04-28 2005-05-25 ジンバル機構を備えた転写装置及び同装置を用いた転写方法

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JP (1) JP4732801B2 (zh)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7641467B2 (en) * 2007-05-02 2010-01-05 Asml Netherlands B.V. Imprint lithography
JP6294686B2 (ja) * 2014-02-04 2018-03-14 キヤノン株式会社 インプリント装置、インプリント方法及び物品の製造方法
US10996561B2 (en) * 2017-12-26 2021-05-04 Canon Kabushiki Kaisha Nanoimprint lithography with a six degrees-of-freedom imprint head module

Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001135634A (ja) * 1999-11-10 2001-05-18 Nippon Telegr & Teleph Corp <Ntt> 薄膜形成装置
JP2003224154A (ja) * 2002-01-31 2003-08-08 Toray Eng Co Ltd 接合装置
JP2004103232A (ja) * 2002-09-12 2004-04-02 Komag Inc パターン化されたメディア製造のためのディスク位置合わせシステム
JP2004291607A (ja) * 2002-05-17 2004-10-21 Konica Minolta Holdings Inc 成形型ユニットの調整方法及び成形装置
WO2004093171A1 (ja) * 2003-04-11 2004-10-28 Scivax Corporation パターン形成装置、パターン形成方法
JP2005052841A (ja) * 2003-08-01 2005-03-03 Meisho Kiko Kk 高精度プレス機
JP2005101201A (ja) * 2003-09-24 2005-04-14 Canon Inc ナノインプリント装置
JP2007296530A (ja) * 2004-07-29 2007-11-15 Scivax Kk 傾き調整機能付きプレス装置、傾き調整機能付きパターン形成装置、型の傾き調整方法

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63261405A (ja) * 1987-04-17 1988-10-28 Sanyo Mach Works Ltd 昇降位置決め装置
NL9100366A (nl) * 1991-02-28 1992-09-16 Philips & Du Pont Optical Werkwijze voor het vervaardigen van een schijfvormige informatiedrager, informatiedrager vervaardigd volgens de werkwijze en inrichting voor het uitvoeren van de werkwijze.
JPH08259245A (ja) * 1995-03-24 1996-10-08 Olympus Optical Co Ltd 光学素子成形装置の偏芯調整機構
JPH11314231A (ja) * 1998-03-06 1999-11-16 Toshiba Corp 光学部品製造方法及びその装置

Patent Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001135634A (ja) * 1999-11-10 2001-05-18 Nippon Telegr & Teleph Corp <Ntt> 薄膜形成装置
JP2003224154A (ja) * 2002-01-31 2003-08-08 Toray Eng Co Ltd 接合装置
JP2004291607A (ja) * 2002-05-17 2004-10-21 Konica Minolta Holdings Inc 成形型ユニットの調整方法及び成形装置
JP2004103232A (ja) * 2002-09-12 2004-04-02 Komag Inc パターン化されたメディア製造のためのディスク位置合わせシステム
WO2004093171A1 (ja) * 2003-04-11 2004-10-28 Scivax Corporation パターン形成装置、パターン形成方法
JP2005052841A (ja) * 2003-08-01 2005-03-03 Meisho Kiko Kk 高精度プレス機
JP2005101201A (ja) * 2003-09-24 2005-04-14 Canon Inc ナノインプリント装置
JP2007296530A (ja) * 2004-07-29 2007-11-15 Scivax Kk 傾き調整機能付きプレス装置、傾き調整機能付きパターン形成装置、型の傾き調整方法

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JP2006326991A (ja) 2006-12-07

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