JP4700340B2 - 失透の制御された溶融石英物品 - Google Patents

失透の制御された溶融石英物品 Download PDF

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Publication number
JP4700340B2
JP4700340B2 JP2004503409A JP2004503409A JP4700340B2 JP 4700340 B2 JP4700340 B2 JP 4700340B2 JP 2004503409 A JP2004503409 A JP 2004503409A JP 2004503409 A JP2004503409 A JP 2004503409A JP 4700340 B2 JP4700340 B2 JP 4700340B2
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Prior art keywords
article
fused silica
exposed surface
fused
silica
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Expired - Lifetime
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JP2004503409A
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Japanese (ja)
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JP2005525284A (ja
JP2005525284A5 (enExample
Inventor
マクナルティ，トマス・フランシス
ペンダー，デビッド・チャールズ
ルー，ビクター・リーン−コン
ギディングズ，ロバート・アーサー
アールグレン，フレデリック・フランシス
Original Assignee
モーメンティブ・パフォーマンス・マテリアルズ・インク
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Publication of JP2005525284A5 publication Critical patent/JP2005525284A5/ja
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    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/06—Surface treatment of glass, not in the form of fibres or filaments, by coating with metals
    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B35/00—Apparatus not otherwise provided for, specially adapted for the growth, production or after-treatment of single crystals or of a homogeneous polycrystalline material with defined structure
    • C30B35/002—Crucibles or containers
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B32/00—Thermal after-treatment of glass products not provided for in groups C03B19/00, C03B25/00 - C03B31/00 or C03B37/00, e.g. crystallisation, eliminating gas inclusions or other impurities; Hot-pressing vitrified, non-porous, shaped glass products
    • C03B32/02—Thermal crystallisation, e.g. for crystallising glass bodies into glass-ceramic articles
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C10/00—Devitrified glass ceramics, i.e. glass ceramics having a crystalline phase dispersed in a glassy phase and constituting at least 50% by weight of the total composition
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C10/00—Devitrified glass ceramics, i.e. glass ceramics having a crystalline phase dispersed in a glassy phase and constituting at least 50% by weight of the total composition
    • C03C10/0009—Devitrified glass ceramics, i.e. glass ceramics having a crystalline phase dispersed in a glassy phase and constituting at least 50% by weight of the total composition containing silica as main constituent
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
    • C03C17/23—Oxides
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/20—Materials for coating a single layer on glass
    • C03C2217/21—Oxides
    • C03C2217/213—SiO2
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/20—Materials for coating a single layer on glass
    • C03C2217/21—Oxides
    • C03C2217/24—Doped oxides

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Ceramic Engineering (AREA)
  • Dispersion Chemistry (AREA)
  • Metallurgy (AREA)
  • Thermal Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Glass Melting And Manufacturing (AREA)
  • Glass Compositions (AREA)
  • Surface Treatment Of Glass (AREA)
JP2004503409A 2002-05-10 2003-04-24 失透の制御された溶融石英物品 Expired - Lifetime JP4700340B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US10/063,754 2002-05-10
US10/063,754 US6875515B2 (en) 2002-05-10 2002-05-10 Fused quartz article having controlled devitrification
PCT/US2003/012599 WO2003095384A1 (en) 2002-05-10 2003-04-24 Fused quartz article having controlled devitrification

Publications (3)

Publication Number Publication Date
JP2005525284A JP2005525284A (ja) 2005-08-25
JP2005525284A5 JP2005525284A5 (enExample) 2006-06-15
JP4700340B2 true JP4700340B2 (ja) 2011-06-15

Family

ID=29399072

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2004503409A Expired - Lifetime JP4700340B2 (ja) 2002-05-10 2003-04-24 失透の制御された溶融石英物品

Country Status (8)

Country Link
US (2) US6875515B2 (enExample)
EP (1) EP1506142B1 (enExample)
JP (1) JP4700340B2 (enExample)
KR (1) KR100967034B1 (enExample)
CN (1) CN1313407C (enExample)
AU (1) AU2003231062A1 (enExample)
TW (1) TW200400924A (enExample)
WO (1) WO2003095384A1 (enExample)

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7118789B2 (en) 2001-07-16 2006-10-10 Heraeus Shin-Etsu America Silica glass crucible
US6641663B2 (en) * 2001-12-12 2003-11-04 Heracus Shin-Estu America Silica crucible with inner layer crystallizer and method
JP3970692B2 (ja) * 2002-05-31 2007-09-05 信越化学工業株式会社 プリフォーム製造方法
JP5050363B2 (ja) * 2005-08-12 2012-10-17 株式会社Ｓｕｍｃｏ 半導体シリコン基板用熱処理治具およびその製作方法
US20070151504A1 (en) * 2005-10-19 2007-07-05 General Electric Company Quartz glass crucible and method for treating surface of quartz glass crucible
US9139932B2 (en) 2006-10-18 2015-09-22 Richard Lee Hansen Quartz glass crucible and method for treating surface of quartz glass crucible
DE102007036407B4 (de) 2007-02-28 2010-01-28 Schott Ag Verfahren zur Herstellung einer beschichteten dreidimensional verformten Scheibe aus Glaskeramik
JP5146402B2 (ja) * 2009-05-19 2013-02-20 トヨタ自動車株式会社 炭素粒子含有被膜の成膜方法、伝熱部材、パワーモジュール、及び車両用インバータ
US20110129784A1 (en) * 2009-11-30 2011-06-02 James Crawford Bange Low thermal expansion doped fused silica crucibles
JP5610570B2 (ja) * 2010-07-20 2014-10-22 株式会社Sumco シリカガラスルツボ、シリコンインゴットの製造方法
CN102453956B (zh) * 2010-10-27 2016-03-23 杭州先进石英材料有限公司 一种石英玻璃坩埚及其制备方法
KR101697027B1 (ko) * 2012-06-25 2017-01-16 실리코르 머티리얼즈 인코포레이티드 실리콘 용융물의 정제용 내화 도가니의 표면용 라이닝 및 용융 및 추가적인 방향성 고체화를 위하여 상기 도가니(들)를 이용하는 실리콘 용융물의 정제 방법
CN105382673B (zh) * 2015-11-09 2018-01-09 盐城工学院 利用复合粉末介质火抛水钻珠坯的方法
EP3428132B1 (de) 2017-07-10 2023-08-30 Heraeus Quarzglas GmbH & Co. KG Quarzglasbauteil mit hoher thermischer stabilität, halbzeug dafür und verfahren zur herstellung desselben
CN107793021B (zh) * 2017-10-31 2021-07-30 江苏亨通光导新材料有限公司 适于光纤预制棒烧结炉的微晶化炉芯管及快速微晶化方法
CN113430479B (zh) * 2021-06-25 2022-05-20 常州大学 钛及钛合金表面碳纳米材料改性的Ti-Al-Si-C镀层及其制备方法

Family Cites Families (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4102666A (en) 1968-02-22 1978-07-25 Heraeus-Schott Quarzschmelze Gmbh Method of surface crystallizing quartz
US3972704A (en) * 1971-04-19 1976-08-03 Sherwood Refractories, Inc. Apparatus for making vitreous silica receptacles
DE2340546A1 (de) * 1973-08-10 1975-02-27 Pfaudler Werke Ag Metallisches implantat und verfahren zu seiner herstellung
US4169168A (en) * 1978-08-24 1979-09-25 Zenith Radio Corporation Process for manufacturing microporous cathode coatings
US5389582A (en) 1985-11-06 1995-02-14 Loxley; Ted A. Cristobalite reinforcement of quartz glass
US5053359A (en) 1989-03-24 1991-10-01 Pyromatics, Inc. Cristobalite reinforcement of high silica glass
JPH068181B2 (ja) 1987-03-26 1994-02-02 信越石英株式会社 半導体工業用石英ガラス製品
JPS63236722A (ja) 1987-03-26 1988-10-03 Shinetsu Sekiei Kk 石英ガラス製品及びその製造方法
JPH01126238A (ja) * 1987-11-09 1989-05-18 Shinetsu Sekiei Kk 石英ガラス炉芯管
US5316854A (en) * 1991-12-06 1994-05-31 Ppg Industries, Inc. Glass or quartz articles having high temperature UV absorbing coatings containing ceria
US5674792A (en) * 1993-11-12 1997-10-07 Heraeus Quarzglas Gmbh Shaped body having a high silicon dioxide content and a process for producing such shaped bodies
US5976247A (en) 1995-06-14 1999-11-02 Memc Electronic Materials, Inc. Surface-treated crucibles for improved zero dislocation performance
US5980629A (en) 1995-06-14 1999-11-09 Memc Electronic Materials, Inc. Methods for improving zero dislocation yield of single crystals
EP0911429A1 (en) * 1997-09-30 1999-04-28 Heraeus Quarzglas GmbH Quartz glass crucible for producing silicon single crystal and method for producing the crucible
JP3583604B2 (ja) * 1998-01-12 2004-11-04 東芝セラミックス株式会社 石英ガラスルツボとその製造方法
JP2002029890A (ja) 2000-07-19 2002-01-29 Wacker Nsce Corp シリコン単結晶引き上げ用石英ガラスルツボ
DE10041582B4 (de) * 2000-08-24 2007-01-18 Heraeus Quarzglas Gmbh & Co. Kg Quarzglastiegel sowie Verfahren zur Herstellung desselben
US6755049B2 (en) * 2001-03-08 2004-06-29 Heraeus Quarzglas Gmbh & Co. Kg Method of producing a quartz glass crucible
US20040118156A1 (en) * 2001-03-08 2004-06-24 Gabriele Korus Method of producing a quartz glass crucible
WO2002070414A1 (de) 2001-03-08 2002-09-12 Heraeus Quarzglas Gmbh & Co. Kg Verfahren zur herstellung eines quarzglastiegels
JP4288646B2 (ja) * 2001-10-16 2009-07-01 ジャパンスーパークォーツ株式会社 石英ガラスルツボの表面改質方法と表面改質ルツボ
US6734328B1 (en) * 2002-11-08 2004-05-11 Catalytic Distillation Technologies Process for the selective hydrogenation of alkynes

Also Published As

Publication number Publication date
CN1313407C (zh) 2007-05-02
TW200400924A (en) 2004-01-16
WO2003095384A1 (en) 2003-11-20
JP2005525284A (ja) 2005-08-25
KR20050004851A (ko) 2005-01-12
US20050081564A1 (en) 2005-04-21
CN1665751A (zh) 2005-09-07
AU2003231062A1 (en) 2003-11-11
US6875515B2 (en) 2005-04-05
EP1506142A1 (en) 2005-02-16
KR100967034B1 (ko) 2010-06-30
US20030211335A1 (en) 2003-11-13
EP1506142B1 (en) 2019-12-11

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