TW200400924A - Fused quartz article having controlled devitrification - Google Patents
Fused quartz article having controlled devitrification Download PDFInfo
- Publication number
- TW200400924A TW200400924A TW092112720A TW92112720A TW200400924A TW 200400924 A TW200400924 A TW 200400924A TW 092112720 A TW092112720 A TW 092112720A TW 92112720 A TW92112720 A TW 92112720A TW 200400924 A TW200400924 A TW 200400924A
- Authority
- TW
- Taiwan
- Prior art keywords
- fused quartz
- coating
- patent application
- metal
- item
- Prior art date
Links
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 title claims abstract description 185
- 239000005350 fused silica glass Substances 0.000 title claims abstract description 109
- 238000004031 devitrification Methods 0.000 title abstract description 11
- 150000001768 cations Chemical class 0.000 claims abstract description 95
- 238000000576 coating method Methods 0.000 claims abstract description 87
- 239000011248 coating agent Substances 0.000 claims abstract description 86
- 229910052751 metal Inorganic materials 0.000 claims abstract description 78
- 239000002184 metal Substances 0.000 claims abstract description 78
- 239000002002 slurry Substances 0.000 claims abstract description 46
- 238000000034 method Methods 0.000 claims abstract description 40
- 239000013078 crystal Substances 0.000 claims abstract description 21
- 229910052788 barium Inorganic materials 0.000 claims abstract description 11
- DSAJWYNOEDNPEQ-UHFFFAOYSA-N barium atom Chemical compound [Ba] DSAJWYNOEDNPEQ-UHFFFAOYSA-N 0.000 claims abstract description 11
- OYPRJOBELJOOCE-UHFFFAOYSA-N Calcium Chemical compound [Ca] OYPRJOBELJOOCE-UHFFFAOYSA-N 0.000 claims abstract description 5
- 229910052791 calcium Inorganic materials 0.000 claims abstract description 5
- 239000011575 calcium Substances 0.000 claims abstract description 5
- 229910052712 strontium Inorganic materials 0.000 claims abstract 2
- CIOAGBVUUVVLOB-UHFFFAOYSA-N strontium atom Chemical compound [Sr] CIOAGBVUUVVLOB-UHFFFAOYSA-N 0.000 claims abstract 2
- 235000012239 silicon dioxide Nutrition 0.000 claims description 38
- 239000010453 quartz Substances 0.000 claims description 24
- 239000000377 silicon dioxide Substances 0.000 claims description 19
- 239000004575 stone Substances 0.000 claims description 17
- 239000010410 layer Substances 0.000 claims description 14
- 229910052761 rare earth metal Inorganic materials 0.000 claims description 14
- 150000002910 rare earth metals Chemical class 0.000 claims description 13
- 150000002500 ions Chemical class 0.000 claims description 12
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 10
- 239000000463 material Substances 0.000 claims description 9
- 229910052784 alkaline earth metal Inorganic materials 0.000 claims description 7
- 150000001342 alkaline earth metals Chemical class 0.000 claims description 7
- 238000006243 chemical reaction Methods 0.000 claims description 7
- 239000011247 coating layer Substances 0.000 claims description 7
- 230000008018 melting Effects 0.000 claims description 7
- 238000002844 melting Methods 0.000 claims description 7
- 239000010456 wollastonite Substances 0.000 claims description 7
- 229910052882 wollastonite Inorganic materials 0.000 claims description 7
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 6
- 229910052783 alkali metal Inorganic materials 0.000 claims description 6
- 150000001340 alkali metals Chemical class 0.000 claims description 6
- 229910021645 metal ion Inorganic materials 0.000 claims description 6
- 238000005498 polishing Methods 0.000 claims description 6
- 229910052710 silicon Inorganic materials 0.000 claims description 6
- 239000010703 silicon Substances 0.000 claims description 6
- 239000002689 soil Substances 0.000 claims description 6
- 238000001035 drying Methods 0.000 claims description 5
- 239000002253 acid Substances 0.000 claims description 4
- -1 cation silicon dioxide Chemical class 0.000 claims description 4
- 238000005520 cutting process Methods 0.000 claims description 4
- 239000007789 gas Substances 0.000 claims description 4
- 238000010438 heat treatment Methods 0.000 claims description 4
- 238000005507 spraying Methods 0.000 claims description 4
- 150000007513 acids Chemical class 0.000 claims description 3
- 230000007850 degeneration Effects 0.000 claims description 3
- 238000002791 soaking Methods 0.000 claims description 3
- 150000001875 compounds Chemical class 0.000 claims description 2
- 230000009466 transformation Effects 0.000 claims description 2
- 239000004576 sand Substances 0.000 claims 2
- BGJSXRVXTHVRSN-UHFFFAOYSA-N 1,3,5-trioxane Chemical compound C1OCOCO1 BGJSXRVXTHVRSN-UHFFFAOYSA-N 0.000 claims 1
- 240000005528 Arctium lappa Species 0.000 claims 1
- 235000003130 Arctium lappa Nutrition 0.000 claims 1
- 235000008078 Arctium minus Nutrition 0.000 claims 1
- BHPQYMZQTOCNFJ-UHFFFAOYSA-N Calcium cation Chemical compound [Ca+2] BHPQYMZQTOCNFJ-UHFFFAOYSA-N 0.000 claims 1
- 206010011224 Cough Diseases 0.000 claims 1
- 235000010627 Phaseolus vulgaris Nutrition 0.000 claims 1
- 244000046052 Phaseolus vulgaris Species 0.000 claims 1
- 229910001422 barium ion Inorganic materials 0.000 claims 1
- 238000005282 brightening Methods 0.000 claims 1
- 229910001424 calcium ion Inorganic materials 0.000 claims 1
- 238000007598 dipping method Methods 0.000 claims 1
- 239000010437 gem Substances 0.000 claims 1
- 229910001751 gemstone Inorganic materials 0.000 claims 1
- 239000004570 mortar (masonry) Substances 0.000 claims 1
- 230000001590 oxidative effect Effects 0.000 claims 1
- 229920000642 polymer Polymers 0.000 claims 1
- 239000003380 propellant Substances 0.000 claims 1
- 229910052814 silicon oxide Inorganic materials 0.000 claims 1
- 239000008119 colloidal silica Substances 0.000 abstract description 8
- 230000006911 nucleation Effects 0.000 abstract description 3
- 238000010899 nucleation Methods 0.000 abstract description 3
- 229910052906 cristobalite Inorganic materials 0.000 abstract 2
- 238000004380 ashing Methods 0.000 description 12
- IWOUKMZUPDVPGQ-UHFFFAOYSA-N barium nitrate Chemical compound [Ba+2].[O-][N+]([O-])=O.[O-][N+]([O-])=O IWOUKMZUPDVPGQ-UHFFFAOYSA-N 0.000 description 8
- 239000002019 doping agent Substances 0.000 description 8
- 238000012360 testing method Methods 0.000 description 6
- 239000011521 glass Substances 0.000 description 5
- 238000005245 sintering Methods 0.000 description 5
- 239000010408 film Substances 0.000 description 4
- 230000003287 optical effect Effects 0.000 description 4
- 239000000243 solution Substances 0.000 description 4
- 241000237858 Gastropoda Species 0.000 description 3
- 239000000835 fiber Substances 0.000 description 3
- 210000002816 gill Anatomy 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 239000000725 suspension Substances 0.000 description 3
- BPQQTUXANYXVAA-UHFFFAOYSA-N Orthosilicate Chemical compound [O-][Si]([O-])([O-])[O-] BPQQTUXANYXVAA-UHFFFAOYSA-N 0.000 description 2
- 150000001553 barium compounds Chemical class 0.000 description 2
- 230000001680 brushing effect Effects 0.000 description 2
- 238000002425 crystallisation Methods 0.000 description 2
- 230000008025 crystallization Effects 0.000 description 2
- 238000001514 detection method Methods 0.000 description 2
- XSXHWVKGUXMUQE-UHFFFAOYSA-N dioxoosmium Chemical compound O=[Os]=O XSXHWVKGUXMUQE-UHFFFAOYSA-N 0.000 description 2
- 235000013399 edible fruits Nutrition 0.000 description 2
- 150000004820 halides Chemical class 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- 238000012545 processing Methods 0.000 description 2
- 239000002994 raw material Substances 0.000 description 2
- 241000894007 species Species 0.000 description 2
- 239000010409 thin film Substances 0.000 description 2
- HGUFODBRKLSHSI-UHFFFAOYSA-N 2,3,7,8-tetrachloro-dibenzo-p-dioxin Chemical compound O1C2=CC(Cl)=C(Cl)C=C2OC2=C1C=C(Cl)C(Cl)=C2 HGUFODBRKLSHSI-UHFFFAOYSA-N 0.000 description 1
- 240000007154 Coffea arabica Species 0.000 description 1
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 description 1
- 241000238631 Hexapoda Species 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
- 235000014676 Phragmites communis Nutrition 0.000 description 1
- 229910052769 Ytterbium Inorganic materials 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000008280 blood Substances 0.000 description 1
- 210000004369 blood Anatomy 0.000 description 1
- 230000009172 bursting Effects 0.000 description 1
- 229910052793 cadmium Inorganic materials 0.000 description 1
- BDOSMKKIYDKNTQ-UHFFFAOYSA-N cadmium atom Chemical compound [Cd] BDOSMKKIYDKNTQ-UHFFFAOYSA-N 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 238000005352 clarification Methods 0.000 description 1
- 230000015271 coagulation Effects 0.000 description 1
- 238000005345 coagulation Methods 0.000 description 1
- 239000003245 coal Substances 0.000 description 1
- 235000016213 coffee Nutrition 0.000 description 1
- 235000013353 coffee beverage Nutrition 0.000 description 1
- 239000000084 colloidal system Substances 0.000 description 1
- 238000009833 condensation Methods 0.000 description 1
- 230000005494 condensation Effects 0.000 description 1
- 239000008367 deionised water Substances 0.000 description 1
- 229910021641 deionized water Inorganic materials 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 229910001882 dioxygen Inorganic materials 0.000 description 1
- 230000005670 electromagnetic radiation Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 239000012530 fluid Substances 0.000 description 1
- 229910021485 fumed silica Inorganic materials 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- KYCCPXBWYYZSRP-UHFFFAOYSA-N gold yttrium Chemical compound [Y].[Au].[Au] KYCCPXBWYYZSRP-UHFFFAOYSA-N 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 150000002484 inorganic compounds Chemical class 0.000 description 1
- 229910010272 inorganic material Inorganic materials 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 238000001465 metallisation Methods 0.000 description 1
- 238000001000 micrograph Methods 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 230000007935 neutral effect Effects 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- 239000000382 optic material Substances 0.000 description 1
- 239000013307 optical fiber Substances 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 239000011044 quartzite Substances 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 230000008439 repair process Effects 0.000 description 1
- CVHZOJJKTDOEJC-UHFFFAOYSA-N saccharin Chemical compound C1=CC=C2C(=O)NS(=O)(=O)C2=C1 CVHZOJJKTDOEJC-UHFFFAOYSA-N 0.000 description 1
- 229940081974 saccharin Drugs 0.000 description 1
- 235000019204 saccharin Nutrition 0.000 description 1
- 239000000901 saccharin and its Na,K and Ca salt Substances 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 230000035807 sensation Effects 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 230000001131 transforming effect Effects 0.000 description 1
- 210000002700 urine Anatomy 0.000 description 1
- 238000004017 vitrification Methods 0.000 description 1
- NAWDYIZEMPQZHO-UHFFFAOYSA-N ytterbium Chemical compound [Yb] NAWDYIZEMPQZHO-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/06—Surface treatment of glass, not in the form of fibres or filaments, by coating with metals
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B35/00—Apparatus not otherwise provided for, specially adapted for the growth, production or after-treatment of single crystals or of a homogeneous polycrystalline material with defined structure
- C30B35/002—Crucibles or containers
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B32/00—Thermal after-treatment of glass products not provided for in groups C03B19/00, C03B25/00 - C03B31/00 or C03B37/00, e.g. crystallisation, eliminating gas inclusions or other impurities; Hot-pressing vitrified, non-porous, shaped glass products
- C03B32/02—Thermal crystallisation, e.g. for crystallising glass bodies into glass-ceramic articles
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C10/00—Devitrified glass ceramics, i.e. glass ceramics having a crystalline phase dispersed in a glassy phase and constituting at least 50% by weight of the total composition
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C10/00—Devitrified glass ceramics, i.e. glass ceramics having a crystalline phase dispersed in a glassy phase and constituting at least 50% by weight of the total composition
- C03C10/0009—Devitrified glass ceramics, i.e. glass ceramics having a crystalline phase dispersed in a glassy phase and constituting at least 50% by weight of the total composition containing silica as main constituent
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
- C03C17/23—Oxides
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/20—Materials for coating a single layer on glass
- C03C2217/21—Oxides
- C03C2217/213—SiO2
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/20—Materials for coating a single layer on glass
- C03C2217/21—Oxides
- C03C2217/24—Doped oxides
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Crystallography & Structural Chemistry (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Ceramic Engineering (AREA)
- Dispersion Chemistry (AREA)
- Metallurgy (AREA)
- Physics & Mathematics (AREA)
- Thermal Sciences (AREA)
- Glass Melting And Manufacturing (AREA)
- Glass Compositions (AREA)
- Surface Treatment Of Glass (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US10/063,754 US6875515B2 (en) | 2002-05-10 | 2002-05-10 | Fused quartz article having controlled devitrification |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| TW200400924A true TW200400924A (en) | 2004-01-16 |
Family
ID=29399072
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW092112720A TW200400924A (en) | 2002-05-10 | 2003-05-09 | Fused quartz article having controlled devitrification |
Country Status (8)
| Country | Link |
|---|---|
| US (2) | US6875515B2 (enExample) |
| EP (1) | EP1506142B1 (enExample) |
| JP (1) | JP4700340B2 (enExample) |
| KR (1) | KR100967034B1 (enExample) |
| CN (1) | CN1313407C (enExample) |
| AU (1) | AU2003231062A1 (enExample) |
| TW (1) | TW200400924A (enExample) |
| WO (1) | WO2003095384A1 (enExample) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8105078B2 (en) | 2005-08-12 | 2012-01-31 | Sumco Corporation | Heat treatment jig for semiconductor silicon substrates and method for manufacturing the same |
Families Citing this family (15)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7118789B2 (en) * | 2001-07-16 | 2006-10-10 | Heraeus Shin-Etsu America | Silica glass crucible |
| US6641663B2 (en) * | 2001-12-12 | 2003-11-04 | Heracus Shin-Estu America | Silica crucible with inner layer crystallizer and method |
| JP3970692B2 (ja) * | 2002-05-31 | 2007-09-05 | 信越化学工業株式会社 | プリフォーム製造方法 |
| US20070151504A1 (en) * | 2005-10-19 | 2007-07-05 | General Electric Company | Quartz glass crucible and method for treating surface of quartz glass crucible |
| US9139932B2 (en) | 2006-10-18 | 2015-09-22 | Richard Lee Hansen | Quartz glass crucible and method for treating surface of quartz glass crucible |
| DE102007036407B4 (de) | 2007-02-28 | 2010-01-28 | Schott Ag | Verfahren zur Herstellung einer beschichteten dreidimensional verformten Scheibe aus Glaskeramik |
| JP5146402B2 (ja) * | 2009-05-19 | 2013-02-20 | トヨタ自動車株式会社 | 炭素粒子含有被膜の成膜方法、伝熱部材、パワーモジュール、及び車両用インバータ |
| US20110129784A1 (en) * | 2009-11-30 | 2011-06-02 | James Crawford Bange | Low thermal expansion doped fused silica crucibles |
| JP5610570B2 (ja) * | 2010-07-20 | 2014-10-22 | 株式会社Sumco | シリカガラスルツボ、シリコンインゴットの製造方法 |
| CN102453956B (zh) * | 2010-10-27 | 2016-03-23 | 杭州先进石英材料有限公司 | 一种石英玻璃坩埚及其制备方法 |
| EP2864529A1 (en) * | 2012-06-25 | 2015-04-29 | Silicor Materials Inc. | Lining for surfaces of a refractory crucible for purification of silicon melt and method of purification of the silicon melt using that crucible (s) for melting and further directional solidification |
| CN105382673B (zh) * | 2015-11-09 | 2018-01-09 | 盐城工学院 | 利用复合粉末介质火抛水钻珠坯的方法 |
| EP3428132B1 (de) * | 2017-07-10 | 2023-08-30 | Heraeus Quarzglas GmbH & Co. KG | Quarzglasbauteil mit hoher thermischer stabilität, halbzeug dafür und verfahren zur herstellung desselben |
| CN107793021B (zh) * | 2017-10-31 | 2021-07-30 | 江苏亨通光导新材料有限公司 | 适于光纤预制棒烧结炉的微晶化炉芯管及快速微晶化方法 |
| CN113430479B (zh) * | 2021-06-25 | 2022-05-20 | 常州大学 | 钛及钛合金表面碳纳米材料改性的Ti-Al-Si-C镀层及其制备方法 |
Family Cites Families (22)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4102666A (en) | 1968-02-22 | 1978-07-25 | Heraeus-Schott Quarzschmelze Gmbh | Method of surface crystallizing quartz |
| US3972704A (en) * | 1971-04-19 | 1976-08-03 | Sherwood Refractories, Inc. | Apparatus for making vitreous silica receptacles |
| DE2340546A1 (de) * | 1973-08-10 | 1975-02-27 | Pfaudler Werke Ag | Metallisches implantat und verfahren zu seiner herstellung |
| US4169168A (en) * | 1978-08-24 | 1979-09-25 | Zenith Radio Corporation | Process for manufacturing microporous cathode coatings |
| US5389582A (en) | 1985-11-06 | 1995-02-14 | Loxley; Ted A. | Cristobalite reinforcement of quartz glass |
| US5053359A (en) | 1989-03-24 | 1991-10-01 | Pyromatics, Inc. | Cristobalite reinforcement of high silica glass |
| JPS63236722A (ja) | 1987-03-26 | 1988-10-03 | Shinetsu Sekiei Kk | 石英ガラス製品及びその製造方法 |
| JPH068181B2 (ja) | 1987-03-26 | 1994-02-02 | 信越石英株式会社 | 半導体工業用石英ガラス製品 |
| JPH01126238A (ja) * | 1987-11-09 | 1989-05-18 | Shinetsu Sekiei Kk | 石英ガラス炉芯管 |
| US5316854A (en) * | 1991-12-06 | 1994-05-31 | Ppg Industries, Inc. | Glass or quartz articles having high temperature UV absorbing coatings containing ceria |
| US5674792A (en) * | 1993-11-12 | 1997-10-07 | Heraeus Quarzglas Gmbh | Shaped body having a high silicon dioxide content and a process for producing such shaped bodies |
| US5976247A (en) * | 1995-06-14 | 1999-11-02 | Memc Electronic Materials, Inc. | Surface-treated crucibles for improved zero dislocation performance |
| US5980629A (en) | 1995-06-14 | 1999-11-09 | Memc Electronic Materials, Inc. | Methods for improving zero dislocation yield of single crystals |
| EP0911429A1 (en) * | 1997-09-30 | 1999-04-28 | Heraeus Quarzglas GmbH | Quartz glass crucible for producing silicon single crystal and method for producing the crucible |
| JP3583604B2 (ja) * | 1998-01-12 | 2004-11-04 | 東芝セラミックス株式会社 | 石英ガラスルツボとその製造方法 |
| JP2002029890A (ja) | 2000-07-19 | 2002-01-29 | Wacker Nsce Corp | シリコン単結晶引き上げ用石英ガラスルツボ |
| DE10041582B4 (de) * | 2000-08-24 | 2007-01-18 | Heraeus Quarzglas Gmbh & Co. Kg | Quarzglastiegel sowie Verfahren zur Herstellung desselben |
| CN1313399C (zh) | 2001-03-08 | 2007-05-02 | 赫罗伊斯石英玻璃股份有限两合公司 | 石英玻璃坩埚的制造方法 |
| US20040118156A1 (en) * | 2001-03-08 | 2004-06-24 | Gabriele Korus | Method of producing a quartz glass crucible |
| US6755049B2 (en) * | 2001-03-08 | 2004-06-29 | Heraeus Quarzglas Gmbh & Co. Kg | Method of producing a quartz glass crucible |
| JP4288646B2 (ja) * | 2001-10-16 | 2009-07-01 | ジャパンスーパークォーツ株式会社 | 石英ガラスルツボの表面改質方法と表面改質ルツボ |
| US6734328B1 (en) * | 2002-11-08 | 2004-05-11 | Catalytic Distillation Technologies | Process for the selective hydrogenation of alkynes |
-
2002
- 2002-05-10 US US10/063,754 patent/US6875515B2/en not_active Expired - Lifetime
-
2003
- 2003-04-24 EP EP03724186.6A patent/EP1506142B1/en not_active Expired - Lifetime
- 2003-04-24 WO PCT/US2003/012599 patent/WO2003095384A1/en not_active Ceased
- 2003-04-24 KR KR1020047018171A patent/KR100967034B1/ko not_active Expired - Lifetime
- 2003-04-24 AU AU2003231062A patent/AU2003231062A1/en not_active Abandoned
- 2003-04-24 JP JP2004503409A patent/JP4700340B2/ja not_active Expired - Lifetime
- 2003-04-24 CN CNB03816275XA patent/CN1313407C/zh not_active Expired - Lifetime
- 2003-05-09 TW TW092112720A patent/TW200400924A/zh unknown
-
2004
- 2004-12-08 US US11/007,765 patent/US20050081564A1/en not_active Abandoned
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8105078B2 (en) | 2005-08-12 | 2012-01-31 | Sumco Corporation | Heat treatment jig for semiconductor silicon substrates and method for manufacturing the same |
Also Published As
| Publication number | Publication date |
|---|---|
| WO2003095384A1 (en) | 2003-11-20 |
| EP1506142B1 (en) | 2019-12-11 |
| US20050081564A1 (en) | 2005-04-21 |
| US6875515B2 (en) | 2005-04-05 |
| AU2003231062A1 (en) | 2003-11-11 |
| JP4700340B2 (ja) | 2011-06-15 |
| CN1665751A (zh) | 2005-09-07 |
| CN1313407C (zh) | 2007-05-02 |
| KR100967034B1 (ko) | 2010-06-30 |
| KR20050004851A (ko) | 2005-01-12 |
| EP1506142A1 (en) | 2005-02-16 |
| US20030211335A1 (en) | 2003-11-13 |
| JP2005525284A (ja) | 2005-08-25 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| TW200400924A (en) | Fused quartz article having controlled devitrification | |
| JP5008198B2 (ja) | 反射体層を備えた部材およびその製造方法 | |
| JP3040278B2 (ja) | 高シリカガラスからなる製品の製造方法 | |
| JP2008510677A5 (enExample) | ||
| JP6395723B2 (ja) | ガラス板の製造方法及びガラス板 | |
| TWI651277B (zh) | 製造用於ｅｕｖ微影術之高矽酸含量的氟與鈦摻雜玻璃底板的方法及由該方法製造之底板 | |
| JPS63307140A (ja) | 超低膨張ガラスを製造するためのゾルーゲル法 | |
| CN108529872B (zh) | 化学强化玻璃和化学强化玻璃的制造方法 | |
| CN104876434B (zh) | 一种均匀掺杂石英玻璃棒的制备方法 | |
| CN102688702B (zh) | 一种硅酸盐玻璃中空纤维膜的制备方法 | |
| JPS62105936A (ja) | 平板状石英ガラスの製造方法 | |
| TW201520586A (zh) | 抗反射物件以及製造彼之方法 | |
| JP4855933B2 (ja) | Ｇｒｉｎレンズの製造方法及びｇｒｉｎレンズ | |
| JP4482679B2 (ja) | 任意の表面特性及び表面形状を有する基体表面へのシリカ薄膜の製造方法及び複合構造体 | |
| Liu et al. | Room‐temperature bonding method of bioactive ultrathin glass film on titanium by a dissolution‐polymerization reaction | |
| Gil et al. | TEM monitoring of silver nanoparticles formation on the surface of lead crystal glass | |
| CN101798179A (zh) | 具有二向色性的、掺杂纳米金颗粒的玻璃及其制备方法 | |
| Garcia et al. | Optical spectroscopy of arsenic-and silver-containing sol-gelcoatings | |
| JP3150723B2 (ja) | フッ化物ガラスの製造法 | |
| US20250289968A1 (en) | Engineered feedstocks for additive manufacture of glass | |
| JP2005145751A (ja) | Ｇｒｉｎレンズの製造方法及びｇｒｉｎレンズ | |
| WO2003078320A1 (en) | Thin silica film and silica-titania composite film, and method for preparing them | |
| Carter et al. | Glass and glass-ceramics | |
| CH627723A5 (en) | Process for coating the surface of a ceramic with a biologically active glass, product obtained by using this process and use of this product | |
| JPH05306126A (ja) | 屈折率分布型光学素子およびその製造方法 |