CN1313407C - 具有可控脱玻作用的熔凝石英制品 - Google Patents

具有可控脱玻作用的熔凝石英制品 Download PDF

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Publication number
CN1313407C
CN1313407C CNB03816275XA CN03816275A CN1313407C CN 1313407 C CN1313407 C CN 1313407C CN B03816275X A CNB03816275X A CN B03816275XA CN 03816275 A CN03816275 A CN 03816275A CN 1313407 C CN1313407 C CN 1313407C
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CN
China
Prior art keywords
article
coating
fused
silica
metal cations
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
CNB03816275XA
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English (en)
Chinese (zh)
Other versions
CN1665751A (zh
Inventor
托马斯·F·麦克纳尔蒂
戴维·C·彭德
维克托·L－K·卢
罗伯特·A·吉丁斯
弗雷德里克·F·阿尔格伦
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Momentive Performance Materials Inc
Original Assignee
General Electric Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by General Electric Co filed Critical General Electric Co
Publication of CN1665751A publication Critical patent/CN1665751A/zh
Application granted granted Critical
Publication of CN1313407C publication Critical patent/CN1313407C/zh
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    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/06—Surface treatment of glass, not in the form of fibres or filaments, by coating with metals
    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B35/00—Apparatus not otherwise provided for, specially adapted for the growth, production or after-treatment of single crystals or of a homogeneous polycrystalline material with defined structure
    • C30B35/002—Crucibles or containers
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B32/00—Thermal after-treatment of glass products not provided for in groups C03B19/00, C03B25/00 - C03B31/00 or C03B37/00, e.g. crystallisation, eliminating gas inclusions or other impurities; Hot-pressing vitrified, non-porous, shaped glass products
    • C03B32/02—Thermal crystallisation, e.g. for crystallising glass bodies into glass-ceramic articles
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C10/00—Devitrified glass ceramics, i.e. glass ceramics having a crystalline phase dispersed in a glassy phase and constituting at least 50% by weight of the total composition
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C10/00—Devitrified glass ceramics, i.e. glass ceramics having a crystalline phase dispersed in a glassy phase and constituting at least 50% by weight of the total composition
    • C03C10/0009—Devitrified glass ceramics, i.e. glass ceramics having a crystalline phase dispersed in a glassy phase and constituting at least 50% by weight of the total composition containing silica as main constituent
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
    • C03C17/23—Oxides
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/20—Materials for coating a single layer on glass
    • C03C2217/21—Oxides
    • C03C2217/213—SiO2
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/20—Materials for coating a single layer on glass
    • C03C2217/21—Oxides
    • C03C2217/24—Doped oxides

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Ceramic Engineering (AREA)
  • Dispersion Chemistry (AREA)
  • Metallurgy (AREA)
  • Physics & Mathematics (AREA)
  • Thermal Sciences (AREA)
  • Glass Melting And Manufacturing (AREA)
  • Glass Compositions (AREA)
  • Surface Treatment Of Glass (AREA)
CNB03816275XA 2002-05-10 2003-04-24 具有可控脱玻作用的熔凝石英制品 Expired - Lifetime CN1313407C (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US10/063,754 2002-05-10
US10/063,754 US6875515B2 (en) 2002-05-10 2002-05-10 Fused quartz article having controlled devitrification

Publications (2)

Publication Number Publication Date
CN1665751A CN1665751A (zh) 2005-09-07
CN1313407C true CN1313407C (zh) 2007-05-02

Family

ID=29399072

Family Applications (1)

Application Number Title Priority Date Filing Date
CNB03816275XA Expired - Lifetime CN1313407C (zh) 2002-05-10 2003-04-24 具有可控脱玻作用的熔凝石英制品

Country Status (8)

Country Link
US (2) US6875515B2 (enExample)
EP (1) EP1506142B1 (enExample)
JP (1) JP4700340B2 (enExample)
KR (1) KR100967034B1 (enExample)
CN (1) CN1313407C (enExample)
AU (1) AU2003231062A1 (enExample)
TW (1) TW200400924A (enExample)
WO (1) WO2003095384A1 (enExample)

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* Cited by examiner, † Cited by third party
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US7118789B2 (en) * 2001-07-16 2006-10-10 Heraeus Shin-Etsu America Silica glass crucible
US6641663B2 (en) * 2001-12-12 2003-11-04 Heracus Shin-Estu America Silica crucible with inner layer crystallizer and method
JP3970692B2 (ja) * 2002-05-31 2007-09-05 信越化学工業株式会社 プリフォーム製造方法
JP5050363B2 (ja) * 2005-08-12 2012-10-17 株式会社Ｓｕｍｃｏ 半導体シリコン基板用熱処理治具およびその製作方法
US20070151504A1 (en) * 2005-10-19 2007-07-05 General Electric Company Quartz glass crucible and method for treating surface of quartz glass crucible
US9139932B2 (en) 2006-10-18 2015-09-22 Richard Lee Hansen Quartz glass crucible and method for treating surface of quartz glass crucible
DE102007036407B4 (de) 2007-02-28 2010-01-28 Schott Ag Verfahren zur Herstellung einer beschichteten dreidimensional verformten Scheibe aus Glaskeramik
JP5146402B2 (ja) * 2009-05-19 2013-02-20 トヨタ自動車株式会社 炭素粒子含有被膜の成膜方法、伝熱部材、パワーモジュール、及び車両用インバータ
US20110129784A1 (en) * 2009-11-30 2011-06-02 James Crawford Bange Low thermal expansion doped fused silica crucibles
JP5610570B2 (ja) * 2010-07-20 2014-10-22 株式会社Sumco シリカガラスルツボ、シリコンインゴットの製造方法
CN102453956B (zh) * 2010-10-27 2016-03-23 杭州先进石英材料有限公司 一种石英玻璃坩埚及其制备方法
EP2864529A1 (en) * 2012-06-25 2015-04-29 Silicor Materials Inc. Lining for surfaces of a refractory crucible for purification of silicon melt and method of purification of the silicon melt using that crucible (s) for melting and further directional solidification
CN105382673B (zh) * 2015-11-09 2018-01-09 盐城工学院 利用复合粉末介质火抛水钻珠坯的方法
EP3428132B1 (de) * 2017-07-10 2023-08-30 Heraeus Quarzglas GmbH & Co. KG Quarzglasbauteil mit hoher thermischer stabilität, halbzeug dafür und verfahren zur herstellung desselben
CN107793021B (zh) * 2017-10-31 2021-07-30 江苏亨通光导新材料有限公司 适于光纤预制棒烧结炉的微晶化炉芯管及快速微晶化方法
CN113430479B (zh) * 2021-06-25 2022-05-20 常州大学 钛及钛合金表面碳纳米材料改性的Ti-Al-Si-C镀层及其制备方法

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4102666A (en) * 1968-02-22 1978-07-25 Heraeus-Schott Quarzschmelze Gmbh Method of surface crystallizing quartz
EP0748885A1 (en) * 1995-06-14 1996-12-18 MEMC Electronic Materials, Inc. Crucible for improved zero dislocation single crystal growth
EP0753605A1 (en) * 1995-06-14 1997-01-15 MEMC Electronic Materials, Inc. Methods for improving zero dislocation yield of single crystals

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US3972704A (en) * 1971-04-19 1976-08-03 Sherwood Refractories, Inc. Apparatus for making vitreous silica receptacles
DE2340546A1 (de) * 1973-08-10 1975-02-27 Pfaudler Werke Ag Metallisches implantat und verfahren zu seiner herstellung
US4169168A (en) * 1978-08-24 1979-09-25 Zenith Radio Corporation Process for manufacturing microporous cathode coatings
US5389582A (en) 1985-11-06 1995-02-14 Loxley; Ted A. Cristobalite reinforcement of quartz glass
US5053359A (en) 1989-03-24 1991-10-01 Pyromatics, Inc. Cristobalite reinforcement of high silica glass
JPS63236722A (ja) 1987-03-26 1988-10-03 Shinetsu Sekiei Kk 石英ガラス製品及びその製造方法
JPH068181B2 (ja) 1987-03-26 1994-02-02 信越石英株式会社 半導体工業用石英ガラス製品
JPH01126238A (ja) * 1987-11-09 1989-05-18 Shinetsu Sekiei Kk 石英ガラス炉芯管
US5316854A (en) * 1991-12-06 1994-05-31 Ppg Industries, Inc. Glass or quartz articles having high temperature UV absorbing coatings containing ceria
US5674792A (en) * 1993-11-12 1997-10-07 Heraeus Quarzglas Gmbh Shaped body having a high silicon dioxide content and a process for producing such shaped bodies
EP0911429A1 (en) * 1997-09-30 1999-04-28 Heraeus Quarzglas GmbH Quartz glass crucible for producing silicon single crystal and method for producing the crucible
JP3583604B2 (ja) * 1998-01-12 2004-11-04 東芝セラミックス株式会社 石英ガラスルツボとその製造方法
JP2002029890A (ja) 2000-07-19 2002-01-29 Wacker Nsce Corp シリコン単結晶引き上げ用石英ガラスルツボ
DE10041582B4 (de) * 2000-08-24 2007-01-18 Heraeus Quarzglas Gmbh & Co. Kg Quarzglastiegel sowie Verfahren zur Herstellung desselben
CN1313399C (zh) 2001-03-08 2007-05-02 赫罗伊斯石英玻璃股份有限两合公司 石英玻璃坩埚的制造方法
US20040118156A1 (en) * 2001-03-08 2004-06-24 Gabriele Korus Method of producing a quartz glass crucible
US6755049B2 (en) * 2001-03-08 2004-06-29 Heraeus Quarzglas Gmbh & Co. Kg Method of producing a quartz glass crucible
JP4288646B2 (ja) * 2001-10-16 2009-07-01 ジャパンスーパークォーツ株式会社 石英ガラスルツボの表面改質方法と表面改質ルツボ
US6734328B1 (en) * 2002-11-08 2004-05-11 Catalytic Distillation Technologies Process for the selective hydrogenation of alkynes

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4102666A (en) * 1968-02-22 1978-07-25 Heraeus-Schott Quarzschmelze Gmbh Method of surface crystallizing quartz
EP0748885A1 (en) * 1995-06-14 1996-12-18 MEMC Electronic Materials, Inc. Crucible for improved zero dislocation single crystal growth
EP0753605A1 (en) * 1995-06-14 1997-01-15 MEMC Electronic Materials, Inc. Methods for improving zero dislocation yield of single crystals

Also Published As

Publication number Publication date
WO2003095384A1 (en) 2003-11-20
EP1506142B1 (en) 2019-12-11
TW200400924A (en) 2004-01-16
US20050081564A1 (en) 2005-04-21
US6875515B2 (en) 2005-04-05
AU2003231062A1 (en) 2003-11-11
JP4700340B2 (ja) 2011-06-15
CN1665751A (zh) 2005-09-07
KR100967034B1 (ko) 2010-06-30
KR20050004851A (ko) 2005-01-12
EP1506142A1 (en) 2005-02-16
US20030211335A1 (en) 2003-11-13
JP2005525284A (ja) 2005-08-25

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Owner name: MOMENDIFU PERFORMANCE MATERIAL CO., LTD.

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Effective date: 20080725

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