JP4682332B2 - サブミクロンハニカム構造の製造法 - Google Patents
サブミクロンハニカム構造の製造法 Download PDFInfo
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- JP4682332B2 JP4682332B2 JP2006532591A JP2006532591A JP4682332B2 JP 4682332 B2 JP4682332 B2 JP 4682332B2 JP 2006532591 A JP2006532591 A JP 2006532591A JP 2006532591 A JP2006532591 A JP 2006532591A JP 4682332 B2 JP4682332 B2 JP 4682332B2
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- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 8
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- FUZZWVXGSFPDMH-UHFFFAOYSA-N hexanoic acid Chemical compound CCCCCC(O)=O FUZZWVXGSFPDMH-UHFFFAOYSA-N 0.000 description 1
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- 229920002223 polystyrene Polymers 0.000 description 1
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- AVXLXFZNRNUCRP-UHFFFAOYSA-N trichloro(1,1,2,2,3,3,4,4,5,5,6,6,7,7,8,8,8-heptadecafluorooctyl)silane Chemical compound FC(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)[Si](Cl)(Cl)Cl AVXLXFZNRNUCRP-UHFFFAOYSA-N 0.000 description 1
- 238000011144 upstream manufacturing Methods 0.000 description 1
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Classifications
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C41/00—Shaping by coating a mould, core or other substrate, i.e. by depositing material and stripping-off the shaped article; Apparatus therefor
- B29C41/24—Shaping by coating a mould, core or other substrate, i.e. by depositing material and stripping-off the shaped article; Apparatus therefor for making articles of indefinite length
- B29C41/28—Shaping by coating a mould, core or other substrate, i.e. by depositing material and stripping-off the shaped article; Apparatus therefor for making articles of indefinite length by depositing flowable material on an endless belt
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C41/00—Shaping by coating a mould, core or other substrate, i.e. by depositing material and stripping-off the shaped article; Apparatus therefor
- B29C41/02—Shaping by coating a mould, core or other substrate, i.e. by depositing material and stripping-off the shaped article; Apparatus therefor for making articles of definite length, i.e. discrete articles
- B29C41/12—Spreading-out the material on a substrate, e.g. on the surface of a liquid
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C48/00—Extrusion moulding, i.e. expressing the moulding material through a die or nozzle which imparts the desired form; Apparatus therefor
- B29C48/03—Extrusion moulding, i.e. expressing the moulding material through a die or nozzle which imparts the desired form; Apparatus therefor characterised by the shape of the extruded material at extrusion
- B29C48/09—Articles with cross-sections having partially or fully enclosed cavities, e.g. pipes or channels
- B29C48/11—Articles with cross-sections having partially or fully enclosed cavities, e.g. pipes or channels comprising two or more partially or fully enclosed cavities, e.g. honeycomb-shaped
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29D—PRODUCING PARTICULAR ARTICLES FROM PLASTICS OR FROM SUBSTANCES IN A PLASTIC STATE
- B29D24/00—Producing articles with hollow walls
- B29D24/002—Producing articles with hollow walls formed with structures, e.g. cores placed between two plates or sheets, e.g. partially filled
- B29D24/005—Producing articles with hollow walls formed with structures, e.g. cores placed between two plates or sheets, e.g. partially filled the structure having joined ribs, e.g. honeycomb
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29D—PRODUCING PARTICULAR ARTICLES FROM PLASTICS OR FROM SUBSTANCES IN A PLASTIC STATE
- B29D99/00—Subject matter not provided for in other groups of this subclass
- B29D99/0089—Producing honeycomb structures
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J9/00—Working-up of macromolecular substances to porous or cellular articles or materials; After-treatment thereof
- C08J9/28—Working-up of macromolecular substances to porous or cellular articles or materials; After-treatment thereof by elimination of a liquid phase from a macromolecular composition or article, e.g. drying of coagulum
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L101/00—Compositions of unspecified macromolecular compounds
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29L—INDEXING SCHEME ASSOCIATED WITH SUBCLASS B29C, RELATING TO PARTICULAR ARTICLES
- B29L2031/00—Other particular articles
- B29L2031/60—Multitubular or multicompartmented articles, e.g. honeycomb
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29L—INDEXING SCHEME ASSOCIATED WITH SUBCLASS B29C, RELATING TO PARTICULAR ARTICLES
- B29L2031/00—Other particular articles
- B29L2031/756—Microarticles, nanoarticles
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J2201/00—Foams characterised by the foaming process
- C08J2201/04—Foams characterised by the foaming process characterised by the elimination of a liquid or solid component, e.g. precipitation, leaching out, evaporation
- C08J2201/05—Elimination by evaporation or heat degradation of a liquid phase
- C08J2201/0502—Elimination by evaporation or heat degradation of a liquid phase the liquid phase being organic
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- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Chemical & Material Sciences (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Materials Engineering (AREA)
- Manufacture Of Porous Articles, And Recovery And Treatment Of Waste Products (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
- Moulding By Coating Moulds (AREA)
Description
2)工程1)で調製された前記非水溶性ポリマーの水不和合性有機溶媒溶液を基板の表面に塗布する工程、ここで、前記基板の表面張力γSは、前記水不和合性有機溶媒の表面張力γLならびに前記基板と前記水不和合性有機溶媒との間の表面張力γSLに対して、γS−γSL<γLの関係を満たし、前記非水溶性ポリマーの水不和合性有機溶媒溶液の液膜厚は、1〜50μmである;
3)工程2)で前記基板上に塗布された前記非水溶性ポリマーの水不和合性有機溶媒溶液に相対湿度30%以上の空気を接触させて、前記水不和合性有機溶媒を蒸発させる工程、ここで、前記水不和合性有機溶媒の蒸発速度は、前記非水溶性ポリマーの水不和合性有機溶媒溶液の前記基板表面への塗布時の液膜厚が1秒以内に1/5にまで減少する速度である。
Claims (5)
- 以下の工程を含む、直径10〜100nmの細孔を有する、非水溶性ポリマーからなる厚さ10〜1000nmのハニカム状多孔質体の製造方法。
1)50dyn/cm以下の表面張力γLを有する水不和合性有機溶媒に非水溶性ポリマーを溶解して、非水溶性ポリマーの水不和合性有機溶媒溶液を調製する工程;
2)工程1)で調製された前記非水溶性ポリマーの水不和合性有機溶媒溶液を基板の表面に塗布する工程、
ここで、前記基板の表面張力γSは、前記水不和合性有機溶媒の表面張力γLならびに前記基板と前記水不和合性有機溶媒との間の表面張力γSLに対して、γS−γSL<γLの関係を満たし、
前記非水溶性ポリマーの水不和合性有機溶媒溶液の液膜厚は、1〜50μmである;
3)工程2)で前記基板上に塗布された前記非水溶性ポリマーの水不和合性有機溶媒溶液に相対湿度30%以上の空気を接触させて、前記水不和合性有機溶媒を蒸発させる工程、
ここで、前記水不和合性有機溶媒の蒸発速度は、前記非水溶性ポリマーの水不和合性有機溶媒溶液の前記基板表面への塗布時の液膜厚が1秒以内に1/5にまで減少する速度である。 - 工程2)は、
前記基板を一軸方向に移動させながら、前記非水溶性ポリマーの水不和合性有機溶媒溶液を前記基板の表面に塗布する工程と、
前記非水溶性ポリマーの水不和合性有機溶媒溶液を塗布された基板を、前記基板との間隙が1〜50μmとなるように設置された金属板の下側をくぐらせる工程と、
を含む、請求項1に記載の製造方法。 - 前記基板は、ガラス板もしくは金属板である、請求項1に記載の方法。
- 工程3)は、前記基板の表面に塗布された前記非水溶性ポリマーの水不和合性有機溶媒溶液を、相対湿度30%以上の湿度を有する流速10〜100L/分の気流に接触させる工程である、請求項1に記載の製造方法。
- 前記水不和合性有機溶媒は、フッ化炭素溶媒である、請求項1に記載の製造方法。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2004247852 | 2004-08-27 | ||
JP2004247852 | 2004-08-27 | ||
PCT/JP2005/015456 WO2006022341A1 (ja) | 2004-08-27 | 2005-08-25 | サブミクロンハニカム構造の製造法 |
Publications (2)
Publication Number | Publication Date |
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JPWO2006022341A1 JPWO2006022341A1 (ja) | 2008-05-08 |
JP4682332B2 true JP4682332B2 (ja) | 2011-05-11 |
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JP2006532591A Active JP4682332B2 (ja) | 2004-08-27 | 2005-08-25 | サブミクロンハニカム構造の製造法 |
Country Status (5)
Country | Link |
---|---|
US (1) | US7531211B2 (ja) |
EP (1) | EP1783162A4 (ja) |
JP (1) | JP4682332B2 (ja) |
KR (1) | KR101174391B1 (ja) |
WO (1) | WO2006022341A1 (ja) |
Families Citing this family (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2007291185A (ja) * | 2006-04-21 | 2007-11-08 | Hokkaido Univ | ハニカム状多孔質体及びその製造方法。 |
WO2007123495A1 (en) * | 2006-04-25 | 2007-11-01 | National University Of Singapore | Method of patterning and product(s) obtained therefrom |
JP5202913B2 (ja) * | 2007-09-21 | 2013-06-05 | 富士フイルム株式会社 | 多孔フィルムの製造方法及び装置 |
JP5349179B2 (ja) * | 2008-07-10 | 2013-11-20 | 富士フイルム株式会社 | 多孔体の製造方法 |
JP5534750B2 (ja) | 2008-09-19 | 2014-07-02 | キヤノン株式会社 | 表面に凹形状部を有する固形物の製造方法および電子写真感光体の製造方法 |
JP2010134440A (ja) * | 2008-10-27 | 2010-06-17 | Fujifilm Corp | 位相差フィルムの製造方法及びその製造設備 |
JP5405374B2 (ja) * | 2010-03-26 | 2014-02-05 | 富士フイルム株式会社 | ハニカム構造フィルムの製造方法 |
GB201112404D0 (en) | 2011-07-19 | 2011-08-31 | Surface Innovations Ltd | Method |
JP5785143B2 (ja) * | 2012-09-26 | 2015-09-24 | 富士フイルム株式会社 | 結露装置、結露方法及び多孔フィルムの製造方法 |
KR101687491B1 (ko) * | 2015-07-16 | 2016-12-16 | 한국과학기술원 | 자발 확산 효과를 이용한 유기 또는 무기 박막 제조방법 |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH08311231A (ja) * | 1995-05-17 | 1996-11-26 | Toyota Central Res & Dev Lab Inc | ハニカム状多孔質体及びその製造方法 |
JP2001157574A (ja) * | 1999-11-30 | 2001-06-12 | Terumo Corp | ハニカム構造体およびその調製方法、ならびにその構造体を用いたフィルムおよび細胞培養基材 |
JP2003294905A (ja) * | 2002-03-29 | 2003-10-15 | Fuji Photo Film Co Ltd | ハニカム構造体を用いた光学機能膜およびその製造方法 |
JP2005232238A (ja) * | 2004-02-17 | 2005-09-02 | Japan Science & Technology Agency | 3次元多孔質構造体とその製造方法 |
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DE2216895A1 (de) | 1971-04-14 | 1972-11-02 | Watanabe, Hisashi, Mitakia, Tokio (Japan) | Baustoff und Verfahren zu seiner Herstellung |
US4954381A (en) * | 1986-12-30 | 1990-09-04 | The Research Foundation Of The State University Of New York | Preparation of porous substrates having well defined morphology |
US5387378A (en) * | 1993-04-21 | 1995-02-07 | Tulane University | Integral asymmetric fluoropolymer pervaporation membranes and method of making the same |
FR2785905B1 (fr) | 1998-11-13 | 2001-01-05 | Inst Francais Du Petrole | Materiaux alveolaires contenant au moins un polymere thermoplastique, au moins une resine epoxyde modifiee et au moins un agent porogene |
US7387829B2 (en) * | 2004-01-13 | 2008-06-17 | Ibiden Co., Ltd. | Honeycomb structure, porous body, pore forming material for the porous body, and methods for manufacturing the pore forming material, the porous body and the honeycomb structure |
-
2005
- 2005-08-25 WO PCT/JP2005/015456 patent/WO2006022341A1/ja active Application Filing
- 2005-08-25 KR KR1020077003126A patent/KR101174391B1/ko not_active IP Right Cessation
- 2005-08-25 US US11/661,620 patent/US7531211B2/en not_active Expired - Fee Related
- 2005-08-25 EP EP05774701A patent/EP1783162A4/en not_active Withdrawn
- 2005-08-25 JP JP2006532591A patent/JP4682332B2/ja active Active
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH08311231A (ja) * | 1995-05-17 | 1996-11-26 | Toyota Central Res & Dev Lab Inc | ハニカム状多孔質体及びその製造方法 |
JP2001157574A (ja) * | 1999-11-30 | 2001-06-12 | Terumo Corp | ハニカム構造体およびその調製方法、ならびにその構造体を用いたフィルムおよび細胞培養基材 |
JP2003294905A (ja) * | 2002-03-29 | 2003-10-15 | Fuji Photo Film Co Ltd | ハニカム構造体を用いた光学機能膜およびその製造方法 |
JP2005232238A (ja) * | 2004-02-17 | 2005-09-02 | Japan Science & Technology Agency | 3次元多孔質構造体とその製造方法 |
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US7531211B2 (en) | 2009-05-12 |
KR20070100221A (ko) | 2007-10-10 |
JPWO2006022341A1 (ja) | 2008-05-08 |
US20080032048A1 (en) | 2008-02-07 |
WO2006022341A1 (ja) | 2006-03-02 |
EP1783162A1 (en) | 2007-05-09 |
EP1783162A4 (en) | 2010-03-17 |
KR101174391B1 (ko) | 2012-08-16 |
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