JP4678574B2 - 積層構造体、積層構造体を用いた電子素子、電子素子アレイ及び表示装置 - Google Patents

積層構造体、積層構造体を用いた電子素子、電子素子アレイ及び表示装置 Download PDF

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Publication number
JP4678574B2
JP4678574B2 JP2004242035A JP2004242035A JP4678574B2 JP 4678574 B2 JP4678574 B2 JP 4678574B2 JP 2004242035 A JP2004242035 A JP 2004242035A JP 2004242035 A JP2004242035 A JP 2004242035A JP 4678574 B2 JP4678574 B2 JP 4678574B2
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layer
polyimide
electronic element
wettability changing
wettability
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Expired - Fee Related
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JP2004242035A
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Japanese (ja)
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JP2006060113A5 (enExample
JP2006060113A (ja
Inventor
隆徳 田野
浩 藤村
英紀 友野
浩 近藤
均 近藤
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Ricoh Co Ltd
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Ricoh Co Ltd
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  • Electrodes Of Semiconductors (AREA)
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JP2004242035A 2004-08-23 2004-08-23 積層構造体、積層構造体を用いた電子素子、電子素子アレイ及び表示装置 Expired - Fee Related JP4678574B2 (ja)

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JP2004242035A JP4678574B2 (ja) 2004-08-23 2004-08-23 積層構造体、積層構造体を用いた電子素子、電子素子アレイ及び表示装置

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JP2004242035A JP4678574B2 (ja) 2004-08-23 2004-08-23 積層構造体、積層構造体を用いた電子素子、電子素子アレイ及び表示装置

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JP2006060113A JP2006060113A (ja) 2006-03-02
JP2006060113A5 JP2006060113A5 (enExample) 2007-10-04
JP4678574B2 true JP4678574B2 (ja) 2011-04-27

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JP2004242035A Expired - Fee Related JP4678574B2 (ja) 2004-08-23 2004-08-23 積層構造体、積層構造体を用いた電子素子、電子素子アレイ及び表示装置

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Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5181441B2 (ja) * 2006-08-04 2013-04-10 株式会社リコー 有機トランジスタ及びその製造方法
JP5168845B2 (ja) * 2006-08-07 2013-03-27 株式会社リコー 積層構造体、積層構造体を用いた電子素子、これらの製造方法、電子素子アレイ及び表示装置
JP2008066567A (ja) * 2006-09-08 2008-03-21 Ricoh Co Ltd 配線パターンとこれを用いた電子素子、有機半導体素子、積層配線パターンおよび積層配線基板
JP5121264B2 (ja) * 2007-03-14 2013-01-16 株式会社リコー 積層構造体及びその製造方法
EP2168148B1 (en) 2007-07-18 2012-05-16 Ricoh Company, Ltd. Laminate structure, electronic device, and display device
JP5211729B2 (ja) * 2008-02-07 2013-06-12 株式会社リコー 積層構造体及びその製造方法
WO2009113549A1 (ja) * 2008-03-10 2009-09-17 日産化学工業株式会社 画像形成用下層膜組成物
GB2462845B (en) * 2008-08-21 2011-07-27 Cambridge Display Tech Ltd Organic electronic devices and methods of making the same using solution processing techniques
WO2010047346A1 (ja) * 2008-10-23 2010-04-29 日産化学工業株式会社 画像形成用下層膜
JP5532669B2 (ja) * 2009-04-30 2014-06-25 大日本印刷株式会社 有機半導体素子、およびその製造方法
JP5598410B2 (ja) * 2011-04-11 2014-10-01 大日本印刷株式会社 有機半導体素子の製造方法および有機半導体素子
JP6248506B2 (ja) * 2013-09-25 2017-12-20 Jnc株式会社 硬化膜形成用組成物

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003076004A (ja) * 2001-09-04 2003-03-14 Fuji Photo Film Co Ltd パターン形成方法
JP2003059940A (ja) * 2001-08-08 2003-02-28 Fuji Photo Film Co Ltd ミクロファブリケーション用基板、その製造方法および像状薄膜形成方法
JP4362275B2 (ja) * 2002-10-25 2009-11-11 Ｎｅｃ液晶テクノロジー株式会社 薄膜トランジスタの製造方法
JP4629997B2 (ja) * 2003-06-02 2011-02-09 株式会社リコー 薄膜トランジスタ及び薄膜トランジスタアレイ
JP4969041B2 (ja) * 2004-01-26 2012-07-04 株式会社半導体エネルギー研究所 表示装置の作製方法

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