JP4664816B2 - セラミック回路基板、その製造方法およびパワーモジュール - Google Patents
セラミック回路基板、その製造方法およびパワーモジュール Download PDFInfo
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- JP4664816B2 JP4664816B2 JP2005514299A JP2005514299A JP4664816B2 JP 4664816 B2 JP4664816 B2 JP 4664816B2 JP 2005514299 A JP2005514299 A JP 2005514299A JP 2005514299 A JP2005514299 A JP 2005514299A JP 4664816 B2 JP4664816 B2 JP 4664816B2
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
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- H01L24/47—Structure, shape, material or disposition of the wire connectors after the connecting process
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- H05K1/0306—Inorganic insulating substrates, e.g. ceramic, glass
Description
各実施例用および比較例用のセラミックス基板として、表1〜表6に示すように、厚さが0.625〜1.2mmの窒化けい素(Si3N4)基板,窒化アルミニウム(AlN)基板,サイアロン(Si−Al−O−N)基板,炭化けい素(SiC)基板および酸化アルミニウム(Al2O3)基板を多数用意し、回路層としてのクラッド材を接合するセラミックス基板表面に対してブラスト処理と研摩加工とを実施して表面粗さ(Ra)が1μmとなるように調整した。
Claims (5)
- Al板とAl−Siろう材とのクラッド材から成る回路層とセラミックス基板とを一体に接合したセラミックス回路基板において、上記クラッド材のAl−Siろう材側の表面が、セラミックス基板表面に形成した厚さ1μm未満のAl合金膜を介して上記セラミックス基板に接合されており、上記Al合金膜は、Y,Sc,La,Ce,Nd,Sm,Gd,Tb,Dy,Er,ThおよびSrから選択される少なくとも1種の元素を1〜5at%含有することを特徴とするセラミックス回路基板。
- 前記セラミックス基板が窒化アルミニウム焼結体,窒化けい素焼結体,炭化けい素焼結体およびサイアロン焼結体のいずれかにより形成されていることを特徴とする請求の範囲第1項記載のセラミックス回路基板。
- 前記Al−Siろう材のAl含有量が85質量%以上であり、かつSi含有量が6〜15質量%の範囲であることを特徴とする請求の範囲第1項記載のセラミックス回路基板。
- Al板とAl−Siろう材とのクラッド材から成る回路層とAl合金膜とを一体に接合したセラミックス回路基板の製造方法において、上記Al板とAl−Siろう材とのクラッド材から成る回路層と、表面にY,Sc,La,Ce,Nd,Sm,Gd,Tb,Dy,Er,ThおよびSrから選択される少なくとも1種の元素を1〜5at%含有する厚さ1μm未満のAl合金膜を形成したセラミックス基板とを重ね、押圧力が2kg/cm2以上となるように荷重を加えた状態で、真空度が10−2Pa以上である雰囲気中で、温度580〜630℃で加熱して上記回路層とセラミックス基板とを接合することを特徴とするセラミック回路基板の製造方法。
- Al板とAl−Siろう材とのクラッド材から成る回路層とセラミックス基板とを一体に接合したセラミックス回路基板であり、上記クラッド材のAl−Siろう材側の表面が、セラミックス基板表面に形成した厚さ1μm未満のAl合金膜を介して上記セラミックス基板に接合されているセラミックス回路基板と、上記回路層に搭載された半導体素子と、この半導体素子から発生した熱を上記セラミックス回路基板を経由して放出するヒートシンクとを備え、上記Al合金膜は、Y,Sc,La,Ce,Nd,Sm,Gd,Tb,Dy,Er,ThおよびSrから選択される少なくとも1種の元素を1〜5at%含有することを特徴とするパワーモジュール。
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