JP4643520B2 - 検査方法および検査装置 - Google Patents

検査方法および検査装置 Download PDF

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Publication number
JP4643520B2
JP4643520B2 JP2006218563A JP2006218563A JP4643520B2 JP 4643520 B2 JP4643520 B2 JP 4643520B2 JP 2006218563 A JP2006218563 A JP 2006218563A JP 2006218563 A JP2006218563 A JP 2006218563A JP 4643520 B2 JP4643520 B2 JP 4643520B2
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substrate
chuck
rim
gas
peripheral portion
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Japanese (ja)
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JP2006324692A (ja
JP2006324692A5 (https=
Inventor
信一 松本
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Hitachi High Tech Corp
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Hitachi High Technologies Corp
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JP2006218563A 2006-08-10 2006-08-10 検査方法および検査装置 Expired - Lifetime JP4643520B2 (ja)

Priority Applications (1)

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JP2006218563A JP4643520B2 (ja) 2006-08-10 2006-08-10 検査方法および検査装置

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JP2006218563A JP4643520B2 (ja) 2006-08-10 2006-08-10 検査方法および検査装置

Related Parent Applications (1)

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JP2000080695A Division JP3936828B2 (ja) 2000-03-22 2000-03-22 基板搭載装置

Publications (3)

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JP2006324692A JP2006324692A (ja) 2006-11-30
JP2006324692A5 JP2006324692A5 (https=) 2007-04-12
JP4643520B2 true JP4643520B2 (ja) 2011-03-02

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JP2006218563A Expired - Lifetime JP4643520B2 (ja) 2006-08-10 2006-08-10 検査方法および検査装置

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Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5414602B2 (ja) 2010-03-31 2014-02-12 株式会社日立ハイテクノロジーズ 検査装置
CN109461691A (zh) * 2017-09-06 2019-03-12 富士迈半导体精密工业（上海）有限公司 晶圆支撑装置
JP7331139B2 (ja) * 2019-12-24 2023-08-22 株式会社日立ハイテク 基板検査装置
CN112105166B (zh) * 2020-09-02 2024-03-29 深圳市鑫达辉软性电路科技有限公司 一种fpc翘曲修复装置
WO2023037424A1 (ja) * 2021-09-08 2023-03-16 株式会社日立ハイテク ウェハ検査装置

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2891894B2 (ja) * 1995-03-30 1999-05-17 大陽東洋酸素株式会社 基板回転装置
JPH11111819A (ja) * 1997-09-30 1999-04-23 Asahi Kasei Micro Syst Co Ltd ウェハーの固定方法及び露光装置

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JP2006324692A (ja) 2006-11-30

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