JP4642610B2 - 基板位置合わせ装置および基板収容ユニット - Google Patents

基板位置合わせ装置および基板収容ユニット Download PDF

Info

Publication number
JP4642610B2
JP4642610B2 JP2005257165A JP2005257165A JP4642610B2 JP 4642610 B2 JP4642610 B2 JP 4642610B2 JP 2005257165 A JP2005257165 A JP 2005257165A JP 2005257165 A JP2005257165 A JP 2005257165A JP 4642610 B2 JP4642610 B2 JP 4642610B2
Authority
JP
Japan
Prior art keywords
substrate
pressing
piston
slide member
moved
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JP2005257165A
Other languages
English (en)
Japanese (ja)
Other versions
JP2007073646A (ja
Inventor
良幸 羽立
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tokyo Electron Ltd
Original Assignee
Tokyo Electron Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Electron Ltd filed Critical Tokyo Electron Ltd
Priority to JP2005257165A priority Critical patent/JP4642610B2/ja
Priority to TW095132616A priority patent/TWI421969B/zh
Priority to CNB2006101289635A priority patent/CN100446215C/zh
Priority to KR1020060085136A priority patent/KR100860143B1/ko
Publication of JP2007073646A publication Critical patent/JP2007073646A/ja
Priority to KR1020080042242A priority patent/KR100952524B1/ko
Application granted granted Critical
Publication of JP4642610B2 publication Critical patent/JP4642610B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/68—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67155—Apparatus for manufacturing or treating in a plurality of work-stations
    • H01L21/67201—Apparatus for manufacturing or treating in a plurality of work-stations characterized by the construction of the load-lock chamber
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/1303—Apparatus specially adapted to the manufacture of LCDs

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • General Physics & Mathematics (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Computer Hardware Design (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Power Engineering (AREA)
  • Nonlinear Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Optics & Photonics (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
JP2005257165A 2005-09-05 2005-09-05 基板位置合わせ装置および基板収容ユニット Active JP4642610B2 (ja)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP2005257165A JP4642610B2 (ja) 2005-09-05 2005-09-05 基板位置合わせ装置および基板収容ユニット
TW095132616A TWI421969B (zh) 2005-09-05 2006-09-04 A substrate alignment device and a substrate storage unit
CNB2006101289635A CN100446215C (zh) 2005-09-05 2006-09-05 基板定位装置和基板收纳单元
KR1020060085136A KR100860143B1 (ko) 2005-09-05 2006-09-05 기판 위치 맞춤 장치 및 기판 수용 유닛
KR1020080042242A KR100952524B1 (ko) 2005-09-05 2008-05-07 기판 수용 유닛

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005257165A JP4642610B2 (ja) 2005-09-05 2005-09-05 基板位置合わせ装置および基板収容ユニット

Publications (2)

Publication Number Publication Date
JP2007073646A JP2007073646A (ja) 2007-03-22
JP4642610B2 true JP4642610B2 (ja) 2011-03-02

Family

ID=37859001

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2005257165A Active JP4642610B2 (ja) 2005-09-05 2005-09-05 基板位置合わせ装置および基板収容ユニット

Country Status (4)

Country Link
JP (1) JP4642610B2 (zh)
KR (2) KR100860143B1 (zh)
CN (1) CN100446215C (zh)
TW (1) TWI421969B (zh)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5501688B2 (ja) * 2009-07-30 2014-05-28 東京エレクトロン株式会社 基板位置合わせ機構、それを用いた真空予備室および基板処理システム
JP5582895B2 (ja) * 2010-07-09 2014-09-03 キヤノンアネルバ株式会社 基板ホルダーストッカ装置及び基板処理装置並びに該基板ホルダーストッカ装置を用いた基板ホルダー移動方法
TW201514502A (zh) * 2013-10-03 2015-04-16 Chips Best Technology Co Ltd 晶片檢測座
TW201514516A (zh) * 2013-10-03 2015-04-16 Chips Best Technology Co Ltd 晶片自動檢測系統
US9929029B2 (en) * 2015-10-15 2018-03-27 Applied Materials, Inc. Substrate carrier system
CN106773157B (zh) * 2016-12-06 2018-08-31 友达光电（昆山）有限公司 位置校正装置及位置校正方法
JP2019102721A (ja) * 2017-12-06 2019-06-24 エスペック株式会社 基板用位置決め装置
KR102186594B1 (ko) * 2020-04-08 2020-12-03 백철호 인쇄회로기판의 자동정렬장치

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0460636U (zh) * 1990-09-29 1992-05-25
JPH0927536A (ja) * 1995-07-10 1997-01-28 Nissin Electric Co Ltd ロ−ドロック室内に基板位置合わせ機構を有するイオン注入装置
JP2000306980A (ja) * 1993-02-26 2000-11-02 Tokyo Electron Ltd Ｌｃｄ用ガラス基板の位置合わせ機構及び真空処理装置
JP2001291758A (ja) * 2000-11-27 2001-10-19 Tokyo Electron Ltd 真空処理装置
JP2002057205A (ja) * 1991-09-10 2002-02-22 Tokyo Electron Ltd ロードロック室内の位置合わせ機構及び処理装置及び位置合わせ方法及び搬送方法
JP2005116878A (ja) * 2003-10-09 2005-04-28 Toshiba Corp 基板支持方法および基板支持装置

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3260427B2 (ja) * 1991-09-10 2002-02-25 東京エレクトロン株式会社 真空処理装置及び真空処理装置における基板搬送方法
JP3468430B2 (ja) * 1994-02-15 2003-11-17 東京エレクトロン株式会社 位置検出案内装置、位置検出案内方法及び真空処理装置
JPH08288368A (ja) * 1995-04-14 1996-11-01 Tokyo Electron Ltd 基板の整列装置および方法
JP4030654B2 (ja) * 1998-06-02 2008-01-09 大日本スクリーン製造株式会社 基板搬送装置
JP2003086659A (ja) * 2001-09-11 2003-03-20 Hirata Corp 基板の移載装置
US20030072639A1 (en) * 2001-10-17 2003-04-17 Applied Materials, Inc. Substrate support
JP2003282684A (ja) * 2002-03-22 2003-10-03 Olympus Optical Co Ltd ガラス基板保持具
KR101018909B1 (ko) * 2002-10-25 2011-03-02 도쿄엘렉트론가부시키가이샤 기판 얼라이먼트장치, 기판처리장치 및 기판반송장치
TWI226298B (en) * 2002-11-21 2005-01-11 Hitachi Int Electric Inc Method for positioning a substrate and inspecting apparatus using same
JP4479881B2 (ja) * 2003-09-19 2010-06-09 株式会社日立ハイテクノロジーズ 基板スピン処理装置及び基板スピン処理方法

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0460636U (zh) * 1990-09-29 1992-05-25
JP2002057205A (ja) * 1991-09-10 2002-02-22 Tokyo Electron Ltd ロードロック室内の位置合わせ機構及び処理装置及び位置合わせ方法及び搬送方法
JP2000306980A (ja) * 1993-02-26 2000-11-02 Tokyo Electron Ltd Ｌｃｄ用ガラス基板の位置合わせ機構及び真空処理装置
JPH0927536A (ja) * 1995-07-10 1997-01-28 Nissin Electric Co Ltd ロ−ドロック室内に基板位置合わせ機構を有するイオン注入装置
JP2001291758A (ja) * 2000-11-27 2001-10-19 Tokyo Electron Ltd 真空処理装置
JP2005116878A (ja) * 2003-10-09 2005-04-28 Toshiba Corp 基板支持方法および基板支持装置

Also Published As

Publication number Publication date
KR100952524B1 (ko) 2010-04-12
CN100446215C (zh) 2008-12-24
TW200721361A (en) 2007-06-01
KR20080059118A (ko) 2008-06-26
TWI421969B (zh) 2014-01-01
CN1929109A (zh) 2007-03-14
KR100860143B1 (ko) 2008-09-24
KR20070026274A (ko) 2007-03-08
JP2007073646A (ja) 2007-03-22

Similar Documents

Publication Publication Date Title
JP4642610B2 (ja) 基板位置合わせ装置および基板収容ユニット
JP5264050B2 (ja) 昇降機構および搬送装置
JP4849825B2 (ja) 処理装置、位置合わせ方法、制御プログラムおよびコンピュータ記憶媒体
TWI417978B (zh) A substrate processing device, a loading lock chamber unit, and a transporting device
EP2282331B1 (en) Substrate position alignment mechanism
TWI555681B (zh) A position shift preventing device, a substrate holder including the same, a substrate handling device, and a substrate handling method
JP4903027B2 (ja) 基板搬送装置および基板支持体
KR101915878B1 (ko) 기판 주고받음 위치의 교시 방법 및 기판 처리 시스템
JP4795893B2 (ja) 基板検知機構および基板収容容器
JP3350234B2 (ja) 被処理体のバッファ装置、これを用いた処理装置及びその搬送方法
JP2011249657A (ja) 試料吸着保持装置および試料吸着判定方法
JP2005076845A (ja) ゲートバルブ
JP5428370B2 (ja) 基板把持ハンド、基板把持機構およびそれを備えた基板搬送装置、製造装置
JP2012074498A (ja) 基板処理装置及び基板搬送方法並びにその方法を実施するためのプログラムを記憶する記憶媒体
TWI549215B (zh) Substrate processing system and substrate transfer method
JP2007243078A (ja) 荷位置決め装置
KR20210077598A (ko) 감압 건조 장치 및 감압 건조 방법
JP2014236193A (ja) 基板搬送装置、及びこれを用いた基板搬送方法
JP2006005032A (ja) 基板ステージ装置
JP2005096908A (ja) 基板の処理装置
JP2005167151A (ja) 基板の搬送方法
JP2009267356A (ja) 基板処理装置及び基板処理装置内部の工程空間を開閉する方法

Legal Events

Date Code Title Description
A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20080804

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20100408

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20100511

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20100705

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20101130

A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20101201

R150 Certificate of patent or registration of utility model

Ref document number: 4642610

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R150

Free format text: JAPANESE INTERMEDIATE CODE: R150

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20131210

Year of fee payment: 3

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250