JP4629097B2 - ノボラック型の構造を有する誘導体化されたポリヒドロキシスチレン、および、それらの製造方法 - Google Patents

ノボラック型の構造を有する誘導体化されたポリヒドロキシスチレン、および、それらの製造方法 Download PDF

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Publication number
JP4629097B2
JP4629097B2 JP2007511408A JP2007511408A JP4629097B2 JP 4629097 B2 JP4629097 B2 JP 4629097B2 JP 2007511408 A JP2007511408 A JP 2007511408A JP 2007511408 A JP2007511408 A JP 2007511408A JP 4629097 B2 JP4629097 B2 JP 4629097B2
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acid
carbinol
dphs
pressure
solution
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JP2007536398A (ja
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シーハン，マイケル・ティー
ゼイ，エドワード・ジー
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デュポン・エレクトロニック・ポリマーズ・エル・ピー
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    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D125/00—Coating compositions based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring; Coating compositions based on derivatives of such polymers
    • C09D125/18—Homopolymers or copolymers of aromatic monomers containing elements other than carbon and hydrogen
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G61/00—Macromolecular compounds obtained by reactions forming a carbon-to-carbon link in the main chain of the macromolecule
    • C08G61/02—Macromolecular compounds containing only carbon atoms in the main chain of the macromolecule, e.g. polyxylylenes
    • C08G61/04—Macromolecular compounds containing only carbon atoms in the main chain of the macromolecule, e.g. polyxylylenes only aliphatic carbon atoms
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G2261/00—Macromolecular compounds obtained by reactions forming a carbon-to-carbon link in the main chain of the macromolecule
    • C08G2261/30—Monomer units or repeat units incorporating structural elements in the main chain
    • C08G2261/31—Monomer units or repeat units incorporating structural elements in the main chain incorporating aromatic structural elements in the main chain
    • C08G2261/312—Non-condensed aromatic systems, e.g. benzene
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P20/00—Technologies relating to chemical industry
    • Y02P20/50—Improvements relating to the production of bulk chemicals
    • Y02P20/582—Recycling of unreacted starting or intermediate materials

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Wood Science & Technology (AREA)
  • Phenolic Resins Or Amino Resins (AREA)
  • Inks, Pencil-Leads, Or Crayons (AREA)
  • Adhesives Or Adhesive Processes (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Epoxy Resins (AREA)
  • Paints Or Removers (AREA)
  • Non-Metallic Protective Coatings For Printed Circuits (AREA)
  • Polyoxymethylene Polymers And Polymers With Carbon-To-Carbon Bonds (AREA)
  • Color Printing (AREA)
  • Low-Molecular Organic Synthesis Reactions Using Catalysts (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Anti-Oxidant Or Stabilizer Compositions (AREA)
  • Materials For Photolithography (AREA)
JP2007511408A 2004-05-05 2005-04-22 ノボラック型の構造を有する誘導体化されたポリヒドロキシスチレン、および、それらの製造方法 Expired - Fee Related JP4629097B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US56793404P 2004-05-05 2004-05-05
PCT/US2005/013913 WO2005113634A1 (en) 2004-05-05 2005-04-22 Derivatized polyhydroxystyrenes with a novolak type structure and processes for preparing the same

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2009277598A Division JP5204746B2 (ja) 2004-05-05 2009-12-07 ノボラック型の構造を有する誘導体化されたポリヒドロキシスチレン

Publications (2)

Publication Number Publication Date
JP2007536398A JP2007536398A (ja) 2007-12-13
JP4629097B2 true JP4629097B2 (ja) 2011-02-09

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Family Applications (2)

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JP2007511408A Expired - Fee Related JP4629097B2 (ja) 2004-05-05 2005-04-22 ノボラック型の構造を有する誘導体化されたポリヒドロキシスチレン、および、それらの製造方法
JP2009277598A Expired - Fee Related JP5204746B2 (ja) 2004-05-05 2009-12-07 ノボラック型の構造を有する誘導体化されたポリヒドロキシスチレン

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JP2009277598A Expired - Fee Related JP5204746B2 (ja) 2004-05-05 2009-12-07 ノボラック型の構造を有する誘導体化されたポリヒドロキシスチレン

Country Status (4)

Country Link
US (5) US7371800B2 (enExample)
EP (2) EP1756191B1 (enExample)
JP (2) JP4629097B2 (enExample)
WO (1) WO2005113634A1 (enExample)

Families Citing this family (15)

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EP1756191B1 (en) * 2004-05-05 2012-09-19 DuPont Electronic Polymers L.P. Derivatized polyhydroxystyrenes with a novolak type structure and processes for preparing the same
US7662538B2 (en) * 2004-11-08 2010-02-16 Du Pont Electronic Polymers L.P. Derivatized polyhydroxystyrenes (DPHS) with a novolak type structure and blocked DPHS (BDPHS) and processes for preparing the same
KR101084461B1 (ko) * 2005-12-22 2011-11-21 듀퐁 일렉트로닉 폴리머스 엘피 안정한 포토레지스트 조성물의 제조방법
US8163464B2 (en) * 2008-08-25 2012-04-24 Du Pont Electronic Polymers L.P. Propanoates and processes for preparing the same
WO2016043317A1 (ja) * 2014-09-19 2016-03-24 日産化学工業株式会社 レジストパターン被覆用塗布液
WO2018087056A1 (en) 2016-11-10 2018-05-17 Agfa-Gevaert N.V. Solder mask inkjet inks for manufacturing printed circuit boards
EP3607014B1 (en) 2017-04-07 2021-06-02 Akzo Nobel Coatings International B.V. Coating compositions containing a hydroxyphenyl functional polymer and a latex polymer
WO2018185094A1 (en) 2017-04-07 2018-10-11 Akzo Nobel Coatings International B.V. Coating compositions containing a hydroxyphenyl functional polymer and a latex polymer
EP3498788B1 (en) 2017-12-18 2023-05-03 Agfa-Gevaert Nv Solder mask inkjet inks for manufacturing printed circuit boards
EP3884002A1 (en) 2018-11-20 2021-09-29 Agfa-Gevaert N.V. Radiation curable inkjet ink for manufacturing printed circuit boards
EP3656824A1 (en) 2018-11-26 2020-05-27 Agfa-Gevaert Nv Radiation curable inkjet for manufacturing printed circuit boards
CN113056528A (zh) 2018-11-26 2021-06-29 爱克发-格法特公司 新型光引发剂
EP3686252A1 (en) 2019-01-24 2020-07-29 Agfa-Gevaert Nv Radiation curable inkjet ink for manufacturing printed circuit boards
CN109943142A (zh) * 2019-03-28 2019-06-28 广东阿特斯科技有限公司 一种粉色油墨、制备方法及手机后盖生产工艺
CN114616294A (zh) 2019-11-07 2022-06-10 爱克发-格法特公司 用于制造印刷电路板的可辐射固化的喷墨油墨

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US4032513A (en) 1976-03-30 1977-06-28 Maruzen Oil Co. Ltd. Process of producing alkenylphenol polymers
JPS5653131A (en) * 1979-10-05 1981-05-12 Cosmo Co Ltd Preparation of poly-vinylphenol
JPS5984908A (ja) 1982-11-04 1984-05-16 Cosmo Co Ltd ｐ−ビニルフエノ−ル重合体の製造方法
JPS601146A (ja) 1983-06-15 1985-01-07 Cosmo Co Ltd ｐ−エチルフエノ−ルの脱水素によるｐ−ビニルフエノ−ルの製造方法
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EP1756191B1 (en) * 2004-05-05 2012-09-19 DuPont Electronic Polymers L.P. Derivatized polyhydroxystyrenes with a novolak type structure and processes for preparing the same
US7662538B2 (en) * 2004-11-08 2010-02-16 Du Pont Electronic Polymers L.P. Derivatized polyhydroxystyrenes (DPHS) with a novolak type structure and blocked DPHS (BDPHS) and processes for preparing the same

Also Published As

Publication number Publication date
US7632896B2 (en) 2009-12-15
US20080214874A1 (en) 2008-09-04
WO2005113634A1 (en) 2005-12-01
US7371800B2 (en) 2008-05-13
US20080188692A1 (en) 2008-08-07
US20050250042A1 (en) 2005-11-10
US7678945B2 (en) 2010-03-16
US7897697B2 (en) 2011-03-01
US7566752B2 (en) 2009-07-28
EP1756191B1 (en) 2012-09-19
EP2336216A1 (en) 2011-06-22
EP1756191A1 (en) 2007-02-28
JP2010106278A (ja) 2010-05-13
JP2007536398A (ja) 2007-12-13
JP5204746B2 (ja) 2013-06-05
US20090264592A1 (en) 2009-10-22
US20080188619A1 (en) 2008-08-07

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