JP4614858B2 - 感光性樹脂組成物およびその積層体 - Google Patents

感光性樹脂組成物およびその積層体 Download PDF

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Publication number
JP4614858B2
JP4614858B2 JP2005292470A JP2005292470A JP4614858B2 JP 4614858 B2 JP4614858 B2 JP 4614858B2 JP 2005292470 A JP2005292470 A JP 2005292470A JP 2005292470 A JP2005292470 A JP 2005292470A JP 4614858 B2 JP4614858 B2 JP 4614858B2
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Japan
Prior art keywords
photosensitive resin
group
mass
resin composition
resist pattern
Prior art date
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JP2005292470A
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English (en)
Japanese (ja)
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JP2007101941A (ja
Inventor
有里 山田
洋介 秦
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Asahi Kasei Corp
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Asahi Kasei E Materials Corp
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Publication date
Application filed by Asahi Kasei E Materials Corp filed Critical Asahi Kasei E Materials Corp
Priority to JP2005292470A priority Critical patent/JP4614858B2/ja
Priority to CN 200610140451 priority patent/CN1945428A/zh
Publication of JP2007101941A publication Critical patent/JP2007101941A/ja
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Publication of JP4614858B2 publication Critical patent/JP4614858B2/ja
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  • Materials For Photolithography (AREA)
  • Manufacturing Of Printed Wiring (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
JP2005292470A 2005-10-05 2005-10-05 感光性樹脂組成物およびその積層体 Active JP4614858B2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2005292470A JP4614858B2 (ja) 2005-10-05 2005-10-05 感光性樹脂組成物およびその積層体
CN 200610140451 CN1945428A (zh) 2005-10-05 2006-10-08 感光性树脂组合物及其层压体

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005292470A JP4614858B2 (ja) 2005-10-05 2005-10-05 感光性樹脂組成物およびその積層体

Publications (2)

Publication Number Publication Date
JP2007101941A JP2007101941A (ja) 2007-04-19
JP4614858B2 true JP4614858B2 (ja) 2011-01-19

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ID=38028941

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JP2005292470A Active JP4614858B2 (ja) 2005-10-05 2005-10-05 感光性樹脂組成物およびその積層体

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JP (1) JP4614858B2 (zh)
CN (1) CN1945428A (zh)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5252963B2 (ja) * 2007-04-17 2013-07-31 旭化成イーマテリアルズ株式会社 感光性樹脂組成物及び積層体
CN102378940A (zh) * 2009-03-30 2012-03-14 旭化成电子材料株式会社 感光性树脂组合物及其层压体
CN104111584A (zh) * 2009-05-20 2014-10-22 旭化成电子材料株式会社 感光性树脂组合物
TWI491981B (zh) * 2009-11-04 2015-07-11 Sumitomo Chemical Co Coloring the photosensitive resin composition
WO2013115262A1 (ja) * 2012-02-02 2013-08-08 日立化成株式会社 感光性樹脂組成物及びそれを用いた感光性エレメント、スペーサーの形成方法、並びに、スペーサー
US20150293443A1 (en) * 2012-11-20 2015-10-15 Hitachi Chemical Company, Ltd. Photosensitive resin composition, photosensitive element, method for forming resist pattern, and method for manufacturing printed wiring board
JP6591078B2 (ja) * 2016-08-30 2019-10-16 富士フイルム株式会社 感光性樹脂組成物、転写フィルム、タッチパネル用保護膜、タッチパネル及びその製造方法、並びに画像表示装置
CN114114835B (zh) * 2021-12-13 2024-05-28 陕西彩虹新材料有限公司 一种添加剂及包含该添加剂的光刻胶组合物

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004184878A (ja) * 2002-12-05 2004-07-02 Asahi Kasei Electronics Co Ltd 感光性樹脂組成物及びその使用
JP2005215142A (ja) * 2004-01-28 2005-08-11 Asahi Kasei Electronics Co Ltd 感光性樹脂組成物及び積層体
JP2005249970A (ja) * 2004-03-02 2005-09-15 Fuji Photo Film Co Ltd パターン形成材料、並びにパターン形成装置及びパターン形成方法

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004184878A (ja) * 2002-12-05 2004-07-02 Asahi Kasei Electronics Co Ltd 感光性樹脂組成物及びその使用
JP2005215142A (ja) * 2004-01-28 2005-08-11 Asahi Kasei Electronics Co Ltd 感光性樹脂組成物及び積層体
JP2005249970A (ja) * 2004-03-02 2005-09-15 Fuji Photo Film Co Ltd パターン形成材料、並びにパターン形成装置及びパターン形成方法

Also Published As

Publication number Publication date
JP2007101941A (ja) 2007-04-19
CN1945428A (zh) 2007-04-11

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