JP4595320B2 - Exposure apparatus and device manufacturing method - Google Patents

Description

The present invention relates to an exposure apparatus that performs exposure with a pattern image projected by a projection optical system in a state where at least a part between the projection optical system and a substrate is filled with a liquid , and a device manufacturing method.

Semiconductor devices and liquid crystal display devices are manufactured by a so-called photolithography technique in which a pattern formed on a mask is transferred onto a photosensitive substrate. An exposure apparatus used in this photolithography process has a mask stage for supporting a mask and a substrate stage for supporting a substrate, and a mask pattern is transferred via a projection optical system while sequentially moving the mask stage and the substrate stage. It is transferred to the substrate. In recent years, in order to cope with higher integration of device patterns, higher resolution of the projection optical system is desired. The resolution of the projection optical system becomes higher as the exposure wavelength used becomes shorter and the numerical aperture of the projection optical system becomes larger. Therefore, the exposure wavelength used in the exposure apparatus is shortened year by year, and the numerical aperture of the projection optical system is also increasing. The mainstream exposure wavelength is 248 nm of the KrF excimer laser, but the 193 nm of the shorter wavelength ArF excimer laser is also being put into practical use. Also, when performing exposure, the depth of focus (DOF) is important as well as the resolution. The resolution R and the depth of focus δ are each expressed by the following equations.
R = k ₁ · λ / NA (1)
δ = ± k ₂ · λ / NA ² (2)
Here, λ is the exposure wavelength, NA is the numerical aperture of the projection optical system, and k ₁ and k ₂ are process coefficients. From the equations (1) and (2), it can be seen that the depth of focus δ becomes narrower when the exposure wavelength λ is shortened and the numerical aperture NA is increased in order to increase the resolution R.

If the depth of focus δ becomes too narrow, it becomes difficult to match the substrate surface with the image plane of the projection optical system, and the focus margin during the exposure operation may be insufficient. Therefore, as a method for substantially shortening the exposure wavelength and increasing the depth of focus, for example, an immersion method disclosed in International Publication No. 99/49504 has been proposed. In this immersion method, the space between the lower surface of the projection optical system and the substrate surface is filled with a liquid such as water or an organic solvent, and the wavelength of the exposure light in the liquid is 1 / n (n is the refractive index of the liquid). The resolution is improved by utilizing the fact that the ratio is usually about 1.2 to 1.6), and the depth of focus is expanded about n times.
International Publication No. 99/49504 Pamphlet

  By the way, when exposing while flowing a liquid between the projection optical system and the substrate, or when exposing while moving the substrate with respect to the projection optical system in a state where the liquid is filled between the projection optical system and the substrate, There is a possibility that the liquid may be peeled off from the projection optical system and the substrate, resulting in a disadvantage that the pattern image transferred to the substrate is deteriorated. Alternatively, when exposure is performed while flowing a liquid between the projection optical system and the substrate, the pattern image also deteriorates when a turbulent flow occurs in the liquid flow.

  The present invention has been made in view of such circumstances. When an exposure process is performed by filling a liquid between the projection optical system and the substrate, the pattern can be accurately transferred by placing the liquid in a desired state. An object is to provide an exposure apparatus, an exposure method, and a device manufacturing method.

  In order to solve the above-described problems, the present invention adopts the following configuration corresponding to FIGS. 1 to 10 shown in the embodiment.

According to a first aspect of the present invention, there is provided an exposure apparatus for transferring a pattern image onto a substrate (P) through a liquid (50) to expose the substrate:
A projection optical system (PL) that projects an image of the pattern onto a substrate;
A portion (60, PK) of the projection optical system (PL) that contacts the liquid (50) is provided with an exposure apparatus (EX) that is surface-treated in order to adjust the affinity with the liquid (50). The

  In the exposure apparatus of the present invention, the surface of the liquid projection optical system that comes into contact with the liquid (hereinafter referred to as “liquid contact portion” as appropriate) is subjected to surface treatment for adjusting the affinity with the liquid. A liquid is maintained in a desired state between the projection optical system and the substrate. For example, when the affinity of the liquid contact portion with the liquid is low, a phenomenon that adversely affects immersion exposure occurs, such as separation between the contact portion and the liquid or generation of bubbles. On the other hand, when the affinity of the liquid contact portion with the liquid is too high, there is a case where the liquid excessively wets and spreads with respect to the contact portion and flows out between the projection optical system and the substrate. On the other hand, in the exposure apparatus of the present invention, since the affinity of the liquid contact portion of the projection optical system with the liquid is adjusted, only the batch exposure in which the substrate is stationary with respect to the exposure light during exposure is performed. In addition, even in a scanning exposure apparatus in which the substrate is moved by the moving stage during exposure, the liquid immersion state is reliably maintained between the substrate and the projection optical system.

According to a second aspect of the present invention, there is provided an exposure apparatus for transferring an image of a pattern onto a substrate (P) through a liquid (50) to expose the substrate:
A projection optical system (PL) that projects an image of the pattern onto a substrate;
The projection optical system (PL) has a first surface region (AR1) including the surface of the optical element (60) at the tip thereof, and a second surface region (AR2) around the first surface region (AR1), An exposure apparatus (EX) is provided in which the affinity of the first surface area (AR1) for the liquid (50) is higher than the affinity of the second surface area (AR2) for the liquid (50).

  According to the present invention, the affinity of the first surface region including the optical element at the tip of the projection optical system with respect to the liquid is made higher than that of the second surface region around the first surface region. Then, the liquid is stably arranged, and the second surface region prevents the liquid from getting wet and spreading to the outside. Therefore, not only for batch exposure in which the substrate is stationary with respect to the exposure light during exposure, but also for scanning exposure in which the substrate is moved with respect to the exposure light during exposure, the liquid is exposed on the optical path of the exposure light. Can be stably arranged.

  According to the third aspect of the present invention, there is provided an exposure apparatus that exposes a substrate by illuminating a pattern with an exposure beam (EL) and transferring an image of the pattern onto the substrate (P) through the liquid (50). A projection optical system (PL) that projects an image of the pattern onto a substrate; an immersion apparatus (1,) that fills at least a part between the projection optical system (PL) and the substrate (P) with a liquid (50) 2); d is the thickness of the liquid (50), v is the flow velocity of the liquid (50) between the projection optical system (PL) and the substrate (P), and ρ is the density of the liquid (50). An exposure apparatus (EX) is provided that satisfies the conditional expression (v · d · ρ) / μ ≦ 2000, where μ is the viscosity coefficient of the liquid (50).

  According to the present invention, the liquid is turbulent by setting a condition for maintaining the liquid in at least a part between the projection optical system (PL) and the substrate (P) so as to satisfy the conditional expression. Does not occur. Therefore, the inconvenience that the pattern image projected on the substrate is deteriorated due to the turbulent flow of the liquid can be suppressed.

  According to the fourth aspect of the present invention, the pattern of the mask (M) is illuminated with the exposure beam (EL), and the image of the pattern is transferred onto the substrate (P) via the liquid (50) to expose the substrate. An exposure apparatus for: a projection optical system (PL) that projects an image of the pattern onto a substrate; and an immersion for filling at least a part between the projection optical system (PL) and the substrate (P) with a liquid An exposure apparatus (EX) in which the liquid (50) flows in a laminar flow parallel to the scanning direction of the substrate (P) is provided.

  According to the present invention, by controlling the liquid immersion state by various methods, the liquid flows in a laminar flow in parallel with the scanning direction of the substrate during exposure, thereby preventing deterioration of the pattern image projected on the substrate. can do. Further, unnecessary vibration is not generated in the projection optical system in contact with the liquid, the wafer, the substrate stage holding the wafer, or the like. For example, by controlling the liquid supply (recovery) amount of the immersion apparatus, adjusting the structure of the liquid supply nozzle of the immersion apparatus, or adjusting the speed when moving the substrate during exposure, Can be laminarized.

  According to the fifth aspect of the present invention, there is provided an exposure apparatus for exposing a substrate by illuminating a pattern with an exposure beam (EL) and transferring an image of the pattern onto the substrate (P) through the liquid (50). A projection optical system (PL) that projects an image of the pattern onto the substrate; an immersion apparatus (1, 2) that supplies the liquid (50) only onto the substrate (P); and an immersion apparatus (1, 2) A control device (CONT) that controls the liquid immersion device (1, 2) such that the supply of the liquid (50) is stopped during the exposure of the substrate (P). An exposure apparatus (EX) for controlling is provided.

  According to the present invention, the liquid immersion device is controlled so as not to supply the liquid during the exposure of the substrate, so that the pattern formed on the substrate without damaging the photosensitive agent applied on the substrate. Can be prevented, and the positional relationship between the projection optical system and the substrate can be stably maintained in a desired state.

According to a sixth aspect of the present invention, in an exposure method for projecting an image of a pattern by a projection optical system (PL) onto a substrate (P) to expose the substrate (P): Before exposure, the substrate (P) Surface treatment to adjust the affinity with the liquid (50); filling at least a portion between the projection optical system (PL) and the substrate (P) with the liquid (50); ;
An exposure method is provided which includes projecting an image of a pattern onto a substrate (P) via a liquid (50) to expose the substrate (P).

  According to the present invention, the liquid can be maintained on the substrate in a state suitable for immersion exposure by performing a surface treatment according to the affinity with the liquid on the surface of the substrate before immersion exposure is performed. . For example, when the affinity with the liquid is too low, problems such as separation of the liquid from the surface of the substrate or generation of bubbles occur. On the other hand, when the affinity with the liquid is too high, there may be a disadvantage that the liquid is excessively wetted and spread on the substrate. On the other hand, like the exposure method of the present invention, the liquid can be held in a desired state on the substrate by performing an appropriate treatment on the substrate surface in consideration of the affinity with the liquid. In addition, the liquid on the substrate can be properly collected and removed.

  According to the present invention, in immersion exposure, it is possible to maintain the liquid in a desired state by suppressing the separation of the liquid, the generation of bubbles, or the generation of turbulent flow between the projection optical system and the substrate. The pattern transfer can be performed accurately under. Therefore, the present invention is extremely useful for exposure using a short wavelength light source such as ArF, and a highly integrated device having desired performance can be manufactured.

  Hereinafter, the exposure apparatus and device manufacturing method of the present invention will be described with reference to the drawings, but the present invention is not limited thereto. FIG. 1 is a schematic block diagram showing an embodiment of the exposure apparatus of the present invention.

  In FIG. 1, an exposure apparatus EX includes a mask stage MST that supports a mask M, a substrate stage PST that supports a substrate P, and an illumination optical system IL that illuminates the mask M supported by the mask stage MST with exposure light EL. A projection optical system PL that projects and exposes an image of the pattern of the mask M illuminated by the exposure light EL onto the substrate P supported by the substrate stage PST, and a control device CONT that controls the overall operation of the exposure apparatus EX. It has.

  Here, in the present embodiment, as the exposure apparatus EX, scanning exposure is performed in which the pattern formed on the mask M is exposed to the substrate P while the mask M and the substrate P are synchronously moved in different directions (reverse directions) in the scanning direction. A case where an apparatus (so-called scanning stepper) is used will be described as an example. In the following description, the direction that coincides with the optical axis AX of the projection optical system PL is the Z-axis direction, the synchronous movement direction (scanning direction) between the mask M and the substrate P in the plane perpendicular to the Z-axis direction is the X-axis direction, A direction (non-scanning direction) perpendicular to the Z-axis direction and the Y-axis direction is defined as a Y-axis direction. Further, the directions around the X axis, the Y axis, and the Z axis are defined as θX, θY, and θZ directions, respectively. Here, the “substrate” includes a semiconductor wafer coated with a resist, and the “mask” includes a reticle on which a device pattern to be reduced and projected on the substrate is formed.

The illumination optical system IL illuminates the mask M supported by the mask stage MST with the exposure light EL, and the exposure light source, an optical integrator that equalizes the illuminance of the light beam emitted from the exposure light source, and an optical integrator A condenser lens that collects the exposure light EL from the light source, a relay lens system, a variable field stop that sets the illumination area on the mask M by the exposure light EL in a slit shape, and the like. A predetermined illumination area on the mask M is illuminated with the exposure light EL having a uniform illuminance distribution by the illumination optical system IL. As the exposure light EL emitted from the illumination optical system IL, for example, far ultraviolet light (g-line, h-line, i-line) and KrF excimer laser light (wavelength 248 nm) emitted from a mercury lamp (e.g. DUV light), vacuum ultraviolet light (VUV light) such as ArF excimer laser light (wavelength 193 nm) and F ₂ laser light (wavelength 157 nm), or the like is used. In this embodiment, ArF excimer laser light is used.

  The mask stage MST supports the mask M, and can move two-dimensionally in a plane perpendicular to the optical axis AX of the projection optical system PL, that is, in the XY plane, and can be slightly rotated in the θZ direction. The mask stage MST is driven by a mask stage driving device MSTD such as a linear motor. The mask stage driving device MSTD is controlled by the control device CONT. The two-dimensional position and rotation angle of the mask M on the mask stage MST are measured in real time by the laser interferometer, and the measurement result is output to the control device CONT. The control device CONT drives the mask stage driving device MSTD based on the measurement result of the laser interferometer, thereby positioning the mask M supported on the mask stage MST.

  The projection optical system PL projects and exposes the pattern of the mask M onto the substrate P at a predetermined projection magnification β, and is composed of a plurality of optical elements (lenses). These optical elements are metal members such as stainless steel. It is supported by a lens barrel PK formed of (SUS403). In the present embodiment, the projection optical system PL is a reduction system having a projection magnification β of, for example, 1/4 or 1/5. Note that the projection optical system PL may be either an equal magnification system or an enlargement system. In addition, a parallel flat plate (optical element) 60 formed of a glass member such as quartz or calcium fluoride (fluorite) is provided at the tip 7 on the substrate P side of the projection optical system PL of the present embodiment. Yes. This optical element 60 is detachably (replaceable) with respect to the lens barrel PK. The distal end portion 7 of the projection optical system PL is constituted by an optical element 60 and a part of a lens barrel (holding member) PK that holds the optical element 60.

  The substrate stage PST supports the substrate P, and includes a Z stage 51 that holds the substrate P via a substrate holder, an XY stage 52 that supports the Z stage 51, and a base 53 that supports the XY stage 52. It has. The substrate stage PST is driven by a substrate stage driving device PSTD such as a linear motor. The substrate stage driving device PSTD is controlled by the control device CONT. By driving the Z stage 51, the position (focus position) of the substrate P held by the Z stage 51 in the Z-axis direction and the positions in the θX and θY directions are controlled. Further, by driving the XY stage 52, the position of the substrate P in the XY direction (position in a direction substantially parallel to the image plane of the projection optical system PL) is controlled. That is, the Z stage 51 controls the focus position and the tilt angle of the substrate P to adjust the surface of the substrate P to the image plane of the projection optical system PL by the autofocus method and the auto leveling method. Is positioned in the X-axis direction and the Y-axis direction. Needless to say, the Z stage and the XY stage may be provided integrally.

  On the substrate stage PST (Z stage 51), a movable mirror 54 that moves with respect to the projection optical system PL together with the substrate stage PST is provided. A laser interferometer 55 is provided at a position facing the movable mirror 54. The two-dimensional position and rotation angle of the substrate P on the substrate stage PST are measured in real time by the laser interferometer 55, and the measurement result is output to the control device CONT. The control device CONT drives the substrate stage driving device PSTD based on the measurement result of the laser interferometer 55 to position the substrate P supported by the substrate stage PST.

  In the present embodiment, the immersion method is applied to improve the resolution by substantially shortening the exposure wavelength and to substantially increase the depth of focus. Therefore, at least while the pattern image of the mask M is transferred onto the substrate P, the predetermined liquid 50 is filled between the surface of the substrate P and the tip 7 of the projection optical system PL. As described above, the optical element 60 and a part of the lens barrel PK are disposed at the distal end portion 7 of the projection optical system PL, and the liquid 50 includes the optical element (glass member) 60 and the lens barrel (metal member) PK. Contact with. In the present embodiment, pure water is used for the liquid 50. Pure water is not only ArF excimer laser light but also far ultraviolet light such as ultraviolet emission lines (g-line, h-line, i-line) emitted from a mercury lamp and KrF excimer laser light (wavelength 248 nm) as exposure light EL. In the case of light (DUV light), the exposure light EL can be transmitted.

  The exposure apparatus EX supplies a liquid supply apparatus (immersion apparatus, supply apparatus) 1 that supplies a predetermined liquid 50 to the space 56 between the distal end portion 7 of the projection optical system PL and the substrate P, and the liquid 50 in the space 56. A liquid recovery apparatus (an immersion apparatus, a recovery apparatus) 2 for recovery is provided. The liquid supply device 1 is a device that allows the liquid 50 to flow at least partially between the projection optical system PL and the substrate P in parallel with the scanning direction of the substrate P. The tank that stores the liquid 50, a pressure pump, and the like It has. One end of a supply pipe 3 is connected to the liquid supply apparatus 1, and a supply nozzle 4 is connected to the other end of the supply pipe 3. The liquid supply apparatus 1 supplies the liquid 50 to the space 56 via the supply pipe 3 and the supply nozzle 4.

  The liquid recovery apparatus 2 includes a suction pump, a tank for storing the recovered liquid 50, and the like. One end of a recovery pipe 6 is connected to the liquid recovery apparatus 2, and a recovery nozzle 5 is connected to the other end of the recovery pipe 6. The liquid recovery apparatus 2 recovers the liquid 50 in the space 56 via the recovery nozzle 5 and the recovery pipe 6. When filling the space 50 with the liquid 50, the control device CONT drives the liquid supply device 1 to supply a predetermined amount of the liquid 50 per unit time to the space 56 via the supply pipe 3 and the supply nozzle 4. The recovery device 2 is driven, and a predetermined amount of liquid 50 per unit time is recovered from the space 56 via the recovery nozzle 5 and the recovery pipe 6. Thereby, the liquid 50 is arranged in the space 56 between the front end surface 7 of the projection optical system PL and the substrate P.

  At the time of scanning exposure, a part of the pattern image of the mask M is projected onto a rectangular projection area directly below the front end surface 60A, and the mask M is at a velocity V in the −X direction (or + X direction) with respect to the projection optical system PL. In synchronization with the movement, the substrate P moves in the + X direction (or -X direction) at the speed β · V (β is the projection magnification) via the XY stage 52. Then, after the exposure of one shot area is completed, the next shot area is moved to the scanning start position by stepping the substrate P, and thereafter, the exposure process for each shot area is sequentially performed by the step-and-scan method. In the present embodiment, the liquid 50 is set to flow in the same direction as the movement direction of the substrate in parallel with the movement direction of the substrate P.

  FIG. 2 shows the positional relationship between the distal end portion 7 of the projection optical system PL, the supply nozzle 4 (4A to 4C) for supplying the liquid 50 in the X-axis direction, and the recovery nozzle 5 (5A, 5B) for recovering the liquid 50. FIG. In FIG. 2, the shape of the tip 7 (tip surface 60A of the optical element 60) is a rectangular shape elongated in the Y-axis direction, and the + X direction so as to sandwich the tip 7 of the projection optical system PL in the X-axis direction. Three supply nozzles 4A to 4C are arranged on the side, and two recovery nozzles 5A and 5B are arranged on the −X direction side. The supply nozzles 4 </ b> A to 4 </ b> C are connected to the liquid supply apparatus 1 via the supply pipe 3, and the recovery nozzles 5 </ b> A and 5 </ b> B are connected to the liquid recovery apparatus 2 via the recovery pipe 4. In addition, the supply nozzles 8A to 8C and the recovery nozzles 9A and 9B are arranged in an arrangement in which the supply nozzles 4A to 4C and the recovery nozzles 5A and 5B are rotated by approximately 180 ° with respect to the center of the tip end portion 7. Supply nozzles 4A to 4C and recovery nozzles 9A and 9B are alternately arranged in the Y-axis direction, supply nozzles 8A to 8C and recovery nozzles 5A and 5B are alternately arranged in the Y-axis direction, and supply nozzles 8A to 8C are The recovery nozzles 9 </ b> A and 9 </ b> B are connected to the liquid recovery apparatus 2 via the recovery pipe 11. It is necessary to supply the liquid from the nozzle so that no gas portion is generated between the projection optical system PL and the substrate P.

  In addition, as shown in FIG. 3, supply nozzles 31 and 32 and recovery nozzles 33 and 34 may be provided on both sides in the Y-axis direction with the distal end portion 7 interposed therebetween. By this supply nozzle and recovery nozzle, the liquid 50 is stably supplied between the projection optical system PL and the substrate P even when the substrate P is moved in the non-scanning direction (Y-axis direction) during the step movement. be able to.

  The shape of the nozzle described above is not particularly limited, and for example, the liquid 50 may be supplied or recovered with two pairs of nozzles on the long side of the tip portion 7. In this case, the supply nozzle and the recovery nozzle may be arranged side by side so that the liquid 50 can be supplied and recovered from either the + X direction or the −X direction. .

  FIG. 4 is an enlarged view of the vicinity of the tip 7 of the projection optical system PL. In FIG. 4, the front end portion 7 of the projection optical system PL is subjected to a surface treatment corresponding to the affinity with the liquid 50. The tip portion 7 is a portion that comes into contact with the liquid 50 when the substrate P is moved in the scanning direction (X-axis direction) for scanning exposure, and a part of the lower surface 60A of the optical element 60 and the lower surface of the lens barrel PK. The projection optical system PL includes a lower surface 7A, and a part of the side surface 7B of the lens barrel PK connected to the lower surface 7A. In the present embodiment, since the liquid 50 is water, the tip portion 7 is subjected to a surface treatment according to the affinity with water.

  At the distal end portion 7 of the projection optical system PL, a first surface area AR1 including a surface (lower surface) 60A of the optical element 60 and a partial area of the lower surface of the lens barrel PK, and a mirror around the first surface area AR1. The remaining area on the lower surface of the cylinder PK and the second surface area AR2 including the side surface of the lens barrel PK are subjected to different surface treatments. Specifically, the first surface area AR1, the second surface area AR1, so that the affinity of the first surface area AR1 for the liquid (water) 50 is higher than the affinity of the second surface area AR2 for the liquid (water) 50, Surface treatment is applied to each of AR2. Here, a lyophilic process (hydrophilic process) for imparting lyophilicity to the first surface area AR1 including the optical element 60, and a lyophobic process for imparting liquid repellency to the second surface area AR2. (Water repellent treatment) is applied. The lyophilic process is a process for increasing the affinity for the liquid, and the lyophobic process is a process for decreasing the affinity for the liquid.

The surface treatment is performed according to the polarity of the liquid 50. In the present embodiment, since the liquid 50 is water having a large polarity, as a hydrophilic treatment for the first surface region AR1 including the optical element 60, for example, by forming a thin film with a substance having a molecular structure with a large polarity such as alcohol, Hydrophilicity is imparted to the first surface area AR1. Alternatively, the surface of the first surface area AR1 has a strong polarity by subjecting the lower surface 60A of the optical element 60 and the lens barrel PK to an O ₂ plasma treatment using, for example, oxygen (O ₂ ) as a treatment gas. Since many O molecules gather, hydrophilicity can be imparted. As described above, when water is used as the liquid 50, it is desirable to dispose the first surface region AR1 having a highly polar molecular structure such as an OH group on the surface. In addition, since the first surface area AR1 includes the optical element 60 that is a glass member and the lens barrel PK that is a metal member, when the hydrophilic treatment is performed, the glass member and the metal member are made of different materials and thin films. Different surface treatments can be performed, such as forming. Of course, you may perform the same surface treatment with respect to each of the glass member and metal member of 1st surface area AR1. Moreover, when forming a thin film, methods, such as application | coating and vapor deposition, can be used.

On the other hand, the water repellent process is performed on the second surface area AR2 including the surface of the lens barrel PK. As the water repellency treatment for the second surface region AR2, for example, a thin film is formed with a substance having a small molecular structure including fluorine, thereby imparting water repellency to the second surface region AR2. Alternatively, water repellency can be imparted by performing CF ₄ plasma treatment in which carbon tetrafluoride (CF ₄ ) is used as a treatment gas. Even when a thin film is formed on the second surface region AR2, a technique such as coating or vapor deposition can be used.

  In the present embodiment, the surface of the substrate P is also surface-treated according to the affinity with the liquid 50. Here, the surface of the substrate P is hydrophilized. As the hydrophilization treatment for the substrate P, lyophilicity is imparted to the surface of the substrate P by forming a thin film with a substance having a molecular structure having a large polarity such as alcohol as described above. When the surface of the substrate P is surface-treated by applying alcohol or the like, a coating film is formed after the exposure and before the next photosensitive material coating process, for example, before the substrate is transported to the developer / coater. It is desirable to provide a cleaning process for cleaning.

  And the liquid 50 is stably hold | maintained in 1st surface area AR1 by making the affinity with respect to the liquid 50 of 1st surface area AR1 higher than the affinity with respect to the liquid 50 of 2nd surface area AR2.

  Here, the thin film for the surface treatment is formed of a material that is insoluble in the liquid 50. Further, since the thin film formed on the optical element 60 is disposed on the optical path of the exposure light EL, the thin film is formed of a material having transparency to the exposure light EL, and the film thickness of the thin film is also the same as that of the exposure light EL. It is set to a degree that allows transmission.

  Next, an operation when the pattern of the mask M is exposed on the substrate P using the above-described exposure apparatus EX will be described.

  When the mask M is loaded on the mask stage MST and the substrate P is loaded on the substrate stage PST, the control device CONT drives the liquid supply device 1 and starts the liquid supply operation to the space 56. The liquid supply apparatus 1 supplies the liquid 50 to the space 56 along the moving direction of the substrate P. For example, when scanning exposure is performed by moving the substrate P in the scanning direction (−X direction) indicated by the arrow Xa (see FIG. 2), the supply pipe 3, the supply nozzles 4A to 4C, the recovery pipe 4, and the recovery nozzle The liquid 50 is supplied and recovered by the liquid supply device 1 and the liquid recovery device 2 using 5A and 5B. That is, when the substrate P moves in the −X direction, the liquid 50 is supplied between the projection optical system PL and the substrate P from the liquid supply device 1 via the supply pipe 3 and the supply nozzles 4 (4A to 4C). At the same time, the liquid 50 is recovered by the liquid recovery device 2 via the recovery nozzles 5 (5A, 5B) and the recovery pipe 6, and the liquid 50 is applied in the −X direction so as to fill between the lens 60 and the substrate P. Flowing. On the other hand, when scanning exposure is performed by moving the substrate P in the scanning direction (+ X direction) indicated by the arrow Xb, the supply pipe 10, the supply nozzles 8A to 8C, the recovery pipe 11, and the recovery nozzles 9A and 9B are used. The liquid supply device 1 and the liquid recovery device 2 supply and recover the liquid 50. That is, when the substrate P moves in the + X direction, the liquid 50 is supplied from the liquid supply device 1 between the projection optical system PL and the substrate P via the supply pipe 10 and the supply nozzles 8 (8A to 8C). At the same time, the liquid 50 is recovered by the liquid recovery apparatus 2 via the recovery nozzle 9 (9A, 9B) and the recovery pipe 11, and the liquid 50 flows in the + X direction so as to fill the space between the lens 60 and the substrate P. As described above, the control device CONT causes the liquid 50 to flow along the moving direction of the substrate P using the liquid supply device 1 and the liquid recovery device 2. In this case, for example, the liquid 50 supplied from the liquid supply apparatus 1 via the supply nozzle 4 flows so as to be drawn into the space 56 as the substrate P moves in the −X direction. Even when the energy is small, the liquid 50 can be easily supplied to the space 56. Then, by switching the flow direction of the liquid 50 according to the scanning direction, the substrate P is scanned between the front end surface 7 of the lens 60 and the substrate P in either the + X direction or the −X direction. Can be filled with the liquid 50, and high resolution and a wide depth of focus can be obtained.

  At this time, a case where the surface treatment is not performed on the projection optical system PL or the substrate P will be considered. FIG. 5 is a schematic diagram showing the flow of the liquid 50 in a state where the surface treatment is not performed. Here, it is assumed that the projection optical system PL surface and the substrate P surface have low affinity for the liquid 50.

  FIG. 5A is a diagram illustrating a state where the substrate stage PST is stopped. The liquid 50 is supplied from the supply nozzle 4 and recovered from the recovery nozzle 5. At this time, since the affinity between the liquid 50 and the substrate P is low, the contact angle θ is large. FIG. 5B is a diagram showing a state in which the substrate P starts to move in the X-axis direction by the substrate stage PST. The liquid 50 is deformed by being pulled by the moving substrate P. Since the affinity between the liquid 50 and the substrate P is low, the liquid 50 is easily separated from the surface of the substrate P. FIG. 5C is a diagram showing a state where the moving speed of the substrate P on the substrate stage PST is further increased. A separation region (bubble) H1 is formed between the substrate P and the liquid 50, and a separation region H2 is also formed between the optical element 60 and the liquid 50. If the separation regions H1 and H2 are formed on the optical path of the exposure light EL, the pattern of the mask M is not accurately transferred to the substrate P.

  FIG. 6 is a schematic diagram showing the flow of the liquid 50 in a state where the tip 7 of the projection optical system P and the surface of the substrate P are surface-treated as described with reference to FIG.

  FIG. 6A is a diagram showing a state where the substrate stage PST is stopped. Since the surface treatment is performed to increase the affinity between the liquid 50 and the substrate P, the contact angle θ is small. FIG. 6B is a diagram illustrating a state in which the substrate P starts to move in the X-axis direction by the substrate stage PST. Since the affinity between the liquid 50 and the substrate P is high, the liquid 50 is not excessively pulled by the substrate P even if the substrate P moves. Further, since the first surface area AR1 of the projection optical system PL has high affinity for the liquid 50, the first surface area AR1 and the liquid 50 are not separated. At this time, since the periphery of the first surface area AR1 is surrounded by the second surface area AR2 having a low affinity for the liquid 50, the liquid 50 in the space 56 does not flow out to the outside and is stably in the space 56. Has been placed. FIG. 6C is a diagram showing a state where the moving speed of the substrate P on the substrate stage PST is further increased. Even if the moving speed of the substrate P is increased, since the surface treatment is performed on the projection optical system PL and the substrate P, no separation occurs between the liquid 50 and the projection optical system PL and the substrate P.

  As described above, in the exposure process based on the liquid immersion method, the surface treatment according to the affinity with the liquid 50 is performed on the front end portion 7 of the projection optical system PL and the surface of the substrate P which are in contact with the liquid 50. By applying, the occurrence of inconveniences such as peeling of the liquid 50 and generation of bubbles can be suppressed, and the liquid 50 can be stably disposed between the projection optical system PL and the substrate P. Therefore, good pattern transfer accuracy can be maintained.

Note that the surface treatment according to the affinity with the liquid 50 may be performed on only one of the front end portion 7 of the projection optical system PL and the surface of the substrate P.
In the above embodiment, the surface 60A of the optical element 60 and a part of the lower surface of the lens barrel (holding member) PK are defined as the first surface area AR1, and the affinity for the liquid 50 is increased with respect to the first surface area AR1. As described above, the surface treatment is performed. That is, the boundary between the lyophilic region and the lyophobic region has been described as being on the lower surface of the lens barrel PK, but this boundary may be set on the surface of the optical element 60. That is, a configuration in which a part of the optical element 60 (at least a region through which exposure light passes) is subjected to lyophilic treatment and the remaining region is subjected to lyophobic treatment. Of course, the boundary between the lyophilic region and the lyophobic region may be made coincident with the boundary between the optical element 60 and the lens barrel PK. In other words, the lyophilic process may be performed only on the optical element 60. Furthermore, the boundary is not limited to the lower surface 7A of the projection optical system PL, and the entire lower surface 7A of the projection optical system PL may be lyophilic.

  Furthermore, when the surface treatment is performed, it is possible to provide a distribution of lyophilicity (liquid repellency). In other words, the surface treatment can be performed so that the contact angles of the liquid for the plurality of regions on the surface to be surface treated have different values. Alternatively, the lyophilic area and the lyophobic area may be appropriately divided and arranged.

  Further, the thin film for surface treatment may be a single layer film or a film composed of a plurality of layers. Further, as the forming material, any material can be used as long as it can exhibit desired performance, such as metal, metal compound, and organic substance.

  In addition, thin film formation, plasma processing, and the like are effective for the surface treatment of the optical element 60 and the substrate P. Regarding the surface treatment of the lens barrel PK that is a metal member, for example, the surface of the lens barrel PK is roughened. The affinity for the liquid can be adjusted by a physical method.

In the above-described embodiment, the surface of the substrate P is lyophilic (lyophilic treatment) with emphasis on the stable holding of the liquid between the projection optical system PL and the substrate P. When importance is attached to the recovery or removal of the liquid, the surface of the substrate P may be made liquid repellent (liquid repellent treatment).
In the above-described embodiment, the surface treatment corresponding to the affinity with the liquid 50 is performed on the front end portion 7 of the projection optical system PL and the surface of the substrate P. However, the front end portion 7 of the projection optical system PL is used. And a liquid corresponding to the affinity between at least one of the surfaces of the substrate P may be supplied from the liquid supply apparatus 1.

  As described above, the liquid 50 in the present embodiment is composed of pure water. Pure water has an advantage that it can be easily obtained in large quantities at a semiconductor manufacturing factory or the like and has no adverse effect on the photoresist, optical element (lens), etc. on the substrate P. In addition, pure water has no adverse effects on the environment, and since the impurity content is extremely low, it can be expected to clean the surface of the substrate P and the surface of the optical element provided on the front end surface of the projection optical system PL. .

  The refractive index n of pure water (water) with respect to the exposure light EL having a wavelength of about 193 nm is said to be about 1.44 to 1.47, and ArF excimer laser light (wavelength 193 nm) is used as the light source of the exposure light EL. Is used, the wavelength is shortened to 1 / n on the substrate P, that is, about 131 to 134 nm, and a high resolution can be obtained. Furthermore, since the depth of focus is expanded to about n times, that is, about 1.44 to 1.47 times compared with that in the air, if it is sufficient to ensure the same depth of focus as that used in the air, The numerical aperture of the projection optical system PL can be further increased, and the resolution is improved also in this respect.

  In the present embodiment, a plane-parallel plate is attached as the optical element 60 to the tip of the projection optical system PL. However, as an optical element attached to the tip of the projection optical system PL, for example, optical characteristics of the projection optical system PL, such as aberration ( It may be an optical plate or a lens used for adjusting spherical aberration, coma aberration, etc. On the other hand, by making the optical element in contact with the liquid 50 a plane parallel plate that is cheaper than the lens, the transmittance of the projection optical system PL, the exposure light on the substrate P, etc. during transportation, assembly, and adjustment of the exposure apparatus EX Even if a substance that reduces the illuminance of the EL and the uniformity of the illuminance distribution (for example, silicon-based organic matter) adheres to the parallel flat plate, it is only necessary to replace the parallel flat plate immediately before supplying the liquid 50, There is an advantage that the replacement cost is lower than in the case where the optical element in contact with the liquid 50 is a lens. That is, the surface of the optical element that comes into contact with the liquid 50 is contaminated due to scattering particles generated from the resist by exposure to the exposure light EL, or adhesion of impurities in the liquid 50, and the optical element is periodically replaced. Although it is necessary, by making this optical element an inexpensive parallel flat plate, the cost of replacement parts is lower than that of lenses and the time required for replacement can be shortened, resulting in an increase in maintenance costs (running costs). And a decrease in throughput.

  Further, when the pressure between the optical element at the tip of the projection optical system PL generated by the flow of the liquid 50 and the substrate P is large, the optical element is not exchangeable but the optical element is moved by the pressure. It may be fixed firmly so that there is no.

The liquid 50 of the present embodiment is water, but may be a liquid other than water. For example, when the light source of the exposure light EL is an F ₂ laser, the F ₂ laser light does not transmit water. The liquid 50 may be, for example, fluorinated oil (fluorinated liquid) or perfluorinated polyether (PFPE) that can transmit F ₂ laser light. In this case, a lyophilic process is performed by forming a thin film of a substance having a molecular structure with a small polarity including fluorine, for example, on the surface of the projection optical system PL that is in contact with the liquid 50 and the surface of the substrate P. In addition, as the liquid 50, the liquid 50 is transmissive to the exposure light EL, has a refractive index as high as possible, and is stable with respect to the photoresist applied to the projection optical system PL and the surface of the substrate P (for example, Cedar). Oil) can also be used. Also in this case, the surface treatment is performed according to the polarity of the liquid 50 to be used.

  Next, a second embodiment of the present invention will be described with reference to FIG.

In the exposure apparatus EX of the present embodiment, the thickness of the liquid 50 between the lower surface 7A of the projection optical system PL and the surface of the substrate P (here, the distance between the projection optical system PL and the substrate P) is d, and the projection optical system. When the flow velocity of the liquid 50 between PL and the substrate P is v, the density of the liquid 50 is ρ, and the viscosity coefficient of the liquid 50 is μ, the conditional expression (v · d · ρ) / μ ≦ 2000 ( 3)
Is set to satisfy. Thereby, the liquid 50 flows in a laminar flow in the space 56. In the liquid 50, there may be a plurality of different flow velocities v depending on the position in the liquid, but the maximum velocity Vmax only needs to satisfy the above expression (3).

  In order to satisfy the conditional expression (3), the control device CONT supplies the liquid 56 with the liquid supply unit 1 to the space 56 per unit time and the liquid recovery device 2 collects the liquid 56 in the space 56 per unit time. Adjust at least one of the quantity. Thereby, the velocity v of the liquid 50 flowing through the space 56 is determined, and the conditional expression (3) can be satisfied. By satisfying conditional expression (3), the liquid 50 flows through the space 56 in a laminar flow.

  Alternatively, the control apparatus CONT can also satisfy the conditional expression (3) by adjusting the moving speed of the substrate P in the scanning direction via the substrate stage PST. That is, the velocity v of the liquid 50 flowing through the space 56 may be determined by the moving speed of the substrate P. In other words, the liquid 50 on the substrate P may flow so as to be dragged to the substrate P by the movement of the substrate P. In that case, the conditional expression (3) can be satisfied by adjusting the moving speed of the substrate P. For example, when the substrate P and the liquid 50 flow with respect to the projection optical system PL at substantially the same speed, the moving speed of the substrate P is set to the speed v of the liquid 50 so that the conditional expression (3) is satisfied. Good. Even in this case, the liquid 50 flows through the space 56 as a laminar flow. In that case, it is not always necessary to operate the liquid supply device 1 and the liquid recovery device 2 during the exposure of the substrate P, and the flow of the liquid 50 can be made laminar only by adjusting the moving speed of the substrate P. it can.

  In order to satisfy the conditional expression (3), the thickness d of the liquid 50 (that is, the distance between the projection optical system PL and the substrate P) d is preset as a design value of the exposure apparatus, and based on this. The speed v may be determined, or the speed v may be preset as a design value, and the thickness (distance) d may be determined based on this.

  Further, in order to allow the liquid 50 to flow in a laminar flow in the space 56, for example, as shown in FIG. 8A, a slit is provided in the opening of the supply nozzle 4 connected to the liquid supply apparatus 1, As shown in FIG. 8B, the liquid 50 can be rectified and flowed in a laminar flow state by providing a porous body at the opening of the supply nozzle 4.

  And since the liquid 50 flows as a laminar flow, inconveniences such as a change in refractive index and vibration due to pressure fluctuations are suppressed, and good pattern transfer accuracy can be maintained. Further, the surface of the projection optical system PL in contact with the liquid 50 and the surface of the substrate P are subjected to surface treatment, and the exposure apparatus EX is set so as to satisfy the above conditional expression (3) to perform exposure processing. 56 liquids 50 are set in a better state that does not affect the pattern transfer accuracy.

  In the above-described embodiment, the exposure apparatus that locally fills the space between the projection optical system PL and the substrate P with the liquid is adopted. However, the liquid that moves the stage holding the substrate to be exposed in the liquid tank. The present invention can also be applied to an immersion exposure apparatus or an immersion exposure apparatus in which a liquid tank having a predetermined depth is formed on a stage and a substrate is held therein. For the structure and exposure operation of an immersion exposure apparatus that moves a stage holding a substrate to be exposed in a liquid tank, a liquid tank having a predetermined depth is formed on the stage, for example, in JP-A-6-124873. The structure and exposure operation of the immersion exposure apparatus for holding the substrate therein are disclosed in, for example, Japanese Patent Application Laid-Open No. 10-303114 and US Pat. No. 5,825,043.

  In the above embodiment, the liquid supply device 1 and the liquid recovery device 2 continue to supply and recover the liquid 50 during the exposure of the substrate P. However, during the exposure of the substrate P, the liquid supply device 1 and the liquid recovery device 2 The supply and recovery of the liquid 50 by the liquid recovery apparatus 2 may be stopped. That is, before the exposure of the substrate P is started, the liquid immersion having a thickness equal to or less than the working distance of the projection optical system PL (about 0.5 to 1.0 mm) is provided between the distal end portion 7 of the projection optical system PL and the substrate P. A small amount of liquid 50 is supplied onto the substrate P by the liquid supply device 1 to such an extent that a portion can be formed or a thin liquid film can be formed on the entire surface of the substrate P, and the tip of the projection optical system PL is passed through the liquid 50. The part 7 and the substrate P are brought into close contact with each other. Since the distance between the tip 7 of the projection optical system PL and the substrate P is several mm or less, the substrate P is moved during the exposure of the substrate P without supplying and recovering the liquid by the liquid supply device 1 and the liquid recovery device 2. Even so, the liquid 50 can continue to be held between the projection optical system PL and the substrate P due to the surface tension of the liquid 50. Further, the resist (photosensitive film) on the substrate P is not damaged by the liquid supply from the liquid supply apparatus 1. In this case, if a coating that repels the liquid 50 with a predetermined width is applied to the periphery of the substrate P (a water-repellent coating when the liquid is water), the liquid 50 can be prevented from flowing out from the substrate P. In addition, when moving the board | substrate P, it cannot be overemphasized not to generate | occur | produce a turbulent flow in the liquid 50 so that the above-mentioned conditional expression (3) may be satisfy | filled.

  In the above-described embodiment, the liquid (50) is supplied on the substrate stage PST. However, the liquid may be supplied onto the substrate P before the substrate P is loaded onto the substrate stage PST. In this case, if the thickness of the liquid supplied to a part or the entire surface of the substrate P is set to about 0.5 to 1.0 mm, the liquid is carried onto the substrate stage PST while being placed on the substrate P by surface tension. Unloading from the substrate stage PST can be performed. Also in this case, if the liquid repellent coating having a predetermined width is applied to the periphery of the substrate P, the liquid holding force on the substrate P can be increased. In this way, by supplying the substrate P to the substrate stage PST and unloading the substrate P from the substrate stage PST while holding the liquid on the substrate P, the liquid is supplied and recovered on the substrate stage PST. The mechanism can be omitted.

  In the above embodiment, the space between the projection optical system PL and the surface of the substrate P is filled with the liquid 50. For example, as shown in FIG. The structure which fills the liquid 50 in the state which attached the cover glass 65 may be sufficient. Here, the cover glass 65 is supported on the Z stage 51 via the support member 66, and the space 57 formed by the cover glass 65, the support member 66, and the Z stage 51 is a substantially sealed space. The liquid 50 and the substrate P are disposed in the space 57. The cover glass 65 is made of a material that is transmissive to the exposure light EL. Then, the liquid 50 is supplied and recovered by the liquid supply device 1 and the liquid recovery device 2 to the space 56 ′ between the surface of the cover glass 65 and the projection optical system PL, and the surface of the cover glass 65 and the projection are projected. When the distance from the tip portion 7 of the optical system PL is d, the space 56 ′ is set to satisfy the conditional expression (3).

  And the surface treatment according to the affinity with the liquid 50 can be performed also on the surface (upper surface) of the cover glass 65. Since it is desirable that the surface of the cover glass 65 be lyophilic, when the liquid 50 is water, a thin film is formed on the surface of the cover glass 65 with a substance having a molecular structure having a large polarity.

  The substrate P in each of the above embodiments is not only a semiconductor wafer for manufacturing a semiconductor device, but also a glass substrate for a display device, a ceramic wafer for a thin film magnetic head, or an original mask or reticle used in an exposure apparatus. (Synthetic quartz, silicon wafer) or the like is applied.

  As the exposure apparatus EX, in addition to the step-and-scan type scanning exposure apparatus (scanning stepper) that scans and exposes the pattern of the mask M by moving the mask M and the substrate P synchronously, the mask M and the substrate P Can be applied to a step-and-repeat type projection exposure apparatus (stepper) in which the pattern of the mask M is collectively exposed while the substrate P is stationary and the substrate P is sequentially moved stepwise. The present invention can also be applied to a step-and-stitch type exposure apparatus that partially transfers at least two patterns on the substrate P.

  The present invention can also be applied to a twin stage type exposure apparatus. The structure and exposure operation of a twin stage type exposure apparatus are disclosed in, for example, Japanese Patent Laid-Open Nos. 10-163099 and 10-214783 (corresponding US Pat. Nos. 6,341,007, 6,400,441, 6,549,269). No. 6,590,634), JP 2000-505958 (corresponding US Pat. No. 5,969,441) or US Pat. No. 6,208,407.

  The type of the exposure apparatus EX is not limited to an exposure apparatus for manufacturing a semiconductor element that exposes a semiconductor element pattern on the substrate P, but an exposure apparatus for manufacturing a liquid crystal display element or a display, a thin film magnetic head, an image sensor (CCD). ) Or an exposure apparatus for manufacturing reticles or masks.

  When a linear motor is used for the substrate stage PST and the mask stage MST, either an air levitation type using an air bearing or a magnetic levitation type using a Lorentz force or a reactance force may be used. Each stage PST, MST may be a type that moves along a guide, or may be a guideless type that does not have a guide. Examples using a linear motor for the stage are disclosed in US Pat. Nos. 5,623,853 and 5,528,118.

  As a driving mechanism for each stage PST, MST, a planar motor that drives each stage PST, MST by electromagnetic force with a magnet unit having a two-dimensionally arranged magnet and an armature unit having a two-dimensionally arranged coil facing each other is provided. It may be used. In this case, either one of the magnet unit and the armature unit may be connected to the stages PST and MST, and the other of the magnet unit and the armature unit may be provided on the moving surface side of the stages PST and MST.

  The reaction force generated by the movement of the substrate stage PST may be released mechanically to the floor (ground) using a frame member so as not to be transmitted to the projection optical system PL. This reaction force processing method is disclosed in detail, for example, in JP-A-8-166475 (US Pat. No. 5,528,118).

  The reaction force generated by the movement of the mask stage MST may be released mechanically to the floor (ground) using a frame member so as not to be transmitted to the projection optical system PL. This reaction force processing method is disclosed in detail in, for example, Japanese Patent Application Laid-Open No. 8-330224 (US Pat. No. 5,874,820).

  As described above, the exposure apparatus EX according to the present embodiment maintains various mechanical subsystems including the respective constituent elements recited in the claims of the present application so as to maintain predetermined mechanical accuracy, electrical accuracy, and optical accuracy. Manufactured by assembling. In order to ensure these various accuracies, before and after assembly, various optical systems are adjusted to achieve optical accuracy, various mechanical systems are adjusted to achieve mechanical accuracy, and various electrical systems are Adjustments are made to achieve electrical accuracy. The assembly process from the various subsystems to the exposure apparatus includes mechanical connection, electrical circuit wiring connection, pneumatic circuit piping connection and the like between the various subsystems. Needless to say, there is an assembly process for each subsystem before the assembly process from the various subsystems to the exposure apparatus. When the assembly process of the various subsystems to the exposure apparatus is completed, comprehensive adjustment is performed to ensure various accuracies as the entire exposure apparatus. The exposure apparatus is preferably manufactured in a clean room where the temperature, cleanliness, etc. are controlled.

  As shown in FIG. 10, a microdevice such as a semiconductor device includes a step 201 for performing a function / performance design of the microdevice, a step 202 for manufacturing a mask (reticle) based on the design step, and a substrate as a base material of the device. Manufacturing step 203, exposure processing step 204 for exposing the mask pattern onto the substrate by the exposure apparatus EX of the above-described embodiment, device assembly step (including dicing process, bonding process, packaging process) 205, inspection step 206, etc. It is manufactured after. The exposure processing step 204 includes a step of performing a surface treatment of the substrate in order to adjust the hydrophilicity between the substrate and the liquid before the exposure.

It is a schematic block diagram which shows one Embodiment of the exposure apparatus of this invention. It is a figure which shows the example of arrangement | positioning of a supply nozzle and a collection | recovery nozzle. It is a figure which shows the example of arrangement | positioning of a supply nozzle and a collection | recovery nozzle. It is a schematic diagram for demonstrating the area | region where the projection optical system and the board | substrate are surface-treated. It is a schematic diagram for demonstrating a liquid flowing between the projection optical system which is not surface-treated, and a board | substrate. It is a schematic diagram for demonstrating a mode that a liquid flows between the projection optical system to which surface treatment was performed, and a board | substrate. It is a figure for demonstrating other embodiment of this invention. It is a figure which shows the other Example of a supply nozzle. It is a figure which shows the cover glass provided on the board | substrate. It is a flowchart figure which shows an example of the manufacturing process of a semiconductor device.

Explanation of symbols

DESCRIPTION OF SYMBOLS 1 ... Liquid supply apparatus (immersion means, supply means), 2 ... Liquid recovery apparatus (immersion means, recovery means), 7 ... Projection optical system front-end | tip part, 50 ... Liquid, 60 ... Optical element, 65 ... Cover glass,
AR1 ... first surface region, AR2 ... second surface region, EX ... exposure device, P ... substrate,
PK ... barrel (holding member), PL ... projection optical system

Claims (11)

  An exposure apparatus that exposes a substrate by transferring an image of a pattern onto the substrate via a liquid,
  A projection optical system that projects an image of the pattern onto a substrate;
  The projection optical system has a first surface region including an optical element surface at the tip thereof, and a second surface region around the first surface region,
  An exposure apparatus in which the affinity of the liquid in the first surface region is higher than the affinity of the liquid in the second surface region.   The exposure apparatus according to claim 1, wherein the exposure of the substrate is performed while moving the substrate in a scanning direction. The first surface region and the second surface region are subjected to surface treatment to adjust the affinity with the liquid,
The exposure apparatus according to claim 1, wherein the surface treatment is performed according to a polarity of the liquid. The exposure apparatus according to claim 3, wherein the liquid is water, and the surface treatment is performed on the first surface region by forming a thin film with a substance having a molecular structure having a large polarity. The exposure apparatus according to claim 3, wherein the liquid is a fluorinated liquid, and the surface treatment is performed on the first surface region by forming a thin film with a substance having a molecular structure with a small polarity. The exposure apparatus according to claim 1, wherein the second surface region includes at least a part of a surface of a holding member that holds an optical element at a tip of the projection optical system. The exposure apparatus according to claim 1, wherein the first surface region is formed in at least a portion of the optical element surface through which exposure light passes. The liquid according to any one of claims 1 to 7 , wherein the liquid is retained in the first surface region by making the affinity of the first surface region to the liquid higher than the affinity of the second surface region to the liquid. the exposure apparatus according to an item or. The thickness of the liquid between the projection optical system and the substrate is d, the velocity of the liquid flow between the projection optical system and the substrate is v, the density of the liquid is ρ, the viscosity of the liquid Conditional expression (v · d · ρ) / μ ≦ 2000, where μ is a coefficient
The exposure apparatus according to any one of claims 1 to 8 , wherein: At least a portion between the substrate and the projection optical system, comprising an immersion device for flowing the liquid, the liquid of any one of claims 1-8, characterized in that flow as laminar flows Exposure device. An exposure processing step of exposing a pattern to the substrate using the exposure apparatus according to any one of claims 1 to 10,
A device manufacturing method including a dicing step, a bonding step, and a package step, and a device assembly step for processing the exposed substrate .

Images