JPH04305917A - Adhesion type exposure device - Google Patents

Adhesion type exposure device

Info

Publication number
JPH04305917A
JPH04305917A JP3094863A JP9486391A JPH04305917A JP H04305917 A JPH04305917 A JP H04305917A JP 3094863 A JP3094863 A JP 3094863A JP 9486391 A JP9486391 A JP 9486391A JP H04305917 A JPH04305917 A JP H04305917A
Authority
JP
Japan
Prior art keywords
hydrophilic
wafer
adhesive surface
immersion liquid
treated
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP3094863A
Inventor
Takashi Matsubara
Hisao Ozeki
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Priority to JP3094863A priority Critical patent/JPH04305917A/en
Publication of JPH04305917A publication Critical patent/JPH04305917A/en
Application status is Pending legal-status Critical

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Exposure apparatus for microlithography
    • G03F7/70216Systems for imaging mask onto workpiece
    • G03F7/70341Immersion

Abstract

PURPOSE: To thin film thickness of an immersion liquid and reduce the quantity of light absorbed, and to minimize and prevent exposure unevenness in an adhesion type exposure device.
CONSTITUTION: The adhesive surface 11 of an exposure lens is hydrophilic- treated by a hydrophilic solution such as alcohol. A wafer 3 coated with a photoresist 4 is fast stuck on the hydrophilic-treated adhesive surface 11 through an immersion liquid 5, and the pattern 7 of a photomask 1 is transferred onto the wafer 3 by the irradiation of irradiation light 6. Wafer absorbing properties are improved in the hydrophilic-treated adhesive surface 11, and the film thickness of the immersion liquid 5 is made thin.
COPYRIGHT: (C)1992,JPO&Japio
JP3094863A 1991-04-02 1991-04-02 Adhesion type exposure device Pending JPH04305917A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3094863A JPH04305917A (en) 1991-04-02 1991-04-02 Adhesion type exposure device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3094863A JPH04305917A (en) 1991-04-02 1991-04-02 Adhesion type exposure device

Publications (1)

Publication Number Publication Date
JPH04305917A true JPH04305917A (en) 1992-10-28

Family

ID=14121877

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3094863A Pending JPH04305917A (en) 1991-04-02 1991-04-02 Adhesion type exposure device

Country Status (1)

Country Link
JP (1) JPH04305917A (en)

Cited By (246)

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US10209624B2 (en) 2010-04-22 2019-02-19 Asml Netherlands B.V. Fluid handling structure, lithographic apparatus and device manufacturing method
US10254663B2 (en) 2015-10-13 2019-04-09 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method involving a heater
US10248033B2 (en) 2017-09-01 2019-04-02 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US10248035B2 (en) 2017-11-02 2019-04-02 Asml Netherlands B.V. Lithographic apparatus

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