JP4587170B2 - 露光装置及びデバイスの製造方法 - Google Patents

露光装置及びデバイスの製造方法 Download PDF

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Publication number
JP4587170B2
JP4587170B2 JP2005013033A JP2005013033A JP4587170B2 JP 4587170 B2 JP4587170 B2 JP 4587170B2 JP 2005013033 A JP2005013033 A JP 2005013033A JP 2005013033 A JP2005013033 A JP 2005013033A JP 4587170 B2 JP4587170 B2 JP 4587170B2
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JP
Japan
Prior art keywords
exposure
light source
exposure apparatus
substrate
image
Prior art date
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Expired - Fee Related
Application number
JP2005013033A
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English (en)
Japanese (ja)
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JP2006201476A5 (zh
JP2006201476A (ja
Inventor
充朗 杉田
和明 近江
隆夫 米原
俊彦 辻
孝昭 寺師
徹 香田
慎二 筒井
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Canon Inc
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Canon Inc
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Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP2005013033A priority Critical patent/JP4587170B2/ja
Priority to TW095101065A priority patent/TWI342985B/zh
Priority to KR1020060005146A priority patent/KR100724637B1/ko
Priority to US11/336,754 priority patent/US8035668B2/en
Priority to CN2006100064047A priority patent/CN1808282B/zh
Publication of JP2006201476A publication Critical patent/JP2006201476A/ja
Publication of JP2006201476A5 publication Critical patent/JP2006201476A5/ja
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70275—Multiple projection paths, e.g. array of projection systems, microlens projection systems or tandem projection systems
    • A—HUMAN NECESSITIES
    • A01—AGRICULTURE; FORESTRY; ANIMAL HUSBANDRY; HUNTING; TRAPPING; FISHING
    • A01K—ANIMAL HUSBANDRY; AVICULTURE; APICULTURE; PISCICULTURE; FISHING; REARING OR BREEDING ANIMALS, NOT OTHERWISE PROVIDED FOR; NEW BREEDS OF ANIMALS
    • A01K1/00—Housing animals; Equipment therefor
    • A01K1/0047—Air-conditioning, e.g. ventilation, of animal housings
    • A01K1/0052—Arrangement of fans or blowers

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  • Life Sciences & Earth Sciences (AREA)
  • Environmental Sciences (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Zoology (AREA)
  • Animal Husbandry (AREA)
  • Biodiversity & Conservation Biology (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2005013033A 2005-01-20 2005-01-20 露光装置及びデバイスの製造方法 Expired - Fee Related JP4587170B2 (ja)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP2005013033A JP4587170B2 (ja) 2005-01-20 2005-01-20 露光装置及びデバイスの製造方法
TW095101065A TWI342985B (en) 2005-01-20 2006-01-11 Exposure apparatus and device manufacturing method
KR1020060005146A KR100724637B1 (ko) 2005-01-20 2006-01-18 노광장치 및 디바이스의 제조방법
US11/336,754 US8035668B2 (en) 2005-01-20 2006-01-19 Exposure apparatus and device manufacturing method
CN2006100064047A CN1808282B (zh) 2005-01-20 2006-01-20 曝光设备及器件制造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005013033A JP4587170B2 (ja) 2005-01-20 2005-01-20 露光装置及びデバイスの製造方法

Publications (3)

Publication Number Publication Date
JP2006201476A JP2006201476A (ja) 2006-08-03
JP2006201476A5 JP2006201476A5 (zh) 2008-03-06
JP4587170B2 true JP4587170B2 (ja) 2010-11-24

Family

ID=36683423

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2005013033A Expired - Fee Related JP4587170B2 (ja) 2005-01-20 2005-01-20 露光装置及びデバイスの製造方法

Country Status (5)

Country Link
US (1) US8035668B2 (zh)
JP (1) JP4587170B2 (zh)
KR (1) KR100724637B1 (zh)
CN (1) CN1808282B (zh)
TW (1) TWI342985B (zh)

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7802910B2 (en) * 2008-01-29 2010-09-28 Dymax Corporation Light guide exposure device
JP5131129B2 (ja) * 2008-09-30 2013-01-30 ウシオ電機株式会社 光源ユニット及び該光源ユニットを具備した露光装置
JP5345443B2 (ja) * 2009-04-21 2013-11-20 株式会社日立ハイテクノロジーズ 露光装置、露光光照射方法、及び表示用パネル基板の製造方法
KR20120056094A (ko) * 2010-11-24 2012-06-01 삼성전기주식회사 노광 파장 조절 장치 및 그를 이용한 노광기
KR20120060018A (ko) * 2010-12-01 2012-06-11 삼성전자주식회사 마스크리스 노광 장치
JP2012174810A (ja) * 2011-02-18 2012-09-10 Fuji Xerox Co Ltd 発光部品、プリントヘッドおよび画像形成装置
KR101532352B1 (ko) * 2013-10-30 2015-06-29 주식회사 인피테크 노광용 led 광원 장치 및 노광용 led 광원장치 관리시스템
WO2016039721A1 (en) * 2014-09-08 2016-03-17 Empire Technology Development Llc Integrated packaging for multi-component sensors
KR101689836B1 (ko) * 2015-09-25 2016-12-27 주식회사 리텍 고출력 uv led 광원의 펄스제어를 이용한 dmd 과열 저감 시스템
JP6406201B2 (ja) * 2015-10-02 2018-10-17 東京エレクトロン株式会社 基板処理装置、基板処理方法及び記憶媒体
CN106502059A (zh) * 2016-12-30 2017-03-15 俞庆平 一种适用于曲面手机玻璃的直写曝光系统及方法
CN106647185A (zh) * 2016-12-31 2017-05-10 江苏九迪激光装备科技有限公司 一种丝网印刷直接制版系统及制版方法
WO2019098262A1 (ja) * 2017-11-16 2019-05-23 国立大学法人長岡技術科学大学 光発生装置、光発生装置を備える露光装置、露光システム、光発生方法、及び露光フォトレジスト製造方法
CN108646521A (zh) * 2018-06-19 2018-10-12 上海频微电子科技有限公司 一种光源直接成像聚焦光刻装置及光刻方法
US10901253B2 (en) * 2018-10-02 2021-01-26 Aristocrat Technologies Australia Pty Limited Button deck assembly for an electronic gaming machine and method for making the same
CN112051711A (zh) * 2020-08-20 2020-12-08 江苏迪盛智能科技有限公司 一种曝光设备

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0716937U (ja) * 1993-08-27 1995-03-20 大日本スクリーン製造株式会社 画像出力装置
JP2002098677A (ja) * 2000-09-25 2002-04-05 Gl Sciences Inc 液体クロマトグラフィーの試料導入方法及び装置
JP2003098676A (ja) * 2001-09-25 2003-04-04 Pentax Corp 露光装置
JP2004274011A (ja) * 2003-01-16 2004-09-30 Nikon Corp 照明光源装置、照明装置、露光装置、及び露光方法
JP2004327660A (ja) * 2003-04-24 2004-11-18 Nikon Corp 走査型投影露光装置、露光方法及びデバイス製造方法

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5561365A (en) * 1986-07-07 1996-10-01 Karel Havel Digital color display system
AU1975197A (en) * 1996-02-28 1997-10-01 Kenneth C. Johnson Microlens scanner for microlithography and wide-field confocal microscopy
JP2942230B2 (ja) * 1998-01-12 1999-08-30 キヤノン株式会社 画像形成装置及び発光装置
SE516347C2 (sv) * 1999-11-17 2001-12-17 Micronic Laser Systems Ab Laserskanningssystem och metod för mikrolitografisk skrivning
US6927018B2 (en) * 2001-10-29 2005-08-09 Hewlett-Packard Development Company, L.P. Three dimensional printing using photo-activated building materials
CN101446773A (zh) 2001-11-07 2009-06-03 应用材料有限公司 无掩膜光子电子点格栅阵列光刻机
CN1659479A (zh) * 2002-04-10 2005-08-24 富士胶片株式会社 曝光头及曝光装置和它的应用
JP4546019B2 (ja) 2002-07-03 2010-09-15 株式会社日立製作所 露光装置
JP2004109658A (ja) * 2002-09-19 2004-04-08 Ricoh Co Ltd 光走査装置及び光路調整方法並びに画像形成装置
EP1482373A1 (en) * 2003-05-30 2004-12-01 ASML Netherlands B.V. Lithographic apparatus and device manufacturing method
CN1637589A (zh) * 2003-12-26 2005-07-13 富士胶片株式会社 图像曝光方法和装置
JP2005309380A (ja) * 2004-03-26 2005-11-04 Fuji Photo Film Co Ltd 画像露光装置

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0716937U (ja) * 1993-08-27 1995-03-20 大日本スクリーン製造株式会社 画像出力装置
JP2002098677A (ja) * 2000-09-25 2002-04-05 Gl Sciences Inc 液体クロマトグラフィーの試料導入方法及び装置
JP2003098676A (ja) * 2001-09-25 2003-04-04 Pentax Corp 露光装置
JP2004274011A (ja) * 2003-01-16 2004-09-30 Nikon Corp 照明光源装置、照明装置、露光装置、及び露光方法
JP2004327660A (ja) * 2003-04-24 2004-11-18 Nikon Corp 走査型投影露光装置、露光方法及びデバイス製造方法

Also Published As

Publication number Publication date
KR100724637B1 (ko) 2007-06-04
TWI342985B (en) 2011-06-01
TW200636393A (en) 2006-10-16
CN1808282B (zh) 2011-11-16
US8035668B2 (en) 2011-10-11
CN1808282A (zh) 2006-07-26
US20060158504A1 (en) 2006-07-20
JP2006201476A (ja) 2006-08-03
KR20060084800A (ko) 2006-07-25

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