JP4574011B2 - 湾曲基板における真空蒸着法 - Google Patents

湾曲基板における真空蒸着法 Download PDF

Info

Publication number
JP4574011B2
JP4574011B2 JP2000569032A JP2000569032A JP4574011B2 JP 4574011 B2 JP4574011 B2 JP 4574011B2 JP 2000569032 A JP2000569032 A JP 2000569032A JP 2000569032 A JP2000569032 A JP 2000569032A JP 4574011 B2 JP4574011 B2 JP 4574011B2
Authority
JP
Japan
Prior art keywords
mask
curved substrate
sputtering
substrate according
diameter
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP2000569032A
Other languages
English (en)
Japanese (ja)
Other versions
JP2002524659A5 (https=
JP2002524659A (ja
Inventor
パスカル コンブル
ジェラール ケラー
フレデリック ムーオ
Original Assignee
エシロール アンテルナショナル コムパニー ジェネラル ドプテイク
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by エシロール アンテルナショナル コムパニー ジェネラル ドプテイク filed Critical エシロール アンテルナショナル コムパニー ジェネラル ドプテイク
Publication of JP2002524659A publication Critical patent/JP2002524659A/ja
Publication of JP2002524659A5 publication Critical patent/JP2002524659A5/ja
Application granted granted Critical
Publication of JP4574011B2 publication Critical patent/JP4574011B2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Images

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/04—Coating on selected surface areas, e.g. using masks
    • C23C14/042—Coating on selected surface areas, e.g. using masks using masks
    • C23C14/044—Coating on selected surface areas, e.g. using masks using masks using masks to redistribute rather than totally prevent coating, e.g. producing thickness gradient

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Laminated Bodies (AREA)
JP2000569032A 1998-09-04 1999-09-02 湾曲基板における真空蒸着法 Expired - Lifetime JP4574011B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
FR9811100A FR2783001B1 (fr) 1998-09-04 1998-09-04 Procede pour le traitement sous vide d'un quelconque substrat courbe, notamment un verre de lunettes, et cache propre a la mise en oeuvre d'un tel procede
FR98/11100 1998-09-04
PCT/FR1999/002092 WO2000014294A1 (fr) 1998-09-04 1999-09-02 Procede pour le depot sous vide d'un substrat courbe

Publications (3)

Publication Number Publication Date
JP2002524659A JP2002524659A (ja) 2002-08-06
JP2002524659A5 JP2002524659A5 (https=) 2010-04-30
JP4574011B2 true JP4574011B2 (ja) 2010-11-04

Family

ID=9530149

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2000569032A Expired - Lifetime JP4574011B2 (ja) 1998-09-04 1999-09-02 湾曲基板における真空蒸着法

Country Status (10)

Country Link
US (1) US7122223B1 (https=)
EP (1) EP1114200B1 (https=)
JP (1) JP4574011B2 (https=)
AT (1) ATE217362T1 (https=)
AU (1) AU761513B2 (https=)
CA (1) CA2341608C (https=)
DE (1) DE69901455T2 (https=)
ES (1) ES2177311T3 (https=)
FR (1) FR2783001B1 (https=)
WO (1) WO2000014294A1 (https=)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7014317B2 (en) 2001-11-02 2006-03-21 Essilor International (Compagnie Generale D'optique) Method for manufacturing multifocal lenses
DE10234855A1 (de) * 2002-07-31 2004-02-12 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Einrichtung zur Einstellung einer vorgegebenen Schichtdickenverteilung bei Vakuumbeschichtungsprozessen auf bewegten Substraten
US8347814B2 (en) * 2008-01-22 2013-01-08 Raytheon Canada Limited Method and apparatus for coating a curved surface
US20090258151A1 (en) * 2008-04-10 2009-10-15 Raytheon Company Method and Apparatus for Coating Curved Surfaces
US8293017B2 (en) * 2008-04-10 2012-10-23 Raytheon Canada Limited Method and apparatus for coating surfaces
US8398776B2 (en) * 2008-05-12 2013-03-19 Raytheon Canada Limited Method and apparatus for supporting workpieces in a coating apparatus
US8246748B2 (en) * 2008-07-09 2012-08-21 Raytheon Canada Limited Method and apparatus for coating surfaces
US20100047594A1 (en) * 2008-08-20 2010-02-25 Aharon Inspektor Equipment and method for physical vapor deposition
US20110020623A1 (en) * 2009-07-22 2011-01-27 Raytheon Company Method and Apparatus for Repairing an Optical Component Substrate Through Coating
CN104988464B (zh) * 2015-06-30 2017-10-27 中国工程物理研究院材料研究所 一种轴对称曲面件内表面均匀磁控溅射沉积方法及其装置

Family Cites Families (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR1380432A (fr) * 1961-12-14 1964-12-04 Siemens Ag Procédé pour déposer au moyen d'une vapeur une couche sur un support, en particulier un corps semi-conducteur en forme de disque
US3627569A (en) * 1968-12-27 1971-12-14 Bell Telephone Labor Inc Deposition of thin films with controlled thickness and planar area profile
FR2406217A1 (fr) * 1977-10-14 1979-05-11 Essilor Int Procede pour le marquage d'une lentille ophtalmique en matiere organique, et une telle lentille ainsi marquee
US4222345A (en) * 1978-11-30 1980-09-16 Optical Coating Laboratory, Inc. Vacuum coating apparatus with rotary motion assembly
JPH0239588B2 (ja) * 1984-04-16 1990-09-06 Ulvac Corp Puranetariishikiseimakusochiniokerumakuatsushuseisochi
JPS62239103A (ja) * 1986-04-11 1987-10-20 Alps Electric Co Ltd プラスチツクレンズ
US5225057A (en) * 1988-02-08 1993-07-06 Optical Coating Laboratory, Inc. Process for depositing optical films on both planar and non-planar substrates
DE3816578C1 (en) * 1988-05-14 1989-03-16 Agfa-Gevaert Ag, 5090 Leverkusen, De Process and device for the vapour deposition of graded-light filter layers on transparent plates
JPH0331473A (ja) * 1989-06-27 1991-02-12 Mitsubishi Electric Corp プラネタリー式成膜装置
US5389397A (en) 1989-08-29 1995-02-14 North American Philips Corporation Method for controlling the thickness distribution of a deposited layer
JP2825918B2 (ja) * 1990-03-13 1998-11-18 キヤノン株式会社 真空蒸着装置
EP0496036B1 (en) * 1991-01-25 1994-12-14 Sony Corporation A sputtering apparatus
JPH04371578A (ja) * 1991-06-19 1992-12-24 Sony Corp マグネトロンスパッタリング装置
JPH0643304A (ja) * 1992-07-24 1994-02-18 Nikon Corp 反射防止膜及び反射防止膜付き光学部品
JP3412849B2 (ja) * 1992-12-25 2003-06-03 キヤノン株式会社 薄膜蒸着装置
US5724189A (en) * 1995-12-15 1998-03-03 Mcdonnell Douglas Corporation Methods and apparatus for creating an aspheric optical element and the aspheric optical elements formed thereby
JPH10176267A (ja) * 1996-12-13 1998-06-30 Applied Materials Inc スパッタ装置
GB9701114D0 (en) * 1997-01-20 1997-03-12 Coherent Optics Europ Ltd Three-dimensional masking method for control of optical coating thickness

Also Published As

Publication number Publication date
FR2783001B1 (fr) 2000-11-24
AU5428099A (en) 2000-03-27
US7122223B1 (en) 2006-10-17
DE69901455D1 (de) 2002-06-13
WO2000014294A1 (fr) 2000-03-16
CA2341608C (fr) 2005-07-12
EP1114200B1 (fr) 2002-05-08
DE69901455T2 (de) 2002-12-12
ATE217362T1 (de) 2002-05-15
CA2341608A1 (fr) 2000-03-16
EP1114200A1 (fr) 2001-07-11
FR2783001A1 (fr) 2000-03-10
AU761513B2 (en) 2003-06-05
JP2002524659A (ja) 2002-08-06
ES2177311T3 (es) 2002-12-01

Similar Documents

Publication Publication Date Title
JP4574011B2 (ja) 湾曲基板における真空蒸着法
JP4268938B2 (ja) 層および層システム、および被覆された基板を生成する方法
US5597622A (en) Process for the production of a reflection-reducing coating on lenses
US5824197A (en) Shield for a physical vapor deposition chamber
US20040206620A1 (en) Segmented sputtering target and method/apparatus for using same
JPH048503B2 (https=)
TW201713796A (zh) 用於共同濺射多個靶材之方法和設備
JP5352010B2 (ja) 光学部材
KR20050033485A (ko) 변형된 표면 텍스쳐를 갖는 스퍼터 타겟
US20090258141A1 (en) Method and Apparatus for Coating Surfaces
JPH11310875A (ja) 基板の被覆のための装置
US6716322B1 (en) Method and apparatus for controlling film profiles on topographic features
JP7349798B2 (ja) 反射防止膜、光学素子及び反射防止膜の成膜方法
WO2003083162A1 (en) Vacuum deposition apparatus and method for depositing thin optical films on high curvature substrates
JP5825781B2 (ja) 反射防止膜形成方法及び反射防止膜形成装置
JP2005113267A (ja) 表面構造が改良されたスパッタターゲット及びその製造方法
JP2013256707A (ja) 成膜装置
JP2746292B2 (ja) スパッタリング装置
US6402901B1 (en) System and method for performing sputter deposition using a spherical geometry
JP2000319776A (ja) スパッタリング用ターゲットとこれを用いたカラーフィルタ用ブラックマトリクスの製造方法
JP3810034B2 (ja) 楕円形グラデーションｎｄフィルタの製造方法
JP2020122193A (ja) 成膜装置
JP2014002293A (ja) 金属酸化膜形成方法、金属酸化膜形成装置および反射防止膜付き光学素子の製造方法
JP5654255B2 (ja) 蒸着装置
GB2279763A (en) Decorative bevel-edged mirror

Legal Events

Date Code Title Description
A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20060811

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20090910

A601 Written request for extension of time

Free format text: JAPANESE INTERMEDIATE CODE: A601

Effective date: 20091209

A602 Written permission of extension of time

Free format text: JAPANESE INTERMEDIATE CODE: A602

Effective date: 20091216

A524 Written submission of copy of amendment under article 19 pct

Free format text: JAPANESE INTERMEDIATE CODE: A524

Effective date: 20100310

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20100729

A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20100818

R150 Certificate of patent or registration of utility model

Ref document number: 4574011

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R150

Free format text: JAPANESE INTERMEDIATE CODE: R150

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20130827

Year of fee payment: 3

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

S111 Request for change of ownership or part of ownership

Free format text: JAPANESE INTERMEDIATE CODE: R313113

S531 Written request for registration of change of domicile

Free format text: JAPANESE INTERMEDIATE CODE: R313531

S533 Written request for registration of change of name

Free format text: JAPANESE INTERMEDIATE CODE: R313533

R350 Written notification of registration of transfer

Free format text: JAPANESE INTERMEDIATE CODE: R350

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

EXPY Cancellation because of completion of term