JP2002524659A5 - - Google Patents
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- Publication number
- JP2002524659A5 JP2002524659A5 JP2000569032A JP2000569032A JP2002524659A5 JP 2002524659 A5 JP2002524659 A5 JP 2002524659A5 JP 2000569032 A JP2000569032 A JP 2000569032A JP 2000569032 A JP2000569032 A JP 2000569032A JP 2002524659 A5 JP2002524659 A5 JP 2002524659A5
- Authority
- JP
- Japan
- Prior art keywords
- curved substrate
- mask
- sputtering
- diameter
- law
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| FR9811100A FR2783001B1 (fr) | 1998-09-04 | 1998-09-04 | Procede pour le traitement sous vide d'un quelconque substrat courbe, notamment un verre de lunettes, et cache propre a la mise en oeuvre d'un tel procede |
| FR98/11100 | 1998-09-04 | ||
| PCT/FR1999/002092 WO2000014294A1 (fr) | 1998-09-04 | 1999-09-02 | Procede pour le depot sous vide d'un substrat courbe |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2002524659A JP2002524659A (ja) | 2002-08-06 |
| JP2002524659A5 true JP2002524659A5 (https=) | 2010-04-30 |
| JP4574011B2 JP4574011B2 (ja) | 2010-11-04 |
Family
ID=9530149
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2000569032A Expired - Lifetime JP4574011B2 (ja) | 1998-09-04 | 1999-09-02 | 湾曲基板における真空蒸着法 |
Country Status (10)
| Country | Link |
|---|---|
| US (1) | US7122223B1 (https=) |
| EP (1) | EP1114200B1 (https=) |
| JP (1) | JP4574011B2 (https=) |
| AT (1) | ATE217362T1 (https=) |
| AU (1) | AU761513B2 (https=) |
| CA (1) | CA2341608C (https=) |
| DE (1) | DE69901455T2 (https=) |
| ES (1) | ES2177311T3 (https=) |
| FR (1) | FR2783001B1 (https=) |
| WO (1) | WO2000014294A1 (https=) |
Families Citing this family (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7014317B2 (en) | 2001-11-02 | 2006-03-21 | Essilor International (Compagnie Generale D'optique) | Method for manufacturing multifocal lenses |
| DE10234855A1 (de) * | 2002-07-31 | 2004-02-12 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Einrichtung zur Einstellung einer vorgegebenen Schichtdickenverteilung bei Vakuumbeschichtungsprozessen auf bewegten Substraten |
| US8347814B2 (en) * | 2008-01-22 | 2013-01-08 | Raytheon Canada Limited | Method and apparatus for coating a curved surface |
| US20090258151A1 (en) * | 2008-04-10 | 2009-10-15 | Raytheon Company | Method and Apparatus for Coating Curved Surfaces |
| US8293017B2 (en) * | 2008-04-10 | 2012-10-23 | Raytheon Canada Limited | Method and apparatus for coating surfaces |
| US8398776B2 (en) * | 2008-05-12 | 2013-03-19 | Raytheon Canada Limited | Method and apparatus for supporting workpieces in a coating apparatus |
| US8246748B2 (en) * | 2008-07-09 | 2012-08-21 | Raytheon Canada Limited | Method and apparatus for coating surfaces |
| US20100047594A1 (en) * | 2008-08-20 | 2010-02-25 | Aharon Inspektor | Equipment and method for physical vapor deposition |
| US20110020623A1 (en) * | 2009-07-22 | 2011-01-27 | Raytheon Company | Method and Apparatus for Repairing an Optical Component Substrate Through Coating |
| CN104988464B (zh) * | 2015-06-30 | 2017-10-27 | 中国工程物理研究院材料研究所 | 一种轴对称曲面件内表面均匀磁控溅射沉积方法及其装置 |
Family Cites Families (18)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR1380432A (fr) * | 1961-12-14 | 1964-12-04 | Siemens Ag | Procédé pour déposer au moyen d'une vapeur une couche sur un support, en particulier un corps semi-conducteur en forme de disque |
| US3627569A (en) * | 1968-12-27 | 1971-12-14 | Bell Telephone Labor Inc | Deposition of thin films with controlled thickness and planar area profile |
| FR2406217A1 (fr) * | 1977-10-14 | 1979-05-11 | Essilor Int | Procede pour le marquage d'une lentille ophtalmique en matiere organique, et une telle lentille ainsi marquee |
| US4222345A (en) * | 1978-11-30 | 1980-09-16 | Optical Coating Laboratory, Inc. | Vacuum coating apparatus with rotary motion assembly |
| JPH0239588B2 (ja) * | 1984-04-16 | 1990-09-06 | Ulvac Corp | Puranetariishikiseimakusochiniokerumakuatsushuseisochi |
| JPS62239103A (ja) * | 1986-04-11 | 1987-10-20 | Alps Electric Co Ltd | プラスチツクレンズ |
| US5225057A (en) * | 1988-02-08 | 1993-07-06 | Optical Coating Laboratory, Inc. | Process for depositing optical films on both planar and non-planar substrates |
| DE3816578C1 (en) * | 1988-05-14 | 1989-03-16 | Agfa-Gevaert Ag, 5090 Leverkusen, De | Process and device for the vapour deposition of graded-light filter layers on transparent plates |
| JPH0331473A (ja) * | 1989-06-27 | 1991-02-12 | Mitsubishi Electric Corp | プラネタリー式成膜装置 |
| US5389397A (en) | 1989-08-29 | 1995-02-14 | North American Philips Corporation | Method for controlling the thickness distribution of a deposited layer |
| JP2825918B2 (ja) * | 1990-03-13 | 1998-11-18 | キヤノン株式会社 | 真空蒸着装置 |
| EP0496036B1 (en) * | 1991-01-25 | 1994-12-14 | Sony Corporation | A sputtering apparatus |
| JPH04371578A (ja) * | 1991-06-19 | 1992-12-24 | Sony Corp | マグネトロンスパッタリング装置 |
| JPH0643304A (ja) * | 1992-07-24 | 1994-02-18 | Nikon Corp | 反射防止膜及び反射防止膜付き光学部品 |
| JP3412849B2 (ja) * | 1992-12-25 | 2003-06-03 | キヤノン株式会社 | 薄膜蒸着装置 |
| US5724189A (en) * | 1995-12-15 | 1998-03-03 | Mcdonnell Douglas Corporation | Methods and apparatus for creating an aspheric optical element and the aspheric optical elements formed thereby |
| JPH10176267A (ja) * | 1996-12-13 | 1998-06-30 | Applied Materials Inc | スパッタ装置 |
| GB9701114D0 (en) * | 1997-01-20 | 1997-03-12 | Coherent Optics Europ Ltd | Three-dimensional masking method for control of optical coating thickness |
-
1998
- 1998-09-04 FR FR9811100A patent/FR2783001B1/fr not_active Expired - Fee Related
-
1999
- 1999-09-02 ES ES99940277T patent/ES2177311T3/es not_active Expired - Lifetime
- 1999-09-02 US US09/786,412 patent/US7122223B1/en not_active Expired - Lifetime
- 1999-09-02 CA CA002341608A patent/CA2341608C/fr not_active Expired - Fee Related
- 1999-09-02 DE DE69901455T patent/DE69901455T2/de not_active Expired - Lifetime
- 1999-09-02 JP JP2000569032A patent/JP4574011B2/ja not_active Expired - Lifetime
- 1999-09-02 WO PCT/FR1999/002092 patent/WO2000014294A1/fr not_active Ceased
- 1999-09-02 AU AU54280/99A patent/AU761513B2/en not_active Ceased
- 1999-09-02 EP EP99940277A patent/EP1114200B1/fr not_active Expired - Lifetime
- 1999-09-02 AT AT99940277T patent/ATE217362T1/de not_active IP Right Cessation
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