AU761513B2 - Method for vacuum deposit on a curved substrate - Google Patents
Method for vacuum deposit on a curved substrate Download PDFInfo
- Publication number
- AU761513B2 AU761513B2 AU54280/99A AU5428099A AU761513B2 AU 761513 B2 AU761513 B2 AU 761513B2 AU 54280/99 A AU54280/99 A AU 54280/99A AU 5428099 A AU5428099 A AU 5428099A AU 761513 B2 AU761513 B2 AU 761513B2
- Authority
- AU
- Australia
- Prior art keywords
- mask
- curved substrate
- annular part
- machine according
- diameter
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Ceased
Links
- 239000000758 substrate Substances 0.000 title claims abstract description 90
- 238000000034 method Methods 0.000 title claims abstract description 19
- 239000000463 material Substances 0.000 claims abstract description 38
- 238000009489 vacuum treatment Methods 0.000 claims description 10
- 235000009917 Crataegus X brevipes Nutrition 0.000 claims 1
- 235000013204 Crataegus X haemacarpa Nutrition 0.000 claims 1
- 235000009685 Crataegus X maligna Nutrition 0.000 claims 1
- 235000009444 Crataegus X rubrocarnea Nutrition 0.000 claims 1
- 235000009486 Crataegus bullatus Nutrition 0.000 claims 1
- 235000017181 Crataegus chrysocarpa Nutrition 0.000 claims 1
- 235000009682 Crataegus limnophila Nutrition 0.000 claims 1
- 235000004423 Crataegus monogyna Nutrition 0.000 claims 1
- 240000000171 Crataegus monogyna Species 0.000 claims 1
- 235000002313 Crataegus paludosa Nutrition 0.000 claims 1
- 235000009840 Crataegus x incaedua Nutrition 0.000 claims 1
- 239000011248 coating agent Substances 0.000 description 6
- 238000000576 coating method Methods 0.000 description 6
- 239000007789 gas Substances 0.000 description 6
- 239000002245 particle Substances 0.000 description 6
- 238000000151 deposition Methods 0.000 description 5
- 230000008021 deposition Effects 0.000 description 5
- 230000004907 flux Effects 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000011261 inert gas Substances 0.000 description 2
- 229910052786 argon Inorganic materials 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 230000000295 complement effect Effects 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 230000002349 favourable effect Effects 0.000 description 1
- 238000010849 ion bombardment Methods 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 238000002955 isolation Methods 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/04—Coating on selected surface areas, e.g. using masks
- C23C14/042—Coating on selected surface areas, e.g. using masks using masks
- C23C14/044—Coating on selected surface areas, e.g. using masks using masks using masks to redistribute rather than totally prevent coating, e.g. producing thickness gradient
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
- Laminated Bodies (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| FR9811100A FR2783001B1 (fr) | 1998-09-04 | 1998-09-04 | Procede pour le traitement sous vide d'un quelconque substrat courbe, notamment un verre de lunettes, et cache propre a la mise en oeuvre d'un tel procede |
| FR98/11100 | 1998-09-04 | ||
| PCT/FR1999/002092 WO2000014294A1 (fr) | 1998-09-04 | 1999-09-02 | Procede pour le depot sous vide d'un substrat courbe |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| AU5428099A AU5428099A (en) | 2000-03-27 |
| AU761513B2 true AU761513B2 (en) | 2003-06-05 |
Family
ID=9530149
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| AU54280/99A Ceased AU761513B2 (en) | 1998-09-04 | 1999-09-02 | Method for vacuum deposit on a curved substrate |
Country Status (10)
| Country | Link |
|---|---|
| US (1) | US7122223B1 (https=) |
| EP (1) | EP1114200B1 (https=) |
| JP (1) | JP4574011B2 (https=) |
| AT (1) | ATE217362T1 (https=) |
| AU (1) | AU761513B2 (https=) |
| CA (1) | CA2341608C (https=) |
| DE (1) | DE69901455T2 (https=) |
| ES (1) | ES2177311T3 (https=) |
| FR (1) | FR2783001B1 (https=) |
| WO (1) | WO2000014294A1 (https=) |
Families Citing this family (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7014317B2 (en) | 2001-11-02 | 2006-03-21 | Essilor International (Compagnie Generale D'optique) | Method for manufacturing multifocal lenses |
| DE10234855A1 (de) * | 2002-07-31 | 2004-02-12 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Einrichtung zur Einstellung einer vorgegebenen Schichtdickenverteilung bei Vakuumbeschichtungsprozessen auf bewegten Substraten |
| US8347814B2 (en) * | 2008-01-22 | 2013-01-08 | Raytheon Canada Limited | Method and apparatus for coating a curved surface |
| US20090258151A1 (en) * | 2008-04-10 | 2009-10-15 | Raytheon Company | Method and Apparatus for Coating Curved Surfaces |
| US8293017B2 (en) * | 2008-04-10 | 2012-10-23 | Raytheon Canada Limited | Method and apparatus for coating surfaces |
| US8398776B2 (en) * | 2008-05-12 | 2013-03-19 | Raytheon Canada Limited | Method and apparatus for supporting workpieces in a coating apparatus |
| US8246748B2 (en) * | 2008-07-09 | 2012-08-21 | Raytheon Canada Limited | Method and apparatus for coating surfaces |
| US20100047594A1 (en) * | 2008-08-20 | 2010-02-25 | Aharon Inspektor | Equipment and method for physical vapor deposition |
| US20110020623A1 (en) * | 2009-07-22 | 2011-01-27 | Raytheon Company | Method and Apparatus for Repairing an Optical Component Substrate Through Coating |
| CN104988464B (zh) * | 2015-06-30 | 2017-10-27 | 中国工程物理研究院材料研究所 | 一种轴对称曲面件内表面均匀磁控溅射沉积方法及其装置 |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR1380432A (fr) * | 1961-12-14 | 1964-12-04 | Siemens Ag | Procédé pour déposer au moyen d'une vapeur une couche sur un support, en particulier un corps semi-conducteur en forme de disque |
| US5225057A (en) * | 1988-02-08 | 1993-07-06 | Optical Coating Laboratory, Inc. | Process for depositing optical films on both planar and non-planar substrates |
Family Cites Families (16)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3627569A (en) * | 1968-12-27 | 1971-12-14 | Bell Telephone Labor Inc | Deposition of thin films with controlled thickness and planar area profile |
| FR2406217A1 (fr) * | 1977-10-14 | 1979-05-11 | Essilor Int | Procede pour le marquage d'une lentille ophtalmique en matiere organique, et une telle lentille ainsi marquee |
| US4222345A (en) * | 1978-11-30 | 1980-09-16 | Optical Coating Laboratory, Inc. | Vacuum coating apparatus with rotary motion assembly |
| JPH0239588B2 (ja) * | 1984-04-16 | 1990-09-06 | Ulvac Corp | Puranetariishikiseimakusochiniokerumakuatsushuseisochi |
| JPS62239103A (ja) * | 1986-04-11 | 1987-10-20 | Alps Electric Co Ltd | プラスチツクレンズ |
| DE3816578C1 (en) * | 1988-05-14 | 1989-03-16 | Agfa-Gevaert Ag, 5090 Leverkusen, De | Process and device for the vapour deposition of graded-light filter layers on transparent plates |
| JPH0331473A (ja) * | 1989-06-27 | 1991-02-12 | Mitsubishi Electric Corp | プラネタリー式成膜装置 |
| US5389397A (en) | 1989-08-29 | 1995-02-14 | North American Philips Corporation | Method for controlling the thickness distribution of a deposited layer |
| JP2825918B2 (ja) * | 1990-03-13 | 1998-11-18 | キヤノン株式会社 | 真空蒸着装置 |
| EP0496036B1 (en) * | 1991-01-25 | 1994-12-14 | Sony Corporation | A sputtering apparatus |
| JPH04371578A (ja) * | 1991-06-19 | 1992-12-24 | Sony Corp | マグネトロンスパッタリング装置 |
| JPH0643304A (ja) * | 1992-07-24 | 1994-02-18 | Nikon Corp | 反射防止膜及び反射防止膜付き光学部品 |
| JP3412849B2 (ja) * | 1992-12-25 | 2003-06-03 | キヤノン株式会社 | 薄膜蒸着装置 |
| US5724189A (en) * | 1995-12-15 | 1998-03-03 | Mcdonnell Douglas Corporation | Methods and apparatus for creating an aspheric optical element and the aspheric optical elements formed thereby |
| JPH10176267A (ja) * | 1996-12-13 | 1998-06-30 | Applied Materials Inc | スパッタ装置 |
| GB9701114D0 (en) * | 1997-01-20 | 1997-03-12 | Coherent Optics Europ Ltd | Three-dimensional masking method for control of optical coating thickness |
-
1998
- 1998-09-04 FR FR9811100A patent/FR2783001B1/fr not_active Expired - Fee Related
-
1999
- 1999-09-02 ES ES99940277T patent/ES2177311T3/es not_active Expired - Lifetime
- 1999-09-02 US US09/786,412 patent/US7122223B1/en not_active Expired - Lifetime
- 1999-09-02 CA CA002341608A patent/CA2341608C/fr not_active Expired - Fee Related
- 1999-09-02 DE DE69901455T patent/DE69901455T2/de not_active Expired - Lifetime
- 1999-09-02 JP JP2000569032A patent/JP4574011B2/ja not_active Expired - Lifetime
- 1999-09-02 WO PCT/FR1999/002092 patent/WO2000014294A1/fr not_active Ceased
- 1999-09-02 AU AU54280/99A patent/AU761513B2/en not_active Ceased
- 1999-09-02 EP EP99940277A patent/EP1114200B1/fr not_active Expired - Lifetime
- 1999-09-02 AT AT99940277T patent/ATE217362T1/de not_active IP Right Cessation
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR1380432A (fr) * | 1961-12-14 | 1964-12-04 | Siemens Ag | Procédé pour déposer au moyen d'une vapeur une couche sur un support, en particulier un corps semi-conducteur en forme de disque |
| US5225057A (en) * | 1988-02-08 | 1993-07-06 | Optical Coating Laboratory, Inc. | Process for depositing optical films on both planar and non-planar substrates |
Also Published As
| Publication number | Publication date |
|---|---|
| FR2783001B1 (fr) | 2000-11-24 |
| AU5428099A (en) | 2000-03-27 |
| US7122223B1 (en) | 2006-10-17 |
| DE69901455D1 (de) | 2002-06-13 |
| JP4574011B2 (ja) | 2010-11-04 |
| WO2000014294A1 (fr) | 2000-03-16 |
| CA2341608C (fr) | 2005-07-12 |
| EP1114200B1 (fr) | 2002-05-08 |
| DE69901455T2 (de) | 2002-12-12 |
| ATE217362T1 (de) | 2002-05-15 |
| CA2341608A1 (fr) | 2000-03-16 |
| EP1114200A1 (fr) | 2001-07-11 |
| FR2783001A1 (fr) | 2000-03-10 |
| JP2002524659A (ja) | 2002-08-06 |
| ES2177311T3 (es) | 2002-12-01 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| FGA | Letters patent sealed or granted (standard patent) |