JP4565350B2 - 半導体レーザ装置 - Google Patents
半導体レーザ装置 Download PDFInfo
- Publication number
- JP4565350B2 JP4565350B2 JP2007074074A JP2007074074A JP4565350B2 JP 4565350 B2 JP4565350 B2 JP 4565350B2 JP 2007074074 A JP2007074074 A JP 2007074074A JP 2007074074 A JP2007074074 A JP 2007074074A JP 4565350 B2 JP4565350 B2 JP 4565350B2
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- JP
- Japan
- Prior art keywords
- semiconductor laser
- layer
- active layer
- solder
- laser device
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
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-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/30—Structure or shape of the active region; Materials used for the active region
- H01S5/34—Structure or shape of the active region; Materials used for the active region comprising quantum well or superlattice structures, e.g. single quantum well [SQW] lasers, multiple quantum well [MQW] lasers or graded index separate confinement heterostructure [GRINSCH] lasers
- H01S5/343—Structure or shape of the active region; Materials used for the active region comprising quantum well or superlattice structures, e.g. single quantum well [SQW] lasers, multiple quantum well [MQW] lasers or graded index separate confinement heterostructure [GRINSCH] lasers in AIIIBV compounds, e.g. AlGaAs-laser, InP-based laser
- H01S5/34326—Structure or shape of the active region; Materials used for the active region comprising quantum well or superlattice structures, e.g. single quantum well [SQW] lasers, multiple quantum well [MQW] lasers or graded index separate confinement heterostructure [GRINSCH] lasers in AIIIBV compounds, e.g. AlGaAs-laser, InP-based laser with a well layer based on InGa(Al)P, e.g. red laser
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y20/00—Nanooptics, e.g. quantum optics or photonic crystals
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/02—Structural details or components not essential to laser action
- H01S5/022—Mountings; Housings
- H01S5/0235—Method for mounting laser chips
- H01S5/02355—Fixing laser chips on mounts
- H01S5/0237—Fixing laser chips on mounts by soldering
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/02—Structural details or components not essential to laser action
- H01S5/024—Arrangements for thermal management
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/20—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers
- H01S5/2004—Confining in the direction perpendicular to the layer structure
- H01S5/2009—Confining in the direction perpendicular to the layer structure by using electron barrier layers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/20—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers
- H01S5/22—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers having a ridge or stripe structure
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/30—Structure or shape of the active region; Materials used for the active region
- H01S5/32—Structure or shape of the active region; Materials used for the active region comprising PN junctions, e.g. hetero- or double- heterostructures
- H01S5/3201—Structure or shape of the active region; Materials used for the active region comprising PN junctions, e.g. hetero- or double- heterostructures incorporating bulkstrain effects, e.g. strain compensation, strain related to polarisation
Landscapes
- Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Nanotechnology (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Life Sciences & Earth Sciences (AREA)
- Biophysics (AREA)
- Crystallography & Structural Chemistry (AREA)
- Semiconductor Lasers (AREA)
Description
歪量=(W3−W4)/W3…(2)
Claims (4)
- GaAs基板上に、少なくとも下部クラッド層、活性層および上部クラッド層をこの順に含むAlGaInP系積層構造を有する半導体レーザ素子と、
実装基板と、
前記半導体レーザ素子と前記実装基板との間に配置され、かつ前記半導体レーザ素子を前記実装基板に直接固定する半田と
を備え、
前記活性層は、GaInPを含み、
前記活性層のGa組成比は、GaInPがGaAsと格子整合するときのGa組成比よりも小さくなっており、
前記AlGaInP系積層構造は、前記活性層のGa組成比が、GaInPがGaAsと格子整合するときのGa組成比となっており、かつ前記AlGaInP系積層構造が前記実装基板から応力を受けていないときの発光波長と等しい発光波長となるような圧縮応力を、前記半田を介して前記実装基板から受けている
半導体レーザ装置。 - 前記半田の融点は200度を超える
請求項1に記載の半導体レーザ装置。 - 前記半田は、AuSn、SnAg、SnAgCu、AuGeまたはAuSbを含む
請求項2に記載の半導体レーザ装置。 - 前記活性層と、前記下部クラッド層および前記上部クラッド層のいずれか一方との間に、前記下部クラッド層および前記上部クラッド層のバンドギャップよりも大きなバンドギャップを有する電子障壁層を備える
請求項1に記載の半導体レーザ装置。
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2007074074A JP4565350B2 (ja) | 2007-03-22 | 2007-03-22 | 半導体レーザ装置 |
US12/049,884 US7693199B2 (en) | 2007-03-22 | 2008-03-17 | Laser diode |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2007074074A JP4565350B2 (ja) | 2007-03-22 | 2007-03-22 | 半導体レーザ装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2008235630A JP2008235630A (ja) | 2008-10-02 |
JP4565350B2 true JP4565350B2 (ja) | 2010-10-20 |
Family
ID=39774640
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2007074074A Expired - Fee Related JP4565350B2 (ja) | 2007-03-22 | 2007-03-22 | 半導体レーザ装置 |
Country Status (2)
Country | Link |
---|---|
US (1) | US7693199B2 (ja) |
JP (1) | JP4565350B2 (ja) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5519355B2 (ja) * | 2010-03-19 | 2014-06-11 | スタンレー電気株式会社 | 半導体発光素子及びその製造方法 |
CN106134018A (zh) * | 2014-03-31 | 2016-11-16 | Ipg光子公司 | 高功率激光二极管封装方法和激光二极管模块 |
US11228160B2 (en) * | 2018-11-15 | 2022-01-18 | Sharp Kabushiki Kaisha | AlGaInPAs-based semiconductor laser device and method for producing same |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2002261376A (ja) * | 2001-03-02 | 2002-09-13 | Sharp Corp | 半導体発光装置 |
JP2006049420A (ja) * | 2004-08-02 | 2006-02-16 | Sony Corp | 半導体レーザおよびこれを用いた光装置 |
JP2006286868A (ja) * | 2005-03-31 | 2006-10-19 | Fuji Photo Film Co Ltd | 光通信伝送システム及び半導体レーザ装置 |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5917292A (ja) * | 1982-07-20 | 1984-01-28 | Sharp Corp | 半導体レ−ザ素子 |
US5276698A (en) * | 1990-09-20 | 1994-01-04 | Sumitomo Electric Ind., Ltd. | Semiconductor laser having an optical waveguide layer including an AlGaInP active layer |
JP3056813B2 (ja) * | 1991-03-25 | 2000-06-26 | 株式会社半導体エネルギー研究所 | 薄膜トランジスタ及びその製造方法 |
JPH0521894A (ja) | 1991-07-15 | 1993-01-29 | Sumitomo Electric Ind Ltd | 半導体レーザ |
JP2007235107A (ja) * | 2006-02-02 | 2007-09-13 | Mitsubishi Electric Corp | 半導体発光素子 |
-
2007
- 2007-03-22 JP JP2007074074A patent/JP4565350B2/ja not_active Expired - Fee Related
-
2008
- 2008-03-17 US US12/049,884 patent/US7693199B2/en not_active Expired - Fee Related
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2002261376A (ja) * | 2001-03-02 | 2002-09-13 | Sharp Corp | 半導体発光装置 |
JP2006049420A (ja) * | 2004-08-02 | 2006-02-16 | Sony Corp | 半導体レーザおよびこれを用いた光装置 |
JP2006286868A (ja) * | 2005-03-31 | 2006-10-19 | Fuji Photo Film Co Ltd | 光通信伝送システム及び半導体レーザ装置 |
Also Published As
Publication number | Publication date |
---|---|
US7693199B2 (en) | 2010-04-06 |
US20080232415A1 (en) | 2008-09-25 |
JP2008235630A (ja) | 2008-10-02 |
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