JP4563811B2 - 薄膜構造の特性評価を含む、偏光解析、反射光測定および散乱光測定のための干渉計法および走査式干渉計 - Google Patents

薄膜構造の特性評価を含む、偏光解析、反射光測定および散乱光測定のための干渉計法および走査式干渉計 Download PDF

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JP4563811B2
JP4563811B2 JP2004534816A JP2004534816A JP4563811B2 JP 4563811 B2 JP4563811 B2 JP 4563811B2 JP 2004534816 A JP2004534816 A JP 2004534816A JP 2004534816 A JP2004534816 A JP 2004534816A JP 4563811 B2 JP4563811 B2 JP 4563811B2
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light
angle
interferometer
test object
test
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JP2005538359A (ja
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グロート、ピーター ジェイ． デ
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Zygo Corp
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    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
    • G01B11/06—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/0209—Low-coherence interferometers
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
    • G01B11/06—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
    • G01B11/0616—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating
    • G01B11/0675—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating using interferometry
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/02055—Reduction or prevention of errors; Testing; Calibration
    • G01B9/02056—Passive reduction of errors
    • G01B9/02057—Passive reduction of errors by using common path configuration, i.e. reference and object path almost entirely overlapping
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B2290/00—Aspects of interferometers not specifically covered by any group under G01B9/02
    • G01B2290/50—Pupil plane manipulation, e.g. filtering light of certain reflection angles
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B2290/00—Aspects of interferometers not specifically covered by any group under G01B9/02
    • G01B2290/70—Using polarization in the interferometer

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Instruments For Measurement Of Length By Optical Means (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)
JP2004534816A 2002-09-09 2003-09-09 薄膜構造の特性評価を含む、偏光解析、反射光測定および散乱光測定のための干渉計法および走査式干渉計 Expired - Lifetime JP4563811B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US40914702P 2002-09-09 2002-09-09
PCT/US2003/028484 WO2004023071A1 (en) 2002-09-09 2003-09-09 Interferometry method for ellipsometry, reflectometry, and scatterometry measurements, including characterization of thin film structures

Related Child Applications (1)

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JP2010061341A Division JP5352506B2 (ja) 2002-09-09 2010-03-17 薄膜構造の特性評価を含む、偏光解析、反射光測定および散乱光測定のための干渉計法

Publications (2)

Publication Number Publication Date
JP2005538359A JP2005538359A (ja) 2005-12-15
JP4563811B2 true JP4563811B2 (ja) 2010-10-13

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JP2004534816A Expired - Lifetime JP4563811B2 (ja) 2002-09-09 2003-09-09 薄膜構造の特性評価を含む、偏光解析、反射光測定および散乱光測定のための干渉計法および走査式干渉計
JP2010061341A Expired - Lifetime JP5352506B2 (ja) 2002-09-09 2010-03-17 薄膜構造の特性評価を含む、偏光解析、反射光測定および散乱光測定のための干渉計法

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JP2010061341A Expired - Lifetime JP5352506B2 (ja) 2002-09-09 2010-03-17 薄膜構造の特性評価を含む、偏光解析、反射光測定および散乱光測定のための干渉計法

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JP (2) JP4563811B2 (ko)
KR (2) KR20050057279A (ko)
AU (1) AU2003266136A1 (ko)
DE (1) DE10393244B4 (ko)
WO (1) WO2004023071A1 (ko)

Families Citing this family (26)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7139081B2 (en) 2002-09-09 2006-11-21 Zygo Corporation Interferometry method for ellipsometry, reflectometry, and scatterometry measurements, including characterization of thin film structures
US7271918B2 (en) 2003-03-06 2007-09-18 Zygo Corporation Profiling complex surface structures using scanning interferometry
EP1664932B1 (en) 2003-09-15 2015-01-28 Zygo Corporation Interferometric analysis of surfaces
TWI335417B (en) 2003-10-27 2011-01-01 Zygo Corp Method and apparatus for thin film measurement
DE102004013521B4 (de) * 2004-03-19 2006-04-27 Bundesrepublik Deutschland, vertr. d. d. Bundesministerium für Wirtschaft und Arbeit, dieses vertr. d. d. Präsidenten der Physikalisch-Technischen Bundesanstalt Vorrichtung zum Messen eines Profils und kleinster Verschiebungen
JP4194971B2 (ja) * 2004-04-16 2008-12-10 日本電信電話株式会社 屈折率測定方法及びその装置並びに屈折率測定・硬化装置
GB0415766D0 (en) 2004-07-14 2004-08-18 Taylor Hobson Ltd Apparatus for and a method of determining a characteristic of a layer or layers
US7453577B2 (en) 2004-12-14 2008-11-18 Asml Netherlands B.V. Apparatus and method for inspecting a patterned part of a sample
US7428057B2 (en) * 2005-01-20 2008-09-23 Zygo Corporation Interferometer for determining characteristics of an object surface, including processing and calibration
GB0523722D0 (en) 2005-11-22 2005-12-28 Taylor Hobson Ltd Trench measurement
WO2007126475A2 (en) 2006-04-26 2007-11-08 Davidson Instruments, Inc. Fiber optic mems seismic sensor with mass supported by hinged beams
DE102006057727A1 (de) * 2006-12-07 2008-06-12 Brückner Maschinenbau GmbH Verfahren zur Messung der Doppelbrechung und/oder der Retardation, insbesondere an zumindest teiltransparenten Folien sowie zugehörige Vorrichtung
US7889355B2 (en) 2007-01-31 2011-02-15 Zygo Corporation Interferometry for lateral metrology
WO2008132976A1 (ja) * 2007-04-12 2008-11-06 Nikon Corporation 顕微鏡装置
US8072611B2 (en) 2007-10-12 2011-12-06 Zygo Corporation Interferometric analysis of under-resolved features
US7978337B2 (en) * 2007-11-13 2011-07-12 Zygo Corporation Interferometer utilizing polarization scanning
NL1036123A1 (nl) 2007-11-13 2009-05-14 Asml Netherlands Bv Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method.
US8004688B2 (en) 2008-11-26 2011-08-23 Zygo Corporation Scan error correction in low coherence scanning interferometry
KR102068950B1 (ko) * 2011-02-10 2020-01-21 케이엘에이 코포레이션 오버레이 계측의 콘트라스트 증강을 위한 구조화 조명
JP5648961B2 (ja) * 2011-02-28 2015-01-07 国立大学法人 香川大学 分光特性測定装置及びその校正方法
WO2013019776A2 (en) * 2011-08-01 2013-02-07 University Of Florida Research Foundation, Inc. Simultaneous refractive index and thickness measurments with a monochromatic low-coherence interferometer
DE102011085599B3 (de) 2011-11-02 2012-12-13 Polytec Gmbh Vorrichtung und Verfahren zur interferometrischen Vermessung eines Objekts
KR102231730B1 (ko) * 2012-06-26 2021-03-24 케이엘에이 코포레이션 각도 분해형 반사율 측정에서의 스캐닝 및 광학 계측으로부터 회절의 알고리즘적 제거
JP2017090395A (ja) 2015-11-17 2017-05-25 株式会社ミツトヨ 干渉対物レンズ及び参照面ユニットセット
JP6906837B2 (ja) * 2017-02-13 2021-07-21 株式会社ディスコ レーザー加工装置
CN107036539B (zh) * 2017-06-14 2018-07-13 深圳中科飞测科技有限公司 膜厚测量系统及方法

Family Cites Families (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4576479A (en) * 1982-05-17 1986-03-18 Downs Michael J Apparatus and method for investigation of a surface
JPS63292043A (ja) * 1987-05-26 1988-11-29 D S Sukiyanaa:Kk 膜厚・組成同時分析装置
JPS6475902A (en) * 1987-09-18 1989-03-22 Ricoh Kk Method for measuring refractive index and film thickness
US4899055A (en) * 1988-05-12 1990-02-06 Tencor Instruments Thin film thickness measuring method
JPH02190704A (ja) * 1989-01-20 1990-07-26 Ricoh Co Ltd 屈折率・膜厚測定に於ける入射角決定方法
US4999014A (en) * 1989-05-04 1991-03-12 Therma-Wave, Inc. Method and apparatus for measuring thickness of thin films
US5073018A (en) * 1989-10-04 1991-12-17 The Board Of Trustees Of The Leland Stanford Junior University Correlation microscope
US5129724A (en) * 1991-01-29 1992-07-14 Wyko Corporation Apparatus and method for simultaneous measurement of film thickness and surface height variation for film-substrate sample
US5181080A (en) * 1991-12-23 1993-01-19 Therma-Wave, Inc. Method and apparatus for evaluating the thickness of thin films
US5386119A (en) * 1993-03-25 1995-01-31 Hughes Aircraft Company Apparatus and method for thick wafer measurement
JPH07208937A (ja) * 1994-01-25 1995-08-11 Fujitsu Ltd 膜厚及び誘電率の測定装置及びその測定方法
JP3602925B2 (ja) * 1995-12-08 2004-12-15 独立行政法人科学技術振興機構 光干渉法による測定対象物の屈折率と厚さの同時測定装置
US5602643A (en) * 1996-02-07 1997-02-11 Wyko Corporation Method and apparatus for correcting surface profiles determined by phase-shifting interferometry according to optical parameters of test surface
JP3459327B2 (ja) * 1996-06-17 2003-10-20 理化学研究所 積層構造体の層厚および屈折率の測定方法およびその測定装置
JP3582311B2 (ja) * 1996-08-04 2004-10-27 松下電器産業株式会社 媒質の測定方法および測定装置
JP3569726B2 (ja) * 1998-12-15 2004-09-29 独立行政法人理化学研究所 試料の幾何学的厚さおよび屈折率測定装置およびその測定方法
KR100290086B1 (ko) * 1999-03-23 2001-05-15 윤덕용 백색광주사간섭법을 이용한 투명한 박막층의 3차원 두께 형상 측정 및 굴절률 측정 방법 및 그 기록매체
JP3642996B2 (ja) * 1999-11-18 2005-04-27 独立行政法人科学技術振興機構 光干渉法による測定対象物の屈折率と厚さの同時測定方法及びそのための装置
JP4673955B2 (ja) * 2000-03-24 2011-04-20 オリンパス株式会社 光学装置

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Publication number Publication date
DE10393244T5 (de) 2005-09-01
KR20050057279A (ko) 2005-06-16
KR20100122123A (ko) 2010-11-19
JP5352506B2 (ja) 2013-11-27
KR101223195B1 (ko) 2013-01-21
JP2005538359A (ja) 2005-12-15
DE10393244B4 (de) 2017-09-21
JP2010197398A (ja) 2010-09-09
WO2004023071A1 (en) 2004-03-18
AU2003266136A1 (en) 2004-03-29

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