AU2003266136A1 - Interferometry method for ellipsometry, reflectometry, and scatterometry measurements, including characterization of thin film structures - Google Patents

Interferometry method for ellipsometry, reflectometry, and scatterometry measurements, including characterization of thin film structures

Info

Publication number
AU2003266136A1
AU2003266136A1 AU2003266136A AU2003266136A AU2003266136A1 AU 2003266136 A1 AU2003266136 A1 AU 2003266136A1 AU 2003266136 A AU2003266136 A AU 2003266136A AU 2003266136 A AU2003266136 A AU 2003266136A AU 2003266136 A1 AU2003266136 A1 AU 2003266136A1
Authority
AU
Australia
Prior art keywords
reflectometry
ellipsometry
thin film
film structures
interferometry method
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2003266136A
Other languages
English (en)
Inventor
Peter J. De Groot
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Zygo Corp
Original Assignee
Zygo Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Zygo Corp filed Critical Zygo Corp
Publication of AU2003266136A1 publication Critical patent/AU2003266136A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
    • G01B11/06—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/0209—Low-coherence interferometers
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
    • G01B11/06—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
    • G01B11/0616—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating
    • G01B11/0675—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating using interferometry
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/02055—Reduction or prevention of errors; Testing; Calibration
    • G01B9/02056—Passive reduction of errors
    • G01B9/02057—Passive reduction of errors by using common path configuration, i.e. reference and object path almost entirely overlapping
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B2290/00—Aspects of interferometers not specifically covered by any group under G01B9/02
    • G01B2290/50—Pupil plane manipulation, e.g. filtering light of certain reflection angles
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B2290/00—Aspects of interferometers not specifically covered by any group under G01B9/02
    • G01B2290/70—Using polarization in the interferometer

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Instruments For Measurement Of Length By Optical Means (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
AU2003266136A 2002-09-09 2003-09-09 Interferometry method for ellipsometry, reflectometry, and scatterometry measurements, including characterization of thin film structures Abandoned AU2003266136A1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US40914702P 2002-09-09 2002-09-09
US60/409,147 2002-09-09
PCT/US2003/028484 WO2004023071A1 (en) 2002-09-09 2003-09-09 Interferometry method for ellipsometry, reflectometry, and scatterometry measurements, including characterization of thin film structures

Publications (1)

Publication Number Publication Date
AU2003266136A1 true AU2003266136A1 (en) 2004-03-29

Family

ID=31978720

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2003266136A Abandoned AU2003266136A1 (en) 2002-09-09 2003-09-09 Interferometry method for ellipsometry, reflectometry, and scatterometry measurements, including characterization of thin film structures

Country Status (5)

Country Link
JP (2) JP4563811B2 (ko)
KR (2) KR101223195B1 (ko)
AU (1) AU2003266136A1 (ko)
DE (1) DE10393244B4 (ko)
WO (1) WO2004023071A1 (ko)

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US7139081B2 (en) 2002-09-09 2006-11-21 Zygo Corporation Interferometry method for ellipsometry, reflectometry, and scatterometry measurements, including characterization of thin film structures
US7271918B2 (en) 2003-03-06 2007-09-18 Zygo Corporation Profiling complex surface structures using scanning interferometry
JP5340539B2 (ja) 2003-09-15 2013-11-13 ザイゴ コーポレーション 表面の干渉分析のための方法およびシステムならびに関連する応用例
TWI335417B (en) 2003-10-27 2011-01-01 Zygo Corp Method and apparatus for thin film measurement
DE102004013521B4 (de) * 2004-03-19 2006-04-27 Bundesrepublik Deutschland, vertr. d. d. Bundesministerium für Wirtschaft und Arbeit, dieses vertr. d. d. Präsidenten der Physikalisch-Technischen Bundesanstalt Vorrichtung zum Messen eines Profils und kleinster Verschiebungen
JP4194971B2 (ja) * 2004-04-16 2008-12-10 日本電信電話株式会社 屈折率測定方法及びその装置並びに屈折率測定・硬化装置
GB0415766D0 (en) 2004-07-14 2004-08-18 Taylor Hobson Ltd Apparatus for and a method of determining a characteristic of a layer or layers
US7453577B2 (en) 2004-12-14 2008-11-18 Asml Netherlands B.V. Apparatus and method for inspecting a patterned part of a sample
US7446882B2 (en) * 2005-01-20 2008-11-04 Zygo Corporation Interferometer for determining characteristics of an object surface
GB0523722D0 (en) 2005-11-22 2005-12-28 Taylor Hobson Ltd Trench measurement
US7743661B2 (en) 2006-04-26 2010-06-29 Halliburton Energy Services, Inc. Fiber optic MEMS seismic sensor with mass supported by hinged beams
DE102006057727A1 (de) * 2006-12-07 2008-06-12 Brückner Maschinenbau GmbH Verfahren zur Messung der Doppelbrechung und/oder der Retardation, insbesondere an zumindest teiltransparenten Folien sowie zugehörige Vorrichtung
US7889355B2 (en) 2007-01-31 2011-02-15 Zygo Corporation Interferometry for lateral metrology
JP4835750B2 (ja) * 2007-04-12 2011-12-14 株式会社ニコン 顕微鏡装置
US8072611B2 (en) 2007-10-12 2011-12-06 Zygo Corporation Interferometric analysis of under-resolved features
US7978337B2 (en) * 2007-11-13 2011-07-12 Zygo Corporation Interferometer utilizing polarization scanning
NL1036123A1 (nl) 2007-11-13 2009-05-14 Asml Netherlands Bv Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method.
US8120781B2 (en) 2008-11-26 2012-02-21 Zygo Corporation Interferometric systems and methods featuring spectral analysis of unevenly sampled data
KR102068950B1 (ko) * 2011-02-10 2020-01-21 케이엘에이 코포레이션 오버레이 계측의 콘트라스트 증강을 위한 구조화 조명
JP5648961B2 (ja) * 2011-02-28 2015-01-07 国立大学法人 香川大学 分光特性測定装置及びその校正方法
WO2013019776A2 (en) * 2011-08-01 2013-02-07 University Of Florida Research Foundation, Inc. Simultaneous refractive index and thickness measurments with a monochromatic low-coherence interferometer
DE102011085599B3 (de) * 2011-11-02 2012-12-13 Polytec Gmbh Vorrichtung und Verfahren zur interferometrischen Vermessung eines Objekts
EP2865003A1 (en) * 2012-06-26 2015-04-29 Kla-Tencor Corporation Scanning in angle-resolved reflectometry and algorithmically eliminating diffraction from optical metrology
KR102134943B1 (ko) * 2013-09-16 2020-08-26 케이엘에이 코포레이션 반도체 샘플의 계측을 수행하기 위한 타원편광 측정기 장치
JP2017090395A (ja) 2015-11-17 2017-05-25 株式会社ミツトヨ 干渉対物レンズ及び参照面ユニットセット
JP6906837B2 (ja) * 2017-02-13 2021-07-21 株式会社ディスコ レーザー加工装置
CN107036539B (zh) * 2017-06-14 2018-07-13 深圳中科飞测科技有限公司 膜厚测量系统及方法
KR102680009B1 (ko) * 2018-09-07 2024-07-03 에스케이하이닉스 주식회사 반도체 패턴 계측 장치, 이를 이용한 반도체 패턴 계측 시스템 및 방법

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JPS63292043A (ja) * 1987-05-26 1988-11-29 D S Sukiyanaa:Kk 膜厚・組成同時分析装置
JPS6475902A (en) * 1987-09-18 1989-03-22 Ricoh Kk Method for measuring refractive index and film thickness
US4899055A (en) * 1988-05-12 1990-02-06 Tencor Instruments Thin film thickness measuring method
JPH02190704A (ja) * 1989-01-20 1990-07-26 Ricoh Co Ltd 屈折率・膜厚測定に於ける入射角決定方法
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US5129724A (en) * 1991-01-29 1992-07-14 Wyko Corporation Apparatus and method for simultaneous measurement of film thickness and surface height variation for film-substrate sample
US5181080A (en) * 1991-12-23 1993-01-19 Therma-Wave, Inc. Method and apparatus for evaluating the thickness of thin films
US5386119A (en) * 1993-03-25 1995-01-31 Hughes Aircraft Company Apparatus and method for thick wafer measurement
JPH07208937A (ja) * 1994-01-25 1995-08-11 Fujitsu Ltd 膜厚及び誘電率の測定装置及びその測定方法
JP3602925B2 (ja) * 1995-12-08 2004-12-15 独立行政法人科学技術振興機構 光干渉法による測定対象物の屈折率と厚さの同時測定装置
US5602643A (en) * 1996-02-07 1997-02-11 Wyko Corporation Method and apparatus for correcting surface profiles determined by phase-shifting interferometry according to optical parameters of test surface
JP3459327B2 (ja) * 1996-06-17 2003-10-20 理化学研究所 積層構造体の層厚および屈折率の測定方法およびその測定装置
JP3582311B2 (ja) * 1996-08-04 2004-10-27 松下電器産業株式会社 媒質の測定方法および測定装置
JP3569726B2 (ja) * 1998-12-15 2004-09-29 独立行政法人理化学研究所 試料の幾何学的厚さおよび屈折率測定装置およびその測定方法
KR100290086B1 (ko) * 1999-03-23 2001-05-15 윤덕용 백색광주사간섭법을 이용한 투명한 박막층의 3차원 두께 형상 측정 및 굴절률 측정 방법 및 그 기록매체
JP3642996B2 (ja) * 1999-11-18 2005-04-27 独立行政法人科学技術振興機構 光干渉法による測定対象物の屈折率と厚さの同時測定方法及びそのための装置
JP4673955B2 (ja) * 2000-03-24 2011-04-20 オリンパス株式会社 光学装置

Also Published As

Publication number Publication date
KR20050057279A (ko) 2005-06-16
KR20100122123A (ko) 2010-11-19
DE10393244B4 (de) 2017-09-21
KR101223195B1 (ko) 2013-01-21
JP2005538359A (ja) 2005-12-15
DE10393244T5 (de) 2005-09-01
JP2010197398A (ja) 2010-09-09
JP5352506B2 (ja) 2013-11-27
WO2004023071A1 (en) 2004-03-18
JP4563811B2 (ja) 2010-10-13

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Legal Events

Date Code Title Description
MK6 Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase