JP4554303B2 - 塗布装置及び塗布方法 - Google Patents

塗布装置及び塗布方法 Download PDF

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Publication number
JP4554303B2
JP4554303B2 JP2004257016A JP2004257016A JP4554303B2 JP 4554303 B2 JP4554303 B2 JP 4554303B2 JP 2004257016 A JP2004257016 A JP 2004257016A JP 2004257016 A JP2004257016 A JP 2004257016A JP 4554303 B2 JP4554303 B2 JP 4554303B2
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Japan
Prior art keywords
substrate
unit
coating
nozzle
thickness
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Expired - Fee Related
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JP2004257016A
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Japanese (ja)
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JP2006073872A5 (cg-RX-API-DMAC7.html
JP2006073872A (ja
Inventor
貴生 高木
慶崇 大塚
公男 元田
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Tokyo Electron Ltd
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Tokyo Electron Ltd
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Priority to JP2004257016A priority Critical patent/JP4554303B2/ja
Publication of JP2006073872A publication Critical patent/JP2006073872A/ja
Publication of JP2006073872A5 publication Critical patent/JP2006073872A5/ja
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Publication of JP4554303B2 publication Critical patent/JP4554303B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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  • Coating Apparatus (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Length Measuring Devices By Optical Means (AREA)
JP2004257016A 2004-09-03 2004-09-03 塗布装置及び塗布方法 Expired - Fee Related JP4554303B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2004257016A JP4554303B2 (ja) 2004-09-03 2004-09-03 塗布装置及び塗布方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2004257016A JP4554303B2 (ja) 2004-09-03 2004-09-03 塗布装置及び塗布方法

Publications (3)

Publication Number Publication Date
JP2006073872A JP2006073872A (ja) 2006-03-16
JP2006073872A5 JP2006073872A5 (cg-RX-API-DMAC7.html) 2006-10-19
JP4554303B2 true JP4554303B2 (ja) 2010-09-29

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JP2004257016A Expired - Fee Related JP4554303B2 (ja) 2004-09-03 2004-09-03 塗布装置及び塗布方法

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JP (1) JP4554303B2 (cg-RX-API-DMAC7.html)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100781771B1 (ko) 2006-07-21 2007-12-10 주식회사 케이씨텍 예비 토출부와 이를 포함하는 기판 코팅 장치
KR100820362B1 (ko) 2006-11-17 2008-04-08 주식회사 디엠에스 약액 공급장치
JP2015181977A (ja) * 2014-03-20 2015-10-22 東レ株式会社 間隙維持方法、間隙維持装置及び塗布装置
KR20180009469A (ko) * 2016-07-19 2018-01-29 주식회사 케이씨텍 기판 처리 장치 및 그 제어방법

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3487655B2 (ja) * 1994-11-10 2004-01-19 大日本スクリーン製造株式会社 処理液塗布装置
JP3245812B2 (ja) * 1996-08-30 2002-01-15 東京エレクトロン株式会社 液処理方法及びその装置
JP4073990B2 (ja) * 1997-12-01 2008-04-09 大日本印刷株式会社 塗布膜形成方法および塗布装置
JP2003028712A (ja) * 2001-07-18 2003-01-29 Olympus Optical Co Ltd 光強度測定方法及び光強度測定装置
JP3987378B2 (ja) * 2002-05-24 2007-10-10 大日本スクリーン製造株式会社 基板処理装置
JP4091372B2 (ja) * 2002-07-16 2008-05-28 大日本スクリーン製造株式会社 基板処理装置

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JP2006073872A (ja) 2006-03-16

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