JP4554303B2 - 塗布装置及び塗布方法 - Google Patents
塗布装置及び塗布方法 Download PDFInfo
- Publication number
- JP4554303B2 JP4554303B2 JP2004257016A JP2004257016A JP4554303B2 JP 4554303 B2 JP4554303 B2 JP 4554303B2 JP 2004257016 A JP2004257016 A JP 2004257016A JP 2004257016 A JP2004257016 A JP 2004257016A JP 4554303 B2 JP4554303 B2 JP 4554303B2
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- unit
- coating
- nozzle
- thickness
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Images
Landscapes
- Coating Apparatus (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Length Measuring Devices By Optical Means (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2004257016A JP4554303B2 (ja) | 2004-09-03 | 2004-09-03 | 塗布装置及び塗布方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2004257016A JP4554303B2 (ja) | 2004-09-03 | 2004-09-03 | 塗布装置及び塗布方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2006073872A JP2006073872A (ja) | 2006-03-16 |
| JP2006073872A5 JP2006073872A5 (cg-RX-API-DMAC7.html) | 2006-10-19 |
| JP4554303B2 true JP4554303B2 (ja) | 2010-09-29 |
Family
ID=36154142
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2004257016A Expired - Fee Related JP4554303B2 (ja) | 2004-09-03 | 2004-09-03 | 塗布装置及び塗布方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP4554303B2 (cg-RX-API-DMAC7.html) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100781771B1 (ko) | 2006-07-21 | 2007-12-10 | 주식회사 케이씨텍 | 예비 토출부와 이를 포함하는 기판 코팅 장치 |
| KR100820362B1 (ko) | 2006-11-17 | 2008-04-08 | 주식회사 디엠에스 | 약액 공급장치 |
| JP2015181977A (ja) * | 2014-03-20 | 2015-10-22 | 東レ株式会社 | 間隙維持方法、間隙維持装置及び塗布装置 |
| KR20180009469A (ko) * | 2016-07-19 | 2018-01-29 | 주식회사 케이씨텍 | 기판 처리 장치 및 그 제어방법 |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3487655B2 (ja) * | 1994-11-10 | 2004-01-19 | 大日本スクリーン製造株式会社 | 処理液塗布装置 |
| JP3245812B2 (ja) * | 1996-08-30 | 2002-01-15 | 東京エレクトロン株式会社 | 液処理方法及びその装置 |
| JP4073990B2 (ja) * | 1997-12-01 | 2008-04-09 | 大日本印刷株式会社 | 塗布膜形成方法および塗布装置 |
| JP2003028712A (ja) * | 2001-07-18 | 2003-01-29 | Olympus Optical Co Ltd | 光強度測定方法及び光強度測定装置 |
| JP3987378B2 (ja) * | 2002-05-24 | 2007-10-10 | 大日本スクリーン製造株式会社 | 基板処理装置 |
| JP4091372B2 (ja) * | 2002-07-16 | 2008-05-28 | 大日本スクリーン製造株式会社 | 基板処理装置 |
-
2004
- 2004-09-03 JP JP2004257016A patent/JP4554303B2/ja not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| JP2006073872A (ja) | 2006-03-16 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP4398786B2 (ja) | 塗布方法及び塗布装置 | |
| JP4673180B2 (ja) | 塗布装置及び塗布方法 | |
| US7874261B2 (en) | Stage apparatus and coating treatment device | |
| JP5443070B2 (ja) | インプリントシステム | |
| JP4407970B2 (ja) | 基板処理装置及び基板処理方法 | |
| JP4071183B2 (ja) | 塗布方法及び塗布装置 | |
| WO2010150741A1 (ja) | インプリントシステム、インプリント方法及びコンピュータ記憶媒体 | |
| KR20100007725A (ko) | 기판 처리 장치 | |
| JP4247890B2 (ja) | 塗布ノズル及び塗布装置 | |
| KR20090031823A (ko) | 상압 건조장치 및 기판처리장치 및 기판처리방법 | |
| JP4578381B2 (ja) | 塗布方法及び塗布装置 | |
| JP4422006B2 (ja) | 処理装置及び処理液供給方法及び処理液供給プログラム | |
| KR101052977B1 (ko) | 처리 시스템 | |
| JP4554303B2 (ja) | 塗布装置及び塗布方法 | |
| KR101300853B1 (ko) | 기판 반송 시스템, 기판 반송 장치 및 기판 처리 장치 | |
| JP5149244B2 (ja) | インプリントシステム、インプリント方法、プログラム及びコンピュータ記憶媒体 | |
| JP4338130B2 (ja) | 塗布方法及び塗布装置 | |
| KR101117380B1 (ko) | 도포장치 및 도포방법 | |
| JP2011025220A (ja) | テンプレート処理装置、インプリントシステム、テンプレート処理方法、プログラム及びコンピュータ記憶媒体 | |
| JP4498862B2 (ja) | 塗布方法及び塗布装置 | |
| JP2008200674A (ja) | 塗布方法及び塗布装置 |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20060905 |
|
| A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20060905 |
|
| A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20090616 |
|
| A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20090811 |
|
| A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20100105 |
|
| A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20100303 |
|
| TRDD | Decision of grant or rejection written | ||
| A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20100713 |
|
| A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 |
|
| A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20100714 |
|
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20130723 Year of fee payment: 3 |
|
| R150 | Certificate of patent or registration of utility model |
Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| LAPS | Cancellation because of no payment of annual fees |