JP4549519B2 - 露光装置および露光方法 - Google Patents

露光装置および露光方法 Download PDF

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Publication number
JP4549519B2
JP4549519B2 JP2000369134A JP2000369134A JP4549519B2 JP 4549519 B2 JP4549519 B2 JP 4549519B2 JP 2000369134 A JP2000369134 A JP 2000369134A JP 2000369134 A JP2000369134 A JP 2000369134A JP 4549519 B2 JP4549519 B2 JP 4549519B2
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Japan
Prior art keywords
exposure
product
photomask
etching
light shielding
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Expired - Fee Related
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JP2000369134A
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Japanese (ja)
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JP2002169298A5 (enExample
JP2002169298A (ja
Inventor
孝治 鈴木
清 小野澤
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Dai Nippon Printing Co Ltd
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Dai Nippon Printing Co Ltd
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Priority to JP2000369134A priority Critical patent/JP4549519B2/ja
Publication of JP2002169298A publication Critical patent/JP2002169298A/ja
Publication of JP2002169298A5 publication Critical patent/JP2002169298A5/ja
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Publication of JP4549519B2 publication Critical patent/JP4549519B2/ja
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  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP2000369134A 2000-12-04 2000-12-04 露光装置および露光方法 Expired - Fee Related JP4549519B2 (ja)

Priority Applications (1)

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JP2000369134A JP4549519B2 (ja) 2000-12-04 2000-12-04 露光装置および露光方法

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Application Number Priority Date Filing Date Title
JP2000369134A JP4549519B2 (ja) 2000-12-04 2000-12-04 露光装置および露光方法

Publications (3)

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JP2002169298A JP2002169298A (ja) 2002-06-14
JP2002169298A5 JP2002169298A5 (enExample) 2007-11-29
JP4549519B2 true JP4549519B2 (ja) 2010-09-22

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JP2000369134A Expired - Fee Related JP4549519B2 (ja) 2000-12-04 2000-12-04 露光装置および露光方法

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Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2685811B2 (ja) * 1988-06-10 1997-12-03 株式会社東芝 シャドウマスクの露光方法及びその露光装置
JP3284645B2 (ja) * 1993-02-19 2002-05-20 株式会社ニコン 露光装置および露光方法
JP3351013B2 (ja) * 1993-04-12 2002-11-25 株式会社ニコン 露光装置および露光方法
JP3427132B2 (ja) * 1994-02-22 2003-07-14 株式会社ニコン 露光装置
JP2001068021A (ja) * 1999-08-30 2001-03-16 Sony Corp 蛍光面の形成方法および装置
JP2001272790A (ja) * 2000-03-28 2001-10-05 Mitsubishi Electric Corp 露光用光源装置
JP4888819B2 (ja) * 2000-04-12 2012-02-29 株式会社ニコン 露光装置、露光方法、露光装置の製造方法及びマイクロデバイスの製造方法

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JP2002169298A (ja) 2002-06-14

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