JP4549519B2 - Exposure apparatus and exposure method - Google Patents

Description

[0001]
BACKGROUND OF THE INVENTION
The present invention relates to an exposure apparatus and an exposure method, and in particular, a photo-etching method is used to etch a substrate that is continuous in a strip shape to obtain a product. In addition, the present invention relates to an exposure method in a plate-making process for forming an etching-resistant resist image, and an exposure apparatus for plate-making used therefor.
[0002]
[Prior art]
In recent years, a shadow mask for a color TV (CRT) has been mass-produced with an increase in the amount of use, and depending on the purpose of use, there has been a demand for finer size and larger size.
Such shadow masks are generally produced on a line that uses a strip-shaped metal plate as a material and performs an etching process by a photoetching method.
Briefly, while continuously or intermittently moving the belt-shaped metal plate material, usually, a plate-making process is performed on both sides thereof to form an etching-resistant resist image, and this is used as an etching mask to form the belt-shaped metal plate material. An etching process for etching was performed so that the outer peripheral portion of the product portion of each shadow mask was held by the strip-shaped metal plate material, and the contour mask was faced on the strip-shaped metal plate material.
Then, after that, a trimming process for separating each shadow mask is performed to obtain a target shadow mask.
[0003]
As mass production continues to increase in recent years, the demand for lowering the production cost of shadow masks, which are products, has become increasingly severe, and the exposure method used in the plate making process also increases productivity and quality. Improvement is required from the aspect of cost and cost.
In the shadow mask production line, as an exposure method in the plate making process, the strip-shaped metal plate on which the photosensitive resist film is formed is intermittently moved in a substantially stretched state, and at the time of stoppage, A photomask formed of a corresponding large glass dry plate is adhered to the resist films on both sides of the metal plate material, and exposed to form a latent image for developing and forming an etching-resistant resist image. An exposure method was adopted.
The distance between products is required to be as narrow as possible. In exposure, conventionally, since adjacent product parts are not exposed, a shading tape for avoiding exposure of adjacent product parts on a photomask manually. I was pasting it.
However, since the shading tape was manually applied, the positional accuracy was poor, and in order to prevent troubles that the strip-shaped metal plate was cut during the etching process, the distance between the product exposure area and the shading tape was set for safety. It was necessary to make it big.
That is, it is necessary to increase the product interval, which is a loss of the strip-shaped metal plate material.
On the other hand, the light shielding tape portion is irradiated with exposure energy and the photomask is heated, which causes expansion and contraction and distortion of the photomask, which deteriorates the plate-making quality.
[0004]
[Problems to be solved by the invention]
In this way, the exposure method of the plate-making process in a line that uses a strip-shaped metal plate material as a raw material and performs etching processing by a photo etching method, such as a shadow mask production line, has a problem of loss of the strip-shaped metal plate material and plate-making quality. There was a problem with the above, and this response was required.
The present invention corresponds to this, using a strip-shaped metal plate as a raw material, in the exposure method of the plate making process in a line where etching is performed by a photoetching method, the loss of the strip-shaped metal plate can be reduced, and An object of the present invention is to provide an exposure method that can be expected to improve plate-making quality and productivity, and an exposure apparatus used therefor.
[0005]
[Means for Solving the Problems]
The exposure apparatus of the present invention etches a continuous base material in a belt shape by a photo-etching method to obtain a product. In a product manufacturing process, it is resistant to etching in accordance with a product pattern on both sides or one side of a base material. An exposure apparatus for plate making used in a plate making process for forming a resist image of a photomask used for exposure is performed by etching in order from the product exposure region side before and after the longitudinal direction of the substrate, respectively. Is provided with a blank portion for preventing separation and a black solid portion for light shielding, and a light shielding structure for shielding the black solid portion is disposed between the photomask and the light source. It is what. In the above, the light shielding structure is provided with a honeycomb structure or a fin structure for preventing reflection so that light from the light source is reflected by the light shielding structure and does not enter the product exposure region side. It is what. Also, in the above, the light shielding structure that shields light can be moved according to the longitudinal direction of the base material continuous in a strip shape and the product interval to be manufactured, and the product interval to be manufactured is input in advance. Thus, the light shielding structure is automatically moved. In the above, the product is a shadow mask.
[0006]
The black solid portion is the same as the black pattern material of the photomask to be formed, and is formed simultaneously with the pattern of the photomask when the photomask is manufactured.
As the photomask, a glass dry plate provided with a silver salt photosensitive material is generally used as a material, and a silver salt photosensitive material is selectively exposed to form a pattern (also referred to as patterning). In this case, the black solid portion is a black portion after development of the silver salt photosensitive material.
The original photomask mask for shadow masks has recently been formed by patterning and patterning with selective exposure and development using a drawing exposure machine. It depends on the accuracy of the drawing exposure machine.
An original plate or a photomask that has been subjected to contact exposure based on the original plate and developed to form a pattern, or that has undergone a pattern synthesis process is used as a photomask.
[0007]
In the exposure method of the present invention, the strip-shaped metal plate material having a photosensitive resist film formed on its surface is moved intermittently in a substantially stretched state, and the resist on the surface of the strip-shaped metal plate material is stopped when stopped. Form a latent image to develop and form an etching-resistant resist image that becomes an etching-resistant mask by attaching a photomask with a size larger than the width of the metal plate to the film and exposing it to the film. As a photomask used for exposure in the exposure method, a margin part for preventing the base material from being separated by etching in the longitudinal direction of the base material and before and after the product exposure area, respectively, from the product exposure area side, and for light shielding The black solid portion is used, and a light shielding structure for shielding the black solid portion is disposed between the photomask and the light source to perform exposure.
In the above, the product is a shadow mask.
When the product is a shadow mask, the photosensitive resist film is formed on both sides of the strip-shaped metal plate material, and the photomask is in close contact with the resist film on both sides of the strip-shaped metal plate material, respectively. Then, an etching resistant resist image is developed and formed on both surfaces of the metal plate.
[0008]
[Action]
In the exposure apparatus of the present invention, the strip-shaped metal plate material is reduced in the exposure method of the plate making process in a line where etching processing is performed by a photo-etching method using the strip-shaped metal plate material as a material. It is possible to provide an exposure apparatus that can implement an exposure method that can be reduced and that can be expected to improve plate-making quality and productivity. Specifically, a photo-etching method is used to etch a substrate that is continuous in a strip shape to obtain a product. In a product manufacturing process, the resist is resisted by etching on both sides or one side of the substrate according to the pattern of the product. An exposure apparatus for plate making used in a plate making process for forming an image, wherein a photomask used for exposure separates the base material by etching in order from the product exposure region side before and after the longitudinal direction of the base material, respectively. Are provided with a blank portion for preventing light and a black solid portion for light shielding, and a light shielding structure for shielding the black solid portion is disposed between the photomask and the light source. Have achieved. That is, a black solid portion is provided on a photomask to be used without using a light shielding tape as in the prior art, and a light shielding structure for light shielding this is provided, so that the black solid portion by exposure is provided. Heat absorption is reduced, photomask expansion and contraction and distortion can be reduced, and as a result, quality accuracy can be improved. In addition, when the photomask master is selectively exposed with a drawing exposure machine, developed, and patterned, the position accuracy of the black solid portion is the same as that of the pattern. Determined by. At the same time, damage to the resist due to heat can be prevented. In addition, compared to the conventional method of manually attaching a shading tape to a photomask, the black solid part can be placed when producing the photomask, and its positional accuracy is also more accurate than that of the conventional shading tape. In addition, the interval between products to be manufactured can be maintained with a predetermined accuracy, and as a result, the loss of the substrate can be reduced.
[0009]
Further, the light shielding structure is provided with a honeycomb structure or a fin structure for preventing reflection so that light from the light source is reflected by the light shielding structure and is not incident on the product exposure region side. Therefore, it is possible to suppress the incidence of unnecessary light on the product part of the product and to uniformly expose the product part regardless of the product width. As a result, improvement in product quality can be expected from the conventional method. Specific examples of the light shielding structure include a honeycomb structure, a fin structure, and a surface black coating applied to the end face. In addition, according to the longitudinal direction of the base material continuous in a strip shape, the light shielding structure that shields light can be moved according to the product interval to be manufactured, so that it can cope with (different sizes) items of the product. By inputting the interval between products to be manufactured in advance, it is possible to shorten the product item switching time and reduce the switching loss by automatically moving the light shielding structure, so that improvement in productivity can be expected.
[0010]
This is particularly effective when the product is a shadow mask, but the product is not limited to this.
It can also be applied to lead frame fabrication.
[0011]
In the exposure method of the present invention, with such a configuration, the strip-shaped metal plate material is lost in the plate-making process in a line where etching is performed by a photoetching method using the strip-shaped metal plate material as a material. It is possible to provide an exposure method that can be reduced and an improvement in plate-making quality can be expected.
[0012]
DETAILED DESCRIPTION OF THE INVENTION
An example of an embodiment of the present invention will be described.
FIG. 1A is a schematic view of a main part of an example of an embodiment of the exposure apparatus of the present invention, FIG. 1B is a diagram for explaining a photomask to be used, and FIG. 2 is a shielding structure. FIG. 3 is a view showing an antireflection mechanism of the shielding structure.
1A is a view showing a state at the time of exposure, FIG. 1B is a view of the photomask viewed from the film surface side, and FIG. 2 is a view taken from the A1-A2 side of FIG. 1A. 3A and 3B are enlarged views of the A0 portion of FIG. 1A.
1-4, 110 is a metal plate material, 115 is a photosensitive resist, 120 is a photomask, 121 is a product exposure region (also referred to as a product region), 122 is a blank portion (light transmission portion b), and 125 is a black solid. , 130 is a light source, 135 is exposure light, 135a is incident light, 135b is reflected light, 150 is a shielding structure, 151 is a ball screw, 152 is a support, 155 is a honeycomb, 156 is a fin, M is a motor, and PLC is It is a programmable controller.
[0013]
An example of an embodiment of the exposure apparatus of the present invention will be described with reference to FIG.
The description of the exposure apparatus of the present embodiment and the description of the exposure operation will be replaced with the description of the exposure method of the present invention.
The exposure apparatus of this example uses a photo-etching method to etch a metal plate material, which is a continuous base material in a strip shape, to obtain a shadow mask, which is a product. In addition, as shown in FIG. 1 (a), a photosensitive resist 115 film was formed on both surfaces of the plate making exposure apparatus used in the plate making process for forming an etching resistant resist image. While the belt-like metal plate 110 is moved intermittently in a substantially stretched state, the resist film 115 on both surfaces of the belt-like metal plate 110 is applied to the resist films 115 on both sides of the belt-like metal plate 110 from the band width direction and the band width, respectively. An exposure apparatus for forming a latent image for developing and forming an etching-resistant resist image to be an etching-resistant mask by closely adhering and exposing a large-sized photomask 120 A.
Then, on each side of the metal plate 110, a predetermined width is opened from the product exposure area 121 before and after the product exposure area 121 of the photomask 120 in the longitudinal direction of the metal plate 110, and the photomask 120 is shielded from light. A light shielding structure 150 is disposed between the photomask 120 and the light source 130.
Each of the light shielding structures 150 is driven by a motor M controlled by a programmable controller PLC, and its position is controlled.
Although not shown, a vacuum contact portion is provided that supports the photomask 120 and attaches the photomask 120 to the resist film 115.
[0014]
In this example, as shown in FIG. 1B, the photomask 120 used for exposure is sequentially from the product exposure area 121 side in the longitudinal direction of the metal plate 110 in the product exposure area 121, respectively. A blank portion 122 for preventing the metal plate material 110 from being divided by etching and a black solid portion 125 for light shielding are provided, and the light shielding structure 150 is for shielding the black solid portion 125 of the photomask.
As described above, a photomask is usually a glass dry plate provided with a silver salt photosensitive material, and a pattern is formed by selectively exposing the silver salt photosensitive material (this is also called patterning). Things are used. In this case, the black solid portion is a black portion after development of the silver salt photosensitive material.
From the loss side of the metal plate 110, the width W0 between the product exposure region 121 and the black solid 125 is preferably as small as possible. However, when using the conventional light-shielding tape, the metal plate is cut from the necessary amount due to troubles. It was necessary to take more than 4 mm.
Note that the original mask of the photomask for the shadow mask is formed by selectively exposing and developing with a drawing exposure machine and patterning, and the position accuracy of the black solid portion of the photomask 120 is also the pattern. As well as the accuracy of the lithography tool.
[0015]
As the light source 130 for exposure, an Xe lamp, a metal haloid lamp, or the like is used as a light source, and it is used as a substantially parallel light by a mirror.
In this example, the support portion 152 is formed with a screw so as to be fitted with the ball screw, and the light shielding structure 150 supported by the support portion 152 is moved by the rotation of the ball screw 151 driven by the motor M. To do.
The motor M is controlled by the programmable controller PLC. Eventually, the light shielding structure 150 is controlled by the programmable controller PLC and its position is controlled.
In addition, the control and movement method of the light shielding structure 150 are not limited to those in this example.
[0016]
As an antireflection mechanism for preventing light reflected from the light shielding structure 150 from entering the photomask 120, a honeycomb structure (FIG. 3A) or a fin structure (FIG. 3B) is provided on the end face. And those with black paint on the end face.
Thereby, most of the reflected light 135b from the light shielding structure 150 can be prevented from entering the photomask 120.
[0017]
The operation of the exposure apparatus of this example will be briefly described below with reference to FIG.
First, from the state of FIG. 1 (a), the light source is closed by a shutter (not shown), and then two photomasks 120 are provided, and a metal plate material having a photosensitive resist film 115 disposed on both sides thereof. 110 away from each other. (Step 1)
The two photomasks 120 are moved by a vacuum contact apparatus (not shown).
Next, after the metal plate material 110 having the photosensitive resist film disposed on both sides thereof is almost stretched, it passes between the two photomasks 120 and is conveyed by a predetermined distance in the longitudinal direction of the metal plate material 110. Stop. (Step 2)
Next, in the case where the photomask 120 is not replaced, the two photomasks 120 are brought into close contact with the resist film of the metal plate 110 having the photosensitive resist film 115 disposed on both sides thereof, and again shown in FIG. In this state, exposure is performed. (Step 3)
In this case, the position of the light shielding structure 150 is not adjusted.
When exchanging the photomask 120, two photomasks 120 are newly set in a vacuum contact device (not shown), and the metal plate material 110 having a photosensitive resist film 115 disposed on both sides thereof is used. Each of the resist films is brought into close contact with each other, and the state shown in FIG. 1A is set again. In addition, the position of the light shielding structure 150 is adjusted. (Step 4)
Since the area of the black solid portion 125 differs depending on the size of the product exposure area 121 of the photomask 120, the position of the light shielding structure 150 is adjusted.
In order to set the W0 width (FIG. 1B) to a predetermined width regardless of the product, the transport distance in step 2 is controlled in accordance with the product.
The position adjustment of the light shielding structure 150 in step 4 is performed according to the transport distance in step 2.
In the apparatus of this example, the conveyance distance in step 2 can be used as an input value to the programmable controller PLC, so that the PLC can instruct the light shielding structure 150 to move to an appropriate position.
After step 1 to step 3 or step 4, the process proceeds to step 1 again and can be repeated to perform the exposure process.
Thereby, a latent image for developing and forming an etching-resistant resist image can be formed on both surfaces of a metal plate material continuous in a strip shape at a predetermined product interval.
[0018]
【The invention's effect】
As described above, the present invention uses a strip-shaped metal plate as a raw material, and in the exposure method of the plate-making process in a line where etching is performed by a photoetching method, the loss of the strip-shaped metal plate can be reduced, and the plate-making quality It has become possible to provide an exposure method that can be expected to improve the productivity and also the productivity, and an exposure apparatus used therefor.
[Brief description of the drawings]
FIG. 1 (a) is a schematic view of a main part of an example of an embodiment of an exposure apparatus of the present invention, and FIG. 1 (b) is a diagram for explaining a photomask to be used. Figure showing the shielding state by the shielding structure [Figure 3] Figure showing the antireflection mechanism of the shielding structure [Explanation of symbols]
110 Metal plate material 115 Photosensitive resist 120 Photomask 121 Product exposure area (also referred to as product area)
122 Margin (light transmission part b)
125 Black solid 130 Light source 135 Exposure light 135a Incident light 135b Reflected light 150 Shielding structure 151 Ball screw 152 Support portion 155 Honeycomb 156 Fin M Motor PLC Programmable controller

Claims (7)

Plate making that forms an etching-resistant resist image on the both sides or one side of the substrate in the product manufacturing process in the product manufacturing process by etching the continuous substrate in a belt shape by photo etching method An exposure apparatus for plate making used in a process,
The photomask used for exposure is provided with a blank portion for preventing the substrate from being separated by etching and a black solid portion for light shielding, in order from the product exposure region side, respectively, in the longitudinal direction of the substrate. ,
An exposure apparatus, wherein a light shielding structure for shielding the black solid portion is disposed between a photomask and a light source. 2. The exposure apparatus according to claim 1, wherein the light shielding structure is provided with a honeycomb structure or a fin structure for preventing reflection so that light from the light source is reflected by the light shielding structure and does not enter the product exposure region side. An exposure apparatus characterized by that. 3. The exposure apparatus according to claim 1 , wherein the light shielding structure for shielding light is movable in accordance with the longitudinal direction of the base material continuous in a belt shape and the interval between products to be produced. 4. The exposure apparatus according to claim 3, wherein the light shielding structure is automatically moved by inputting in advance the interval between products to be produced. 5. The exposure apparatus according to claim 1 , wherein the product is a shadow mask.   While the strip-shaped metal plate having the photosensitive resist film formed on the surface is moved intermittently in a substantially stretched state, the strip of the metal plate material is applied to the resist film on the surface of the strip-shaped metal plate when stopping. A photomask with a size larger than the width direction and the width of the band is adhered, exposed, and an exposure method for forming a latent image to develop and form an etching resistant resist image that becomes an etching resistant mask. As the photomask used, a blank portion for preventing the substrate from being separated by etching and a black solid portion for light shielding were provided in order from the product exposure region side in the longitudinal direction of the substrate and before and after the product exposure region, respectively. An exposure method characterized in that a light shielding structure for shielding a black solid portion is disposed between a photomask and a light source, and exposure is performed. 7. The exposure method according to claim 6, wherein the product is a shadow mask.

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