JPH01312547A - Method and device for exposing shadow mask - Google Patents

Abstract

PURPOSE:To reduce contact time by enabling to change optionally exhausting strength from at least one exhausting means among plural exhausting means and changing additionally exhausting strength by means of providing optional time difference after exhaustion starts. CONSTITUTION:At the process of exhaustion from the plural exhausting means 15a-j, 16e-i provided on the periphery of a pair of negative dry plates 31a and 31b and adhering a pair of the negative dry plates 31a and 31b to a continuous metallic band plate 1, time difference is provided from the optional plates of periphery of a pair of the negative dry plates 31a and 31b and exhaustion is performed by changing exhausting strength optionally. Then only exhausting strength is additionally changed by providing optional time difference, i.e., among the exhausting means 15a-15j, 16e-16i the exhausting at least from one exhausting means is controlled to be later than other exhausting means so that one exhausting route remains from near absorbing opening of exhausting means which exhausts later than the others to near the center of the continuous metallic band plate 1. The air around this center is efficiently exhausted. Thus, the degree of contact between the negative dry plate and the continuous metallic banded plate is improved and contact time can be reduced.

Description

DETAILED DESCRIPTION OF THE INVENTION [Object of the Invention] (Industrial Application Field) The present invention relates to a shadow mask exposure method and an exposure apparatus for the shadow mask manufacturing process for color cathode ray tubes.

(Prior Art) Shadow shields used in color cathode ray tubes are generally manufactured by photo-etching. This involves a coating process in which a photoresist film is coated onto a continuous metal strip, an exposure process in which a shadow mask pattern is printed on the photoresist film on the continuous metal strip, and unexposed areas of the photoresist are dissolved and removed by development. It consists of a development/burning process in which the photoresist film is heat treated at a high temperature, and an etching process in which it is etched.

An example of an exposure device for printing a shadow pattern on a continuous metal strip plate on which a photoresist film is formed is the one disclosed in Japanese Patent Application Laid-Open No. 1986-
Exposure apparatuses such as those described in Japanese Patent Laid-Open No. 13298 or Japanese Patent Application Laid-Open No. 53-28092 are known.

This type of exposure equipment is capable of feeding a continuous metal strip in a fixed amount, placing a negative dry plate with a shadow pattern formed on the continuous metal strip in close contact with the continuous metal strip, printing a shadow pattern onto the continuous metal strip, and printing a negative plate from a continuous metal strip. One cycle consisted of the steps of separating the dry plate and feeding the continuous metal strip in a fixed amount in 130 to 180 seconds.

What is particularly important here is the placement of the negative dry plate on which the shadow pattern is formed in close contact with the continuous metal strip plate.

At this point, if the continuous metal strip and the negative dry plate are not in complete contact with each other, that is, there are some areas where the continuous metal strip and the negative dry plate are not in close contact, the exposure on the continuous metal strip The correct shadow pattern cannot be printed onto the film. In other words, the shadow pattern formed on the negative dry plate is exposed in a one-on-one manner in the area where the continuous metal strip and the negative dry plate are in complete contact, but the continuous metal strip and the negative dry plate are not completely in contact with each other. At some points, the light passing through the negative dry plate is diffused and irradiated onto the photoresist film on the continuous metal strip, so that a pattern larger than the shadow pattern is exposed on the photoresist film on the continuous metal strip.

The accuracy of the shadow mask is very important, and incomplete adhesion as described above cannot be tolerated.However, in reality, continuous metal strips are not completely pure planes, but have some unevenness, so Mechanically, the close contact arrangement of the negative dry plate and the continuous metal strip plate has been a major practical problem. Therefore, by performing vacuum evacuation, an attempt was made to forcibly improve the degree of adhesion between the negative dry plate and the continuous metal strip plate.

(Problems to be Solved by the Invention) The above-mentioned exposure process can process very few continuous metal strips per unit time compared to other coating processes, development/burning processes, or etching processes. In particular, continuous metal strips and negative dry plates require complete adhesion as mentioned above, so adhesion usually takes a long time of 60 to 120 seconds.
The production of shadow masks was largely influenced by the contact time of the exposure equipment. Therefore, in order to improve the productivity of shadow masks, it is conceivable to increase the number of continuous metal strips that can be processed per unit time by increasing the number of exposure devices.

For example, there is a method in which multiple exposure devices are connected in series to perform exposure, but due to the spacing between the exposure devices, gaps also occur between the shadow mask patterns printed on the continuous metal strip, resulting in material loss on the continuous metal strip. It leads to Recently, from the viewpoint of countermeasures against doming in shadow masks, iron-nickel alloys, which are low thermal expansion materials, have begun to be used for shadow masks for large consumer pipes and display pipes. However, this iron-nickel alloy is much more expensive than conventionally used iron. Therefore, the material loss of the continuous metal strip leads to an increase in the cost of the shadow mask. Further, such exposure apparatuses are very expensive, and increasing the number of exposure apparatuses requires a large investment in equipment.

As described above, in the conventional exposure apparatus, it took a long time to bring the continuous metal strip plate and the negative dry plate into close contact with each other, so the productivity of shadow masks was not very good.

Furthermore, the degree of adhesion between the continuous metal strip and the negative dry plate was not sufficient.

Therefore, the present invention improves the productivity of shadow masks by providing an exposure method and an exposure apparatus for shadow masks in which the degree of adhesion between a negative dry plate and a continuous metal strip plate is excellent and the time required for the adhesion is short, and the productivity of shadow masks is improved. The purpose is to improve quality as well.

[Structure of the Invention] (Means for Solving the Problems) The shadow mask exposure method of the present invention includes the steps of aligning a pair of negative dry plates each having a desired shadow mask pattern forming surface on one principal surface; A conveying process in which a continuous metal strip plate having a photoresist film having a desired film thickness formed on both main surfaces between the negative dry plates is conveyed for a desired length, and a pair of negative dry plates are moved close to the continuous metal strip plate to the extent that they do not come into close contact with each other. Along with moving
A process of sealing a continuous metal band-shaped plate corresponding to a pair of negative dry plates, and performing exhaust by setting a time difference and arbitrarily changing the exhaust intensity from a plurality of exhaust means provided around the outer periphery of the pair of negative dry plates, and a step of baking a shadow mask pattern on both main surfaces of the continuous metal strip corresponding to a pair of negative drying plates. It is characterized by comprising a separating process of separating the plate from a pair of negative dry plates, and a conveying process of conveying the continuous metal strip plate a desired length including the shadow mask pattern portion printed on the photoresist film on both main surfaces of the continuous metal strip plate. This is what I did.

In addition, the shadow mask exposure method of the present invention involves evacuation from a plurality of evacuation means provided around the outer periphery of the pair of negative dry plates at different times and by arbitrarily changing the exhaust intensity to form a continuous metal strip between the pair of negative dry plates and the continuous metal strip. The process of bringing the plates into perfect contact can be achieved by evacuation from any point on the outer periphery of the pair of negative dry plates at a time difference and by arbitrarily changing the exhaust intensity, and then by further changing only the exhaust intensity by providing an arbitrary time difference. A pair of negative dry plates and a continuous metal strip are brought into perfect contact]
By doing so, the adhesion time can be further shortened.

The shadow mask exposure apparatus of the present invention includes a conveying means capable of conveying a continuous metal strip plate having a photoresist film having a desired film thickness on both principal surfaces for each desired length, and A pair of negative dry plates on which shadow mask patterns are formed are supported so that the shadow mask pattern forming surfaces can face each other,
A pair of frames capable of sandwiching a continuous metal strip plate between a pair of negative dry plates to create a vacuum-sealed state; and a support base having a function of moving the pair of frames in a direction opposite to the shadow mask pattern forming surface and in the opposite direction. In order to form a vacuum-adhesive state between the pair of negative dry plates and the continuous metal strip plate by the pair of frames, an exhaust means having a plurality of exhaust pipes each installed in the pair of frames (in the opposite direction of the pair of frames) A light source provided on the opposite side and an exhaust timing control that controls the exhaust timing so that the start of exhaust from at least one of the plurality of exhaust means is set with a time difference from the other exhaust means. It is characterized by comprising means.

Furthermore, the shadow mask exposure apparatus of the present invention is such that the intensity of the exhaust from at least one of the plurality of exhaust means can be arbitrarily changed in the shadow mask exposure apparatus described above, and an arbitrary time difference is provided after the start of exhaust. Furthermore, it is equipped with an exhaust intensity control means that can change the exhaust intensity, making it possible to further shorten the contact time.

(Function) As mentioned above, in conventional exposure equipment, in order to shorten the contact time between a pair of negative dry plates on which a shadow mask pattern is formed and a continuous metal strip plate coated with a photoresist film, Attempts were made to shorten the adhesion time by forcibly bringing them into close contact by exhausting the atmosphere between the metal strip and the continuous metal strip, but the shortening of the adhesion time remained unimproved. As a result of research, it was found that this was due to the following reasons.

Conventionally, in order to shorten the adhesion time, the atmosphere between the pair of negative dry plates and the continuous metal strip plate was simultaneously exhausted by a strong exhaust force from a plurality of exhaust means. For this reason, the continuous metal strip plate that tends to come into close contact with the negative dry plate comes into close contact with the negative dry plate first in the vicinity of the suction port of the exhaust pipe.

That is, the adhesion between the peripheral part of the negative dry plate and the continuous metal strip plate is faster than that in the center part, and the remaining popularity in the center part passes through the slight gap between the peripheral part of the negative dry plate and the continuous metal strip plate.
Since exhaust is performed by using a strong exhaust force, the exhaust efficiency is poor and the contact time is long.

Therefore, for example, the exhaust from at least one of the plurality of exhaust means is controlled to be delayed from the other exhaust means. Exhaust in this case means substantial exhaust to the extent that the effect of exhaust is sufficiently produced. Then, at least one exhaust path is left in the vicinity of the center of the continuous metal strip plate corresponding to the pair of negative dry plates from the vicinity of the suction port of the exhaust means that exhausts the gas later than the others. Therefore, the atmosphere near the center of the continuous metal strip can be efficiently exhausted, and the contact time can be shortened.

(First Embodiment) An embodiment of a shadow mask exposure apparatus of the present invention will be described with reference to the drawings.

FIG. 1 is a schematic perspective view of the exposure apparatus of this embodiment, and the second
The figure is A-A- of the exposure apparatus main body (101) in Fig. 1.
FIG. 2 is a schematic cross-sectional view taken along a line.

The shadow mask exposure device consists of a conveying means for feeding out a continuous metal strip (1) coated with a photoresist film on both sides, and an exposure device main body (101) for exposing the continuous metal strip (1) with a shadow mask pattern. It has become.

The conveying means is installed on both sides of the exposure apparatus main body (101), and the continuous metal strip plate (1) is placed on the winder (55).
), (57) spool (5B), (5B>
This continuous metal strip plate (1) is installed in the guide rollers (51a) and (51b) installed on the insertion side of the exposure apparatus main body (101), and on the ejection side. It is fixed by guide rollers (53a) and (53b). And this winder (57)
is driven by an electric motor (not shown) and rotated while being controlled by a feed rate setting device (not shown).
01).

Next, the exposure apparatus main body (101) will be explained. The exposure apparatus main body (101) includes a base (3) and a pair of negative dry plates (31a) on which a shadow mask pattern is formed.

(311)) on the base (3), a frame (llb), (11a>, and this frame (lla
> , (llb), and exhaust timing control means and exhaust intensity control means for controlling the exhaust means. A frame (tla) with a continuous metal strip (1) sandwiched between the base (3).

(11t)) is vertically supported. The frames (11a) and (11b) are movable in opposite directions by cranks (5a) and (5b) provided on the base (3).

FIG. 3 is a schematic front view of this frame (lla>, (11b>) in the opposing direction, and with reference to this, the frame (lla>, (11b>)
la), (lib>. This frame (l
la).

Rubber gaskets (13a) and (13b) are placed near the outermost periphery of the frame (llb) in the opposite direction, respectively.
lla>.

It is provided along the shape of (11b). Inside these gaskets (13a>, (13b), there are 10 exhaust pipes (15a) forming exhaust means).
(15j>.

(16a),..., (16j> are provided at regular intervals, and control valves (25a>,..., (25j)
, (2Ba>,..., (26j), and are externally connected to a vacuum device (not shown).This control valve (25a),..., (25j).

(26a> ,..., (26j) are connected to each exhaust pipe (15a),..., (1) by the exhaust timing signal @TX from the exhaust timing signal generation circuit (41).
5j>, (16a>.

..., (16j>), and this control valve (25a), ...,
(25j).

(26a>,..., (26j>) and the exhaust timing signal generation circuit (41) constitute an exhaust timing control means.

And the exhaust pipe (15a),..., (15j>,
(16a) ,...

(There is a rubber gasket (21a) on the inside of 16j>.
.

(21b), and this gasket (21a),
Rubber gaskets (19a>, (19b) are formed at regular intervals on the inner periphery of (21b).These gaskets (21a>, (21b),
(19a) and (19b) are also provided with six exhaust pipes (17a>, (17b) at predetermined intervals, and are externally connected to solenoid valves (27a>, (27b)). By operating and opening the valves (27a) and (27b), the gaskets (19a) and (1
9a).

Exhaust can be carried out from the portion sandwiched between
).

(11b) can be adsorbed and held.

In addition, a mercury discharge lamp is located at a certain distance from the center of the frames (lla) and (llb) in opposite directions.
The exposure device is configured as shown in FIG.

Next, an embodiment of the exposure method according to the present invention will be described using the above-described shadow mask exposure apparatus.

First, before performing exposure, the solenoid valves (27a) and (27B
> is opened and a pair of negative drying plates (31a>, (31b
) to the opposing surfaces of the frames (11a>, (llb>), and the pair of negative drying plates (31a), (31b)
) Correctly align each shadow mask pattern formed thereon.

The negative dry plates (31a) and (31b) were made of glass and had a size of 28 inches x 32 inches x 0.19 inches (industrial photographic glass dry plates manufactured by Kogutsuku Co., Ltd.), which are commonly used.

Next, between the negative dry plates (31a) and (31b), milk casein and A, D, C, (ammonium dei.
A continuous metal strip (1) on which a photoresist film made of (chromate) is formed is wound onto a spool (56) several hundred meters in length, and loaded into the exposure apparatus main body (101). It is pulled from a spool (56) loaded into a winder (55), and the continuous metal strip (1) is pulled from a guide roller (56).
1a), (51b), negative dry plate (31a).

(31b), and the guide roller (51a), (
51b) and the empty spool (57) of the winder (57).
58) and fix it.

Then, by differentially moving the cranks (5a) and (5b), the frames (Ila) and (11b) are brought close to the continuous metal strip plate (1), respectively, and the continuous metal strip plate (
1) and the negative dry plates (31a) and (31b) are brought into close contact with each other.

Therefore, each exhaust pipe (15a>,..., (15j)
, (16a).

..., The exhaust intensity from (16j> is controlled by setting the exhaust timing signal TX as shown in FIG. 4, for example. In the figure, (a) shows the exhaust from the exhaust pipes (15a) and (16a>). This exhaust timing signal TXa exhausts at the exhaust intensity p1 from time t1 to time t3, and at time t3.
The evacuation is interrupted from the time to the time t4, and starts again at the time t4. During this evacuation, the close contact is completed at time t2 and the exposure process begins. In addition, (b) in the figure shows exhaust from the exhaust pipes (15b) and (16b), and this exhaust timing signal TXb is generated at time t1+Δt.
The exhaust is started at the exhaust intensity p1. And the exhaust pipe (15c).

(16c) ,..., (15i) , (16i)
Also, the exhaust timing starts to be sequentially shifted by Δt. Furthermore, the exhaust from the exhaust pipes (15j) and (16j) is as shown in the exhaust timing signal TXj of (C) in the figure.
The exhaust is set to start at time t1+9·Δt.

In this way, the exhaust pipes (15a), - are provided on the left and right frames (11a), (llb) symmetrically with respect to the continuous metal strip (1).

(15j) , (16a) ,..., (16j>
Preferably, the evacuation is symmetrical.

By controlling the exhaust means in this way, the exhaust timing of the exhaust means is gradually shifted and the exhaust starts. For this reason, the exhaust pipe (15j) has the slowest exhaust compared to the others.
, (16j), there are negative dry plates (31a), (31
b) An exhaust path is formed from the central part, and a negative drying plate (31a
> , (31b) No atmosphere remains in the center and is quickly exhausted, leaving the continuous metal strip plate (1) and negative dry plate (31a) , (
31b) is in close contact.

Since the state of close contact between the negative dry plate (31a>, (31b>) and the continuous metal strip plate (1) can be detected by observing Newton's rings, the negative dry plate (31a).

(31b) and the continuous metal strip plate (1) completely adhere to each other when Newton's rings disappear.

For this reason, providing the Newton ring detection means leads to further improvement in adhesion accuracy.

After this close contact process is completed, 45 to 50
The shadow mask pattern formed on the negative dry plates (31a) and (31b) is irradiated with second light and then transferred to the continuous metal strip plate (31a) and (31b).
1) Baking on the photoresist film deposited on top.

After the burning is finished, close the control valve (25a>...).

(25j), (26a),..., (26j>, the exhaust is interrupted by the exhaust timing signal TX from the exhaust timing signal generation circuit (41), and the crank (5a)
> By operating (5b), the negative plate (
31a>, (31b>) and separate the continuous metal strip plate (1).Then, the winders (55) and (57) are rotated to transfer the next continuous metal strip plate (1) to the negative dry plate (31a).
> , (31b) Load between.

This is considered as one exposure process, and a shadow mask pattern is sequentially printed onto the continuous metal strip (1).

As described above, in the shadow mask exposure apparatus of this embodiment, each exhaust pipe (15a) is heated at the exhaust intensity p1.

(15b) , ・, (15j) , (t6a>
, -, (16j), the exhaust is started while shifting the exhaust timing little by little, and the negative drying plate (31a), (31
b) and the continuous metal strip (1) by forming at least one exhaust path for the residual atmosphere between the negative dry plate (31a), (31b>) and the continuous metal strip (1), and further evacuating the negative dry plate (31a), (31b>) and the continuous metal strip (1). For complete adhesion, use a negative drying plate (31a)
There is no residual atmosphere between (31b) and the continuous metal strip (1), allowing for highly accurate baking.

In addition, a negative drying plate (31
a) The time of close contact between (31b) and the continuous metal strip (1) can be halved compared to the conventional method, and the productivity of the shadow mask is improved. In the close contact process of the shadow mask exposure method described here, 10 exhaust pipes (15a),
(15b).

..., (15j>, (16a), ...,
(16j) was carried out by sequentially exhausting the exhaust pipes (15a) and (15b).

..., (15j), (16a>, ...,
(16j> is not limited to 10, and there are other examples such as (15a, 15f).

(15b, 15g), (15c, 15h)
Even if exhaust is performed using diagonal lines as a pair, as in ,...
If the timing of exhaust from at least one exhaust pipe is delayed from the others, a sufficient exhaust path can be formed and the contact time can be shortened.

Further, the following methods are also included in the present invention.

The exhaust force waveform diagram of each exhaust means is shown in FIG. 5, and will be explained with reference to this.

In the figure, (a) shows exhaust from the exhaust pipes (15a) and (16a). At time t1, exhaust is started with an exhaust intensity of pl, at time t3, exhaust is finished, and at time t5, exhaust is resumed. It is a start. In addition, (b) in the figure shows the exhaust pipe (15b
), (16b) showing the exhaust from time t
Exhaust is started from 1 with a very weak exhaust intensity Δp, the exhaust intensity becomes pl at time t1 + Δt, and exhaust ends at time 3, and the exhaust pipe (15c) is
, (16c), -, (15i).

(16i) is the time Δt of the evacuation time at the evacuation intensity p1 in sequence.
(C) in the figure is the exhaust pipe (15j).
, (16j>). At time t1, exhaust starts with an exhaust intensity of Δp, at time t1+9・Δt, the exhaust intensity becomes pl, and at time t3, exhaust ends. In the middle of this, close contact is completed at time t2 and exposure is performed.

This corresponds to the fact that although the exhaust start timing is the same for all exhaust pipes, the actual exhaust timing is shifted by the time Δt depending on each exhaust pipe.

For this reason, as in the above-mentioned embodiment, an exhaust path is formed near the exhaust pipe to exhaust the air, so that the atmosphere can be handled well and the contact time can be shortened. The present invention also includes such a case where the exhaust timing is substantially shifted.

By controlling the exhaust intensity of each individual exhaust means in this way, it is possible to achieve faster adhesion than in the past.

(Second Embodiment) A second embodiment of the shadow mask exposure apparatus of the present invention will be described with the same reference numerals assigned to the same parts as in the first embodiment. FIG. 6 shows a schematic cross-sectional view of the exposure apparatus main body (101).

The shadow mask exposure apparatus shown in the first embodiment includes control valves (25a), ..., (25j).
.

(26a),..., (26j> is connected to each exhaust pipe (15a),..., (1) by the exhaust timing signal TX from the exhaust timing signal generation circuit (41).
5j>, (16a>.

..., (16j>), and also controls the exhaust intensity by the intensity change signal TV from the exhaust intensity change signal generation circuit (43). 25a) ,...

(25j>, (26a>,..., (26j>
The exhaust timing control means is constituted by the exhaust timing signal generation circuit (41) and the control valve (25a).
,..., (25j>.

(26a),..., (26j>) and the exhaust intensity change signal generation circuit (43) constitute an exhaust intensity control means.

Here, the exhaust timing control means and the exhaust intensity control means will be described in detail.

For example, from the exhaust timing signal generation circuit (41) to the control valve (25a), an on-o switch as shown in (a) in FIG.
Assume that the exhaust timing signal @TXa of ff is transmitted.

This exhaust timing signal TXa is from time t1 to time t3.
Exhaust is performed from the exhaust pipes (15a) and (16a) until then, and the exhaust is interrupted from time t3 to time t4. Also, the exhaust intensity change signal TYa is shown in the figure (
As shown in b), it is assumed that a control voltage vO is transmitted such that the exhaust intensity is pO until time tl', and a control voltage 1 is transmitted that causes exhaust to be exhausted at an intensity p1 from time t1' to time t3.

These exhaust timing signal TXa and exhaust intensity change signal @T
The control valve (25a) is controlled by Ya, and exhaust from the exhaust pipe (15a) is performed at time t1 with an exhaust strength pO, and at time tl', the exhaust strength is pl. increases to Then, exhausting is stopped at time t3. Then, from time t4, evacuation is performed again at the evacuation intensity pO. Then, exposure is performed from time t2 when the close contact is completed by exhaustion.

In this way, in the shadow mask exposure apparatus of this embodiment, the exhaust timing signal TYa and the exhaust intensity change signal TYa@
By adjusting each exhaust pipe (15
a) ,..., (15j>, (16a),...
....

(16j> exhaust intensity and exhaust timing can be adjusted individually.

Next, an embodiment of a shadow mask exposure method according to the present invention will be described using such a shadow mask exposure apparatus.

First, a pair of negative dry plates (31a>, (31b) are attracted to the opposing surfaces of frames (11a>, (11b>),
The pair of negative dry plates (31a>, (31b)) are aligned correctly.

Next, a continuous metal strip plate (1) on which a photosensitive film is formed is loaded between the negative dry plates (31a> and (31b)), and the cranks (5a> and (5b) are differentially moved to
a).

(31b) is brought into slightly close contact with the continuous strip plate (1).

And the individual control valves (25a>,..., (2
5j).

By controlling (2&a),..., (26j> with the exhaust timing signal TX and exhaust intensity change signal TY, each exhaust @(15a) *..., (15j),
For example, the exhaust from (16a), . . . , (16j) is controlled as follows.

Figure 8 shows each exhaust pipe (t5a),..., (15j)
, (16a).

..., (This shows the state of the exhaust from 16j>,
In the figure, (a) shows exhaust from the exhaust pipes (15a) and (16a).Evacuation starts at time t1 with exhaust intensity pO, increases exhaust intensity to pl at time t1, and increases to 3 at time t1.
Exhaust ends at time t4, and exhaust is interrupted until time t4.
Exhaust is started again at time t4.

In addition, (b) in the figure shows the exhaust from the exhaust pipes (15b) and (18b), where the exhaust start timing is delayed by Δt at time t1+Δt, and the exhaust intensity is increased at time t1°. , the exhaust is interrupted at time t3, and the exhaust pipes (15C), (16C),...
From then on, exhaust is performed with the exhaust start timing gradually delayed by Δt. Furthermore, (C) in the figure shows the exhaust pipe (15j>
, which shows the exhaust from (16j) at time t1+
9. Start exhausting at Δt, and increase exhaust intensity pl at time t1°.
, and the exhaust is interrupted at time t3.

By controlling as described above, an exhaust path is formed in the vicinity of the exhaust pipes (15j>, (16j>) whose exhaust is delayed the most compared to the others with the central part of the negative drying plate (31a), (31b). By exhausting with a strong exhaust strength, there is no residual atmosphere in the center of the negative photosensitive plates (31a) and (31b), allowing quick contact.

The close contact ends at time t2, and the negative dry plate (31a) is irradiated with light from a light source (not shown) until time t3.

The shadow mask pattern formed in (31b) is printed on the photoresist film deposited on the continuous metal strip (1). This is normally done for 45 to 50 seconds.

This seizure occurs after the process is completed by the control valve (25a),...
・.

(25j) , (26a) ,..., (26j>
is bound by the exhaust timing signal Tx from the exhaust timing signal generation circuit (41), and the crank (5a)
, (5b) is activated, and the negative drying plate (31a),
(31b) and the continuous metal strip (1) are separated, and the spools (56) and (58) are rotated to transfer the next continuous metal strip (1) to the negative dry plate (31a).

(31b) Load between.

This is considered as one exposure process, and a shadow mask pattern is sequentially printed onto the continuous metal strip (1).

As described above, in the exposure apparatus of this embodiment, the exhaust pipes (15a), (15b), ---,
(15j).

(16a),..., (16j), start exhausting while gradually shifting the tie-born ring, and move the negative drying plate (31a).
).

(31b) and the continuous metal strip plate (1) to form at least one exhaust path for the residual atmosphere; Since the negative dry plates (31a), (31b) and the continuous metal strip plate (1) are brought into perfect contact with each other, the negative dry plates (31a), (31b) and the continuous metal strip plate (1) are in close contact with each other. There is no residual atmosphere in between, allowing faster and more accurate printing.

By changing the exhaust force while changing the exhaust timing in this way, the time of contact between the negative drying plates (31a) and (31b) and the continuous metal strip plate (1) can be reduced to 173 compared to the conventional one, increasing the productivity of shadow masks. will improve.

Again, 10 exhaust pipes (15a>, (15b)
,......

(15j>, (16a),..., (18j>
Although we started evacuation sequentially from
, (15b, 15(II ”), (15C.

Even if the exhaust is performed in a diagonal pair as shown in 15h), etc., if the timing of exhaust from at least one exhaust pipe is delayed from the others, a sufficient exhaust path will be formed and the close contact time will be shortened. be able to.

[Effects of the Invention] Since the shadow mask exposure apparatus of the present invention has a control means for shifting the exhaust timing within one exposure cycle, the air pocket near the center area of the negative dry plate always has an exhaust path leading to the outside. can exist. Therefore, the process time involved in the exposure process of the shadow mask is much shorter than in the past, making it easy to mass-produce the shadow mask. Furthermore, there is no need to arrange these exposure devices in series to perform exposure, and the investment in equipment is reduced, making it possible to reduce loss of continuous metal strips.

Further, the precision of adhesion is improved, and the exposure of the shadow mask pattern can be performed more accurately, so that defects can be reduced.

[Brief explanation of the drawing]

1 is a schematic perspective view of a shadow mask exposure device according to an embodiment of the present invention, FIG. 2 is a schematic cross-sectional view of the shadow mask exposure device in FIG. 1 taken along line A-A, and FIG. 3 is a schematic front view of the frame of the shadow mask exposure apparatus according to the embodiment of the present invention, FIG. 4 is a waveform diagram of the exhaust force from the exhaust means according to the first embodiment of the present invention, and FIG. An exhaust force waveform diagram of each exhaust means according to a modification of the first embodiment of the invention, FIG. 6 is a sectional view of a shadow mask exposure apparatus according to the second embodiment of the invention, and FIG. FIG. 8 is a diagram showing control signal waveforms and exhaust force waveforms for the exposure apparatus of the second embodiment, and FIG. 8 shows exhaust force waveforms from each exhaust means for the exposure apparatus of the second embodiment. . (1)... Continuous metal strip plate (lla), (11b) -... Frame (25)...
・Control valve (31a), (31b) ---Negative dry plate (41)...
・Exhaust timing signal generation circuit (43)...Exhaust intensity change signal generation circuit Representative Patent attorney Noriyuki Chika Yudo Kikuo Takehana Figure 1 Figure 2 Figure 3 Figure 4 Figure 5 (■)

Claims (4)

[Claims] (1) A step of aligning a pair of negative dry plates having a desired shadow mask pattern forming surface on one main surface, and forming a photoresist film having a desired film thickness between the pair of negative dry plates on both main surfaces. a conveyance step of conveying the continuous metal strip-shaped plates to a desired length; and moving the pair of negative dry plates close to the continuous metal strip-shaped plates to the extent that they do not come into close contact with the continuous metal strip-shaped plates, and moving the continuous metal strip-shaped plates corresponding to the pair of negative dry plates. a step of sealing the pair of negative dry plates; a step of exhausting at different times from a plurality of exhaust means provided around the outer periphery of the pair of negative dry plates, and completely bringing the pair of negative dry plates and the continuous metal strip plate into close contact with each other; printing the shadow mask pattern on both main surfaces of the continuous metal strip plate corresponding to the negative dry plate; and after the baking step, stopping the exhaust and separating the continuous metal band plate and the pair of negative dry plates. A method for exposing a shadow mask, comprising: a separation step; and a transport step of transporting the continuous metal strip over a desired length including the shadow mask pattern portions printed on the photoresist film on both main surfaces of the continuous metal strip. (2) a step of aligning a pair of negative dry plates each having a desired shadow mask pattern forming surface on one principal surface, and forming a photoresist film having a desired thickness between the pair of negative dry plates on both principal surfaces; a conveyance step of conveying the continuous metal strip-shaped plates to a desired length; and moving the pair of negative dry plates close to the continuous metal strip-shaped plates to the extent that they do not come into close contact with the continuous metal strip-shaped plates, and moving the continuous metal strip-shaped plates corresponding to the pair of negative dry plates. a step of sealing, and evacuation is performed from a plurality of evacuation means provided around the outer periphery of the pair of negative dry plates by setting a time difference and arbitrarily changing the evacuation intensity, and then further changing only the evacuation intensity by setting an arbitrary time difference. a step of completely bringing the pair of negative dry plates and the continuous metal strip plate into close contact with each other; a step of baking the shadow mask pattern on both main surfaces of the continuous metal strip plate corresponding to the pair of negative dry plates; After the completion of the process, the evacuation is stopped and the continuous metal strip plate and the pair of negative dry plates are separated from each other, and a desired shadow mask pattern portion including a shadow mask pattern portion is printed on the photoresist film on both main surfaces of the continuous metal strip plate. 1. A method for exposing a shadow mask, comprising the step of transporting a length. (3) A conveying means capable of conveying a continuous metal strip plate having a photoresist film having a desired film thickness on both principal surfaces for each desired length, and a shadow mask pattern formed on one principal surface of each. a pair of frames capable of supporting a pair of negative dry plates so that the shadow mask pattern forming surfaces face each other, and sandwiching the continuous metal strip plate between the pair of negative dry plates to create a vacuum-sealed state; a support base having a function of being movable in a direction opposite to and in the opposite direction of the shadow mask pattern forming surface, and a vacuum contact state between the pair of negative dry plates and the continuous metal strip plate is formed by the pair of frames. an exhaust means having a plurality of exhaust pipes provided on each of the pair of frames; a light source provided on opposite sides of the pair of frames; and at least one exhaust means of the plurality of exhaust means. 1. An exposure apparatus for a shadow mask, comprising an exhaust timing control means for controlling an exhaust timing so that the start of exhaust can be performed with a time difference from other exhaust means. (4) A conveyance means capable of conveying a continuous metal strip plate having a photoresist film having a desired film thickness on both principal surfaces for each desired length, and a shadow mask pattern formed on one principal surface of each. a pair of frames capable of supporting a pair of negative dry plates so that the shadow mask pattern forming surfaces face each other, and sandwiching the continuous metal strip plate between the pair of negative dry plates to create a vacuum-sealed state; a support base having a function of being movable in a direction opposite to and in the opposite direction of the shadow mask pattern forming surface; and a support base having a function of being movable in a direction opposite to the shadow mask pattern forming surface and in the opposite direction; an exhaust means having a plurality of exhaust pipes provided on each of the pair of frames; a light source provided on opposite sides of the pair of frames; and an exhaust means from at least one of the plurality of exhaust means. An exhaust timing control means for controlling exhaust timing so that exhaust can be performed with a time difference between the start of exhaust and other exhaust means, and an exhaust intensity from at least one exhaust means among the plurality of exhaust means can be arbitrarily changed; 1. A shadow mask exposure apparatus comprising an exhaust intensity control means capable of setting an arbitrary time difference after the start of exhaust and further changing the exhaust intensity.