JPH01276141A - Device and method for exposure for shadow mask - Google Patents

Abstract

PURPOSE:To shorten a contact time and to improve contact accuracy by bringing a couple of negative dry plates where shadow mask patterns are formed and a metallic beltlike plate which is coated with a photosensitive film into contact with each other from the center areas of the negative dry plates by a two-stage contacting means. CONSTITUTION:The continuous metallic beltlike plate 103 where the photosensitive film is formed is carried between frames 31 where the couple of negative dry plates 51 are held. The frames 31 are put close to the beltlike plate 103 by a clutch 25 and then a mechanical contacting means presses the peripheries of the center areas of the dry plates 51, which are made to contact the beltlike plate 103. Further, the frames 31 are evacuated through a discharge pipe to produce a vacuum, thereby bringing the dry plates 51 and beltlike plate 103 into vacuum contact. Then light from a light source irradiates the plate to print the shadow mask patterns of the dry plates 51 on the beltlike plate 103. Thus, the dry plates are brought into contact by the two-stage contacting means from the peripheries of the center areas to shorten the contact time and improve the contact accuracy.

Description

DETAILED DESCRIPTION OF THE INVENTION [Object of the Invention] (Industrial Application Field) The present invention relates to a shadow mask exposure apparatus and an exposure method used in the manufacturing process of a color cathode ray tube shadow mask.

(Prior Art) Shadow masks for color cathode ray tubes are generally manufactured by a photoetching method.

This process consists of a coating process in which a photoresist film is applied to a continuous metal strip, an exposure process in which a shadow mask pattern is printed on the photoresist film on the continuous metal strip, and an unexposed part of the photoresist film is dissolved and removed by development to expose any remaining exposure. It consists of a development/burning process in which the film is heat treated at a high temperature, and an etching process in which the film is etched.

In the exposure process of printing a shadow mask pattern on a continuous metal strip plate on which a photoresist film is formed, for example, Japanese Patent Laid-Open No. 56-1
Exposure apparatuses such as those described in Japanese Patent Laid-open No. 3298 or Japanese Patent Laid-Open No. 53-28092 are known.

This type of exposure equipment is capable of feeding a continuous metal strip in a fixed amount, placing a negative dry plate on which a shadow mask pattern is formed in close contact with the continuous metal strip, printing a shadow mask pattern onto the continuous metal strip, and printing a negative plate from a continuous metal strip. detachment of the dry plate,
One cycle of feeding a continuous metal strip at a constant rate takes 130 to 180 seconds.

What is particularly important here is the placement of the negative dry plate on which the shadow mask pattern is formed in close contact with the continuous metal strip plate.

At this point, if there are some areas where the continuous metal strip and the negative dry plate are not in close contact, the light will be diffused only in those areas and will be irradiated onto the continuous metal strip, creating a continuous pattern larger than the shadow pattern. There was no chance of burning onto the metal strip, and since there were some irregularities, mechanical close placement was a big problem in practice.

Therefore, conventional exposure equipment attempts to forcibly improve the degree of adhesion between the negative dry plate and the continuous metal strip by making the negative dry plate and the continuous metal strip in an airtight state and installing an exhaust pipe to exhaust the air. there were.

(Problems to be Solved by the Invention) The above-mentioned exposure process can process very few continuous metal strips per unit time compared to other coating, developing, or etching processes.

In particular, the continuous metal strip plate and the negative dry plate require complete adhesion as mentioned above, but in the past, the periphery of the negative dry plate was placed in close contact with the continuous metal strip plate faster than the periphery, and the air remaining in the center was removed from the negative plate. This means that it can be handled through the small gap that exists between the periphery of the dry plate and the continuous metal strip.

For this reason, a long time of 60 to 120 seconds is usually required for close contact, and the production of shadow masks largely depends on the close contact time of the exposure device.

Therefore, in order to improve the productivity of shadow masks, it is possible to increase the number of continuous metal strips that can be processed per unit time by increasing the number of exposure devices.

For example, there is a method of performing exposure by arranging a plurality of exposure devices in series, but due to the spacing between the exposure devices, gaps also occur between the shadow mask patterns, leading to material loss of the continuous metal strip plate.

Recently, from the viewpoint of countermeasures against doming in shadow masks, iron-nickel alloy materials, which are low thermal expansion materials, have begun to be used for shadow masks for large consumer pipes and display pipes.

However, the iron-nickel alloy is much more expensive than conventionally used iron, and therefore the loss of material in the continuous metal strip leads to an increase in the cost of the shadow mask.

Furthermore, such exposure apparatuses are very expensive, and increasing the number of exposure apparatuses requires a large investment in equipment.

As described above, in the conventional exposure apparatus, it took a long time to bring the continuous metal strip plate and the negative dry plate into close contact with each other, so the productivity of shadow masks was not very good.

Furthermore, the degree of adhesion between the continuous metal strip and the negative dry plate was not sufficient.

Therefore, an object of the present invention is to improve the productivity of shadow masks as well as the quality of shadow masks by providing an exposure device that has excellent adhesion between a negative dry plate and a continuous metal strip plate and requires less time for adhesion. shall be.

[Structure of the Invention] (Means for Solving the Problems) In the shadow mask exposure apparatus of the present invention, a continuous metal strip plate on which a photoresist film having a desired thickness is formed on both principal surfaces is formed at desired lengths. - a pair of negative dry plates on which a shadow mask pattern having a desired size is formed on the main surface, so that the continuous metal strip plate can be sandwiched with the shadow mask pattern forming surfaces facing each other; A frame for supporting a negative drying plate; a support base having a function of movable in a direction opposite to the shadow mask pattern forming surface and the opposite direction; and a light source that prints the shadow mask pattern on the pair of negative dry plates onto the photoresist film on both main surfaces of the continuous metal strip plate. It is.

The exposure method also includes a step of aligning a pair of negative dry plates each having a desired shadow mask pattern forming surface on one main surface, and forming a photoresist film having a desired thickness between the pair of negative dry plates on both main surfaces. A conveyance step of conveying the continuous metal strip plate to a desired length, a step of moving a pair of negative dry plates close to the continuous metal strip plate, and a step of mechanically bringing the vicinity of the central region of the pair of negative dry plates into close contact with the continuous metal strip plate. a first close contact step, and a second close contact step in which the continuous metal strip plate and the pair of negative dry plates are completely brought into close contact by exhausting air from the outside around the pair of negative dry plates;
Baking is a process in which the shadow mask pattern on a pair of negative dry plates is irradiated onto the photoresist film on the main surface of the continuous metal strip plate.After the baking process is completed, the exhaust is stopped and the continuous metal band plate and the pair of negative dry plates are exposed. It is characterized by having a separating step of separating the continuous metal strip, and a conveying step of conveying a desired length including the shadow mask pattern portion printed on the photoresist film on the main surface of the continuous metal strip.

(Function) The step of bringing a pair of negative dry plates on which a shadow mask pattern is formed and the continuous metal strip plate coated with a photoresist film into close contact is the step of bringing the vicinity of the central region of each negative dry plate into close contact with the continuous metal strip plate. The process is carried out in two stages: the first stage and the second stage, in which the continuous metal strip plate and the negative dry plate are brought into an airtight state and evacuated to completely adhere to each other.

In this way, if the continuous metal strip and the negative dry plate are brought into close contact with each other at the center first, the contact will gradually start from the periphery, so there will be no areas left between the continuous metal strip and the negative dry plate, and the degree of adhesion will be improved. will improve.

Further, since the continuous metal strip plate preferentially starts to come into close contact with the central part of the negative where the adhesion speed is slow, the continuous metal strip sheet metal body and the negative dry plate can be brought into close contact quickly.

(Example) An example of the present invention will be described with reference to FIGS. 1 and 2.

FIG. 1 is a schematic perspective view of the shadow mask exposure device of this embodiment, and FIG. 2 is a schematic cross-sectional view taken along line A to 8 of the shadow mask exposure device (1) in FIG. 1. .

The shadow mask exposure apparatus (1) consists of a conveyance means (101) for delivering a continuous metal strip (103) coated with a photoresist film on both sides, and an exposure apparatus main body (11).

The conveying means (101) is such that the continuous metal strip (103) is connected to the spool (113) of the winder (111) and (121).
), (123>), and this continuous metal strip plate (103) is installed as a guide roller (15a) on the insertion side of the exposure apparatus main body (11).

(15b) and a guide roller installed on the unloading side (
125a>, (125b).

This winder (121) is connected to an electric motor (not shown).
A fixed amount of continuous metal strip (103) can be conveyed into the exposure apparatus main body (11) by being driven by and rotated while being controlled by a feed presetting device (not shown).

Next, the exposure apparatus main body (11) will be explained.

The exposure apparatus main body (11) includes a base (21) and a negative dry plate (51a) on which a shadow mask pattern is formed on the main surface.
), (51b), frames (31a), (31b) erected on the base (21) and holding the negative drying plates (51a), (51b), the continuous metal strip plate (103) and the negative drying plate (51a). ),
(51b), and a second contact means that brings the continuous metal strip plate (103) into complete contact with the negative dry plate (51a), (51b>). There is.

Frames (31a) and (3tb) are vertically supported on the base (21) with a continuous metal strip (103) sandwiched between them.

This 7L/-m (31a), (31b) L
It is movable in opposite directions by a crank (25) provided on the t-base (21).

Figure 3 shows this frame (31a), (31b
), and the frames (31a) and (31b) will be explained with reference to this. The frames (31a) and (31b'') have a frame-like structure, and rubber gaskets (33a) and (33b) are respectively provided near the outermost peripheries of the frame (31a) in opposing directions.

It is provided along the shape of (31b).

And this gasket (33a), (33b
) Inside there are six exhaust pipes (41a) spaced at regular intervals.
).

(41b) is provided.

The exhaust pipes (41a), (41b>) are connected to externally provided solenoid valves (43a>, (43b)).

And these exhaust pipes (41a), (41b)
There is a rubber gasket (35a > , (
35b), and this gasket (35a),
(35b) Gaskets (
37a > , (37b) are formed.

And these gaskets (35a) and (35b
).

Also in the portion sandwiched between (37a) and (37b), six exhaust pipes (45a>, (45b)) are provided at predetermined intervals.

And these exhaust pipes (45a) and (45b)
are also connected to the outside, solenoid valves (47a),
(47b) to open the gasket (35a).

Exhaust can be carried out from the portion sandwiched between (37a), (35b), and (37b).

Such a frame (31a > , (31b)
Glass negative dry plates (51a) and (51b) each having a shadow mask pattern formed thereon in opposite directions.
) operates the solenoid valves (47a) and (47b) to open the exhaust pipes (45a) and (45b).
) is fixed by the suction force.

Such frames (31a), (31b)
When the gaskets (33a) and (3
3b) are in contact and the frames (31a) and (3
1b > can be made airtight.

And a solenoid valve (43a) provided externally.

(43b) by opening the frame (31a).
), (31b) can be in a vacuum state.

This becomes the second close contact means.

Next, the first contact means will be explained.

Negative dry plates (51a) and (51b) from opposite directions of frames (31a>, (31b), respectively)
> A pressing pad (79a) made of sponge near the center area.

(79b) is held at the tip by a rod-shaped press (plot (
77a) and (77b) are located.

This pressing is performed by pads (79a > , (79b)
In addition to sponge, rubber or cushion material may also be used.

And this pressing is rod<778), (77
b) spin rods (75a), (75b
) from a support plate (61) installed at the top of the exposure apparatus main body (11).

These spin rods (75a), (75b) are connected to the first air cylinders (73a>, (73b)
) is supported so as to be movable in the vertical direction with respect to the exposure apparatus main body (11>).

And this first air cylinder (73a).

(73b) is a support stand (71a), (71b)
The slide head (
63a).

(63b).

This support stand (71a>, (71b) is the support stand (71a>, (71b)
65a).

(65b) to slide head (63a).

A second air cylinder (67a>, (67b) fixed to the end of the slide head (63a), (63b) moves the frame (
31a).

It is movable parallel to the direction opposite to (31b).

Mercury discharge lamps are provided as light sources (3a), (3b) for exposure at a certain distance from the center of the frame (31a>, (31b>) in opposite directions.

Next, an embodiment of the exposure process according to the present invention will be described using the above-mentioned shadow mask exposure apparatus (1).

First, a pair of negative dry plates (51a) and (51b) on which a desired shadow mask pattern has been formed are connected to a solenoid valve (
47a) and (47b) and open the exhaust pipe (45).
a＞.

(45b) by exhausting the frame (31).
a>, (31b>) is fixed.

At this time, the negative plates (51a') and (51b) are 28X32X0.
A 19 inch size one was used.

Next, between the negative dry plates (51a) and (51b),
Milk casein and A, D, C, (ammonium,
A continuous metal strip (103) on which a photoresist film consisting of
113) and load it into the exposure apparatus main body (11).

A continuous metal strip (103> pulled out from a spool (113) loaded in a winder (111) is passed through guide rollers (115a>, (115b), (115b),
It passes between the negative drying plates (51a) and (51b) and through the guide rollers (125a) and (125b), and is connected and fixed to the empty spool (123) of the winder (121).

Next, operate the crank (25) and move the frame (31a)
, (31b>) respectively, a continuous metal strip plate (103)
frame (31a) by bringing it close to.

Gasket (33a) installed in (31b).

(33b) is in close contact with the frame (31a>,
(31b) The interior becomes airtight.

In this state, the second air cylinder (67a).

(67b) and slide head (63a).

Support stand (71a) on (63b), (71b
) in the opposite direction of the frames (31a > , (31b)).

At this time, the support stand (71a), (71b
) b> is pushed out below the exposure apparatus main body (11).

In this way, pressing is performed by pads (79a) and (7
9b) with imposition [plot (77a),
(77b) with a negative plate (51a > , (51
b > about 100 μm around the center area on a negative dry plate (51
a), (51b>) in the opposite direction.

This varies depending on the shape of the negative dry plates (51a), (51b), etc., but approximately several tens to several hundred μm is sufficient.

In this state, the solenoid valves (43a) and (43b
), open the exhaust pipes (41a), (41b
The inside of the frames (31a) and (31b), which are kept in a sealed state, becomes a vacuum state by exhausting air from the ")".

As a result, the vicinity of the center region of the negative dry plates (51a), (51b) is preferentially in close contact with the continuous metal strip plate (103>), so that the negative dry plates (51a>, (51b)
The adhesion gradually starts from near the center region of > b and reaches complete adhesion.

Here, it can be determined by observing Newton rings etc. whether the negative dry plates (51a>, (51b>) and the continuous metal strip plate (103) are in complete contact with each other.
Complete adhesion can be achieved in 20 to 40 seconds.

Further, in order to improve the adhesion accuracy, a detection means may be provided to move on to the next step when the Newton ring disappears.

After completing this close contact process, the second air cylinder (67a
), (67b), the pressing pads (79a), (79b) are gradually separated from the negative dry plate (51a>, (51b)).

At the same time, the first air cylinder (73a>, (7
3b) to press the pad (79a),
(79b) Imposition with (plot (77a)
, (77b) are stored near the support plate (61).

And this pressing is Rondo (77a), (77b
) etc. do not interfere with exposure, turn off the light source (81a).
.

(81b) for 45 to 50 seconds to expose a negative dry plate (
The shadow mask patterns formed in 51a) and (51b) are printed onto the photoresist film formed on the continuous metal strip (103).

This burning is done after the completion of the process using the solenoid valve (47a).

(47b) and operate the crank (25) to create the frame (31a > , (31b
) are separated, and the negative drying plates (51a) and (51
b> and the continuous metal strip plate (103) is separated.

Then, the winders (111) and (121) are rotated to pass the next continuous metal strip plate (103) onto the negative drying plate (51).
Load between a) and (51b).

This is considered as one cycle, and a shadow mask pattern is sequentially printed onto a continuous metal strip plate.

Here, a negative dry plate (51a) is attached to a continuous metal strip (103).
) and (51b) close to each other, and then mechanically press the vicinity of the center areas of the negative dry plates (51a) and (51b), and further between the continuous metal strip plate (103) and the negative dry plates (51a>, (51b)). The continuous metal strip (103) and the negative drying plate (51a) are removed by exhausting the air.

Although (51b) is placed in close contact with each other, the same effect (q) can be obtained by using the following order.

By operating the crank (25) while mechanically pushing the vicinity of the center area of the negative dry plates (51a), (51b'), the negative dry plates (51a>, (51)
The continuous metal strip plate (103) may be brought into close contact with the vicinity of the central region of b>.

Or exhaust pipe (41a), (41b)
It is also possible to leave the exhaust continuously.

As detailed above, the negative dry plate (51a).

After mechanically bringing the vicinity of the central region of (51b) into close contact with the continuous metal strip plate (103), in order to bring the whole part into close contact, the continuous metal strip is gradually applied from the vicinity of the central region of the negative dry plate (51a>, (51b)). In close contact with the strip plate (103),
It is possible to achieve even and close contact.

Also, in this way, the negative dry plate (51a > , (5
1b > and the continuous metal strip plate (103) are brought into close contact with each other,
It is now possible to achieve close contact much more quickly than in the past, and the time required for the close contact process during exposure can be reduced to less than half of the conventional time.

Therefore, there is no need to operate the shadow mask exposure devices (1) in series, and the loss of the continuous metal strip (103) can be significantly reduced, and the unit price of the shadow mask can be reduced.

The above-mentioned exposure apparatus (1) is just one example, and the first
Instead of supporting the contact means by the support plate (61) installed on the upper part of the exposure apparatus main body (11), it may be installed on the base (21) or by providing an independent frame. .

Moreover, this first contact means is pressed by a pad (79a>
, (79b) etc., and the negative plate (51a).

In addition to pressing the central region of (51b), for example, it may be pressed by air or the like in order to apply mechanical force.

Such devices or methods are also included in the present invention.

[Effects of the Invention] The exposure apparatus and exposure method of the present invention gradually bring the negative dry plate into close contact with the continuous metal strip from the center area of the negative dry plate using a two-step contact means, so that the negative dry plate and the continuous metal strip can be brought into close contact with each other. The time required for close contact can be shortened.

Therefore, the process time involved in the exposure process of the shadow mask is much shorter than in the past, making it easy to mass-produce the shadow mask.

Further, the precision of adhesion is improved, and the exposure of the shadow mask pattern can be performed more accurately, so that defects can be reduced.

[Brief explanation of the drawing]

FIG. 1 is a schematic perspective view of an exposure apparatus showing an embodiment of the present invention, FIG. 2 is a schematic cross-sectional view of the exposure apparatus in FIG. 1 taken along line A to A', and FIG. FIG. 2 is a schematic front view of a frame of an exposure apparatus according to an embodiment. (1) Exposure device (11) Exposure device body (21) Base (31) - Frame (51) Negative dry plate (79) Pressing is done with bat ( 81)...Light source (101)...Transporting means (103>...Continuous metal strip plate agent Patent attorney Noriyuki Chika Yudo Kikuo Takehana Figure 1 Figure 2 Figure 3

Claims (2)

[Claims] (1) A conveying means capable of conveying a continuous metal strip plate having a photoresist film having a desired thickness on both principal surfaces, for each desired length, and a shadow mask pattern having a desired dimension on one principal surface. a pair of negative dry plates on which the shadow mask pattern is formed, a frame that supports the negative dry plate so as to be able to sandwich the continuous metal strip plate with the shadow mask pattern forming surfaces facing each other; a supporting base having a function of being movable in one direction and the opposite direction; and a support base having a function of being movable in one direction and the opposite direction; a first adhesion means for bringing the pair of negative dry plates into close contact with a part of the continuous metal strip plate corresponding to the pair of negative dry plates; and a light source for printing the shadow mask pattern on both main surfaces of the continuous metal strip plate. (2) a step of aligning a pair of negative dry plates each having a desired shadow mask pattern forming surface on one principal surface, and forming a photoresist film having a desired thickness between the pair of negative dry plates on both principal surfaces; a step of transporting the continuous metal strip plate to a desired length; a step of moving the pair of negative dry plates close to the continuous metal strip plate; A first adhesion step of bringing the pair of negative dry plates into close contact with the vicinity of the central region; and a second adhesion step of completely bringing the continuous metal strip plate and the pair of negative dry plates into close contact by exhausting air from outside the periphery of the pair of negative dry plates. a baking step of irradiating the shadow mask pattern on the pair of negative dry plates onto the photoresist films on both main surfaces of the continuous metal strip plate; and after the baking step, the exhaust is stopped and the continuous metal strip plate is removed. It is characterized by comprising a separating step of separating the pair of negative dry plates, and a conveying step of conveying the continuous metal strip plate a desired length including a shadow mask pattern portion printed on the photoresist film on both main surfaces of the continuous metal strip plate. How to expose a shadow mask.