JP4547489B2 - 膜厚計測装置搭載の光学薄膜形成用装置及び光学薄膜の成膜方法 - Google Patents

膜厚計測装置搭載の光学薄膜形成用装置及び光学薄膜の成膜方法 Download PDF

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Publication number
JP4547489B2
JP4547489B2 JP2007105963A JP2007105963A JP4547489B2 JP 4547489 B2 JP4547489 B2 JP 4547489B2 JP 2007105963 A JP2007105963 A JP 2007105963A JP 2007105963 A JP2007105963 A JP 2007105963A JP 4547489 B2 JP4547489 B2 JP 4547489B2
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layer
wavelength
optical
film thickness
light
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JP2007199084A (ja
JP2007199084A5 (enrdf_load_stackoverflow
Inventor
修 白井
清 細川
敏夫 笠原
和弘 高木
義昭 野村
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Showa Shinku Co Ltd
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Showa Shinku Co Ltd
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  • Physical Vapour Deposition (AREA)
  • Length Measuring Devices By Optical Means (AREA)
JP2007105963A 2003-05-01 2007-04-13 膜厚計測装置搭載の光学薄膜形成用装置及び光学薄膜の成膜方法 Expired - Fee Related JP4547489B2 (ja)

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JP2007105963A JP4547489B2 (ja) 2003-05-01 2007-04-13 膜厚計測装置搭載の光学薄膜形成用装置及び光学薄膜の成膜方法

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JP2003126404 2003-05-01
JP2007105963A JP4547489B2 (ja) 2003-05-01 2007-04-13 膜厚計測装置搭載の光学薄膜形成用装置及び光学薄膜の成膜方法

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JP2004129868A Division JP2004354372A (ja) 2003-05-01 2004-04-26 膜厚計測装置搭載の光学薄膜形成用装置及び光学薄膜の成膜方法

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JP2007199084A JP2007199084A (ja) 2007-08-09
JP2007199084A5 JP2007199084A5 (enrdf_load_stackoverflow) 2008-01-24
JP4547489B2 true JP4547489B2 (ja) 2010-09-22

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Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4878632B2 (ja) * 2009-07-03 2012-02-15 株式会社シンクロン 光学式膜厚計及び光学式膜厚計を備えた薄膜形成装置
TW201250301A (en) * 2011-06-03 2012-12-16 Asia Optical Co Inc Optical filter apparatus

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3084862B2 (ja) * 1991-12-11 2000-09-04 松下電器産業株式会社 光学式膜厚モニター
JPH06137948A (ja) * 1992-10-28 1994-05-20 Shimadzu Corp 測光装置
JP3892525B2 (ja) * 1997-03-25 2007-03-14 ペンタックス株式会社 膜厚モニタ装置ならびに真空蒸着方法および真空蒸着装置
JP3625736B2 (ja) * 2000-04-27 2005-03-02 古河電気工業株式会社 光学フィルタの製造方法
DE60233931D1 (de) * 2001-02-07 2009-11-19 Asahi Glass Co Ltd Verfahren zur herstellung eines sputterfilms
JP2003014423A (ja) * 2001-06-27 2003-01-15 Kyocera Corp 多重薄膜形成装置
JP3737407B2 (ja) * 2001-10-15 2006-01-18 日本電信電話株式会社 膜厚モニタリング装置および方法
JP3737409B2 (ja) * 2001-10-15 2006-01-18 日本電信電話株式会社 膜厚モニタリング装置および方法

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