JP4532660B2 - 露光装置 - Google Patents

露光装置 Download PDF

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Publication number
JP4532660B2
JP4532660B2 JP2000093960A JP2000093960A JP4532660B2 JP 4532660 B2 JP4532660 B2 JP 4532660B2 JP 2000093960 A JP2000093960 A JP 2000093960A JP 2000093960 A JP2000093960 A JP 2000093960A JP 4532660 B2 JP4532660 B2 JP 4532660B2
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JP
Japan
Prior art keywords
gas
chamber
space
gravity
optical
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2000093960A
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English (en)
Japanese (ja)
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JP2001284214A (ja
JP2001284214A5 (enExample
Inventor
真一 原
裕 田中
和之 春見
融 平林
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
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Canon Inc
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Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP2000093960A priority Critical patent/JP4532660B2/ja
Publication of JP2001284214A publication Critical patent/JP2001284214A/ja
Publication of JP2001284214A5 publication Critical patent/JP2001284214A5/ja
Application granted granted Critical
Publication of JP4532660B2 publication Critical patent/JP4532660B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP2000093960A 2000-03-30 2000-03-30 露光装置 Expired - Fee Related JP4532660B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2000093960A JP4532660B2 (ja) 2000-03-30 2000-03-30 露光装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2000093960A JP4532660B2 (ja) 2000-03-30 2000-03-30 露光装置

Publications (3)

Publication Number Publication Date
JP2001284214A JP2001284214A (ja) 2001-10-12
JP2001284214A5 JP2001284214A5 (enExample) 2007-05-24
JP4532660B2 true JP4532660B2 (ja) 2010-08-25

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ID=18609074

Family Applications (1)

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JP2000093960A Expired - Fee Related JP4532660B2 (ja) 2000-03-30 2000-03-30 露光装置

Country Status (1)

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JP (1) JP4532660B2 (enExample)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN105223786B (zh) * 2015-10-30 2017-11-07 武汉华星光电技术有限公司 用于防止镜头内部雾化的方法及装置
CN118604973A (zh) * 2024-08-09 2024-09-06 深圳市新凯来工业机器有限公司 镜筒和半导体设备

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05210049A (ja) * 1992-01-31 1993-08-20 Matsushita Electric Ind Co Ltd 投影レンズ倍率補正方法およびその装置
JPH07201702A (ja) * 1993-12-28 1995-08-04 Fujitsu Ltd 露光方法と露光装置
JP3734043B2 (ja) * 1995-04-07 2006-01-11 株式会社ニコン 露光装置
JP3629790B2 (ja) * 1995-12-05 2005-03-16 株式会社ニコン 露光装置
JPH09298151A (ja) * 1996-05-02 1997-11-18 Nikon Corp 投影露光装置
JP3472066B2 (ja) * 1997-03-04 2003-12-02 キヤノン株式会社 露光装置、半導体生産システム及び半導体製造方法
JPH11233412A (ja) * 1998-02-13 1999-08-27 Nikon Corp 投影露光装置
JP2000036447A (ja) * 1998-07-17 2000-02-02 Nikon Corp 露光装置及び投影光学系の圧力調整方法
JP4026943B2 (ja) * 1997-09-04 2007-12-26 キヤノン株式会社 露光装置およびデバイス製造方法
JPH11224839A (ja) * 1998-02-04 1999-08-17 Canon Inc 露光装置とデバイス製造方法、ならびに該露光装置の光学素子クリーニング方法
WO1999060616A1 (fr) * 1998-05-15 1999-11-25 Nikon Corporation Procede et dispositif d'exposition
JP2000124121A (ja) * 1998-10-16 2000-04-28 Canon Inc 光学装置、露光装置、鏡筒、連結装置、筐体および鏡筒端部遮蔽物
JP2001060548A (ja) * 1999-08-23 2001-03-06 Nikon Corp 露光方法及び装置
JP4738561B2 (ja) * 1999-12-14 2011-08-03 キヤノン株式会社 露光装置およびデバイス製造法
JP2001284215A (ja) * 2000-03-30 2001-10-12 Canon Inc 露光装置、デバイス製造方法、半導体製造工場および露光装置の保守方法
JP3976981B2 (ja) * 2000-03-30 2007-09-19 キヤノン株式会社 露光装置、ガス置換方法、デバイス製造方法

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Publication number Publication date
JP2001284214A (ja) 2001-10-12

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