JP4522139B2 - 基板処理ユニット、基板載置状態検出方法および基板処理装置 - Google Patents
基板処理ユニット、基板載置状態検出方法および基板処理装置 Download PDFInfo
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
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Description
以下の説明において、基板とは、半導体ウェハ、液晶表示装置用ガラス基板、PDP(プラズマディスプレイパネル)用ガラス基板、フォトマスク用ガラス基板、光ディスク用基板等をいう。
第2の実施の形態に係る基板処理ユニットは以下の点で第1の実施の形態に係る基板処理ユニットと異なる。
第3の実施の形態に係る基板処理ユニットは以下の点で第1の実施の形態に係る基板処理ユニット1と異なる。
第4の実施の形態に係る基板処理ユニットは以下の点で第1の実施の形態に係る基板処理ユニット1と異なる。
2 温調プレート
2H ピン導入孔
2J 流体導入孔
2T 温度調整装置
2Z 温調部
5 圧力測定管
5B 流量測定管
6 基板昇降ピン
6i 気流通路
6u 上開口部
7 連結部材
8 昇降装置
20 基板載置検出装置
21a,21b,21c 流体導入孔
30 ベークユニットコントローラ
500 基板処理装置
C10 密閉蓋
C11 プレート収容台座
C14 排気管
DT1,DT2 遅延時間
FL 流量センサ
NE 内部空間
PS 微差圧センサ
Claims (20)
- 基板に所定の処理を行う基板処理ユニットであって、
基板が載置される基板載置台と、
基板を前記基板載置台上で上昇および下降させる昇降手段と、
前記昇降手段による基板の上昇中または下降中における基板と前記基板載置台との間の空間における気流の変化を検出する検出手段と、
前記検出手段により検出される気流の変化に基づいて前記基板載置台における基板の載置状態を判定する判定手段とを備えたことを特徴とする基板処理ユニット。 - 前記検出手段は、前記気流の変化による圧力変化を検出する圧力検出手段を含むことを特徴とする請求項1記載の基板処理ユニット。
- 前記圧力検出手段は第1の空間と第2の空間との圧力差を検出するための差圧センサであり、
前記第1の空間は、前記基板載置台と基板との間の空間であり、
前記第2の空間は、前記第1の空間に連通する空間であることを特徴とする請求項2記載の基板処理ユニット。 - 前記基板載置台を収容する密閉容器と、
前記密閉容器内の雰囲気を排気するための排気配管とをさらに備え、
前記第2の空間は、前記排気配管の内部空間であることを特徴とする請求項3記載の基板処理ユニット。 - 前記基板載置台を収容する密閉容器と、
前記密閉容器内の雰囲気を排気するための排気配管とをさらに備え、
前記第2の空間は、前記基板載置台と基板との間の空間を除く前記密閉容器の内部空間であることを特徴とする請求項3記載の基板処理ユニット。 - 前記検出手段は、前記気流の変化による流量変化を検出する流量検出手段を含むことを特徴とする請求項1〜5のいずれかに記載の基板処理ユニット。
- 前記基板載置台は、上下に貫通する貫通孔を有し、
前記検出手段は、前記昇降手段による基板の上昇中または下降中における前記貫通孔を通る気流の変化を検出することを特徴とする請求項1〜6のいずれかに記載の基板処理ユニット。 - 前記基板載置台は、上下に貫通する複数の貫通孔を有し、
前記昇降手段は、
前記複数の貫通孔内に上下動可能に設けられた複数の支持部材と、
前記複数の支持部材を上昇および下降させる駆動手段とを含み、
前記検出手段は、前記駆動手段による前記複数の支持部材の上昇中または下降中における前記複数の貫通孔の少なくとも1つを通る気流の変化を検出することを特徴とする請求項1〜7のいずれかに記載の基板処理ユニット。 - 前記基板載置台は、上下に貫通する複数の貫通孔を有し、
前記昇降手段は、
前記複数の貫通孔内に上下動可能に設けられた複数の支持部材と、
前記複数の支持部材を上昇および下降させる駆動手段とを含み、
前記支持部材の少なくとも1つは、前記基板載置台と基板との間の空間に開口する通路を有し、
前記検出手段は、前記駆動手段による前記複数の支持部材の上昇中または下降中における前記通路を通る気流の変化を検出することを特徴とする請求項1〜7のいずれかに記載の基板処理ユニット。 - 前記検出手段は、圧力または流量を検出する少なくとも1つのセンサを含み、
前記少なくとも1つのセンサの出力信号を処理する処理手段と、
前記昇降手段による昇降動作を制御するとともに前記処理手段の処理結果に基づいて前記基板載置台における基板の載置状態を判定する制御手段とをさらに備えたことを特徴とする請求項1〜9のいずれかに記載の基板処理ユニット。 - 前記センサは、複数設けられ、
前記処理手段は、前記複数のセンサの出力信号を処理し、
前記制御手段は、前記処理手段により得られる複数の処理結果に基づいて前記基板載置台における基板の載置状態を判定することを特徴とする請求項10記載の基板処理ユニット。 - 前記制御手段は、前記処理手段により得られる複数の処理結果の各々に基づいて前記基板載置台における基板の載置状態が正常か否かを判別し、複数の判別結果の全てが正常である場合に、前記基板載置台における基板の載置状態が正常であると判定することを特徴とする請求項11記載の基板処理ユニット。
- 前記処理手段は、前記少なくとも1つのセンサの出力信号を予め定められたしきい値と比較し、比較結果を示す比較信号を出力し、
前記制御手段は、前記処理手段により出力された比較信号に基づいて前記基板載置台における基板の載置状態を判定することを特徴とする請求項10〜12のいずれかに記載の基板処理ユニット。 - 前記処理手段は、前記少なくとも1つのセンサの出力信号に移動平均処理を行い、処理された出力信号を前記しきい値と比較することを特徴とする請求項13記載の基板処理ユニット。
- 前記処理手段は、前記少なくとも1つのセンサの出力信号と前記しきい値とを比較し、比較された前記少なくとも1つのセンサの出力信号にディレイフィルタ処理を行うことを特徴とする請求項14または15記載の基板処理ユニット。
- 前記基板載置台は、基板を所定の処理温度に調整する温度調整手段を含み、
前記処理手段は、前記処理温度に応じた遅延時間に基づいて前記ディレイフィルタ処理を行うことを特徴とする請求項15記載の基板処理ユニット。 - 前記処理温度に応じて前記遅延時間を設定するための設定手段をさらに備え、
前記処理手段は、前記設定手段により設定された前記遅延時間に基づいて前記ディレイフィルタ処理を行うことを特徴とする請求項16記載の基板処理ユニット。 - 前記制御手段は、前記駆動手段による前記複数の支持部材の上昇前または下降前に、前記処理手段の前記比較信号を所定の状態にリセットし、前記駆動手段による前記複数の支持部材の上昇後または下降後に、前記処理手段から前記比較信号を受け取ることを特徴とする請求項13〜17のいずれかに記載の基板処理ユニット。
- 基板載置台における基板の載置状態を検出する基板載置状態検出方法であって、
基板を前記基板載置台上で上昇または下降させるステップと、
前記基板の上昇中または下降中における基板と前記基板載置台との間の空間における気流の変化を検出するステップと、
前記検出される気流の変化に基づいて前記基板載置台における基板の載置状態を判定するステップとを備えたことを特徴とする基板載置状態検出方法。 - 請求項1〜18のいずれかに記載の基板処理ユニットと、
前記基板処理ユニットに基板を搬入および搬出する搬送手段とを備えたことを特徴とする基板処理装置。
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US10/941,785 US7139638B2 (en) | 2003-09-19 | 2004-09-15 | Substrate processing unit, method for detecting the position of a substrate and substrate processing apparatus |
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US20080008837A1 (en) * | 2006-07-10 | 2008-01-10 | Yasuhiro Shiba | Substrate processing apparatus and substrate processing method for heat-treating substrate |
US7750818B2 (en) * | 2006-11-29 | 2010-07-06 | Adp Engineering Co., Ltd. | System and method for introducing a substrate into a process chamber |
JP2008198836A (ja) * | 2007-02-14 | 2008-08-28 | Dainippon Screen Mfg Co Ltd | 基板処理装置および基板処理方法 |
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US20050065634A1 (en) | 2005-03-24 |
US7139638B2 (en) | 2006-11-21 |
JP2005117007A (ja) | 2005-04-28 |
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