JP4519234B2 - 物品表面の清浄化方法およびそのための清浄化装置 - Google Patents

物品表面の清浄化方法およびそのための清浄化装置 Download PDF

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Publication number
JP4519234B2
JP4519234B2 JP2000011001A JP2000011001A JP4519234B2 JP 4519234 B2 JP4519234 B2 JP 4519234B2 JP 2000011001 A JP2000011001 A JP 2000011001A JP 2000011001 A JP2000011001 A JP 2000011001A JP 4519234 B2 JP4519234 B2 JP 4519234B2
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ozone
cleaning
aqueous
solution
article
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JP2001203182A5 (enExample
JP2001203182A (ja
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久志 村岡
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Nomura Micro Science Co Ltd
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Nomura Micro Science Co Ltd
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JP2000011001A 2000-01-19 2000-01-19 物品表面の清浄化方法およびそのための清浄化装置 Expired - Fee Related JP4519234B2 (ja)

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JP2000011001A JP4519234B2 (ja) 2000-01-19 2000-01-19 物品表面の清浄化方法およびそのための清浄化装置

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JP2000011001A JP4519234B2 (ja) 2000-01-19 2000-01-19 物品表面の清浄化方法およびそのための清浄化装置

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JP2001203182A JP2001203182A (ja) 2001-07-27
JP2001203182A5 JP2001203182A5 (enExample) 2008-07-10
JP4519234B2 true JP4519234B2 (ja) 2010-08-04

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9561982B2 (en) 2013-04-30 2017-02-07 Corning Incorporated Method of cleaning glass substrates

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010225936A (ja) * 2009-03-24 2010-10-07 Dainippon Screen Mfg Co Ltd 基板処理方法および基板処理装置
JP6600470B2 (ja) 2014-04-01 2019-10-30 株式会社荏原製作所 洗浄装置及び洗浄方法
JP6296899B2 (ja) 2014-05-26 2018-03-20 三菱電機株式会社 レジスト除去装置及びレジスト除去方法
JP6713370B2 (ja) * 2016-08-01 2020-06-24 株式会社Ｓｃｒｅｅｎホールディングス 基板処理装置および基板処理方法
CN108220944B (zh) * 2018-01-23 2024-03-15 西安凯龙航空技术有限公司 一种发黑处理设备及其处理方法
JP2020155721A (ja) 2019-03-22 2020-09-24 株式会社Ｓｃｒｅｅｎホールディングス 基板処理方法

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60173841A (ja) * 1984-02-20 1985-09-07 Oki Electric Ind Co Ltd 基板の洗浄装置
JP3034720B2 (ja) * 1993-03-31 2000-04-17 ウシオ電機株式会社 表面洗浄方法もしくは表面改質方法
JP3749567B2 (ja) * 1996-04-08 2006-03-01 シルトロニック・ジャパン株式会社 半導体基板の洗浄方法
JP3332323B2 (ja) * 1996-10-29 2002-10-07 オルガノ株式会社 電子部品部材類の洗浄方法及び洗浄装置
JP3039483B2 (ja) * 1997-10-16 2000-05-08 日本電気株式会社 半導体基板の処理薬液及び半導体基板の薬液処理方法
JPH11260707A (ja) * 1998-03-09 1999-09-24 Tokyo Electron Ltd 現像処理方法及び現像処理装置
JP3125753B2 (ja) * 1998-06-30 2001-01-22 日本電気株式会社 基板の洗浄方法および基板洗浄装置

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9561982B2 (en) 2013-04-30 2017-02-07 Corning Incorporated Method of cleaning glass substrates

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