JP4494831B2 - 基板搬送装置及びこれを備えた基板搬送システム - Google Patents
基板搬送装置及びこれを備えた基板搬送システム Download PDFInfo
- Publication number
- JP4494831B2 JP4494831B2 JP2004068845A JP2004068845A JP4494831B2 JP 4494831 B2 JP4494831 B2 JP 4494831B2 JP 2004068845 A JP2004068845 A JP 2004068845A JP 2004068845 A JP2004068845 A JP 2004068845A JP 4494831 B2 JP4494831 B2 JP 4494831B2
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- cassette
- valve
- substrate transfer
- processing apparatus
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000000758 substrate Substances 0.000 title claims description 177
- 238000012546 transfer Methods 0.000 title claims description 49
- 238000012545 processing Methods 0.000 claims description 61
- 230000007246 mechanism Effects 0.000 claims description 42
- 230000032258 transport Effects 0.000 description 21
- 239000011521 glass Substances 0.000 description 12
- 238000000034 method Methods 0.000 description 6
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 4
- 239000012298 atmosphere Substances 0.000 description 3
- 238000005401 electroluminescence Methods 0.000 description 3
- 230000003028 elevating effect Effects 0.000 description 3
- 239000000696 magnetic material Substances 0.000 description 3
- 230000008569 process Effects 0.000 description 3
- 239000004065 semiconductor Substances 0.000 description 3
- 239000007789 gas Substances 0.000 description 2
- 229910052742 iron Inorganic materials 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- NJPPVKZQTLUDBO-UHFFFAOYSA-N novaluron Chemical compound C1=C(Cl)C(OC(F)(F)C(OC(F)(F)F)F)=CC=C1NC(=O)NC(=O)C1=C(F)C=CC=C1F NJPPVKZQTLUDBO-UHFFFAOYSA-N 0.000 description 2
- 229910001220 stainless steel Inorganic materials 0.000 description 2
- 239000010935 stainless steel Substances 0.000 description 2
- 235000012431 wafers Nutrition 0.000 description 2
- 230000009471 action Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000000969 carrier Substances 0.000 description 1
- 239000003086 colorant Substances 0.000 description 1
- 230000008602 contraction Effects 0.000 description 1
- 230000008878 coupling Effects 0.000 description 1
- 238000010168 coupling process Methods 0.000 description 1
- 238000005859 coupling reaction Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 239000012299 nitrogen atmosphere Substances 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67703—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations
- H01L21/67724—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations by means of a cart or a vehicule
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67763—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading
- H01L21/67775—Docking arrangements
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2004068845A JP4494831B2 (ja) | 2004-03-11 | 2004-03-11 | 基板搬送装置及びこれを備えた基板搬送システム |
PCT/JP2005/003172 WO2005087632A1 (fr) | 2004-03-11 | 2005-02-25 | Equipement de transfert de substrat et systeme de transfert de substrat dote de l’equipement de transfert de substrat |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2004068845A JP4494831B2 (ja) | 2004-03-11 | 2004-03-11 | 基板搬送装置及びこれを備えた基板搬送システム |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2005259947A JP2005259947A (ja) | 2005-09-22 |
JP4494831B2 true JP4494831B2 (ja) | 2010-06-30 |
Family
ID=34975464
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2004068845A Expired - Lifetime JP4494831B2 (ja) | 2004-03-11 | 2004-03-11 | 基板搬送装置及びこれを備えた基板搬送システム |
Country Status (2)
Country | Link |
---|---|
JP (1) | JP4494831B2 (fr) |
WO (1) | WO2005087632A1 (fr) |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8097084B2 (en) * | 2006-01-24 | 2012-01-17 | Vat Holding Ag | Vacuum chamber system for semiconductor processing |
JP2007328999A (ja) * | 2006-06-07 | 2007-12-20 | Tokyo Electron Ltd | 発光素子の製造装置および発光素子の製造方法 |
CN101593716B (zh) * | 2009-05-12 | 2011-06-29 | 上海微电子装备有限公司 | 器件传输方法及其装置 |
KR101293025B1 (ko) * | 2011-12-22 | 2013-08-05 | 에스엔유 프리시젼 주식회사 | 마스크 적재 및 기판 반송 챔버와, 마스크 적재 및 기판 반송 챔버의 운용방법 |
CN104465448B (zh) * | 2013-09-18 | 2017-06-06 | 北京北方微电子基地设备工艺研究中心有限责任公司 | 一种片盒升降装置、传输系统及半导体加工设备 |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH053240A (ja) * | 1991-06-24 | 1993-01-08 | Tdk Corp | クリーン搬送方法及び装置 |
JPH0637175A (ja) * | 1992-05-19 | 1994-02-10 | Ebara Corp | 保管箱のキャップ開閉装置 |
JP2001093957A (ja) * | 1999-09-21 | 2001-04-06 | Sharp Corp | 電子部品の製造装置および電子部品の製造方法 |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH07183354A (ja) * | 1993-12-24 | 1995-07-21 | Tokyo Electron Ltd | 基板の搬送システム及び基板の搬送方法 |
-
2004
- 2004-03-11 JP JP2004068845A patent/JP4494831B2/ja not_active Expired - Lifetime
-
2005
- 2005-02-25 WO PCT/JP2005/003172 patent/WO2005087632A1/fr active Application Filing
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH053240A (ja) * | 1991-06-24 | 1993-01-08 | Tdk Corp | クリーン搬送方法及び装置 |
JPH0637175A (ja) * | 1992-05-19 | 1994-02-10 | Ebara Corp | 保管箱のキャップ開閉装置 |
JP2001093957A (ja) * | 1999-09-21 | 2001-04-06 | Sharp Corp | 電子部品の製造装置および電子部品の製造方法 |
Also Published As
Publication number | Publication date |
---|---|
WO2005087632A1 (fr) | 2005-09-22 |
JP2005259947A (ja) | 2005-09-22 |
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