JP4440920B2 - 工具、特に切削工具及び基材成形体上に二相の層をcvd堆積させる方法 - Google Patents
工具、特に切削工具及び基材成形体上に二相の層をcvd堆積させる方法 Download PDFInfo
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- JP4440920B2 JP4440920B2 JP2006504307A JP2006504307A JP4440920B2 JP 4440920 B2 JP4440920 B2 JP 4440920B2 JP 2006504307 A JP2006504307 A JP 2006504307A JP 2006504307 A JP2006504307 A JP 2006504307A JP 4440920 B2 JP4440920 B2 JP 4440920B2
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- 238000005520 cutting process Methods 0.000 title claims description 19
- 239000000758 substrate Substances 0.000 title claims description 8
- 238000000034 method Methods 0.000 title description 6
- 230000008021 deposition Effects 0.000 title description 5
- 229910018072 Al 2 O 3 Inorganic materials 0.000 claims description 19
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims description 5
- 229910052751 metal Inorganic materials 0.000 claims description 5
- 239000002184 metal Substances 0.000 claims description 5
- 229910052719 titanium Inorganic materials 0.000 claims description 5
- 239000010936 titanium Substances 0.000 claims description 5
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 claims description 4
- 239000000919 ceramic Substances 0.000 claims description 2
- 239000011195 cermet Substances 0.000 claims description 2
- RKTYLMNFRDHKIL-UHFFFAOYSA-N copper;5,10,15,20-tetraphenylporphyrin-22,24-diide Chemical compound [Cu+2].C1=CC(C(=C2C=CC([N-]2)=C(C=2C=CC=CC=2)C=2C=CC(N=2)=C(C=2C=CC=CC=2)C2=CC=C3[N-]2)C=2C=CC=CC=2)=NC1=C3C1=CC=CC=C1 RKTYLMNFRDHKIL-UHFFFAOYSA-N 0.000 claims description 2
- 238000000576 coating method Methods 0.000 description 9
- 239000011248 coating agent Substances 0.000 description 8
- 239000007789 gas Substances 0.000 description 8
- 239000000203 mixture Substances 0.000 description 7
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 description 6
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 6
- 238000000151 deposition Methods 0.000 description 6
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 5
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 4
- 229910007926 ZrCl Inorganic materials 0.000 description 3
- 238000005229 chemical vapour deposition Methods 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 2
- 229910000831 Steel Inorganic materials 0.000 description 2
- 230000002051 biphasic effect Effects 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 239000002131 composite material Substances 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 2
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 2
- 239000010959 steel Substances 0.000 description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 239000007795 chemical reaction product Substances 0.000 description 1
- 239000005068 cooling lubricant Substances 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 229910052735 hafnium Inorganic materials 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 239000012495 reaction gas Substances 0.000 description 1
- UONOETXJSWQNOL-UHFFFAOYSA-N tungsten carbide Chemical compound [W+]#[C-] UONOETXJSWQNOL-UHFFFAOYSA-N 0.000 description 1
- 229910052726 zirconium Inorganic materials 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C30/00—Coating with metallic material characterised only by the composition of the metallic material, i.e. not characterised by the coating process
- C23C30/005—Coating with metallic material characterised only by the composition of the metallic material, i.e. not characterised by the coating process on hard metal substrates
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
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- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Vapour Deposition (AREA)
- Cutting Tools, Boring Holders, And Turrets (AREA)
Description
2TiCl4+CH3CN+4.5H2 → 2TiC0.5N0.5+CH4+8HCl
ZrCl4+2CO2+2H2 → ZrO2+2CO+4HCl
又は
2TiCl4+CH3CN+4.5H2 → 2TiC0.5N0.5+CH4+8HCl
HfCl4+2CO2+2H2 → HfO2+2CO+4HCl
アセトンに代わってピリジンを使用した場合にも相応する反応が行われ、反応生成物として同様にTiCxNy相が生じる。もちろん、ピリジンをガス相中で使用する場合に、C:N比は0.5:0.5から0.7:0.3に変化し、ベンゼンについては1.0:0に変化し、つまり、第1の相中にはよりわずかな窒素が含まれるかもしくは窒素が含まれない。
TiCl4: 1〜4体積%、有利に1〜2体積%
ZrCl4及び/又はHfCl4: 0.3〜4体積%、有利に0.5〜2体積%
C5H5N又はCH3CN又はC6H6: 0.2〜2体積%、有利に0.5〜1体積%
CO2: 0.1〜3体積%、有利に0.3〜2体積%、残りAr及び/又はH2。
TiCl4 1.4体積%、HfCl4 1.4体積%、CH3CN 0.8体積%、CO2 0.5体積%、残りH2。
vc=450m/min、ap=2.5mm及びf=0.315mm/Uであった。
vc=400m/min、ap=2.5mm及びf=0.315mm/U。
Claims (10)
- CVDによって少なくとも1つの二相の層が堆積された基材成形体からなる工具、特に切削工具において、唯一の堆積された層又は複数の層の少なくとも1つがTiCN相又はTiOCN相又はTiOC相又はTiC相の他にZrO 2 又はHfO2からなる他の相を有することを特徴とする、工具。
- 他の相が単斜晶系及び/又は正方晶系で存在することを特徴とする、請求項1記載の工具。
- 他の相としてZrO 2 又はHfO2を含有する層上に、Al2O3 を堆積させることを特徴とする、請求項1又は2記載の工具。
- 他の相としてZrO 2 又はHfO 2 を含有する層上に、Al 2 O 3 を外側層として堆積させることを特徴とする、請求項3記載の工具。
- 他の相としてZrO 2 又はHfO 2 を含有する層上に、Al 2 O 3 をα−Al 2 O 3 として堆積させることを特徴とする、請求項3又は4記載の工具。
- 基材成形体は硬質金属、サーメット又はセラミックからなることを特徴とする、請求項1から5までのいずれか1項記載の工具。
- TiCN相、TiOCN相、TiC相又はTiOC相対他の相の比は、4:1〜1:4であることを特徴とする、請求項1から6までのいずれか1項記載の工具。
- TiCN相、TiOCN相、TiC相又はTiOC相対他の相の比は、2:1〜1:2であることを特徴とする、請求項1から6までのいずれか1項記載の工具。
- TiCN相又はTiOCN相又はTiOC相又はTiC相中でチタンはわずかな割合でZr又はHfに置き換えられていることを特徴とする、請求項1から8までのいずれか1項記載の工具。
- 二相の層は2つのTiN層の間の中間層であることを特徴とする、請求項1から9までのいずれか1項記載の工具。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE2003120652 DE10320652A1 (de) | 2003-05-07 | 2003-05-07 | Werkzeug, insbesondere Schneidwerkzeug und Verfahren zur CVD-Abscheidung einer zweiphasigen Schicht auf einem Substratkörper |
DE102004010594 | 2004-03-02 | ||
PCT/DE2004/000845 WO2004099463A2 (de) | 2003-05-07 | 2004-04-23 | Werkzeug und verfahren zur cvd-abscheidung einer zweiphasigen schicht auf einem substratkörper |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2006525125A JP2006525125A (ja) | 2006-11-09 |
JP4440920B2 true JP4440920B2 (ja) | 2010-03-24 |
Family
ID=33435964
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2006504307A Expired - Fee Related JP4440920B2 (ja) | 2003-05-07 | 2004-04-23 | 工具、特に切削工具及び基材成形体上に二相の層をcvd堆積させる方法 |
Country Status (5)
Country | Link |
---|---|
EP (1) | EP1620578B1 (ja) |
JP (1) | JP4440920B2 (ja) |
CA (1) | CA2524643C (ja) |
MX (1) | MXPA05011197A (ja) |
WO (1) | WO2004099463A2 (ja) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
ES2322156T3 (es) | 2004-12-30 | 2009-06-17 | Lg Electronics Inc. | Procedimiento de fabricacion de una nanopelicula basada en ti-o-c ultrahidrofila. |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4714660A (en) * | 1985-12-23 | 1987-12-22 | Fansteel Inc. | Hard coatings with multiphase microstructures |
ES2182592T3 (es) * | 1998-09-24 | 2003-03-01 | Widia Gmbh | Recubrimiento de material compuesto y procedimiento para su fabricacion. |
DE10017909B4 (de) * | 1999-04-13 | 2009-07-23 | Mitsubishi Materials Corp. | Beschichtetes Sinterkarbid-Schneidwerkzeugelement |
JP2002224903A (ja) * | 2001-01-31 | 2002-08-13 | Hitachi Tool Engineering Ltd | 多層被覆工具 |
JP3475941B2 (ja) * | 2001-06-20 | 2003-12-10 | 三菱マテリアル神戸ツールズ株式会社 | 切粉に対する表面潤滑性にすぐれた表面被覆超硬合金製切削工具 |
-
2004
- 2004-04-23 WO PCT/DE2004/000845 patent/WO2004099463A2/de active Application Filing
- 2004-04-23 EP EP04729035.8A patent/EP1620578B1/de not_active Expired - Lifetime
- 2004-04-23 CA CA2524643A patent/CA2524643C/en not_active Expired - Fee Related
- 2004-04-23 JP JP2006504307A patent/JP4440920B2/ja not_active Expired - Fee Related
- 2004-04-23 MX MXPA05011197A patent/MXPA05011197A/es active IP Right Grant
Also Published As
Publication number | Publication date |
---|---|
EP1620578B1 (de) | 2014-05-21 |
MXPA05011197A (es) | 2005-12-14 |
JP2006525125A (ja) | 2006-11-09 |
CA2524643C (en) | 2010-11-02 |
WO2004099463A3 (de) | 2005-01-06 |
WO2004099463A2 (de) | 2004-11-18 |
EP1620578A2 (de) | 2006-02-01 |
CA2524643A1 (en) | 2004-11-18 |
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