CA2524643A1 - Tool, especially cutting tool and method for the cvd deposition of a two phase layer on a substrate body - Google Patents
Tool, especially cutting tool and method for the cvd deposition of a two phase layer on a substrate body Download PDFInfo
- Publication number
- CA2524643A1 CA2524643A1 CA002524643A CA2524643A CA2524643A1 CA 2524643 A1 CA2524643 A1 CA 2524643A1 CA 002524643 A CA002524643 A CA 002524643A CA 2524643 A CA2524643 A CA 2524643A CA 2524643 A1 CA2524643 A1 CA 2524643A1
- Authority
- CA
- Canada
- Prior art keywords
- phase
- vol
- layer
- tool
- tool according
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000000034 method Methods 0.000 title claims abstract 5
- 239000000758 substrate Substances 0.000 title claims abstract 5
- 230000008021 deposition Effects 0.000 title claims 3
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 claims abstract 6
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 claims abstract 6
- 229910003865 HfCl4 Inorganic materials 0.000 claims abstract 3
- 229910003074 TiCl4 Inorganic materials 0.000 claims abstract 3
- 229910007932 ZrCl4 Inorganic materials 0.000 claims abstract 3
- PDPJQWYGJJBYLF-UHFFFAOYSA-J hafnium tetrachloride Chemical compound Cl[Hf](Cl)(Cl)Cl PDPJQWYGJJBYLF-UHFFFAOYSA-J 0.000 claims abstract 3
- CJNBYAVZURUTKZ-UHFFFAOYSA-N hafnium(IV) oxide Inorganic materials O=[Hf]=O CJNBYAVZURUTKZ-UHFFFAOYSA-N 0.000 claims abstract 3
- XJDNKRIXUMDJCW-UHFFFAOYSA-J titanium tetrachloride Chemical compound Cl[Ti](Cl)(Cl)Cl XJDNKRIXUMDJCW-UHFFFAOYSA-J 0.000 claims abstract 3
- DUNKXUFBGCUVQW-UHFFFAOYSA-J zirconium tetrachloride Chemical compound Cl[Zr](Cl)(Cl)Cl DUNKXUFBGCUVQW-UHFFFAOYSA-J 0.000 claims abstract 3
- 239000011248 coating agent Substances 0.000 claims 4
- 238000000576 coating method Methods 0.000 claims 4
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 claims 3
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 claims 2
- 229910052593 corundum Inorganic materials 0.000 claims 2
- 229910001845 yogo sapphire Inorganic materials 0.000 claims 2
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 claims 1
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 claims 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 claims 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims 1
- 239000000919 ceramic Substances 0.000 claims 1
- 239000011195 cermet Substances 0.000 claims 1
- RKTYLMNFRDHKIL-UHFFFAOYSA-N copper;5,10,15,20-tetraphenylporphyrin-22,24-diide Chemical group [Cu+2].C1=CC(C(=C2C=CC([N-]2)=C(C=2C=CC=CC=2)C=2C=CC(N=2)=C(C=2C=CC=CC=2)C2=CC=C3[N-]2)C=2C=CC=CC=2)=NC1=C3C1=CC=CC=C1 RKTYLMNFRDHKIL-UHFFFAOYSA-N 0.000 claims 1
- 229910052751 metal Inorganic materials 0.000 claims 1
- 239000002184 metal Substances 0.000 claims 1
- 239000010936 titanium Substances 0.000 claims 1
- 229910052719 titanium Inorganic materials 0.000 claims 1
- 238000005229 chemical vapour deposition Methods 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C30/00—Coating with metallic material characterised only by the composition of the metallic material, i.e. not characterised by the coating process
- C23C30/005—Coating with metallic material characterised only by the composition of the metallic material, i.e. not characterised by the coating process on hard metal substrates
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Vapour Deposition (AREA)
- Cutting Tools, Boring Holders, And Turrets (AREA)
Abstract
The invention relates to a tool, especially a cutting tool, comprising a substrate member onto which at least one layer is deposited by means of CVD, and a method for the chemical vapor deposition of a two-phase layer on a sintered part. According to the invention, the single deposited layer or at least one of the layers is provided with a TiCN phase, TiOCN phase, TiOC
phase, or TiC phase and an additional phase consisting of ZrO2 and/or HfO2.
CH3CN, C5H5N, or C6H6 is used in the gas atmosphere for producing such a layer in addition to TiCl4, HfCl4, and/or ZrCl4 and CO2, the remainder being composed of H2 and/or Ar.
phase, or TiC phase and an additional phase consisting of ZrO2 and/or HfO2.
CH3CN, C5H5N, or C6H6 is used in the gas atmosphere for producing such a layer in addition to TiCl4, HfCl4, and/or ZrCl4 and CO2, the remainder being composed of H2 and/or Ar.
Claims (10)
1. A tool, especially a cutting tool comprised of a substrate body upon which at least one coating or layer is deposited by means of CVD, characterized in that the single deposited coating or at least one of the layers has apart from a TiCN phase or a TiOCN phase or a TiOC phase or a TiC phase, a further phase comprised of ZrO2 and/or HfO2.
2. The tool according to claim 1 characterized in that the further phase is present in monoclinic and/or tetragonal form.
3. The tool according to claim 1 or 2 characterized in that on the coating or layer which contains ZrO2 and/or HfO2 as the further phase, Al2O3 is deposited, preferably as an outer coating and preferably further as .alpha.-Al2O3.
4. The tool according to one of claims 1 through 3, characterized in that the substrate body is comprised of a hard metal, a cermet or a ceramic.
5. The tool according to one of claims 1 to 4, characterized in that the ratio of the TiCN phase, TiOCN phase, TiC
phase or TiOC phase to the further phase lies between 4:1 and 1:4, preferably between 2:1 and 1:2.
phase or TiOC phase to the further phase lies between 4:1 and 1:4, preferably between 2:1 and 1:2.
6. The tool according to one of claims 1 to 5, characterized in that in the TiCN phase, or TiOCN phase, or TiOC
pahse or TiC phase, the titanium is replaced to a small proportion by Zr and/or Hf.
pahse or TiC phase, the titanium is replaced to a small proportion by Zr and/or Hf.
7. The tool according to one of claims 1 to 6, characterized in that the two phase layer is an intermediate layer between two TiN layers.
8. A method of CVD deposition of a two phase layer upon a substrate body in accordance with one of claims 1 to 7, characterized in that into the gas atmosphere apart from TiCl4, HfCl4 and/or ZrCl4 and CO2, CH3CN (acetonitrile) or C5H5N (pyridine) or C6H6 (benzene) are introduced, the balance being H2 and/or Ar.
9. The method according to claim 8 characterized by the following gas proportions:
TiCl4 : 1 to 4 vol. % preferably 1 to 2 vol. % ZrCl4 and/or HfCl4 0.3 to 4 vol. %, preferably 0.5 to 2 vol. % C5H5N or CH3CN or C6H6 : 0.2 to 2 vol. %, preferably 0.5 to 1 vol. %; CO2:0.1 to 3 vol. %, preferably 0.3 to 2 vol. % balance Ar and/or H2.
TiCl4 : 1 to 4 vol. % preferably 1 to 2 vol. % ZrCl4 and/or HfCl4 0.3 to 4 vol. %, preferably 0.5 to 2 vol. % C5H5N or CH3CN or C6H6 : 0.2 to 2 vol. %, preferably 0.5 to 1 vol. %; CO2:0.1 to 3 vol. %, preferably 0.3 to 2 vol. % balance Ar and/or H2.
10. The method according to claim 8 or 9 characterized in that the deposition temperature lies between 800°C and 1000°C
and the gas atmosphere pressure lies between 5 × 10 3 and 6 × 10 4 Pa.
and the gas atmosphere pressure lies between 5 × 10 3 and 6 × 10 4 Pa.
Applications Claiming Priority (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE10320652.3 | 2003-05-07 | ||
| DE2003120652 DE10320652A1 (en) | 2003-05-07 | 2003-05-07 | Tool, especially a cutting tool, comprising a substrate member onto which at least one layer is deposited by means of chemical vapor deposition (CVD) used in machining operations, e.g. metal cutting |
| DE102004010594.4 | 2004-03-02 | ||
| DE102004010594 | 2004-03-02 | ||
| PCT/DE2004/000845 WO2004099463A2 (en) | 2003-05-07 | 2004-04-23 | Tool and method for the chemical vapor deposition of a two-phase layer on a substrate member |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CA2524643A1 true CA2524643A1 (en) | 2004-11-18 |
| CA2524643C CA2524643C (en) | 2010-11-02 |
Family
ID=33435964
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CA2524643A Expired - Fee Related CA2524643C (en) | 2003-05-07 | 2004-04-23 | Tool, especially cutting tool and method for the cvd deposition of a two phase layer on a substrate body |
Country Status (5)
| Country | Link |
|---|---|
| EP (1) | EP1620578B1 (en) |
| JP (1) | JP4440920B2 (en) |
| CA (1) | CA2524643C (en) |
| MX (1) | MXPA05011197A (en) |
| WO (1) | WO2004099463A2 (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| ES2322156T3 (en) | 2004-12-30 | 2009-06-17 | Lg Electronics Inc. | MANUFACTURING PROCEDURE OF A TI-O-C ULTRAHYDROPHILE-BASED NANOPELLICLE. |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4714660A (en) * | 1985-12-23 | 1987-12-22 | Fansteel Inc. | Hard coatings with multiphase microstructures |
| ES2182592T3 (en) * | 1998-09-24 | 2003-03-01 | Widia Gmbh | COATING COMPOSITE MATERIAL AND PROCEDURE FOR MANUFACTURING. |
| DE10017909B4 (en) * | 1999-04-13 | 2009-07-23 | Mitsubishi Materials Corp. | Coated cemented carbide cutting tool element |
| JP2002224903A (en) * | 2001-01-31 | 2002-08-13 | Hitachi Tool Engineering Ltd | Multilayer coated tool |
| JP3475941B2 (en) * | 2001-06-20 | 2003-12-10 | 三菱マテリアル神戸ツールズ株式会社 | Surface-coated cemented carbide cutting tool with excellent surface lubricity against chips |
-
2004
- 2004-04-23 WO PCT/DE2004/000845 patent/WO2004099463A2/en active Application Filing
- 2004-04-23 EP EP04729035.8A patent/EP1620578B1/en not_active Expired - Lifetime
- 2004-04-23 CA CA2524643A patent/CA2524643C/en not_active Expired - Fee Related
- 2004-04-23 JP JP2006504307A patent/JP4440920B2/en not_active Expired - Fee Related
- 2004-04-23 MX MXPA05011197A patent/MXPA05011197A/en active IP Right Grant
Also Published As
| Publication number | Publication date |
|---|---|
| EP1620578B1 (en) | 2014-05-21 |
| MXPA05011197A (en) | 2005-12-14 |
| JP2006525125A (en) | 2006-11-09 |
| CA2524643C (en) | 2010-11-02 |
| WO2004099463A3 (en) | 2005-01-06 |
| JP4440920B2 (en) | 2010-03-24 |
| WO2004099463A2 (en) | 2004-11-18 |
| EP1620578A2 (en) | 2006-02-01 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| EEER | Examination request | ||
| MKLA | Lapsed |
Effective date: 20160425 |