JP4438786B2 - Mems振動子及びその製造方法 - Google Patents
Mems振動子及びその製造方法 Download PDFInfo
- Publication number
- JP4438786B2 JP4438786B2 JP2006261135A JP2006261135A JP4438786B2 JP 4438786 B2 JP4438786 B2 JP 4438786B2 JP 2006261135 A JP2006261135 A JP 2006261135A JP 2006261135 A JP2006261135 A JP 2006261135A JP 4438786 B2 JP4438786 B2 JP 4438786B2
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- JP
- Japan
- Prior art keywords
- fixed electrode
- movable electrode
- mems
- electrode
- mems vibrator
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
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- 238000004519 manufacturing process Methods 0.000 title claims description 29
- 239000000758 substrate Substances 0.000 claims description 40
- 238000000034 method Methods 0.000 claims description 16
- 238000005530 etching Methods 0.000 description 22
- 239000004065 semiconductor Substances 0.000 description 10
- 230000001681 protective effect Effects 0.000 description 8
- 229910052751 metal Inorganic materials 0.000 description 6
- 239000002184 metal Substances 0.000 description 6
- 239000000463 material Substances 0.000 description 5
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 4
- 238000005229 chemical vapour deposition Methods 0.000 description 4
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 description 3
- 229910052782 aluminium Inorganic materials 0.000 description 3
- 239000000428 dust Substances 0.000 description 3
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 3
- 230000001133 acceleration Effects 0.000 description 2
- 229910052804 chromium Inorganic materials 0.000 description 2
- 239000004020 conductor Substances 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- 238000009499 grossing Methods 0.000 description 2
- 230000010354 integration Effects 0.000 description 2
- 150000004767 nitrides Chemical class 0.000 description 2
- 230000003647 oxidation Effects 0.000 description 2
- 238000007254 oxidation reaction Methods 0.000 description 2
- 230000000737 periodic effect Effects 0.000 description 2
- 239000005368 silicate glass Substances 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 2
- 229910052715 tantalum Inorganic materials 0.000 description 2
- 229910052721 tungsten Inorganic materials 0.000 description 2
- 238000001039 wet etching Methods 0.000 description 2
- 229910016570 AlCu Inorganic materials 0.000 description 1
- JBRZTFJDHDCESZ-UHFFFAOYSA-N AsGa Chemical compound [As]#[Ga] JBRZTFJDHDCESZ-UHFFFAOYSA-N 0.000 description 1
- 229910052581 Si3N4 Inorganic materials 0.000 description 1
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- GDFCWFBWQUEQIJ-UHFFFAOYSA-N [B].[P] Chemical compound [B].[P] GDFCWFBWQUEQIJ-UHFFFAOYSA-N 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 238000013459 approach Methods 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 230000005489 elastic deformation Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 229910021421 monocrystalline silicon Inorganic materials 0.000 description 1
- 230000010355 oscillation Effects 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
- H03H9/24—Constructional features of resonators of material which is not piezoelectric, electrostrictive, or magnetostrictive
- H03H9/2405—Constructional features of resonators of material which is not piezoelectric, electrostrictive, or magnetostrictive of microelectro-mechanical resonators
- H03H9/2447—Beam resonators
- H03H9/2457—Clamped-free beam resonators
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H3/00—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators
- H03H3/007—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks
- H03H3/0072—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks of microelectro-mechanical resonators or networks
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
- H03H9/02—Details
- H03H9/02244—Details of microelectro-mechanical resonators
- H03H9/02433—Means for compensation or elimination of undesired effects
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
- H03H9/02—Details
- H03H9/02244—Details of microelectro-mechanical resonators
- H03H2009/02488—Vibration modes
- H03H2009/02511—Vertical, i.e. perpendicular to the substrate plane
Landscapes
- Physics & Mathematics (AREA)
- Acoustics & Sound (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Micromachines (AREA)
- Piezo-Electric Or Mechanical Vibrators, Or Delay Or Filter Circuits (AREA)
Description
図1は、本発明を適用した第1の実施の形態に係るMEMS振動子を示す概略平面図である。図2は、本発明を適用した第1の実施の形態に係るMEMS振動子の断面図である。本実施の形態に係るMEMS振動子は、図2に示すように、基板10と、この表面上に設けられたMEMS構造体とによって構成されている。
図5は、本発明を適用した第2の実施の形態に係るMEMS振動子を示す概略平面図である。図6は、本発明を適用した第2の実施の形態に係るMEMS振動子の断面図である。本実施の形態に係るMEMS振動子は、図6に示すように、基板10と、この表面上に設けられたMEMS構造体とによって構成されている。
Claims (5)
- 基板と、
前記基板上に形成される固定電極と、
前記固定電極に対向して配置され、前記固定電極との間隙に働く静電引力又は静電反発力により駆動する可動電極と、
を含み、
前記固定電極は前記可動電極と対向する側面部にテーパー面を有し、
前記可動電極は、前記固定電極のテーパー面に対向する前記可動電極の支持梁の内側面が傾斜面を有するMEMS振動子。 - 請求項1に記載されたMEMS振動子において、
前記テーパー面は傾斜角を持つMEMS振動子。 - 請求項2に記載されたMEMS振動子において、
前記傾斜面は傾斜角を持つMEMS振動子。 - 請求項1又は3に記載されたMEMS振動子において、
前記固定電極のテーパー面と前記可動電極の内側面の傾斜面との間隙は一定の間隔であるMEMS振動子。 - 基板上に、側面部にテーパー面を有する固定電極を形成すること、
前記固定電極上面部および前記固定電極のテーパー面上に犠牲膜を形成すること、
前記基板及び前記犠牲膜上に前記固定電極上面部および前記固定電極のテーパー面の少なくとも一部が対向配置されるように前記可動電極を形成すること、
前記犠牲層を除去すること、
を含むMEMS振動子の製造方法。
Priority Applications (8)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2006261135A JP4438786B2 (ja) | 2005-11-17 | 2006-09-26 | Mems振動子及びその製造方法 |
US11/561,146 US7656252B2 (en) | 2005-11-17 | 2006-11-17 | Micro-electro-mechanical-system (MEMS) resonator and manufacturing method thereof |
EP06023918A EP1788703A3 (en) | 2005-11-17 | 2006-11-17 | Micro-electro-mechanical-system (MEMS) resonator and manufacturing method thereof |
CN2010102457850A CN101917175B (zh) | 2005-11-17 | 2006-11-17 | Mems振子及其制造方法 |
CN200610148484XA CN1966392B (zh) | 2005-11-17 | 2006-11-17 | Mems振子及其制造方法 |
US12/534,468 US8018302B2 (en) | 2005-11-17 | 2009-08-03 | Micro-electro-mechanical-system (MEMS) resonator and manufacturing method thereof |
US12/639,102 US8063721B2 (en) | 2005-11-17 | 2009-12-16 | Micro-electro-mechanical-system (MEMS) resonator and manufacturing method thereof |
US13/270,868 US8198957B2 (en) | 2005-11-17 | 2011-10-11 | Micro-electro-mechanical-system (MEMS) resonator and manufacturing method thereof |
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2005332444 | 2005-11-17 | ||
JP2005332445 | 2005-11-17 | ||
JP2006261135A JP4438786B2 (ja) | 2005-11-17 | 2006-09-26 | Mems振動子及びその製造方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2007160495A JP2007160495A (ja) | 2007-06-28 |
JP4438786B2 true JP4438786B2 (ja) | 2010-03-24 |
Family
ID=37762068
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2006261135A Expired - Fee Related JP4438786B2 (ja) | 2005-11-17 | 2006-09-26 | Mems振動子及びその製造方法 |
Country Status (4)
Country | Link |
---|---|
US (4) | US7656252B2 (ja) |
EP (1) | EP1788703A3 (ja) |
JP (1) | JP4438786B2 (ja) |
CN (2) | CN1966392B (ja) |
Families Citing this family (18)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4438786B2 (ja) | 2005-11-17 | 2010-03-24 | セイコーエプソン株式会社 | Mems振動子及びその製造方法 |
CN101971495A (zh) * | 2008-02-21 | 2011-02-09 | 三洋电机株式会社 | 微型机械谐振器 |
US7880448B2 (en) * | 2008-03-14 | 2011-02-01 | Astronics Advanced Electronic Systems Corp. | Fault clearing method for permanent magnet machines |
JP5339755B2 (ja) * | 2008-03-25 | 2013-11-13 | ラピスセミコンダクタ株式会社 | Mems振動子、半導体パッケージ |
JP5417737B2 (ja) * | 2008-04-23 | 2014-02-19 | パナソニック株式会社 | 慣性力センサ |
JP5463961B2 (ja) * | 2010-03-04 | 2014-04-09 | 富士通株式会社 | Memsデバイスの製造方法およびmemsデバイス |
JP2011189423A (ja) | 2010-03-12 | 2011-09-29 | Seiko Epson Corp | Mems素子および発振器 |
JP2011218462A (ja) | 2010-04-06 | 2011-11-04 | Seiko Epson Corp | Mems装置 |
JP2012129605A (ja) * | 2010-12-13 | 2012-07-05 | Seiko Epson Corp | Mems振動子、発振器、およびmems振動子の製造方法 |
JP5526061B2 (ja) | 2011-03-11 | 2014-06-18 | 株式会社東芝 | Mems及びその製造方法 |
JP2013030905A (ja) * | 2011-07-27 | 2013-02-07 | Seiko Epson Corp | Mems振動子および発振器 |
JP2013211650A (ja) * | 2012-03-30 | 2013-10-10 | Seiko Epson Corp | Mems振動子およびmems振動子の製造方法 |
JP2014033335A (ja) * | 2012-08-03 | 2014-02-20 | Seiko Epson Corp | Mems素子、電子機器、およびmems素子の製造方法 |
JP2014072876A (ja) * | 2012-10-02 | 2014-04-21 | Seiko Epson Corp | Mems素子および発振器 |
JP2014107711A (ja) * | 2012-11-28 | 2014-06-09 | Seiko Epson Corp | 振動子および電子機器 |
JP2014107710A (ja) * | 2012-11-28 | 2014-06-09 | Seiko Epson Corp | 振動子および電子機器 |
JP2014116707A (ja) * | 2012-12-07 | 2014-06-26 | Seiko Epson Corp | 振動子の製造方法 |
JP2014212410A (ja) * | 2013-04-18 | 2014-11-13 | セイコーエプソン株式会社 | 振動子、発振器、電子機器、移動体、および振動子の製造方法 |
Family Cites Families (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5260596A (en) * | 1991-04-08 | 1993-11-09 | Motorola, Inc. | Monolithic circuit with integrated bulk structure resonator |
JPH056891A (ja) | 1991-06-27 | 1993-01-14 | Fujitsu Ltd | 半導体装置の製造方法 |
JPH06224385A (ja) | 1993-01-25 | 1994-08-12 | Mitsubishi Electric Corp | 半導体記憶装置とその製造方法 |
JPH06317404A (ja) | 1993-05-10 | 1994-11-15 | Canon Inc | カンチレバー型アクチュエータ及びそれを用いた走査型探針顕微鏡並びに情報処理装置 |
JPH0766280A (ja) | 1993-08-30 | 1995-03-10 | Toshiba Corp | 半導体装置の製造方法 |
US6249073B1 (en) * | 1999-01-14 | 2001-06-19 | The Regents Of The University Of Michigan | Device including a micromechanical resonator having an operating frequency and method of extending same |
US20020074897A1 (en) * | 2000-12-15 | 2002-06-20 | Qing Ma | Micro-electromechanical structure resonator frequency adjustment using radient energy trimming and laser/focused ion beam assisted deposition |
JP4075503B2 (ja) * | 2002-07-30 | 2008-04-16 | ソニー株式会社 | マイクロマシンおよびその製造方法 |
US6661069B1 (en) * | 2002-10-22 | 2003-12-09 | International Business Machines Corporation | Micro-electromechanical varactor with enhanced tuning range |
JP4337511B2 (ja) | 2003-02-12 | 2009-09-30 | 株式会社デンソー | 静電アクチュエータおよびその製造方法 |
JP4513366B2 (ja) * | 2003-03-25 | 2010-07-28 | パナソニック株式会社 | 機械共振器、フィルタおよび電気回路 |
JP2004314251A (ja) | 2003-04-17 | 2004-11-11 | Fuji Photo Film Co Ltd | 薄膜梁及びその成形方法 |
US7372346B2 (en) * | 2003-12-24 | 2008-05-13 | Interuniversitair Microelektronica Centrum (Imec) | Acoustic resonator |
FR2864951B1 (fr) * | 2004-01-14 | 2006-03-31 | Suisse Electronique Microtech | Dispositif de type microsysteme electromecanique a film mince piezoelectrique |
JP4438786B2 (ja) * | 2005-11-17 | 2010-03-24 | セイコーエプソン株式会社 | Mems振動子及びその製造方法 |
-
2006
- 2006-09-26 JP JP2006261135A patent/JP4438786B2/ja not_active Expired - Fee Related
- 2006-11-17 US US11/561,146 patent/US7656252B2/en not_active Expired - Fee Related
- 2006-11-17 EP EP06023918A patent/EP1788703A3/en not_active Withdrawn
- 2006-11-17 CN CN200610148484XA patent/CN1966392B/zh not_active Expired - Fee Related
- 2006-11-17 CN CN2010102457850A patent/CN101917175B/zh not_active Expired - Fee Related
-
2009
- 2009-08-03 US US12/534,468 patent/US8018302B2/en not_active Expired - Fee Related
- 2009-12-16 US US12/639,102 patent/US8063721B2/en not_active Expired - Fee Related
-
2011
- 2011-10-11 US US13/270,868 patent/US8198957B2/en active Active
Also Published As
Publication number | Publication date |
---|---|
US20120025922A1 (en) | 2012-02-02 |
CN101917175B (zh) | 2012-07-04 |
US20100090786A1 (en) | 2010-04-15 |
US7656252B2 (en) | 2010-02-02 |
US8063721B2 (en) | 2011-11-22 |
US20090302707A1 (en) | 2009-12-10 |
US8198957B2 (en) | 2012-06-12 |
CN1966392B (zh) | 2010-09-29 |
CN1966392A (zh) | 2007-05-23 |
CN101917175A (zh) | 2010-12-15 |
EP1788703A3 (en) | 2012-12-05 |
US8018302B2 (en) | 2011-09-13 |
JP2007160495A (ja) | 2007-06-28 |
EP1788703A2 (en) | 2007-05-23 |
US20070109074A1 (en) | 2007-05-17 |
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