JP4422238B2 - ステージ回転を補償するために極座標ステージ及び連続画像回転を用いる装置及びその装置による測定方法 - Google Patents

ステージ回転を補償するために極座標ステージ及び連続画像回転を用いる装置及びその装置による測定方法 Download PDF

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JP4422238B2
JP4422238B2 JP18736199A JP18736199A JP4422238B2 JP 4422238 B2 JP4422238 B2 JP 4422238B2 JP 18736199 A JP18736199 A JP 18736199A JP 18736199 A JP18736199 A JP 18736199A JP 4422238 B2 JP4422238 B2 JP 4422238B2
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image
sample
rotary platform
processing system
image processing
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JP2000207028A5 (enExample
JP2000207028A (ja
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ロバート・ブキャナン
リチャード・エイ・ヤルーシ
ブライン・アール・スペーディ
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ナノメトリックス・インコーポレイテッド
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    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Control Of Position Or Direction (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Image Analysis (AREA)
JP18736199A 1998-07-10 1999-07-01 ステージ回転を補償するために極座標ステージ及び連続画像回転を用いる装置及びその装置による測定方法 Expired - Fee Related JP4422238B2 (ja)

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US09/113,484 US6320609B1 (en) 1998-07-10 1998-07-10 System using a polar coordinate stage and continuous image rotation to compensate for stage rotation
US09/113484 1998-07-10

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JP2000207028A JP2000207028A (ja) 2000-07-28
JP2000207028A5 JP2000207028A5 (enExample) 2006-02-09
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Cited By (1)

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EP0971254A3 (en) 2000-02-23
EP0971254A2 (en) 2000-01-12
US20070222991A1 (en) 2007-09-27
JP2000207028A (ja) 2000-07-28
US7289215B2 (en) 2007-10-30
US6320609B1 (en) 2001-11-20

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