JP4398541B2 - 不揮発性半導体メモリ - Google Patents
不揮発性半導体メモリ Download PDFInfo
- Publication number
- JP4398541B2 JP4398541B2 JP18705199A JP18705199A JP4398541B2 JP 4398541 B2 JP4398541 B2 JP 4398541B2 JP 18705199 A JP18705199 A JP 18705199A JP 18705199 A JP18705199 A JP 18705199A JP 4398541 B2 JP4398541 B2 JP 4398541B2
- Authority
- JP
- Japan
- Prior art keywords
- signal line
- control signal
- wiring layer
- mos transistor
- well region
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Images
Landscapes
- Semiconductor Memories (AREA)
- Non-Volatile Memory (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP18705199A JP4398541B2 (ja) | 1999-06-30 | 1999-06-30 | 不揮発性半導体メモリ |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP18705199A JP4398541B2 (ja) | 1999-06-30 | 1999-06-30 | 不揮発性半導体メモリ |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2001015718A JP2001015718A (ja) | 2001-01-19 |
| JP2001015718A5 JP2001015718A5 (enExample) | 2005-10-06 |
| JP4398541B2 true JP4398541B2 (ja) | 2010-01-13 |
Family
ID=16199325
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP18705199A Expired - Fee Related JP4398541B2 (ja) | 1999-06-30 | 1999-06-30 | 不揮発性半導体メモリ |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP4398541B2 (enExample) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2006024598A (ja) | 2004-07-06 | 2006-01-26 | Fujitsu Ltd | 半導体装置の製造方法 |
| JP4857682B2 (ja) * | 2005-09-16 | 2012-01-18 | セイコーエプソン株式会社 | 半導体集積回路装置及び電子機器 |
| JP7091130B2 (ja) | 2018-05-08 | 2022-06-27 | キオクシア株式会社 | 半導体記憶装置 |
-
1999
- 1999-06-30 JP JP18705199A patent/JP4398541B2/ja not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| JP2001015718A (ja) | 2001-01-19 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US6420754B2 (en) | Semiconductor integrated circuit device | |
| US6570810B2 (en) | Contactless flash memory with buried diffusion bit/virtual ground lines | |
| US8687455B2 (en) | Nonvolatile semiconductor memory | |
| JP4504402B2 (ja) | 不揮発性半導体記憶装置 | |
| JP4619190B2 (ja) | プログラム可能な不揮発性メモリ | |
| US20090129171A1 (en) | Nonvolatile semiconductor memory and method of driving the same | |
| JP4223859B2 (ja) | 不揮発性半導体記憶装置 | |
| JP5159289B2 (ja) | 不揮発性半導体記憶装置 | |
| JP5051342B2 (ja) | 不揮発性半導体メモリ及びその駆動方法 | |
| US6646916B2 (en) | Non-volatile semiconductor memory device | |
| KR100346991B1 (ko) | 반도체 기억 장치 | |
| US11328776B2 (en) | Semiconductor memory device | |
| US7053441B2 (en) | Nonvolatile semiconductor memory device | |
| US7528436B2 (en) | Scalable electrically eraseable and programmable memory | |
| JP4398541B2 (ja) | 不揮発性半導体メモリ | |
| US7233513B2 (en) | Semiconductor memory device with MOS transistors each having floating gate and control gate | |
| JP3615046B2 (ja) | 不揮発性半導体記憶装置 | |
| US7671399B2 (en) | Semiconductor storage device | |
| JP3985689B2 (ja) | 不揮発性半導体記憶装置 | |
| JP6623247B2 (ja) | フラッシュメモリおよびその製造方法 | |
| US7053442B2 (en) | Nonvolatile semiconductor memory device | |
| JPH0357281A (ja) | 不揮発性半導体記憶装置 | |
| JP2007310999A (ja) | 半導体記憶装置 | |
| JP2007123917A (ja) | 半導体集積回路装置の製造方法 | |
| JP2005260253A (ja) | 半導体集積回路装置およびその製造方法 |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20050523 |
|
| A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20050523 |
|
| A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20080109 |
|
| A711 | Notification of change in applicant |
Free format text: JAPANESE INTERMEDIATE CODE: A712 Effective date: 20090210 |
|
| A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A821 Effective date: 20090210 |
|
| A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20090421 |
|
| A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20090619 |
|
| A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20090714 |
|
| A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20090824 |
|
| TRDD | Decision of grant or rejection written | ||
| A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20090929 |
|
| A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 |
|
| A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20091023 |
|
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20121030 Year of fee payment: 3 |
|
| R150 | Certificate of patent or registration of utility model |
Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20131030 Year of fee payment: 4 |
|
| LAPS | Cancellation because of no payment of annual fees |