JP4395248B2 - 照射された放射線感受性記録材料用の現像液 - Google Patents

照射された放射線感受性記録材料用の現像液 Download PDF

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Publication number
JP4395248B2
JP4395248B2 JP2000271387A JP2000271387A JP4395248B2 JP 4395248 B2 JP4395248 B2 JP 4395248B2 JP 2000271387 A JP2000271387 A JP 2000271387A JP 2000271387 A JP2000271387 A JP 2000271387A JP 4395248 B2 JP4395248 B2 JP 4395248B2
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JP
Japan
Prior art keywords
developer
acid
copolymer
group
molar ratio
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Expired - Fee Related
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JP2000271387A
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English (en)
Japanese (ja)
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JP2001133991A5 (https=
JP2001133991A (ja
Inventor
シユテフエン・デンツインガー
ミヒヤエル・デル
クラウス−ペーター・コンラート
アンドレアス・エルセツサー
ポール・エクラー
Original Assignee
アグフア−ゲヴエルト,ナームローゼ・フエンノートシヤツプ
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Publication of JP2001133991A5 publication Critical patent/JP2001133991A5/ja
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Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26Processing photosensitive materials; Apparatus therefor
    • G03F7/30Imagewise removal using liquid means
    • G03F7/32Liquid compositions therefor, e.g. developers
    • G03F7/322Aqueous alkaline compositions

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
JP2000271387A 1999-09-14 2000-09-07 照射された放射線感受性記録材料用の現像液 Expired - Fee Related JP4395248B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US09/395,961 US6100016A (en) 1999-09-14 1999-09-14 Developer for irradiated, radiation-sensitive recording materials
US09/395961 1999-09-14

Publications (3)

Publication Number Publication Date
JP2001133991A JP2001133991A (ja) 2001-05-18
JP2001133991A5 JP2001133991A5 (https=) 2007-09-13
JP4395248B2 true JP4395248B2 (ja) 2010-01-06

Family

ID=23565279

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2000271387A Expired - Fee Related JP4395248B2 (ja) 1999-09-14 2000-09-07 照射された放射線感受性記録材料用の現像液

Country Status (4)

Country Link
US (1) US6100016A (https=)
EP (1) EP1085381B1 (https=)
JP (1) JP4395248B2 (https=)
DE (1) DE50012513D1 (https=)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6686126B2 (en) 2000-07-14 2004-02-03 Fuji Photo Film Co., Ltd. Developing solution for photosensitive lithographic printing plate, plate-making method of lithographic printing plate, and photosensitive lithographic printing plate
US6649324B1 (en) * 2000-08-14 2003-11-18 Kodak Polychrome Graphics Llc Aqueous developer for lithographic printing plates
JP2002351094A (ja) * 2001-05-22 2002-12-04 Fuji Photo Film Co Ltd 現像液組成物及び画像形成方法
US7078162B2 (en) * 2003-10-08 2006-07-18 Eastman Kodak Company Developer regenerators
JP4166167B2 (ja) * 2004-02-05 2008-10-15 富士フイルム株式会社 感光性平版印刷版用現像液及び平版印刷版の製版方法
US7157213B2 (en) * 2004-03-01 2007-01-02 Think Laboratory Co., Ltd. Developer agent for positive type photosensitive compound
EP1903399B1 (en) * 2006-09-20 2009-10-21 Eastman Kodak Company Method for developing and sealing of lithographic printing plates
JP5422146B2 (ja) * 2008-03-25 2014-02-19 富士フイルム株式会社 平版印刷版作成用処理液および平版印刷版原版の処理方法
US20110236832A1 (en) * 2010-03-26 2011-09-29 Celin Savariar-Hauck Lithographic processing solutions and methods of use
US8846299B2 (en) 2010-03-26 2014-09-30 Eastman Kodak Company Methods for preparing lithograhic printing plates
CN103838090A (zh) * 2014-03-31 2014-06-04 刘国政 一种聚合物薄膜溶解液

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3439597A1 (de) * 1984-10-30 1986-04-30 Hoechst Ag, 6230 Frankfurt Entwickler fuer belichtete negativ arbeitende reproduktionsschichten sowie verfahren zur herstellung von druckformen und verwendung des entwicklers
JPH01177541A (ja) * 1988-01-07 1989-07-13 Fuji Photo Film Co Ltd 平版印刷版の製造方法
DE3837013A1 (de) * 1988-10-31 1990-05-03 Basf Ag Verwendung von partiell veresterten copolymerisaten in fluessigwaschmitteln
DE3838093A1 (de) * 1988-11-10 1990-05-17 Basf Ag Verwendung von copolymerisaten als zusatz zu fluessigwaschmitteln
DE19755295A1 (de) * 1997-12-12 1999-06-17 Agfa Gevaert Ag Entwickler für bestrahlte, strahlungsempfindliche Aufzeichnungsmaterialien

Also Published As

Publication number Publication date
US6100016A (en) 2000-08-08
JP2001133991A (ja) 2001-05-18
EP1085381B1 (de) 2006-04-05
DE50012513D1 (de) 2006-05-18
EP1085381A1 (de) 2001-03-21

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