JP4395248B2 - 照射された放射線感受性記録材料用の現像液 - Google Patents
照射された放射線感受性記録材料用の現像液 Download PDFInfo
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- JP4395248B2 JP4395248B2 JP2000271387A JP2000271387A JP4395248B2 JP 4395248 B2 JP4395248 B2 JP 4395248B2 JP 2000271387 A JP2000271387 A JP 2000271387A JP 2000271387 A JP2000271387 A JP 2000271387A JP 4395248 B2 JP4395248 B2 JP 4395248B2
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- 229920002120 photoresistant polymer Polymers 0.000 description 1
- 239000000049 pigment Substances 0.000 description 1
- 239000004014 plasticizer Substances 0.000 description 1
- 229920002037 poly(vinyl butyral) polymer Polymers 0.000 description 1
- 229920002432 poly(vinyl methyl ether) polymer Polymers 0.000 description 1
- 229920001223 polyethylene glycol Polymers 0.000 description 1
- 229920000193 polymethacrylate Polymers 0.000 description 1
- BWHMMNNQKKPAPP-UHFFFAOYSA-L potassium carbonate Substances [K+].[K+].[O-]C([O-])=O BWHMMNNQKKPAPP-UHFFFAOYSA-L 0.000 description 1
- 235000011181 potassium carbonates Nutrition 0.000 description 1
- 159000000001 potassium salts Chemical class 0.000 description 1
- NNHHDJVEYQHLHG-UHFFFAOYSA-N potassium silicate Chemical compound [K+].[K+].[O-][Si]([O-])=O NNHHDJVEYQHLHG-UHFFFAOYSA-N 0.000 description 1
- 229910052913 potassium silicate Inorganic materials 0.000 description 1
- 235000019353 potassium silicate Nutrition 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 238000001556 precipitation Methods 0.000 description 1
- HJWLCRVIBGQPNF-UHFFFAOYSA-N prop-2-enylbenzene Chemical compound C=CCC1=CC=CC=C1 HJWLCRVIBGQPNF-UHFFFAOYSA-N 0.000 description 1
- 239000011241 protective layer Substances 0.000 description 1
- 238000009877 rendering Methods 0.000 description 1
- 238000007761 roller coating Methods 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 239000003352 sequestering agent Substances 0.000 description 1
- 239000000741 silica gel Substances 0.000 description 1
- 229910002027 silica gel Inorganic materials 0.000 description 1
- 238000007764 slot die coating Methods 0.000 description 1
- 239000010802 sludge Substances 0.000 description 1
- 235000010413 sodium alginate Nutrition 0.000 description 1
- 239000000661 sodium alginate Substances 0.000 description 1
- 229940005550 sodium alginate Drugs 0.000 description 1
- CDBYLPFSWZWCQE-UHFFFAOYSA-L sodium carbonate Substances [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 1
- 235000011182 sodium carbonates Nutrition 0.000 description 1
- FQENQNTWSFEDLI-UHFFFAOYSA-J sodium diphosphate Chemical compound [Na+].[Na+].[Na+].[Na+].[O-]P([O-])(=O)OP([O-])([O-])=O FQENQNTWSFEDLI-UHFFFAOYSA-J 0.000 description 1
- 239000001488 sodium phosphate Substances 0.000 description 1
- NTHWMYGWWRZVTN-UHFFFAOYSA-N sodium silicate Chemical compound [Na+].[Na+].[O-][Si]([O-])=O NTHWMYGWWRZVTN-UHFFFAOYSA-N 0.000 description 1
- 229910052911 sodium silicate Inorganic materials 0.000 description 1
- 235000019794 sodium silicate Nutrition 0.000 description 1
- 235000019832 sodium triphosphate Nutrition 0.000 description 1
- RPACBEVZENYWOL-XFULWGLBSA-M sodium;(2r)-2-[6-(4-chlorophenoxy)hexyl]oxirane-2-carboxylate Chemical compound [Na+].C=1C=C(Cl)C=CC=1OCCCCCC[C@]1(C(=O)[O-])CO1 RPACBEVZENYWOL-XFULWGLBSA-M 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 230000006641 stabilisation Effects 0.000 description 1
- 238000011105 stabilization Methods 0.000 description 1
- 239000008107 starch Substances 0.000 description 1
- 235000019698 starch Nutrition 0.000 description 1
- 239000008117 stearic acid Substances 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 125000001424 substituent group Chemical group 0.000 description 1
- 150000005846 sugar alcohols Polymers 0.000 description 1
- 229940117986 sulfobetaine Drugs 0.000 description 1
- 230000002194 synthesizing effect Effects 0.000 description 1
- WYKYCHHWIJXDAO-UHFFFAOYSA-N tert-butyl 2-ethylhexaneperoxoate Chemical compound CCCCC(CC)C(=O)OOC(C)(C)C WYKYCHHWIJXDAO-UHFFFAOYSA-N 0.000 description 1
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- QZZGJDVWLFXDLK-UHFFFAOYSA-N tetracosanoic acid Chemical compound CCCCCCCCCCCCCCCCCCCCCCCC(O)=O QZZGJDVWLFXDLK-UHFFFAOYSA-N 0.000 description 1
- 235000019818 tetrasodium diphosphate Nutrition 0.000 description 1
- LDHQCZJRKDOVOX-UHFFFAOYSA-N trans-crotonic acid Natural products CC=CC(O)=O LDHQCZJRKDOVOX-UHFFFAOYSA-N 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
- 229960002622 triacetin Drugs 0.000 description 1
- 150000003628 tricarboxylic acids Chemical class 0.000 description 1
- 229910000404 tripotassium phosphate Inorganic materials 0.000 description 1
- 235000019798 tripotassium phosphate Nutrition 0.000 description 1
- RYFMWSXOAZQYPI-UHFFFAOYSA-K trisodium phosphate Chemical compound [Na+].[Na+].[Na+].[O-]P([O-])([O-])=O RYFMWSXOAZQYPI-UHFFFAOYSA-K 0.000 description 1
- 229910000406 trisodium phosphate Inorganic materials 0.000 description 1
- 235000019801 trisodium phosphate Nutrition 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- 229920003169 water-soluble polymer Polymers 0.000 description 1
- 239000000080 wetting agent Substances 0.000 description 1
- 229910052724 xenon Inorganic materials 0.000 description 1
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 1
- 150000007934 α,β-unsaturated carboxylic acids Chemical class 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
- G03F7/32—Liquid compositions therefor, e.g. developers
- G03F7/322—Aqueous alkaline compositions
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US09/395,961 US6100016A (en) | 1999-09-14 | 1999-09-14 | Developer for irradiated, radiation-sensitive recording materials |
| US09/395961 | 1999-09-14 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2001133991A JP2001133991A (ja) | 2001-05-18 |
| JP2001133991A5 JP2001133991A5 (https=) | 2007-09-13 |
| JP4395248B2 true JP4395248B2 (ja) | 2010-01-06 |
Family
ID=23565279
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2000271387A Expired - Fee Related JP4395248B2 (ja) | 1999-09-14 | 2000-09-07 | 照射された放射線感受性記録材料用の現像液 |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US6100016A (https=) |
| EP (1) | EP1085381B1 (https=) |
| JP (1) | JP4395248B2 (https=) |
| DE (1) | DE50012513D1 (https=) |
Families Citing this family (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6686126B2 (en) | 2000-07-14 | 2004-02-03 | Fuji Photo Film Co., Ltd. | Developing solution for photosensitive lithographic printing plate, plate-making method of lithographic printing plate, and photosensitive lithographic printing plate |
| US6649324B1 (en) * | 2000-08-14 | 2003-11-18 | Kodak Polychrome Graphics Llc | Aqueous developer for lithographic printing plates |
| JP2002351094A (ja) * | 2001-05-22 | 2002-12-04 | Fuji Photo Film Co Ltd | 現像液組成物及び画像形成方法 |
| US7078162B2 (en) * | 2003-10-08 | 2006-07-18 | Eastman Kodak Company | Developer regenerators |
| JP4166167B2 (ja) * | 2004-02-05 | 2008-10-15 | 富士フイルム株式会社 | 感光性平版印刷版用現像液及び平版印刷版の製版方法 |
| US7157213B2 (en) * | 2004-03-01 | 2007-01-02 | Think Laboratory Co., Ltd. | Developer agent for positive type photosensitive compound |
| EP1903399B1 (en) * | 2006-09-20 | 2009-10-21 | Eastman Kodak Company | Method for developing and sealing of lithographic printing plates |
| JP5422146B2 (ja) * | 2008-03-25 | 2014-02-19 | 富士フイルム株式会社 | 平版印刷版作成用処理液および平版印刷版原版の処理方法 |
| US20110236832A1 (en) * | 2010-03-26 | 2011-09-29 | Celin Savariar-Hauck | Lithographic processing solutions and methods of use |
| US8846299B2 (en) | 2010-03-26 | 2014-09-30 | Eastman Kodak Company | Methods for preparing lithograhic printing plates |
| CN103838090A (zh) * | 2014-03-31 | 2014-06-04 | 刘国政 | 一种聚合物薄膜溶解液 |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE3439597A1 (de) * | 1984-10-30 | 1986-04-30 | Hoechst Ag, 6230 Frankfurt | Entwickler fuer belichtete negativ arbeitende reproduktionsschichten sowie verfahren zur herstellung von druckformen und verwendung des entwicklers |
| JPH01177541A (ja) * | 1988-01-07 | 1989-07-13 | Fuji Photo Film Co Ltd | 平版印刷版の製造方法 |
| DE3837013A1 (de) * | 1988-10-31 | 1990-05-03 | Basf Ag | Verwendung von partiell veresterten copolymerisaten in fluessigwaschmitteln |
| DE3838093A1 (de) * | 1988-11-10 | 1990-05-17 | Basf Ag | Verwendung von copolymerisaten als zusatz zu fluessigwaschmitteln |
| DE19755295A1 (de) * | 1997-12-12 | 1999-06-17 | Agfa Gevaert Ag | Entwickler für bestrahlte, strahlungsempfindliche Aufzeichnungsmaterialien |
-
1999
- 1999-09-14 US US09/395,961 patent/US6100016A/en not_active Expired - Fee Related
-
2000
- 2000-09-07 JP JP2000271387A patent/JP4395248B2/ja not_active Expired - Fee Related
- 2000-09-11 DE DE50012513T patent/DE50012513D1/de not_active Expired - Lifetime
- 2000-09-11 EP EP00203132A patent/EP1085381B1/de not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| US6100016A (en) | 2000-08-08 |
| JP2001133991A (ja) | 2001-05-18 |
| EP1085381B1 (de) | 2006-04-05 |
| DE50012513D1 (de) | 2006-05-18 |
| EP1085381A1 (de) | 2001-03-21 |
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