DE50012513D1 - Entwickler für bestrahlte, strahlungsempfindliche Aufzeichnungsmaterialien - Google Patents

Entwickler für bestrahlte, strahlungsempfindliche Aufzeichnungsmaterialien

Info

Publication number
DE50012513D1
DE50012513D1 DE50012513T DE50012513T DE50012513D1 DE 50012513 D1 DE50012513 D1 DE 50012513D1 DE 50012513 T DE50012513 T DE 50012513T DE 50012513 T DE50012513 T DE 50012513T DE 50012513 D1 DE50012513 D1 DE 50012513D1
Authority
DE
Germany
Prior art keywords
developer
irradiated
radiation
sensitive recording
recording materials
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE50012513T
Other languages
German (de)
English (en)
Inventor
Steffen Denzinger
Michael Doerr
Klaus-Peter Konrad
Andreas Elsaesser
Paul Eckler
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Agfa NV
Original Assignee
Agfa Gevaert NV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Agfa Gevaert NV filed Critical Agfa Gevaert NV
Application granted granted Critical
Publication of DE50012513D1 publication Critical patent/DE50012513D1/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/32—Liquid compositions therefor, e.g. developers
    • G03F7/322—Aqueous alkaline compositions

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
DE50012513T 1999-09-14 2000-09-11 Entwickler für bestrahlte, strahlungsempfindliche Aufzeichnungsmaterialien Expired - Lifetime DE50012513D1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US09/395,961 US6100016A (en) 1999-09-14 1999-09-14 Developer for irradiated, radiation-sensitive recording materials

Publications (1)

Publication Number Publication Date
DE50012513D1 true DE50012513D1 (de) 2006-05-18

Family

ID=23565279

Family Applications (1)

Application Number Title Priority Date Filing Date
DE50012513T Expired - Lifetime DE50012513D1 (de) 1999-09-14 2000-09-11 Entwickler für bestrahlte, strahlungsempfindliche Aufzeichnungsmaterialien

Country Status (4)

Country Link
US (1) US6100016A (https=)
EP (1) EP1085381B1 (https=)
JP (1) JP4395248B2 (https=)
DE (1) DE50012513D1 (https=)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6686126B2 (en) 2000-07-14 2004-02-03 Fuji Photo Film Co., Ltd. Developing solution for photosensitive lithographic printing plate, plate-making method of lithographic printing plate, and photosensitive lithographic printing plate
US6649324B1 (en) * 2000-08-14 2003-11-18 Kodak Polychrome Graphics Llc Aqueous developer for lithographic printing plates
JP2002351094A (ja) * 2001-05-22 2002-12-04 Fuji Photo Film Co Ltd 現像液組成物及び画像形成方法
US7078162B2 (en) * 2003-10-08 2006-07-18 Eastman Kodak Company Developer regenerators
JP4166167B2 (ja) * 2004-02-05 2008-10-15 富士フイルム株式会社 感光性平版印刷版用現像液及び平版印刷版の製版方法
US7157213B2 (en) * 2004-03-01 2007-01-02 Think Laboratory Co., Ltd. Developer agent for positive type photosensitive compound
EP1903399B1 (en) * 2006-09-20 2009-10-21 Eastman Kodak Company Method for developing and sealing of lithographic printing plates
JP5422146B2 (ja) * 2008-03-25 2014-02-19 富士フイルム株式会社 平版印刷版作成用処理液および平版印刷版原版の処理方法
US20110236832A1 (en) * 2010-03-26 2011-09-29 Celin Savariar-Hauck Lithographic processing solutions and methods of use
US8846299B2 (en) 2010-03-26 2014-09-30 Eastman Kodak Company Methods for preparing lithograhic printing plates
CN103838090A (zh) * 2014-03-31 2014-06-04 刘国政 一种聚合物薄膜溶解液

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3439597A1 (de) * 1984-10-30 1986-04-30 Hoechst Ag, 6230 Frankfurt Entwickler fuer belichtete negativ arbeitende reproduktionsschichten sowie verfahren zur herstellung von druckformen und verwendung des entwicklers
JPH01177541A (ja) * 1988-01-07 1989-07-13 Fuji Photo Film Co Ltd 平版印刷版の製造方法
DE3837013A1 (de) * 1988-10-31 1990-05-03 Basf Ag Verwendung von partiell veresterten copolymerisaten in fluessigwaschmitteln
DE3838093A1 (de) * 1988-11-10 1990-05-17 Basf Ag Verwendung von copolymerisaten als zusatz zu fluessigwaschmitteln
DE19755295A1 (de) * 1997-12-12 1999-06-17 Agfa Gevaert Ag Entwickler für bestrahlte, strahlungsempfindliche Aufzeichnungsmaterialien

Also Published As

Publication number Publication date
US6100016A (en) 2000-08-08
JP4395248B2 (ja) 2010-01-06
JP2001133991A (ja) 2001-05-18
EP1085381B1 (de) 2006-04-05
EP1085381A1 (de) 2001-03-21

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8327 Change in the person/name/address of the patent owner

Owner name: AGFA GRAPHICS N.V., MORTSEL, BE