JP4865834B2 - 現像剤組成物 - Google Patents
現像剤組成物 Download PDFInfo
- Publication number
- JP4865834B2 JP4865834B2 JP2009112763A JP2009112763A JP4865834B2 JP 4865834 B2 JP4865834 B2 JP 4865834B2 JP 2009112763 A JP2009112763 A JP 2009112763A JP 2009112763 A JP2009112763 A JP 2009112763A JP 4865834 B2 JP4865834 B2 JP 4865834B2
- Authority
- JP
- Japan
- Prior art keywords
- developer composition
- weight
- composition according
- parts
- developer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
- G03F7/32—Liquid compositions therefor, e.g. developers
- G03F7/322—Aqueous alkaline compositions
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
- G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Chemical & Material Sciences (AREA)
- Inorganic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
Description
表1に示す重量比に従って(a1)アルカリ性化合物1、(a2)アルカリ性化合物2、(b1)界面活性剤1、および(b2)界面活性剤2を混合し、その中に超純水を加えて水溶液100gを調製した。
表1に従って調製した現像剤組成物を別々のビーカーに入れ、次に加熱した。続いて、溶液が透明から混濁状態に変わってきた時の温度を、温度計を使って測定した。この時測定された温度を曇り点(C.P.)と呼ぶ。
着色フォトレジストフィルムを露光させた後、本発明による現像剤組成物を用いてパターン形成を行った。着色フォトレジストフィルムの構成要素を表2に示す。
現像された90nm×230nmのブラックマトリックスパターンが作られた無アルカリガラス基体の上を、ミキサーを使って上記構成要素を混合して調製した溶液で被覆し、次にそれを20秒間、340rpmでスピンコーティングした。最終的に均一の、薄いフィルムが形成された。
表1に示す現像剤組成物の濃縮物を超純水で希釈して、濃縮物重量の指定倍率(表1の特記事項に示す)になる水溶液を得た。例えば、比較例1による濃縮物10gは、超純水で希釈して濃縮物重量の10倍となる水溶液を得る場合、現像剤組成物100gを得るためには、超純水90gを比較例1による濃縮物10gに加えなければならない。次に基体を上記現像剤組成物中に、25℃、120分間浸漬および攪拌した。現像後、基体は超純水で洗浄し、次に窒素を用いて乾燥させた。
Claims (13)
- R1は水素またはメチルであり、かつR2は水素またはメチルである、請求項1に記載の現像剤組成物。
- nは0である、請求項2に記載の現像剤組成物。
- R1およびR2はメチルである、請求項3に記載の現像剤組成物。
- アルカリ性化合物の量は0.1〜20重量部である、請求項1に記載の現像剤組成物。
- アルカリ性化合物の量は0.5〜15重量部である、請求項1に記載の現像剤組成物。
- アルカリ性化合物の量は3〜15重量部である、請求項1に記載の現像剤組成物。
- アニオン性界面活性剤の量は0.1〜20重量部である、請求項1に記載の現像剤組成物。
- アニオン性界面活性剤の量は0.5〜15重量部である、請求項1に記載の現像剤組成物。
- アニオン性界面活性剤の量は3〜15重量部である、請求項1に記載の現像剤組成物。
- アルカリ性化合物は、アルカリ金属水酸化物、アルカリ金属炭酸塩、アルカリ金属重炭酸塩、アルカリ金属リン酸塩、アルカリ金属ホウ酸塩、アンモニア、およびそれらの混合物から成る群より選択される、請求項1に記載の現像剤組成物。
- アルカリ性化合物は、アルカリ金属炭酸塩またはアルカリ金属重炭酸塩である、請求項11に記載の現像剤組成物。
- アルカリ性化合物は、炭酸ナトリウムまたは重炭酸ナトリウムである、請求項12に記載の現像剤組成物。
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
TW097147626A TWI377451B (en) | 2008-12-08 | 2008-12-08 | Developer composition |
TW097147626 | 2008-12-08 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2010134406A JP2010134406A (ja) | 2010-06-17 |
JP4865834B2 true JP4865834B2 (ja) | 2012-02-01 |
Family
ID=42345728
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2009112763A Expired - Fee Related JP4865834B2 (ja) | 2008-12-08 | 2009-05-07 | 現像剤組成物 |
Country Status (3)
Country | Link |
---|---|
JP (1) | JP4865834B2 (ja) |
KR (1) | KR101161051B1 (ja) |
TW (1) | TWI377451B (ja) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102486619A (zh) * | 2010-12-02 | 2012-06-06 | 台湾永光化学工业股份有限公司 | 清洗液组合物 |
KR101993360B1 (ko) | 2012-08-08 | 2019-06-26 | 삼성전자주식회사 | 포토 리소그래피용 린스액 |
TWI723439B (zh) * | 2019-06-27 | 2021-04-01 | 臺灣永光化學工業股份有限公司 | 著色高分子化合物及其用途 |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH05204164A (ja) * | 1992-01-24 | 1993-08-13 | Fuji Photo Film Co Ltd | 画像形成方法 |
JP3813742B2 (ja) | 1998-06-25 | 2006-08-23 | 富士写真フイルム株式会社 | 感光性樹脂組成物 |
JP4259714B2 (ja) | 2000-02-03 | 2009-04-30 | 株式会社Adeka | 感放射線性組成物用現像液 |
JP4225072B2 (ja) * | 2003-02-12 | 2009-02-18 | コニカミノルタホールディングス株式会社 | 平版印刷版材料用現像液及び平版印刷版材料の処理方法 |
JP4542887B2 (ja) * | 2004-04-07 | 2010-09-15 | 東邦化学工業株式会社 | 乳化重合用乳化剤 |
JP4419682B2 (ja) * | 2004-05-21 | 2010-02-24 | コニカミノルタエムジー株式会社 | 感光性平版印刷版の製版方法 |
CN1811602B (zh) * | 2005-01-27 | 2010-10-06 | 明德国际仓储贸易(上海)有限公司 | 显影液组成物 |
US20090004597A1 (en) * | 2006-01-12 | 2009-01-01 | Takenori Ueoka | Photosensitive Composition, Display Member, and Process for Producing The Same |
CN101657761B (zh) * | 2007-05-16 | 2012-07-04 | 株式会社德山 | 光刻胶显影液 |
-
2008
- 2008-12-08 TW TW097147626A patent/TWI377451B/zh not_active IP Right Cessation
-
2009
- 2009-05-07 JP JP2009112763A patent/JP4865834B2/ja not_active Expired - Fee Related
- 2009-05-08 KR KR1020090040207A patent/KR101161051B1/ko active IP Right Grant
Also Published As
Publication number | Publication date |
---|---|
KR20100066308A (ko) | 2010-06-17 |
JP2010134406A (ja) | 2010-06-17 |
TW201022860A (en) | 2010-06-16 |
KR101161051B1 (ko) | 2012-06-28 |
TWI377451B (en) | 2012-11-21 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP4641499B2 (ja) | 現像液組成物 | |
JP4225909B2 (ja) | シンナー組成物 | |
US8703402B2 (en) | Resist pattern forming method and developer | |
US20060194154A1 (en) | Developer composition | |
CN105103054B (zh) | 图案剥离方法、电子元件及其制造方法 | |
CN106796405A (zh) | 抗蚀剂膜的图案化用有机系处理液、抗蚀剂膜的图案化用有机系处理液的制造方法及抗蚀剂膜的图案化用有机系处理液的收容容器以及使用这些的图案形成方法及电子元件的制造方法 | |
JP4865834B2 (ja) | 現像剤組成物 | |
CN1928724B (zh) | 一种光阻显影液 | |
KR100840530B1 (ko) | 포토레지스트 현상액 조성물 | |
US6503694B1 (en) | Developer solution and edge bead remover composition | |
JP3491978B2 (ja) | 表面反射防止塗布組成物 | |
CN100557514C (zh) | 一种光阻显影液 | |
KR101161029B1 (ko) | 현상제 조성물 | |
CN101750908B (zh) | 显影液组成物 | |
KR100756552B1 (ko) | 씬너 조성물 | |
JP4262207B2 (ja) | 低気泡性感放射線性組成物用現像液 | |
TWI355568B (ja) | ||
US20050233921A1 (en) | Cleaning solution for photoresist, method for forming a photoresist pattern using the same, and semiconductor device | |
JP3970740B2 (ja) | 現像液組成物 | |
WO2007051403A1 (en) | An edge bead remover composition | |
TW200521625A (en) | Low foaming developer for radiation sensitive compositiom | |
CN107870524B (zh) | 光致抗蚀剂显影液组合物及光致抗蚀剂图案形成方法 | |
CN103728845B (zh) | 平板显示用显影液组合物 | |
CN114280900A (zh) | 一种高效cf显影液组合物 | |
TWI299105B (ja) |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20100707 |
|
A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20111007 |
|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20111018 |
|
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20111110 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20141118 Year of fee payment: 3 |
|
R150 | Certificate of patent or registration of utility model |
Ref document number: 4865834 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
LAPS | Cancellation because of no payment of annual fees |