JP4360242B2 - ネガ型感放射線性樹脂組成物 - Google Patents
ネガ型感放射線性樹脂組成物 Download PDFInfo
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- JP4360242B2 JP4360242B2 JP2004087521A JP2004087521A JP4360242B2 JP 4360242 B2 JP4360242 B2 JP 4360242B2 JP 2004087521 A JP2004087521 A JP 2004087521A JP 2004087521 A JP2004087521 A JP 2004087521A JP 4360242 B2 JP4360242 B2 JP 4360242B2
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- radiation
- meth
- acrylate
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- resin composition
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- 229910052751 metal Inorganic materials 0.000 claims description 8
- 239000002184 metal Substances 0.000 claims description 8
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims description 8
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- VFHVQBAGLAREND-UHFFFAOYSA-N diphenylphosphoryl-(2,4,6-trimethylphenyl)methanone Chemical compound CC1=CC(C)=CC(C)=C1C(=O)P(=O)(C=1C=CC=CC=1)C1=CC=CC=C1 VFHVQBAGLAREND-UHFFFAOYSA-N 0.000 claims description 5
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- DQZNLOXENNXVAD-UHFFFAOYSA-N trimethoxy-[2-(7-oxabicyclo[4.1.0]heptan-4-yl)ethyl]silane Chemical compound C1C(CC[Si](OC)(OC)OC)CCC2OC21 DQZNLOXENNXVAD-UHFFFAOYSA-N 0.000 description 1
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Classifications
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/40—Treatment after imagewise removal, e.g. baking
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
- G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/106—Binder containing
- Y10S430/107—Polyamide or polyurethane
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
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- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/106—Binder containing
- Y10S430/111—Polymer of unsaturated acid or ester
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
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- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/114—Initiator containing
- Y10S430/117—Free radical
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
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- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/114—Initiator containing
- Y10S430/118—Initiator containing with inhibitor or stabilizer
- Y10S430/119—Hydroxyl or carbonyl group containing as sole functional groups
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/114—Initiator containing
- Y10S430/12—Nitrogen compound containing
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/114—Initiator containing
- Y10S430/12—Nitrogen compound containing
- Y10S430/121—Nitrogen in heterocyclic ring
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/114—Initiator containing
- Y10S430/126—Halogen compound containing
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials For Photolithography (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Macromonomer-Based Addition Polymer (AREA)
- Polymerisation Methods In General (AREA)
Priority Applications (7)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2004087521A JP4360242B2 (ja) | 2004-03-24 | 2004-03-24 | ネガ型感放射線性樹脂組成物 |
| TW094109149A TW200604739A (en) | 2004-03-24 | 2005-03-24 | Negative radiation-sensitive resin composition |
| KR1020067021971A KR20070007153A (ko) | 2004-03-24 | 2005-03-24 | 네가티브형 감방사선성 수지 조성물 |
| US10/593,972 US7482111B2 (en) | 2004-03-24 | 2005-03-24 | Negative radiation-sensitive resin composition |
| PCT/JP2005/005417 WO2005091072A1 (fr) | 2004-03-24 | 2005-03-24 | Composition de résine sensible aux radiations négatives |
| EP05726999A EP1746461A4 (fr) | 2004-03-24 | 2005-03-24 | Composition de r sine sensible aux radiations negatives |
| CNA2005800090596A CN1934497A (zh) | 2004-03-24 | 2005-03-24 | 负型感放射线性树脂组合物 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2004087521A JP4360242B2 (ja) | 2004-03-24 | 2004-03-24 | ネガ型感放射線性樹脂組成物 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2005274920A JP2005274920A (ja) | 2005-10-06 |
| JP4360242B2 true JP4360242B2 (ja) | 2009-11-11 |
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Family Applications (1)
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| JP2004087521A Expired - Fee Related JP4360242B2 (ja) | 2004-03-24 | 2004-03-24 | ネガ型感放射線性樹脂組成物 |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US7482111B2 (fr) |
| EP (1) | EP1746461A4 (fr) |
| JP (1) | JP4360242B2 (fr) |
| KR (1) | KR20070007153A (fr) |
| CN (1) | CN1934497A (fr) |
| TW (1) | TW200604739A (fr) |
| WO (1) | WO2005091072A1 (fr) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
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| JP2006285035A (ja) * | 2005-04-01 | 2006-10-19 | Jsr Corp | ネガ型感放射線性樹脂組成物 |
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| TW200600975A (en) * | 2004-02-20 | 2006-01-01 | Jsr Corp | Bilayer laminated film for bump formation and method of bump formation |
| JP2007052120A (ja) * | 2005-08-16 | 2007-03-01 | Nec Corp | 光導波路形成用感光性樹脂組成物、光導波路及び光導波路パターンの形成方法 |
| JP2007156011A (ja) * | 2005-12-02 | 2007-06-21 | Fujifilm Corp | フォトスペーサ用感光性樹脂組成物、スペーサ付き基板及びその製造方法並びに液晶表示装置 |
| TW200736834A (en) * | 2005-12-27 | 2007-10-01 | Kansai Paint Co Ltd | Active energy ray-curable resin composition and method for forming resist pattern |
| EP2019679B1 (fr) * | 2006-05-23 | 2018-06-20 | Theracos, Inc. | Inhibiteurs de transport de glucose et procédés d'utilisation |
| JP5277968B2 (ja) * | 2007-01-31 | 2013-08-28 | Ｊｓｒ株式会社 | 感放射線性樹脂組成物 |
| JP5275596B2 (ja) * | 2007-08-30 | 2013-08-28 | 東京応化工業株式会社 | 光硬化性樹脂組成物及びパターン形成方法 |
| TW200919085A (en) * | 2007-09-18 | 2009-05-01 | Asahi Kasei Emd Corp | Photosensitive resin composition and laminate thereof |
| JPWO2009099083A1 (ja) * | 2008-02-05 | 2011-05-26 | 日本電気株式会社 | アクリルアミド系ポリマー、アクリルアミド化合物、化学増幅型感光性樹脂組成物及びパターン形成方法 |
| JP5126354B2 (ja) * | 2008-03-17 | 2013-01-23 | 日立化成工業株式会社 | 感光性樹脂組成物、並びにこれを用いた感光性エレメント、ソルダーレジスト及びプリント配線板 |
| JP5403943B2 (ja) * | 2008-05-21 | 2014-01-29 | 昭和電工株式会社 | ポリマー、感光性樹脂組成物及びレジストパターンの形成方法 |
| JP2010026431A (ja) * | 2008-07-24 | 2010-02-04 | Jsr Corp | ネガ型感放射線性樹脂組成物 |
| JP5978559B2 (ja) * | 2010-07-09 | 2016-08-24 | 日立化成株式会社 | アクリル系エラストマー及びこれを用いた組成物 |
| CN102854750B (zh) * | 2010-07-30 | 2014-08-27 | 日立化成工业株式会社 | 感光性树脂组合物、感光性元件、抗蚀剂图形制法、引线框制法及线路板制法 |
| KR101713574B1 (ko) * | 2011-06-28 | 2017-03-08 | 동우 화인켐 주식회사 | 점착제 조성물, 이를 포함하는 편광판 및 액정표시장치 |
| KR102115817B1 (ko) * | 2013-01-16 | 2020-05-27 | 제이에스알 가부시끼가이샤 | 경화막 형성용 열경화성 수지 조성물, 네가티브형 감방사선성 수지 조성물, 포지티브형 감방사선성 수지 조성물, 경화막, 그의 형성 방법, 반도체 소자 및 표시 소자 |
| JP6008891B2 (ja) * | 2013-03-15 | 2016-10-19 | 富士フイルム株式会社 | 着色感放射線性組成物、着色硬化膜、カラーフィルタ、着色パターン形成方法、カラーフィルタの製造方法、固体撮像素子及び液晶表示装置 |
| JP6097652B2 (ja) * | 2013-07-31 | 2017-03-15 | 富士フイルム株式会社 | パターン形成方法、パターン、並びに、これらを用いたエッチング方法、及び、電子デバイスの製造方法 |
| JP6813399B2 (ja) * | 2017-03-10 | 2021-01-13 | 東京応化工業株式会社 | 硬化膜を形成する方法及びめっき造形物の製造方法 |
| US20180259850A1 (en) * | 2017-03-10 | 2018-09-13 | Tokyo Ohka Kogyo Co., Ltd. | Method for forming patterned cured film, photosensitive composition, dry film, and method for producing plated shaped article |
| JP6813398B2 (ja) * | 2017-03-10 | 2021-01-13 | 東京応化工業株式会社 | 感光性組成物、ドライフィルム、及びパターン化された硬化膜を形成する方法 |
| JP6612485B1 (ja) * | 2018-03-27 | 2019-11-27 | 東京応化工業株式会社 | めっき造形物の製造方法 |
| CN112368643A (zh) | 2018-07-31 | 2021-02-12 | Jsr株式会社 | 镀敷造形物的制造方法、电路基板及表面处理剂以及表面处理剂套组 |
| CN111221219B (zh) * | 2020-01-06 | 2021-03-19 | 福斯特(安吉)新材料有限公司 | 一种感光性树脂组合物、感光干膜 |
| KR102554076B1 (ko) * | 2021-04-26 | 2023-07-12 | 주식회사 켐폴 | 감광성 고분자 및 포토레지스트 조성물 |
| WO2023162551A1 (fr) * | 2022-02-24 | 2023-08-31 | 東京応化工業株式会社 | Procédé de fabrication d'article façonné plaqué |
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| JPH0767868B2 (ja) * | 1984-10-23 | 1995-07-26 | 三菱化学株式会社 | 感光性平版印刷版 |
| US5112743A (en) * | 1989-05-24 | 1992-05-12 | Fuji Photo Film Co., Ltd. | Light-sensitive composition and presensitized plate for use in making lithographic printing plates |
| JP2745333B2 (ja) * | 1989-10-04 | 1998-04-28 | コニカ株式会社 | 像転写方法 |
| DE59007720D1 (de) * | 1989-10-27 | 1994-12-22 | Ciba Geigy Ag | Verfahren zur Abstimmung der Strahlungsempfindlichkeit von photopolymerisierbaren Zusammensetzungen. |
| JP3045820B2 (ja) | 1991-07-02 | 2000-05-29 | 岡本化学工業株式会社 | アルカリ現像型感光性組成物 |
| US5310862A (en) * | 1991-08-20 | 1994-05-10 | Toray Industries, Inc. | Photosensitive polyimide precursor compositions and process for preparing same |
| US6010824A (en) * | 1992-11-10 | 2000-01-04 | Tokyo Ohka Kogyo Co., Ltd. | Photosensitive resin composition containing a triazine compound and a pre-sensitized plate using the same, and photosensitive resin composition containing acridine and triazine compounds and a color filter and a pre-sensitized plate using the same |
| EP0671659B1 (fr) * | 1994-03-03 | 1998-05-27 | Mitsubishi Chemical Corporation | Composition photosensible |
| JPH08179505A (ja) | 1994-12-26 | 1996-07-12 | Konica Corp | ネガ型感光性組成物、ネガ型感光性平版印刷版及びその現像方法 |
| TW475098B (en) * | 1995-10-27 | 2002-02-01 | Tokyo Ohka Kogyo Co Ltd | Photosensitive resin composition and photosensitive resin laminated film containing the same |
| JP3832099B2 (ja) * | 1998-07-24 | 2006-10-11 | Ｊｓｒ株式会社 | バンプ形成用材料および配線形成用材料 |
| US6426176B1 (en) * | 1999-01-06 | 2002-07-30 | Intel Corporation | Method of forming a protective conductive structure on an integrated circuit package interconnection |
| JP4579427B2 (ja) | 2001-01-23 | 2010-11-10 | コダック株式会社 | 感光性平版印刷版及び画像形成方法 |
| JP4048791B2 (ja) | 2002-02-18 | 2008-02-20 | Ｊｓｒ株式会社 | 感放射線性樹脂組成物 |
| TW200600975A (en) * | 2004-02-20 | 2006-01-01 | Jsr Corp | Bilayer laminated film for bump formation and method of bump formation |
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2005
- 2005-03-24 US US10/593,972 patent/US7482111B2/en active Active
- 2005-03-24 EP EP05726999A patent/EP1746461A4/fr not_active Withdrawn
- 2005-03-24 WO PCT/JP2005/005417 patent/WO2005091072A1/fr active Application Filing
- 2005-03-24 CN CNA2005800090596A patent/CN1934497A/zh active Pending
- 2005-03-24 KR KR1020067021971A patent/KR20070007153A/ko not_active Application Discontinuation
- 2005-03-24 TW TW094109149A patent/TW200604739A/zh unknown
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2006285035A (ja) * | 2005-04-01 | 2006-10-19 | Jsr Corp | ネガ型感放射線性樹脂組成物 |
| JP4655726B2 (ja) * | 2005-04-01 | 2011-03-23 | Ｊｓｒ株式会社 | ネガ型感放射線性樹脂組成物 |
Also Published As
| Publication number | Publication date |
|---|---|
| CN1934497A (zh) | 2007-03-21 |
| EP1746461A4 (fr) | 2011-02-02 |
| JP2005274920A (ja) | 2005-10-06 |
| KR20070007153A (ko) | 2007-01-12 |
| WO2005091072A1 (fr) | 2005-09-29 |
| EP1746461A1 (fr) | 2007-01-24 |
| US7482111B2 (en) | 2009-01-27 |
| TW200604739A (en) | 2006-02-01 |
| US20070190450A1 (en) | 2007-08-16 |
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