JP4350906B2 - アズラクトン共重合体をベースとする光硬化性および光パターナブルヒドロゲルマトリックス - Google Patents

アズラクトン共重合体をベースとする光硬化性および光パターナブルヒドロゲルマトリックス Download PDF

Info

Publication number
JP4350906B2
JP4350906B2 JP2000580047A JP2000580047A JP4350906B2 JP 4350906 B2 JP4350906 B2 JP 4350906B2 JP 2000580047 A JP2000580047 A JP 2000580047A JP 2000580047 A JP2000580047 A JP 2000580047A JP 4350906 B2 JP4350906 B2 JP 4350906B2
Authority
JP
Japan
Prior art keywords
azlactone
composition
hydrogel
product
substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2000580047A
Other languages
English (en)
Japanese (ja)
Other versions
JP2002529543A (ja
JP2002529543A5 (enExample
Inventor
リュー，チエ
ジー． ベンツェン，ジェームズ
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
3M Co
Original Assignee
3M Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 3M Co filed Critical 3M Co
Publication of JP2002529543A publication Critical patent/JP2002529543A/ja
Publication of JP2002529543A5 publication Critical patent/JP2002529543A5/ja
Application granted granted Critical
Publication of JP4350906B2 publication Critical patent/JP4350906B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Images

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/008—Azides
    • G03F7/012—Macromolecular azides; Macromolecular additives, e.g. binders
    • G03F7/0125—Macromolecular azides; Macromolecular additives, e.g. binders characterised by the polymeric binder or the macromolecular additives other than the macromolecular azides
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10—Esters
    • C08F220/12—Esters of monohydric alcohols or phenols
    • C08F220/14—Methyl esters, e.g. methyl (meth)acrylate
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0047—Photosensitive materials characterised by additives for obtaining a metallic or ceramic pattern, e.g. by firing
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/095—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having more than one photosensitive layer
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/249921—Web or sheet containing structurally defined element or component
    • Y10T428/249953—Composite having voids in a component [e.g., porous, cellular, etc.]

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Organic Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Medicinal Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Ceramic Engineering (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Apparatus Associated With Microorganisms And Enzymes (AREA)
  • Immobilizing And Processing Of Enzymes And Microorganisms (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
JP2000580047A 1998-10-30 1999-03-08 アズラクトン共重合体をベースとする光硬化性および光パターナブルヒドロゲルマトリックス Expired - Fee Related JP4350906B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US09/183,197 US6156478A (en) 1998-10-30 1998-10-30 Photocurable and photopatternable hydrogel matrix based on azlactone copolymers
US09/183,197 1998-10-30
PCT/US1999/005143 WO2000026725A1 (en) 1998-10-30 1999-03-08 Photocurable and photopatternable hydrogel matrix based on azlactone copolymers

Publications (3)

Publication Number Publication Date
JP2002529543A JP2002529543A (ja) 2002-09-10
JP2002529543A5 JP2002529543A5 (enExample) 2006-05-11
JP4350906B2 true JP4350906B2 (ja) 2009-10-28

Family

ID=22671857

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2000580047A Expired - Fee Related JP4350906B2 (ja) 1998-10-30 1999-03-08 アズラクトン共重合体をベースとする光硬化性および光パターナブルヒドロゲルマトリックス

Country Status (8)

Country Link
US (2) US6156478A (enExample)
EP (1) EP1127293B1 (enExample)
JP (1) JP4350906B2 (enExample)
KR (1) KR100554478B1 (enExample)
CN (1) CN1325505A (enExample)
AU (1) AU749808B2 (enExample)
DE (1) DE69912300T2 (enExample)
WO (1) WO2000026725A1 (enExample)

Families Citing this family (28)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7534543B2 (en) * 1996-04-15 2009-05-19 3M Innovative Properties Company Texture control of thin film layers prepared via laser induced thermal imaging
US6376619B1 (en) * 1998-04-13 2002-04-23 3M Innovative Properties Company High density, miniaturized arrays and methods of manufacturing same
US7638464B2 (en) 1999-04-26 2009-12-29 Biocept, Inc. Three dimensional format biochips
US6482638B1 (en) * 1999-12-09 2002-11-19 3M Innovative Properties Company Heat-relaxable substrates and arrays
JP2004518138A (ja) * 2000-10-26 2004-06-17 バイオセプト インコーポレイテッド ３次元型バイオチップ
US6686431B2 (en) * 2000-11-01 2004-02-03 Avery Dennison Corporation Optical coating having low refractive index
EP1245272A1 (en) * 2001-03-30 2002-10-02 Ucb S.A. Substrates, preparation and use
US6794458B2 (en) * 2001-05-18 2004-09-21 3M Innovative Properties Company Azlactone-functional hydrophilic coatings and hydrogels
US20030040125A1 (en) * 2001-08-21 2003-02-27 3M Innovative Properties Company Methods for performing immunological assays
US7223350B2 (en) * 2002-03-29 2007-05-29 International Business Machines Corporation Planarization in an encapsulation process for thin film surfaces
US20030052003A1 (en) * 2002-10-15 2003-03-20 Kelly Patrick Cast analyte diffusion-limiting membranes using photopolymerizable hydrophylic monomers
WO2004076511A2 (en) * 2003-02-21 2004-09-10 Ciphergen Biosystems, Inc. Photocrosslinked hydrogel surface coatings
US6762257B1 (en) * 2003-05-05 2004-07-13 3M Innovative Properties Company Azlactone chain transfer agents for radical polymerization
JP4373260B2 (ja) * 2004-03-29 2009-11-25 一則 片岡 高分子複合体
EP1858959A1 (en) * 2005-02-16 2007-11-28 3M Innovative Properties Company Method of making topographically patterned coatings
JP2008532737A (ja) * 2005-02-16 2008-08-21 スリーエム イノベイティブ プロパティズ カンパニー モルフォロジー的にパターン化されたコーティングを製造する方法
JP2006316010A (ja) * 2005-05-13 2006-11-24 Institute Of Physical & Chemical Research 物質固定化剤、物質固定化方法および物質固定化基体
US7396631B2 (en) * 2005-10-07 2008-07-08 3M Innovative Properties Company Radiation curable thermal transfer elements
US7678526B2 (en) * 2005-10-07 2010-03-16 3M Innovative Properties Company Radiation curable thermal transfer elements
US8513322B2 (en) * 2007-05-31 2013-08-20 3M Innovative Properties Company Polymeric beads and methods of making polymeric beads
JP5432175B2 (ja) 2007-12-12 2014-03-05 スリーエム イノベイティブ プロパティズ カンパニー 物品の製造方法及び物品
BRPI0820704A2 (pt) * 2007-12-12 2015-06-16 3M Innovative Proferties Company Métodos de fabricação de materiais poliméricos moldados
BRPI0914610B1 (pt) 2008-06-26 2018-03-06 3M Innovative Properties Company Suporte sólido com uma cadeia enxertada
US9296870B2 (en) * 2009-07-27 2016-03-29 The Trustees Of Columbia University In The City Of New York Modification of surfaces with nanoparticles
US10272180B2 (en) * 2014-09-09 2019-04-30 University Of Washington Functionalized zwitterionic and mixed charge polymers, related hydrogels, and methods for their use
TWI648271B (zh) 2014-09-23 2019-01-21 日商住友電木股份有限公司 二氮環丙烯化合物及由其衍生之組成物
EP3995828A1 (en) * 2020-11-04 2022-05-11 MicroCoat Biotechnologie GmbH Novel functionalized hydrogel coatings of assay plates and uses thereof
CN114839835B (zh) * 2022-03-18 2025-12-09 清华大学 量子点的无损光刻图案化方法和设备

Family Cites Families (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1745348A1 (de) * 1967-12-01 1971-09-09 Roehm Gmbh Azlactongruppen enthaltende Mischpolymerisate
US4451619A (en) * 1982-09-30 1984-05-29 Minnesota Mining And Manufacturing Company Method of hydrophilizing or hydrophobizing polymers
US5336742A (en) * 1987-03-13 1994-08-09 Minnesota Mining And Manufacturing Company Polymeric supports
US4871824A (en) * 1987-03-13 1989-10-03 Minnesota Mining And Manufacturing Company Variably crosslinked polymeric supports
US4737560A (en) * 1987-03-13 1988-04-12 Minnesota Mining And Manufacturing Company Polymer beads
US5292840A (en) * 1987-03-13 1994-03-08 Minnesota Mining And Manufacturing Company Polymeric supports
US5013795A (en) * 1989-04-10 1991-05-07 Minnesota Mining And Manufacturing Company Azlactone graft copolymers
US5744101A (en) * 1989-06-07 1998-04-28 Affymax Technologies N.V. Photolabile nucleoside protecting groups
US4981933A (en) * 1989-06-23 1991-01-01 Polaroid Corporation Azlactone copolymers
JPH0450946A (ja) * 1990-06-15 1992-02-19 Fujitsu Ltd 放射線レジストとパターン形成方法
US5200471A (en) * 1990-11-05 1993-04-06 Minnesota Mining And Manufacturing Company Biomolecules covalently immobilized with a high bound specific biological activity and method of preparing same
US5235015A (en) * 1991-02-21 1993-08-10 Minnesota Mining And Manufacturing Company High speed aqueous solvent developable photopolymer compositions
RU1794088C (ru) * 1991-03-18 1993-02-07 Институт Молекулярной Биологии Ан@ Ссср Способ определени нуклеотидной последовательности ДНК и устройство дл его осуществлени
US5352714A (en) * 1991-11-05 1994-10-04 Bausch & Lomb Incorporated Wettable silicone hydrogel compositions and methods for their manufacture
US5632957A (en) * 1993-11-01 1997-05-27 Nanogen Molecular biological diagnostic systems including electrodes
US5605662A (en) * 1993-11-01 1997-02-25 Nanogen, Inc. Active programmable electronic devices for molecular biological analysis and diagnostics
US5344701A (en) * 1992-06-09 1994-09-06 Minnesota Mining And Manufacturing Company Porous supports having azlactone-functional surfaces
WO1996024075A1 (en) * 1995-02-03 1996-08-08 Novartis Ag Crosslinked polymers containing ester or amide groups
EP0808348B1 (en) * 1995-02-10 1999-05-06 Minnesota Mining And Manufacturing Company Cross-linkable pressure sensitive adhesive and process for the production of an article coated with a crosslinked pressure sensitive adhesive
KR100206664B1 (ko) * 1995-06-28 1999-07-01 세키사와 다다시 화학증폭형 레지스트 조성물 및 레지스트 패턴의 형성방법
US5725989A (en) * 1996-04-15 1998-03-10 Chang; Jeffrey C. Laser addressable thermal transfer imaging element with an interlayer

Also Published As

Publication number Publication date
CN1325505A (zh) 2001-12-05
US6156478A (en) 2000-12-05
WO2000026725A1 (en) 2000-05-11
JP2002529543A (ja) 2002-09-10
EP1127293A1 (en) 2001-08-29
AU749808B2 (en) 2002-07-04
KR20010089379A (ko) 2001-10-06
AU2902199A (en) 2000-05-22
DE69912300D1 (de) 2003-11-27
US6372407B1 (en) 2002-04-16
KR100554478B1 (ko) 2006-03-03
DE69912300T2 (de) 2004-07-29
EP1127293B1 (en) 2003-10-22

Similar Documents

Publication Publication Date Title
JP4350906B2 (ja) アズラクトン共重合体をベースとする光硬化性および光パターナブルヒドロゲルマトリックス
US6372813B1 (en) Methods and compositions for attachment of biomolecules to solid supports, hydrogels, and hydrogel arrays
US6664061B2 (en) Use and evaluation of a [2+2] photoaddition in immobilization of oligonucleotides on a three-dimensional hydrogel matrix
Hengsakul et al. Protein patterning with a photoactivatable derivative of biotin
CN1653189B (zh) 制备聚合物涂层的方法
US8664003B2 (en) Chip provided with film having hole pattern with the use of thermoresponsive polymer and method of producing the same
Hong et al. Protein surface patterning using nanoscale PEG hydrogels
US20020115740A1 (en) Hydrogels and hydrogel arrays made from reactive prepolymers crosslinked by [2 + 2] cycloaddition
JP2003515133A (ja) フィルムベースのアドレス可能なプログラマブル電子マトリックス物品およびその製造と使用方法
EP1307414A2 (en) The use and evaluation of a 2+2] photocycloaddition in immobilization of oligonucleotides on a three-dimensional hydrogel matrix
JPH037576A (ja) 細胞の配列制御用具の製法
RU2309959C1 (ru) Применение немодифицированных полимерных материалов для изготовления подложки биочипов, биочип на их основе и способ его изготовления, способ иммобилизации гидрогелей на немодифицированных полимерных материалах
Coq et al. Self-supporting hydrogel stamps for the microcontact printing of proteins
GB2545443A (en) Method for activating click reactions through laser induced forward transfer of molecules
JP2006322709A (ja) 物質固定化基板
US20060111517A1 (en) Recognition layers made of hydrogel based on polyacrylamide for use in biosensor technology
JP4140924B2 (ja) 塗膜形成剤及びドットパタンを有するチップの製造方法
JP2006322708A (ja) 物質固定化方法
JP2006316010A (ja) 物質固定化剤、物質固定化方法および物質固定化基体
Shtylev et al. Immobilization of Protein Macromolecules in Biochip Cells Made of Various Polymers
JP2007516442A (ja) 生体分子を基板上にプリントする分子スタンプ
JP2003136640A (ja) 樹脂硬化物及びその製造方法
JP2007064963A (ja) 生体物質固定用担体

Legal Events

Date Code Title Description
A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20060307

A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20060307

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20081117

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20081125

A601 Written request for extension of time

Free format text: JAPANESE INTERMEDIATE CODE: A601

Effective date: 20090224

A602 Written permission of extension of time

Free format text: JAPANESE INTERMEDIATE CODE: A602

Effective date: 20090303

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20090522

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20090623

A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20090723

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20120731

Year of fee payment: 3

R150 Certificate of patent or registration of utility model

Free format text: JAPANESE INTERMEDIATE CODE: R150

LAPS Cancellation because of no payment of annual fees