CN1325505A - 可光固化和光构图的二氢唑酮共聚物基水凝胶基质 - Google Patents

可光固化和光构图的二氢唑酮共聚物基水凝胶基质 Download PDF

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Publication number
CN1325505A
CN1325505A CN99813055A CN99813055A CN1325505A CN 1325505 A CN1325505 A CN 1325505A CN 99813055 A CN99813055 A CN 99813055A CN 99813055 A CN99813055 A CN 99813055A CN 1325505 A CN1325505 A CN 1325505A
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CN
China
Prior art keywords
azlactone
composition
layer
hydrogel
substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN99813055A
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English (en)
Chinese (zh)
Inventor
刘杰
J·G·本特森
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
3M Co
Original Assignee
Minnesota Mining and Manufacturing Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Minnesota Mining and Manufacturing Co filed Critical Minnesota Mining and Manufacturing Co
Publication of CN1325505A publication Critical patent/CN1325505A/zh
Pending legal-status Critical Current

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/008—Azides
    • G03F7/012—Macromolecular azides; Macromolecular additives, e.g. binders
    • G03F7/0125—Macromolecular azides; Macromolecular additives, e.g. binders characterised by the polymeric binder or the macromolecular additives other than the macromolecular azides
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10—Esters
    • C08F220/12—Esters of monohydric alcohols or phenols
    • C08F220/14—Methyl esters, e.g. methyl (meth)acrylate
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0047—Photosensitive materials characterised by additives for obtaining a metallic or ceramic pattern, e.g. by firing
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/095—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having more than one photosensitive layer
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/249921—Web or sheet containing structurally defined element or component
    • Y10T428/249953—Composite having voids in a component [e.g., porous, cellular, etc.]

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Organic Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Medicinal Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Ceramic Engineering (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Apparatus Associated With Microorganisms And Enzymes (AREA)
  • Immobilizing And Processing Of Enzymes And Microorganisms (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
CN99813055A 1998-10-30 1999-03-08 可光固化和光构图的二氢唑酮共聚物基水凝胶基质 Pending CN1325505A (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US09/183,197 US6156478A (en) 1998-10-30 1998-10-30 Photocurable and photopatternable hydrogel matrix based on azlactone copolymers
US09/183,197 1998-10-30

Publications (1)

Publication Number Publication Date
CN1325505A true CN1325505A (zh) 2001-12-05

Family

ID=22671857

Family Applications (1)

Application Number Title Priority Date Filing Date
CN99813055A Pending CN1325505A (zh) 1998-10-30 1999-03-08 可光固化和光构图的二氢唑酮共聚物基水凝胶基质

Country Status (8)

Country Link
US (2) US6156478A (enExample)
EP (1) EP1127293B1 (enExample)
JP (1) JP4350906B2 (enExample)
KR (1) KR100554478B1 (enExample)
CN (1) CN1325505A (enExample)
AU (1) AU749808B2 (enExample)
DE (1) DE69912300T2 (enExample)
WO (1) WO2000026725A1 (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN100475872C (zh) * 2003-05-05 2009-04-08 3M创新有限公司 用于自由基聚合的二氢唑酮链转移剂

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US7534543B2 (en) * 1996-04-15 2009-05-19 3M Innovative Properties Company Texture control of thin film layers prepared via laser induced thermal imaging
US6376619B1 (en) * 1998-04-13 2002-04-23 3M Innovative Properties Company High density, miniaturized arrays and methods of manufacturing same
US7638464B2 (en) 1999-04-26 2009-12-29 Biocept, Inc. Three dimensional format biochips
US6482638B1 (en) * 1999-12-09 2002-11-19 3M Innovative Properties Company Heat-relaxable substrates and arrays
JP2004518138A (ja) * 2000-10-26 2004-06-17 バイオセプト インコーポレイテッド ３次元型バイオチップ
US6686431B2 (en) * 2000-11-01 2004-02-03 Avery Dennison Corporation Optical coating having low refractive index
EP1245272A1 (en) * 2001-03-30 2002-10-02 Ucb S.A. Substrates, preparation and use
US6794458B2 (en) * 2001-05-18 2004-09-21 3M Innovative Properties Company Azlactone-functional hydrophilic coatings and hydrogels
US20030040125A1 (en) * 2001-08-21 2003-02-27 3M Innovative Properties Company Methods for performing immunological assays
US7223350B2 (en) * 2002-03-29 2007-05-29 International Business Machines Corporation Planarization in an encapsulation process for thin film surfaces
US20030052003A1 (en) * 2002-10-15 2003-03-20 Kelly Patrick Cast analyte diffusion-limiting membranes using photopolymerizable hydrophylic monomers
WO2004076511A2 (en) * 2003-02-21 2004-09-10 Ciphergen Biosystems, Inc. Photocrosslinked hydrogel surface coatings
JP4373260B2 (ja) * 2004-03-29 2009-11-25 一則 片岡 高分子複合体
EP1858959A1 (en) * 2005-02-16 2007-11-28 3M Innovative Properties Company Method of making topographically patterned coatings
JP2008532737A (ja) * 2005-02-16 2008-08-21 スリーエム イノベイティブ プロパティズ カンパニー モルフォロジー的にパターン化されたコーティングを製造する方法
JP2006316010A (ja) * 2005-05-13 2006-11-24 Institute Of Physical & Chemical Research 物質固定化剤、物質固定化方法および物質固定化基体
US7396631B2 (en) * 2005-10-07 2008-07-08 3M Innovative Properties Company Radiation curable thermal transfer elements
US7678526B2 (en) * 2005-10-07 2010-03-16 3M Innovative Properties Company Radiation curable thermal transfer elements
US8513322B2 (en) * 2007-05-31 2013-08-20 3M Innovative Properties Company Polymeric beads and methods of making polymeric beads
JP5432175B2 (ja) 2007-12-12 2014-03-05 スリーエム イノベイティブ プロパティズ カンパニー 物品の製造方法及び物品
BRPI0820704A2 (pt) * 2007-12-12 2015-06-16 3M Innovative Proferties Company Métodos de fabricação de materiais poliméricos moldados
BRPI0914610B1 (pt) 2008-06-26 2018-03-06 3M Innovative Properties Company Suporte sólido com uma cadeia enxertada
US9296870B2 (en) * 2009-07-27 2016-03-29 The Trustees Of Columbia University In The City Of New York Modification of surfaces with nanoparticles
US10272180B2 (en) * 2014-09-09 2019-04-30 University Of Washington Functionalized zwitterionic and mixed charge polymers, related hydrogels, and methods for their use
TWI648271B (zh) 2014-09-23 2019-01-21 日商住友電木股份有限公司 二氮環丙烯化合物及由其衍生之組成物
EP3995828A1 (en) * 2020-11-04 2022-05-11 MicroCoat Biotechnologie GmbH Novel functionalized hydrogel coatings of assay plates and uses thereof
CN114839835B (zh) * 2022-03-18 2025-12-09 清华大学 量子点的无损光刻图案化方法和设备

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US4451619A (en) * 1982-09-30 1984-05-29 Minnesota Mining And Manufacturing Company Method of hydrophilizing or hydrophobizing polymers
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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN100475872C (zh) * 2003-05-05 2009-04-08 3M创新有限公司 用于自由基聚合的二氢唑酮链转移剂

Also Published As

Publication number Publication date
US6156478A (en) 2000-12-05
WO2000026725A1 (en) 2000-05-11
JP2002529543A (ja) 2002-09-10
JP4350906B2 (ja) 2009-10-28
EP1127293A1 (en) 2001-08-29
AU749808B2 (en) 2002-07-04
KR20010089379A (ko) 2001-10-06
AU2902199A (en) 2000-05-22
DE69912300D1 (de) 2003-11-27
US6372407B1 (en) 2002-04-16
KR100554478B1 (ko) 2006-03-03
DE69912300T2 (de) 2004-07-29
EP1127293B1 (en) 2003-10-22

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