DE69912300T2 - Photohärtbare und photostrukturierbare, azlacton-kopolymerisate enthaltende hydrogelmatrix - Google Patents

Photohärtbare und photostrukturierbare, azlacton-kopolymerisate enthaltende hydrogelmatrix Download PDF

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Publication number
DE69912300T2
DE69912300T2 DE1999612300 DE69912300T DE69912300T2 DE 69912300 T2 DE69912300 T2 DE 69912300T2 DE 1999612300 DE1999612300 DE 1999612300 DE 69912300 T DE69912300 T DE 69912300T DE 69912300 T2 DE69912300 T2 DE 69912300T2
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DE
Germany
Prior art keywords
azlactone
composition
layer
light
hydrogel
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE1999612300
Other languages
German (de)
English (en)
Other versions
DE69912300D1 (de
Inventor
Jie Liu
G. James BENTSEN
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
3M Co
Original Assignee
Minnesota Mining and Manufacturing Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Minnesota Mining and Manufacturing Co filed Critical Minnesota Mining and Manufacturing Co
Application granted granted Critical
Publication of DE69912300D1 publication Critical patent/DE69912300D1/de
Publication of DE69912300T2 publication Critical patent/DE69912300T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/008Azides
    • G03F7/012Macromolecular azides; Macromolecular additives, e.g. binders
    • G03F7/0125Macromolecular azides; Macromolecular additives, e.g. binders characterised by the polymeric binder or the macromolecular additives other than the macromolecular azides
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10Esters
    • C08F220/12Esters of monohydric alcohols or phenols
    • C08F220/14Methyl esters, e.g. methyl (meth)acrylate
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007Filters, e.g. additive colour filters; Components for display devices
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/0047Photosensitive materials characterised by additives for obtaining a metallic or ceramic pattern, e.g. by firing
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/038Macromolecular compounds which are rendered insoluble or differentially wettable
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/09Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/095Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having more than one photosensitive layer
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00Stock material or miscellaneous articles
    • Y10T428/249921Web or sheet containing structurally defined element or component
    • Y10T428/249953Composite having voids in a component [e.g., porous, cellular, etc.]

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Organic Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Medicinal Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Ceramic Engineering (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Apparatus Associated With Microorganisms And Enzymes (AREA)
  • Immobilizing And Processing Of Enzymes And Microorganisms (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
DE1999612300 1998-10-30 1999-03-08 Photohärtbare und photostrukturierbare, azlacton-kopolymerisate enthaltende hydrogelmatrix Expired - Lifetime DE69912300T2 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US183197 1988-04-19
US09/183,197 US6156478A (en) 1998-10-30 1998-10-30 Photocurable and photopatternable hydrogel matrix based on azlactone copolymers
PCT/US1999/005143 WO2000026725A1 (en) 1998-10-30 1999-03-08 Photocurable and photopatternable hydrogel matrix based on azlactone copolymers

Publications (2)

Publication Number Publication Date
DE69912300D1 DE69912300D1 (de) 2003-11-27
DE69912300T2 true DE69912300T2 (de) 2004-07-29

Family

ID=22671857

Family Applications (1)

Application Number Title Priority Date Filing Date
DE1999612300 Expired - Lifetime DE69912300T2 (de) 1998-10-30 1999-03-08 Photohärtbare und photostrukturierbare, azlacton-kopolymerisate enthaltende hydrogelmatrix

Country Status (8)

Country Link
US (2) US6156478A (enExample)
EP (1) EP1127293B1 (enExample)
JP (1) JP4350906B2 (enExample)
KR (1) KR100554478B1 (enExample)
CN (1) CN1325505A (enExample)
AU (1) AU749808B2 (enExample)
DE (1) DE69912300T2 (enExample)
WO (1) WO2000026725A1 (enExample)

Families Citing this family (28)

* Cited by examiner, † Cited by third party
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US7534543B2 (en) * 1996-04-15 2009-05-19 3M Innovative Properties Company Texture control of thin film layers prepared via laser induced thermal imaging
US6376619B1 (en) * 1998-04-13 2002-04-23 3M Innovative Properties Company High density, miniaturized arrays and methods of manufacturing same
US7638464B2 (en) 1999-04-26 2009-12-29 Biocept, Inc. Three dimensional format biochips
US6482638B1 (en) * 1999-12-09 2002-11-19 3M Innovative Properties Company Heat-relaxable substrates and arrays
DE60137523D1 (de) * 2000-10-26 2009-03-12 Biocept Inc Dreidimensionales format aufweisender biochip
US6686431B2 (en) * 2000-11-01 2004-02-03 Avery Dennison Corporation Optical coating having low refractive index
EP1245272A1 (en) * 2001-03-30 2002-10-02 Ucb S.A. Substrates, preparation and use
US6794458B2 (en) 2001-05-18 2004-09-21 3M Innovative Properties Company Azlactone-functional hydrophilic coatings and hydrogels
US20030040125A1 (en) * 2001-08-21 2003-02-27 3M Innovative Properties Company Methods for performing immunological assays
US7223350B2 (en) * 2002-03-29 2007-05-29 International Business Machines Corporation Planarization in an encapsulation process for thin film surfaces
US20030052003A1 (en) * 2002-10-15 2003-03-20 Kelly Patrick Cast analyte diffusion-limiting membranes using photopolymerizable hydrophylic monomers
WO2004076511A2 (en) * 2003-02-21 2004-09-10 Ciphergen Biosystems, Inc. Photocrosslinked hydrogel surface coatings
US6762257B1 (en) * 2003-05-05 2004-07-13 3M Innovative Properties Company Azlactone chain transfer agents for radical polymerization
JP4373260B2 (ja) * 2004-03-29 2009-11-25 一則 片岡 高分子複合体
US8182871B2 (en) * 2005-02-16 2012-05-22 3M Innovative Properties Company Method of making topographically patterned coatings
CN101119809A (zh) * 2005-02-16 2008-02-06 3M创新有限公司 制造形态学图案涂层的方法
JP2006316010A (ja) * 2005-05-13 2006-11-24 Institute Of Physical & Chemical Research 物質固定化剤、物質固定化方法および物質固定化基体
US7396631B2 (en) * 2005-10-07 2008-07-08 3M Innovative Properties Company Radiation curable thermal transfer elements
US7678526B2 (en) * 2005-10-07 2010-03-16 3M Innovative Properties Company Radiation curable thermal transfer elements
US8513322B2 (en) * 2007-05-31 2013-08-20 3M Innovative Properties Company Polymeric beads and methods of making polymeric beads
CN101990430B (zh) * 2007-12-12 2015-05-27 3M创新有限公司 微结构抗微生物膜
CA2709289A1 (en) * 2007-12-12 2009-06-18 3M Innovative Properties Company Hydrophilic gel materials and methods of making
BRPI0914610B1 (pt) 2008-06-26 2018-03-06 3M Innovative Properties Company Suporte sólido com uma cadeia enxertada
US9296870B2 (en) * 2009-07-27 2016-03-29 The Trustees Of Columbia University In The City Of New York Modification of surfaces with nanoparticles
US10272180B2 (en) * 2014-09-09 2019-04-30 University Of Washington Functionalized zwitterionic and mixed charge polymers, related hydrogels, and methods for their use
TWI648271B (zh) 2014-09-23 2019-01-21 日商住友電木股份有限公司 二氮環丙烯化合物及由其衍生之組成物
EP3995828A1 (en) * 2020-11-04 2022-05-11 MicroCoat Biotechnologie GmbH Novel functionalized hydrogel coatings of assay plates and uses thereof
CN114839835B (zh) * 2022-03-18 2025-12-09 清华大学 量子点的无损光刻图案化方法和设备

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DE1745348A1 (de) * 1967-12-01 1971-09-09 Roehm Gmbh Azlactongruppen enthaltende Mischpolymerisate
US4451619A (en) * 1982-09-30 1984-05-29 Minnesota Mining And Manufacturing Company Method of hydrophilizing or hydrophobizing polymers
US5292840A (en) * 1987-03-13 1994-03-08 Minnesota Mining And Manufacturing Company Polymeric supports
US4737560A (en) * 1987-03-13 1988-04-12 Minnesota Mining And Manufacturing Company Polymer beads
US5336742A (en) * 1987-03-13 1994-08-09 Minnesota Mining And Manufacturing Company Polymeric supports
US4871824A (en) * 1987-03-13 1989-10-03 Minnesota Mining And Manufacturing Company Variably crosslinked polymeric supports
US5013795A (en) * 1989-04-10 1991-05-07 Minnesota Mining And Manufacturing Company Azlactone graft copolymers
US5744101A (en) * 1989-06-07 1998-04-28 Affymax Technologies N.V. Photolabile nucleoside protecting groups
US4981933A (en) * 1989-06-23 1991-01-01 Polaroid Corporation Azlactone copolymers
JPH0450946A (ja) * 1990-06-15 1992-02-19 Fujitsu Ltd 放射線レジストとパターン形成方法
US5200471A (en) * 1990-11-05 1993-04-06 Minnesota Mining And Manufacturing Company Biomolecules covalently immobilized with a high bound specific biological activity and method of preparing same
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RU1794088C (ru) * 1991-03-18 1993-02-07 Институт Молекулярной Биологии Ан@ Ссср Способ определени нуклеотидной последовательности ДНК и устройство дл его осуществлени
US5352714A (en) * 1991-11-05 1994-10-04 Bausch & Lomb Incorporated Wettable silicone hydrogel compositions and methods for their manufacture
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WO1996024644A1 (en) * 1995-02-10 1996-08-15 Minnesota Mining And Manufacturing Company Process for the production of an article coated with a crosslinked pressure sensitive adhesive
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Also Published As

Publication number Publication date
EP1127293A1 (en) 2001-08-29
KR100554478B1 (ko) 2006-03-03
KR20010089379A (ko) 2001-10-06
CN1325505A (zh) 2001-12-05
EP1127293B1 (en) 2003-10-22
JP4350906B2 (ja) 2009-10-28
JP2002529543A (ja) 2002-09-10
WO2000026725A1 (en) 2000-05-11
US6372407B1 (en) 2002-04-16
US6156478A (en) 2000-12-05
AU2902199A (en) 2000-05-22
AU749808B2 (en) 2002-07-04
DE69912300D1 (de) 2003-11-27

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