JP4343640B2 - 透明基板の位置合わせ方法 - Google Patents

透明基板の位置合わせ方法 Download PDF

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Publication number
JP4343640B2
JP4343640B2 JP2003344013A JP2003344013A JP4343640B2 JP 4343640 B2 JP4343640 B2 JP 4343640B2 JP 2003344013 A JP2003344013 A JP 2003344013A JP 2003344013 A JP2003344013 A JP 2003344013A JP 4343640 B2 JP4343640 B2 JP 4343640B2
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Japan
Prior art keywords
substrate
outer peripheral
alignment
transparent substrate
measurement
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Expired - Fee Related
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JP2003344013A
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Japanese (ja)
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JP2005109376A (ja
JP2005109376A5 (enrdf_load_stackoverflow
Inventor
文昭 北山
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Canon Inc
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Canon Inc
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Priority to JP2003344013A priority Critical patent/JP4343640B2/ja
Publication of JP2005109376A publication Critical patent/JP2005109376A/ja
Publication of JP2005109376A5 publication Critical patent/JP2005109376A5/ja
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Publication of JP4343640B2 publication Critical patent/JP4343640B2/ja
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  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP2003344013A 2003-10-02 2003-10-02 透明基板の位置合わせ方法 Expired - Fee Related JP4343640B2 (ja)

Priority Applications (1)

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JP2003344013A JP4343640B2 (ja) 2003-10-02 2003-10-02 透明基板の位置合わせ方法

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Application Number Priority Date Filing Date Title
JP2003344013A JP4343640B2 (ja) 2003-10-02 2003-10-02 透明基板の位置合わせ方法

Publications (3)

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JP2005109376A JP2005109376A (ja) 2005-04-21
JP2005109376A5 JP2005109376A5 (enrdf_load_stackoverflow) 2006-11-16
JP4343640B2 true JP4343640B2 (ja) 2009-10-14

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JP2003344013A Expired - Fee Related JP4343640B2 (ja) 2003-10-02 2003-10-02 透明基板の位置合わせ方法

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US11333986B2 (en) 2020-03-12 2022-05-17 Canon Kabushiki Kaisha Detection apparatus, exposure apparatus, and article manufacturing method

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010032372A (ja) 2008-07-29 2010-02-12 Toshiba Corp エッジ検出方法
JP2014086578A (ja) * 2012-10-19 2014-05-12 Applied Materials Inc オリエンタチャンバ
US11043437B2 (en) * 2019-01-07 2021-06-22 Applied Materials, Inc. Transparent substrate with light blocking edge exclusion zone

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US11333986B2 (en) 2020-03-12 2022-05-17 Canon Kabushiki Kaisha Detection apparatus, exposure apparatus, and article manufacturing method

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Publication number Publication date
JP2005109376A (ja) 2005-04-21

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